JP5398258B2 - 誘電体スタック及びそれを備える相互接続構造体 - Google Patents

誘電体スタック及びそれを備える相互接続構造体 Download PDF

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JP5398258B2
JP5398258B2 JP2008500925A JP2008500925A JP5398258B2 JP 5398258 B2 JP5398258 B2 JP 5398258B2 JP 2008500925 A JP2008500925 A JP 2008500925A JP 2008500925 A JP2008500925 A JP 2008500925A JP 5398258 B2 JP5398258 B2 JP 5398258B2
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dielectric
layer
stack
present
nanolayer
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JP2008537639A5 (enExample
JP2008537639A (ja
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グエン、サン、ヴイ
レーン、サラ、エル
リニガー、エリック、ジー
健作 井田
レスタイノ、ダリル、ディー
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International Business Machines Corp
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    • H01L21/76829Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
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  • Engineering & Computer Science (AREA)
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  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
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  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
  • Laminated Bodies (AREA)
  • Chemical Vapour Deposition (AREA)
  • Organic Insulating Materials (AREA)
  • Insulating Bodies (AREA)
JP2008500925A 2005-03-08 2006-03-08 誘電体スタック及びそれを備える相互接続構造体 Active JP5398258B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/906,815 US7265437B2 (en) 2005-03-08 2005-03-08 Low k dielectric CVD film formation process with in-situ imbedded nanolayers to improve mechanical properties
US10/906,815 2005-03-08
PCT/US2006/008449 WO2006096813A2 (en) 2005-03-08 2006-03-08 Low k dielectric cvd film formation process with in-situ imbedded nanolayers to improve mechanical properties

Publications (3)

Publication Number Publication Date
JP2008537639A JP2008537639A (ja) 2008-09-18
JP2008537639A5 JP2008537639A5 (enExample) 2009-02-12
JP5398258B2 true JP5398258B2 (ja) 2014-01-29

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