JP5412131B2 - Substrate processing apparatus and substrate processing method - Google Patents

Description

  The present invention relates to a substrate processing apparatus and a substrate processing method, and more particularly to a substrate processing apparatus and a substrate processing method used for processing such as cleaning and surface modification of a liquid crystal panel substrate and a semiconductor substrate.

  In the manufacturing process of substrates such as liquid crystal panel substrates and semiconductor substrates, the substrate processing apparatus supplies liquid such as pure water or chemicals to the substrate, and performs processing such as cleaning the substrate, and adheres to the surface of the substrate. Remove the particles.

  In order to clean the substrate, Patent Document 1 proposes to connect a microbubble generator to the substrate processing apparatus and supply pure water containing microbubbles from the microbubble generator to the substrate in the processing tank. Has been.

  The structure of this micro bubble generating part is described in FIG. 9 of Patent Document 1, and the micro bubble generating part has a structure in which a water supply pipe and an air supply path surrounding the water supply pipe are formed in the casing. ing. The air supply path is connected to a nitrogen gas supply unit and a vacuum pump, and the pressure of nitrogen gas flowing through the air supply path can be adjusted by operating the vacuum pump to increase or decrease the pressure in the casing. Thereby, when the inside of a casing is pressure-reduced, excess gas precipitates from the pure water which flows through a water pipe, becomes supersaturated, and the gas flows out to an air supply path through a hollow piece separation membrane.

JP 2006-179765 A

  However, the technique described in Patent Document 1 uses microbubbles. Microbubbles having a particle size larger than the particle size of the nanobubbles are unnecessary for the substrate processing because they adhere to the substrate and suppress the reaction necessary for the substrate processing. In the step of including microbubbles in the liquid, when nanobubbles are generated, the microbubbles are also present in the liquid at the same time. Therefore, it is necessary to separate the nanobubbles from the microbubbles (including micronano bubbles) as much as possible. Conventionally, in order to separate nanobubbles from microbubbles, it is necessary to wait for the microbubbles to rise in the liquid and be released from the liquid to the atmosphere over time.

  For this reason, the standby time for separating nanobubbles and microbubbles is long, and in order to affect the productivity of the substrate, nanobubbles and microbubbles are separated in a short time, and preferably only the liquid containing nanobubbles is applied to the substrate. It is hoped that it can be supplied.

  The present invention has been made in view of the above, and an object of the present invention is to separate nanobubbles and microbubbles in a liquid in a short time, and to supply and use a liquid containing a large amount of nanobubbles to a substrate. An object of the present invention is to provide a substrate processing apparatus and a substrate processing method.

The substrate processing apparatus of the present invention is a substrate processing apparatus for supplying a liquid to a substrate and processing the substrate, and a microbubble generator for generating a liquid including microbubbles including nanobubbles by mixing the liquid and the gas; together with reservoir for storing a liquid containing the microbubbles, the liquid guide unit in which the liquid containing the microbubbles is pressurized feeding in the storage unit, in the liquid feeding direction upstream side of the liquid in the liquid guide unit A negative electrode and a positive electrode facing each other and opposed to the liquid to be fed, a first chamber corresponding to the minus electrode and the plus electrode disposed on the downstream side in the liquid feeding direction of the liquid in the liquid guide portion and a microbubble separator to have a second chamber corresponding to the electrode, a liquid containing microbubbles that are supplied to the second chamber, characterized that you supplied to the substrate.

The substrate processing method of the present invention is a substrate processing method by supplying a liquid to the substrate to the processing of the substrate, the microbubble generator, a liquid and a gas by mixing to produce a liquid containing microbubbles containing nanobubbles , When the liquid containing the microbubbles is accumulated in the storage unit, and the liquid containing the microbubbles in the storage unit is passed through the liquid guide unit in a pressurized state, the upstream side in the liquid feeding direction of the liquid guide unit A first chamber corresponding to the minus electrode and a first electrode corresponding to the plus electrode provided between the plus electrode and the minus electrode disposed opposite to each other and provided downstream of the liquid guide portion in the liquid feeding direction. Of the two chambers, a liquid containing microbubbles supplied to the second chamber is supplied to the substrate.

  According to the present invention, it is possible to provide a substrate processing apparatus and a substrate processing method capable of separating nanobubbles and microbubbles in a liquid in a short time and supplying and using a liquid containing a large amount of nanobubbles to the substrate. Can do.

It is a block diagram which shows preferable embodiment of the substrate processing apparatus of this invention. It is a figure which shows the structural example of the process unit of the substrate processing apparatus shown in FIG. It is a figure which further expands and shows the microbubble production | generation separation apparatus shown in FIG.

  Embodiments of the present invention will be described with reference to the drawings.

  FIG. 1 shows a preferred embodiment of the substrate processing apparatus of the present invention.

  A substrate processing apparatus 1 shown in FIG. 1 includes a cassette station 2, a robot 3, and a plurality of processing units 4 and 4.

  The substrate processing apparatus 1 is an apparatus that performs single-wafer processing, and the cassette station 2 has a plurality of cassettes 5 and 5, and each cassette 5 accommodates a plurality of substrates W. An example of the substrate is a semiconductor wafer substrate.

  The robot 3 is disposed between the cassette station 2 and the plurality of processing units 4 and 4. The robot 3 transports the substrate W accommodated in each cassette 5 to the processing unit 4 side. Further, the robot 3 transports the processed substrate W on the processing unit 4 side to another cassette 5 and returns it. Each processing unit 4 is used for cleaning the surface of the substrate W by holding and rotating the substrate W and supplying a liquid containing microbubbles, for example.

  FIG. 2 shows a configuration example of the processing unit 4 of the substrate processing apparatus 1 shown in FIG.

  The single-wafer processing unit 4 shown in FIG. 2 includes a micro-bubble generating / separating device 10, a substrate holding unit 11, a nozzle operation unit 12, a downflow filter-equipped fan 13, a cup 14, and a nozzle 15. And a processing chamber 16 and a control unit 20.

  The substrate holding unit 11 shown in FIG. 2 includes a disk base member 17, a rotating shaft 18, and a motor 19, and the substrate W is detachably fixed on the base member 17. A cup 14, a nozzle 15, a base member 17, and a rotating shaft 18 of a motor 19 are accommodated in the processing chamber 16. A base member 17 is fixed to the tip of the rotating shaft 18. The base member 17 can be continuously rotated in the R direction by the motor 19 operating according to a command from the control unit 20.

  The nozzle 15 shown in FIG. 2 is arranged on the upper part of the substrate W, and when the operation unit 12 is operated according to a command from the control unit 20, the nozzle 15 is moved in the Z direction (vertical direction) and the X direction (radial direction of the substrate W). It can move and supply or inject liquid L containing nanobubble NB.

  FIG. 3 shows an enlarged structure of the microbubble generation / separation apparatus 10 shown in FIG.

  As shown in FIGS. 2 and 3, the microbubble generation / separation apparatus 10 includes a gas supply unit 30, a liquid supply unit 77, a regulator 31, a microbubble generator 32, a liquid storage unit 33, and an electric pump 34. And a microbubble separator 40.

  As shown in FIG. 3, the gas supply unit 30 stores a gas for generating microbubbles, for example, nitrogen gas. The inlet part of the regulator 31 is connected to the gas supply part 30 via a pipe 35, and the outlet part of the regulator 31 is connected to the inlet part 32 </ b> B of the microbubble generator 32 via a pipe 36. . The regulator 31 can adjust the amount of gas in the gas supply unit 30 supplied into the microbubble generator 32 according to a command from the control unit 20.

  Since the liquid supply unit 77 is directly connected to the microbubble generator 32 via a pipe and the gas supply unit 30 is connected via the regulator 31, the microbubble generator 32 is connected to the microbubble generator 32 from the liquid supply unit 77. The liquid and the gas from the gas supply unit 30 are mixed, for example, the liquid L and the gas are swirled so that the microbubbles are mixed in the liquid and the liquid L including the microbubbles can be generated. It is a generator.

  The outlet 32C of the microbubble generator 32 can supply and mix the liquid L containing microbubbles to the liquid L in the liquid storage section 33 via the pipe 37. Note that the liquid L to be used is pure water, for example. The liquid storage unit 33 is a buffer container for temporarily storing the liquid L containing microbubbles.

  The bottom of the liquid storage unit 33 shown in FIG. 3 is connected to the inlet 41 of the microbubble separator 40 via the pipe 38 and the electric pump 34. As a result, when the electric pump 34 is operated according to a command from the control unit 20, the liquid L containing the microbubbles in the liquid storage unit 33 flows from the inlet 41 of the microbubble separator 40 through the pipe 38 to the microbubble separator 40. The liquid can be fed under pressure.

  As shown in FIGS. 2 and 3, the microbubble separator 40 includes a liquid guide 50 and an electric field applying unit 51 disposed around the liquid guide 50.

  As shown in FIG. 3, the liquid guide portion 50 is a cylindrical container, for example, and is made of an electrically insulating material such as resin, glass, or ceramics. However, the portion corresponding to the plus electrode 55 and the minus electrode 56 has a conductor material portion 99 instead of an insulator.

  By the way, the portions corresponding to the plus electrode 55 and the minus electrode 56 can be configured as follows without using the conductor material portion 99. That is, in the conductor material portion 99, a plate-like member such as a flat plate of the conductor is in an exposed state, and the plus electrode 55 and the minus electrode 56 are in contact with the liquid. However, instead of the conductor material portion 99, a plurality of holes are uniformly formed in the flat plate of the insulator, or a plurality of holes are non-uniformly formed in the flat plate of the insulator, so that the conductive material is provided in these holes. A portion may be disposed, and the conductive material portion disposed in the hole may be exposed to the liquid so that the plus electrode 55 and the minus electrode 56 are in contact with the liquid.

  The liquid guide part 50 has a first end face part 52, a second end face part 53, and an outer peripheral part 54. The first end surface portion 52 and the second end surface portion 53 face each other, and the inlet portion 41 is formed at the center of the first end surface portion 52, and the electric pump 34 is connected via the pipe 38. Yes.

  The electric field applying unit 51 includes a plus electrode 55 and a minus electrode 56. The plus electrode 55 and the minus electrode 56 are arranged opposite to the outer side of the outer peripheral portion 54 of the liquid guide portion 50, and the plus electrode 55 and the minus electrode 56 are electrically connected to the power supply unit 150. The control unit 20 instructs the power supply unit 150 so that the power supply unit 150 applies a positive current to the positive electrode 55 and applies a negative current to the negative electrode 56, thereby pressurizing the liquid guide unit 50 and feeding the liquid. A predetermined DC voltage can be applied to the liquid L containing the microbubbles. The plus electrode 55 and the minus electrode 56 are arranged from the first end face portion 52 side of the liquid guide portion 50 to the intermediate position MC of the outer peripheral portion 54 of the liquid guide portion 50 along the central axis CL of the liquid guide portion 50. ing.

  As shown in FIG. 3, a microbubble separation member 60 is disposed along the axial direction CL of the liquid guide 50 inside the liquid guide 50. The microbubble separating member 60 is a separation plate for separating microbubbles based on a difference in diameter of the microbubbles.

  Microbubbles MB and nanobubbles NB coexist in the liquid L containing microbubbles in the liquid storage unit 33. That is, when the microbubble generator 32 generates the liquid L containing microbubbles, the liquid L containing microbubbles includes microbubbles MB as microbubbles and nanobubbles NB as microbubbles. When a liquid crystal panel substrate or a semiconductor substrate is used in a wet process, the microbubble MB having a diameter larger than the diameter of the nanobubble NB adheres to the liquid crystal panel substrate or the semiconductor substrate and suppresses the reaction. Since the bubble MB is not necessary for the processing of the liquid crystal panel substrate or the semiconductor substrate, it is removed as much as possible.

  Here, the microbubbles are microbubbles including concepts such as microbubbles (MB), micronanobubbles (MNB), and nanobubbles (NB). For example, microbubbles are bubbles having a diameter of 10 μm to several tens of μm, micronano bubbles are bubbles having a diameter of several hundred nm to 10 μm, and nanobubbles are bubbles having a diameter of several hundred nm or less.

  Therefore, it is necessary to separate and remove only the microbubbles MB from the liquid L containing microbubbles as much as possible and supply only the liquid L containing nanobubbles NB to the substrate W, for example. The microbubble separator 40 uses a principle of measuring a moving speed difference due to a difference in bubble particle size by applying a voltage to the liquid as employed in, for example, an electrophoretic zeta potential measuring device. The microbubble MB and the nanobubble NB having different diameters are separated.

  As shown in FIG. 3, a first chamber 61 and a second chamber 62 are formed in the liquid guide 50 by setting a microbubble separation member 60. The microbubble separation member 60 is disposed along the central axis CL of the liquid guide portion 50 from the intermediate position MC of the outer peripheral portion 54 to the inner surface of the second end face portion 53.

  The first chamber 61 is a semi-cylindrical space formed by the outer peripheral portion 54, the second end surface portion 53, and the first surface 60 </ b> B on the upper side of the microbubble separation member 60. Similarly, the second chamber 62 is a semi-cylindrical space formed by the outer peripheral portion 54, the second end surface portion 53, and the second surface 60 </ b> C below the microbubble separation member 60. The negative electrode 56 corresponds to the first chamber 61 side, and the positive electrode 55 is disposed corresponding to the second chamber 62 side.

  The plus electrode 55 and the minus electrode 56 are arranged from the first end face portion 52 side of the liquid guide portion 50 to the intermediate position MC of the outer peripheral portion 54 of the liquid guide portion 50 along the central axis CL of the liquid guide portion 50. The microbubble separating member 60 is disposed along the central axis CL of the liquid guide portion 50 from the intermediate position MC of the outer peripheral portion 54 to the inner surface of the second end face portion 53. For this reason, since the moving speed of the microbubble MB and the moving speed of the nanobubble NB are changed by the electric field applying unit 51, the first chamber 61 is divided into a liquid containing a lot of microbubbles MB, and the second chamber 62 contains a lot of nanobubbles NB. Can be divided into liquids. That is, the embodiment of the present invention is characterized in that a large amount of nanobubble water contained in the liquid can be taken out.

  An outlet portion 68 is formed in the portion 53D of the second end surface portion 53 on the first chamber 61 side, and an outlet portion 69 is formed in the portion 53F of the second end surface portion 53 on the second chamber 62 side. One end of a return pipe 70 is connected to the outlet 68, and one end of a supply pipe 71 is connected to the outlet 69.

  The other end of the return pipe 70 is connected so as to be fed back to the return port portion 32D of the microbubble generator 32, and only the liquid L containing a large amount of microbubbles MB can be returned into the microbubble generator 32. It is like that. The other end of the supply pipe 71 is connected to the nozzle 15 so that only the liquid L containing a large amount of nanobubbles NB can be supplied to the nozzle 15.

  Next, a substrate processing method by the processing unit 4 of the above-described substrate processing apparatus 1 will be described with reference to FIGS.

  The gas in the gas supply unit 30 shown in FIGS. 2 and 3 is supplied from the inlet 32B of the microbubble generator 32 into the microbubble generator 32 through the pipe 35, the regulator 31, and the pipe 36. The gas is mixed by swirling with the liquid L supplied from the liquid supply unit 77 in the microbubble generator 32. The mixed liquid and gas further increase the swirl speed, and microbubbles are generated by the shearing force generated by the change of the swirl speed. The generated liquid containing microbubbles is supplied and stored in the liquid storage unit 33 via the pipe 37.

  As shown in FIG. 3, the liquid L containing microbubbles is stored in the liquid storage unit 33, and the microbubbles include both microbubbles MB and nanobubbles NB having different diameters. The liquid L containing the microbubbles MB and nanobubbles NB includes micronano bubble water. Thus, the liquid L containing the microbubbles MB, the micronanobubbles, and the nanobubbles NB is operated from the inlet 41 of the microbubble separator 40 through the pipe 38 by operating the electric pump 34 according to the command of the control unit 20. The liquid is fed under pressure into the 40 liquid guides 50. As a result, the liquid L containing microbubbles is reliably fed into the liquid guide 50, the liquid L containing nanobubbles NB is reliably supplied to the substrate W, and the liquid L containing microbubbles MB is generated. It can be reliably returned to the container 32 and reused.

  Since the control unit 20 shown in FIG. 3 is energized to the plus electrode 55 and the minus electrode 56, an electric field is applied to the liquid L containing the microbubbles MB and the nanobubbles NB in the liquid guide unit 50, and the microbubbles MB The nanobubble NB holds a negative potential. The liquid L containing the microbubbles MB and the nanobubbles NB is pressurized in the liquid guide part 50 by the electric pump 34 and fed in the S direction. By applying an electric field in the path of this pressurized liquid feeding, the microbubbles MB and nanobubbles NB having a negative potential tend to be attracted to the positive electrode 55 side.

  However, since the particle size of the microbubble MB is considerably different from the particle size of the nanobubble NB, the moving speed V1 at which the microbubble MB tries to move to the positive electrode 55 side and the nanobubble NB is on the positive electrode 56 side. A movement speed difference (V2−V1) is generated between the movement speed V2 and the movement speed V2. Using the difference between the movement speed of the microbubble MB and the movement speed of the nanobubble NB, the microbubble separation member 60 can separate the nanobubble NB having a high movement speed and the microbubble MB having a low movement speed. For this reason, the first chamber 61 can be divided into a liquid containing a lot of microbubbles MB, and the second chamber 62 can be divided into a liquid containing a lot of nanobubbles NB. That is, in the embodiment of the present invention, a large amount of nanobubble water contained in the liquid can be taken out.

  As a result, as shown in FIG. 3, the liquid L containing a large amount of nanobubbles NB having a high moving speed moves to the second chamber 62 on the positive electrode 55 side, and the nozzle 15 passes through the supply pipe 71 from the second chamber 62. Therefore, the surface of the substrate W can be cleaned more efficiently than when a liquid containing microbubbles MB is used.

  In contrast, the liquid L containing a large amount of microbubbles MB moves to the first chamber 61 on the negative electrode 56 side, and returns from the first chamber 61 to the return port portion 32D of the microbubble generator 32 through the return pipe 70. To be reused. Thereby, the gas from the gas supply unit 30 is mixed with the liquid L containing the returned microbubbles MB, destroys the microbubbles MB, generates nanobubbles NB, and increases the number of nanobubbles NB. It is supplied into the liquid L in the liquid storage unit 33 through the pipe 37. For this reason, the liquid L in the liquid storage part 33 can maintain a state in which the microbubbles MB and the nanobubbles NB are mixed. Then, the liquid L containing the microbubbles MB and the nanobubbles NB is fed in a state where the electric pressure is again applied in the liquid guide 50 by the electric pump 34, and an electric field is applied to the path of the pressurized liquid, so that the liquid L is negative. The first chamber 61 is divided into a liquid containing a large amount of microbubbles MB by separating the fine bubble separation member 60 by using the difference in moving speed caused by the difference in particle size between the microbubbles MB having the potential and the nanobubbles NB. The second chamber 62 can be divided into a liquid containing a lot of nanobubbles NB. As shown in FIG. 3, the liquid L containing nanobubbles NB is sent from the second chamber 62 to the nozzle 15 through the supply pipe 71 and supplied or ejected from the nozzle 15 to the substrate W. The surface can be cleaned efficiently.

  As already mentioned, microbubbles with a particle size larger than the particle size of nanobubbles are not necessary for substrate processing operations because they adhere to the substrate and suppress the reaction required for substrate processing. . Therefore, only the microbubble MB is separated from the liquid L containing the microbubble MB and the nanobubble NB as much as possible, and the liquid L to be supplied to the substrate W is made to contain only the nanobubble NB.

  Therefore, the liquid L containing both microbubbles and nanobubbles is divided into the liquid containing a lot of microbubbles MB in the first chamber 61, and the liquid containing a lot of nanobubbles NB divided into the liquid containing a lot of nanobubbles NB in the second chamber 62. By supplying or injecting L to the substrate W, it is possible to prevent reaction suppression necessary for the substrate by the microbubbles MB as much as possible, and increase the cleaning effect of the substrate W by the nanobubbles NB. Since the nanobubbles NB are more likely to be combined with dirt on the surface of the substrate W on the surface of the substrate W than the microbubbles MB, the cleaning effect is improved. For this reason, for example, the cleaning operation of the substrate can be performed efficiently, and the productivity at the time of manufacturing the substrate can be improved.

  A substrate processing apparatus according to the present invention is a substrate processing apparatus that supplies a liquid to a substrate to process the substrate, and a microbubble generator that generates a liquid containing microbubbles by mixing the liquid and the gas, and a microbubble And a storage part for storing liquid containing microbubbles having nanobubbles, a liquid guide part for passing liquid containing microbubbles in the storage part in a pressurized state, and applying an electric field to the liquid containing microbubbles passing through the liquid guide part And a microbubble separator having an electric field applying unit that separates the microbubbles from the nanobubbles and supplying a liquid containing the separated nanobubbles to the substrate. Thereby, the nanobubble and microbubble in a liquid can be isolate | separated in a short time, and the liquid containing many nanobubbles can be supplied and used with respect to a board | substrate.

  In the substrate processing apparatus of the present invention, the inside of the liquid guide section is divided into a first chamber for passing a liquid containing a lot of microbubbles and a second chamber for passing a liquid containing a lot of nanobubbles. Thus, after the microbubbles and nanobubbles are separated by the difference in moving speed, the first chamber can be divided into liquids containing a lot of microbubbles, and the second chamber can be divided into liquids containing a lot of nanobubbles.

  In the substrate processing apparatus of the present invention, a pipe for returning a liquid containing a large amount of microbubbles to the microbubble generator connects the first chamber and the microbubble generator. Thereby, while returning the liquid containing many microbubbles to a microbubble generator and reusing, the microbubble can be destroyed and made small, and the number of microbubbles can be reduced.

  The substrate processing apparatus of the present invention includes a pump that pressurizes a liquid containing microbubbles and feeds the liquid into the liquid guide. Thereby, the liquid containing microbubbles can be reliably fed into the liquid guide, the liquid containing nanobubbles can be reliably supplied to the substrate, and the liquid containing microbubbles can be reliably returned to the microbubble generator for reuse. .

  The substrate processing method of the present invention is a substrate processing method for processing a substrate by supplying a liquid to the substrate. In the microbubble generator, a liquid and a gas are mixed to generate a liquid containing microbubbles. A liquid containing microbubbles having bubbles and nanobubbles is accumulated in the storage unit, and an electric field is applied to the liquid containing microbubbles when the liquid containing microbubbles in the storage unit is passed through the liquid guide unit in a pressurized state. Then, the microbubbles and nanobubbles are separated, and a liquid containing the separated nanobubbles is supplied to the substrate. Thereby, the nanobubble and microbubble in a liquid can be isolate | separated in a short time, and the liquid containing many nanobubbles can be supplied and used with respect to a board | substrate.

  The present invention is not limited to the above embodiment. As gas, ozone gas or air can be used instead of nitrogen gas. As the liquid, in addition to pure water, an acidic liquid or an alkaline liquid can be used. The substrate may be, for example, a liquid crystal panel substrate in addition to a semiconductor wafer substrate.

  The microbubble generator 32 may be a filter-type generator that includes microbubbles in a liquid by passing a gas through a porous filter, in addition to the above-described swirling generator.

  Furthermore, various inventions can be formed by appropriately combining a plurality of constituent elements disclosed in the embodiments of the present invention. For example, you may delete some components from all the components shown by embodiment of this invention. Furthermore, you may combine the component covering different embodiment suitably.

DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 4 Processing unit 10 Microbubble production | generation separation apparatus 11 Substrate holding | maintenance part 15 Nozzle 20 Control part 30 Gas supply part 31 Regulator 32 Microbubble generator 33 Liquid storage part (an example of a storage part)
34 Electric pump 35, 37, 38 Piping 40 Micro bubble separator 50 Liquid guide part 51 Electric field applying part 52 First end face part 53 Second end face part 54 Peripheral part 55 Plus electrode 56 Negative electrode 60 Micro bubble separating member 61 First chamber 62 Second chamber 70 Return pipe 71 Supply pipe MB Microbubble (an example of microbubbles)
NB Nanobubble (an example of microbubbles)
L Liquid containing microbubbles

Claims (3)

In a substrate processing apparatus for processing a substrate by supplying a liquid to the substrate ,
A microbubble generator for mixing liquid and gas to generate a liquid containing microbubbles including nanobubbles ;
A reservoir for storing a liquid containing the microbubbles;
The liquid guide unit in which the liquid is pressurized feeding containing microbubbles in the reservoir, liquid and opposed to the opposite vital said liquid feed to each other in the feeding direction upstream side of the liquid in the liquid guide unit negative electrode and the positive electrode is, wherein the liquid guide unit placed in the feeding direction downstream side of the liquid, microbubbles which have a second chamber corresponding to the first chamber and the positive electrode corresponding to the negative electrode and a separator,
The substrate processing apparatus according to claim that you supply a liquid containing microbubbles that are supplied to the second chamber to the substrate. The substrate processing according to claim 1 in which a pipe for returning the liquid supplied to said first chamber to said microbubble generator, and wherein the connecting the microbubble generator and said first chamber apparatus. In a substrate processing method for processing a substrate by supplying a liquid to the substrate ,
In the microbubble generator, liquid and gas are mixed to produce a liquid containing microbubbles containing nanobubbles .
The liquid containing the microbubbles is stored in a storage unit,
When the liquid containing the microbubbles in the storage part is passed through the liquid guide part in a pressurized state, the liquid guide part passes between the positive electrode and the negative electrode arranged opposite to each other on the upstream side in the liquid feeding direction. Of the first chamber corresponding to the minus electrode and the second chamber corresponding to the plus electrode provided on the downstream side in the liquid feeding direction of the liquid guide portion. A substrate processing method comprising supplying a liquid containing bubbles to the substrate.

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