JP5391670B2 - 微細構造体の製造方法 - Google Patents

微細構造体の製造方法 Download PDF

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Publication number
JP5391670B2
JP5391670B2 JP2008306721A JP2008306721A JP5391670B2 JP 5391670 B2 JP5391670 B2 JP 5391670B2 JP 2008306721 A JP2008306721 A JP 2008306721A JP 2008306721 A JP2008306721 A JP 2008306721A JP 5391670 B2 JP5391670 B2 JP 5391670B2
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JP
Japan
Prior art keywords
film
substrate
photosensitive film
manufacturing
convex portions
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Expired - Fee Related
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JP2008306721A
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English (en)
Japanese (ja)
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JP2009175707A (ja
JP2009175707A5 (enrdf_load_stackoverflow
Inventor
大輔 澤木
淳 尼子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
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Seiko Epson Corp
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Priority to JP2008306721A priority Critical patent/JP5391670B2/ja
Priority to US12/342,147 priority patent/US8221963B2/en
Publication of JP2009175707A publication Critical patent/JP2009175707A/ja
Publication of JP2009175707A5 publication Critical patent/JP2009175707A5/ja
Application granted granted Critical
Publication of JP5391670B2 publication Critical patent/JP5391670B2/ja
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  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Surface Treatment Of Optical Elements (AREA)
JP2008306721A 2007-12-27 2008-12-01 微細構造体の製造方法 Expired - Fee Related JP5391670B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008306721A JP5391670B2 (ja) 2007-12-27 2008-12-01 微細構造体の製造方法
US12/342,147 US8221963B2 (en) 2007-12-27 2008-12-23 Method for producing fine structure

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007337900 2007-12-27
JP2007337900 2007-12-27
JP2008306721A JP5391670B2 (ja) 2007-12-27 2008-12-01 微細構造体の製造方法

Publications (3)

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JP2009175707A JP2009175707A (ja) 2009-08-06
JP2009175707A5 JP2009175707A5 (enrdf_load_stackoverflow) 2012-01-12
JP5391670B2 true JP5391670B2 (ja) 2014-01-15

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JP2008306721A Expired - Fee Related JP5391670B2 (ja) 2007-12-27 2008-12-01 微細構造体の製造方法

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JP (1) JP5391670B2 (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5360399B2 (ja) * 2009-08-06 2013-12-04 大日本印刷株式会社 回折格子作製用位相マスク
JP5527074B2 (ja) * 2009-11-16 2014-06-18 セイコーエプソン株式会社 偏光素子及びプロジェクター
US8415611B2 (en) 2009-11-19 2013-04-09 Seiko Epson Corporation Sensor chip, sensor cartridge, and analysis apparatus
JP5463947B2 (ja) * 2010-02-19 2014-04-09 セイコーエプソン株式会社 偏光素子及びプロジェクター
JP5526851B2 (ja) * 2010-02-19 2014-06-18 セイコーエプソン株式会社 偏光素子及びプロジェクター
US9651721B2 (en) * 2012-08-27 2017-05-16 Avery Dennison Corporation Retroreflector with low refractive index backing
CN108802881B (zh) * 2018-05-21 2022-03-08 苏州大学 一种高衍射效率光栅结构和制备方法
CN116931144B (zh) * 2022-04-01 2024-10-11 比亚迪股份有限公司 纹理结构、盖板、移动终端以及盖板的制备方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01196003A (ja) * 1988-02-01 1989-08-07 Dainippon Printing Co Ltd 回折効果を有する装飾体の作製方法
JPH0962171A (ja) * 1995-08-28 1997-03-07 Dainippon Printing Co Ltd ホログラムカラーフィルターの作製方法
JPH11305043A (ja) * 1998-04-27 1999-11-05 Victor Co Of Japan Ltd ホログラムカラーフィルタの製造方法及びその装置
JP2000321962A (ja) * 1999-03-10 2000-11-24 Victor Co Of Japan Ltd マスタホログラム及びこれを用いたホログラムフィルタの製造方法
JP2001074924A (ja) * 1999-09-03 2001-03-23 Canon Inc 回折光学素子の作製方法
JP3531738B2 (ja) * 2000-02-22 2004-05-31 日本電気株式会社 屈折率の修正方法、屈折率の修正装置、及び光導波路デバイス
JP2001343512A (ja) * 2000-05-31 2001-12-14 Canon Inc 回折光学素子及びそれを有する光学系
JP4258958B2 (ja) * 2000-07-10 2009-04-30 コニカミノルタオプト株式会社 偏光位相変調素子の製造方法及び製造装置
JP4495722B2 (ja) * 2003-04-22 2010-07-07 オーファオデー キネグラム アーゲー ミクロ構造の作成方法
JP4457854B2 (ja) * 2004-11-02 2010-04-28 ソニー株式会社 偏光子、液晶パネルおよび投射型表示装置
TWI417672B (zh) * 2004-12-17 2013-12-01 尼康股份有限公司 曝光方法、電子元件製造方法、電子元件以及曝光裝置
JP2006185562A (ja) * 2004-12-28 2006-07-13 Sanyo Electric Co Ltd 光ピックアップ用の光学素子

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JP2009175707A (ja) 2009-08-06

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