JP5357393B2 - Ｒｅｌａｘガス放電レーザリソグラフィ光源 - Google Patents

Ｒｅｌａｘガス放電レーザリソグラフィ光源 Download PDF

Info

Publication number
JP5357393B2
JP5357393B2 JP2006538219A JP2006538219A JP5357393B2 JP 5357393 B2 JP5357393 B2 JP 5357393B2 JP 2006538219 A JP2006538219 A JP 2006538219A JP 2006538219 A JP2006538219 A JP 2006538219A JP 5357393 B2 JP5357393 B2 JP 5357393B2
Authority
JP
Japan
Prior art keywords
pulse
laser
pulses
center wavelength
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2006538219A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007511074A (ja
JP2007511074A5 (enExample
Inventor
リチャード エル サンドストロム
ウィリアム エヌ パートロ
ダニエル ジェイ ダブリュー ブラウン
トーマス エイ イェイガー
アレクサンダー アイ アーショフ
ロバート ジェイ ラファック
ジャーマン イー リーロフ
Original Assignee
サイマー インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/701,280 external-priority patent/US7139301B2/en
Priority claimed from US10/808,157 external-priority patent/US7346093B2/en
Priority claimed from US10/847,799 external-priority patent/US7369597B2/en
Priority claimed from US10/875,662 external-priority patent/US7154928B2/en
Priority claimed from US10/884,101 external-priority patent/US7009140B2/en
Application filed by サイマー インコーポレイテッド filed Critical サイマー インコーポレイテッド
Publication of JP2007511074A publication Critical patent/JP2007511074A/ja
Publication of JP2007511074A5 publication Critical patent/JP2007511074A5/ja
Application granted granted Critical
Publication of JP5357393B2 publication Critical patent/JP5357393B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/429—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to measurement of ultraviolet light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/002—Optical devices or arrangements for the control of light using movable or deformable optical elements the movement or the deformation controlling the frequency of light, e.g. by Doppler effect
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/36—Electric or electronic devices
    • B23K2101/40—Semiconductor devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Engineering (AREA)
  • Lasers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2006538219A 2003-11-03 2004-10-27 Ｒｅｌａｘガス放電レーザリソグラフィ光源 Expired - Lifetime JP5357393B2 (ja)

Applications Claiming Priority (13)

Application Number Priority Date Filing Date Title
US10/701,280 2003-11-03
US10/701,280 US7139301B2 (en) 1997-07-22 2003-11-03 Laser spectral engineering for lithographic process
US10/808,157 US7346093B2 (en) 2000-11-17 2004-03-23 DUV light source optical element improvements
US10/808,157 2004-03-23
US10/847,799 2004-05-18
US10/847,799 US7369597B2 (en) 2003-11-13 2004-05-18 Laser output light pulse stretcher
US10/875,662 US7154928B2 (en) 2004-06-23 2004-06-23 Laser output beam wavefront splitter for bandwidth spectrum control
US10/875,662 2004-06-23
US10/884,101 US7009140B2 (en) 2001-04-18 2004-07-01 Laser thin film poly-silicon annealing optical system
US10/884,101 2004-07-01
US10/956,784 2004-10-01
US10/956,784 US7088758B2 (en) 2001-07-27 2004-10-01 Relax gas discharge laser lithography light source
PCT/US2004/035671 WO2005046011A2 (en) 2003-11-03 2004-10-27 Relax gas discharge laser lithography light source

Publications (3)

Publication Number Publication Date
JP2007511074A JP2007511074A (ja) 2007-04-26
JP2007511074A5 JP2007511074A5 (enExample) 2007-12-13
JP5357393B2 true JP5357393B2 (ja) 2013-12-04

Family

ID=34577978

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006538219A Expired - Lifetime JP5357393B2 (ja) 2003-11-03 2004-10-27 Ｒｅｌａｘガス放電レーザリソグラフィ光源

Country Status (4)

Country Link
US (1) US7088758B2 (enExample)
JP (1) JP5357393B2 (enExample)
TW (1) TWI258257B (enExample)
WO (1) WO2005046011A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210057690A (ko) * 2019-11-12 2021-05-21 에스펙 가부시키가이샤 환경 형성 장치 및 환경 형성 장치용 촬영 장치

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7154928B2 (en) * 2004-06-23 2006-12-26 Cymer Inc. Laser output beam wavefront splitter for bandwidth spectrum control
KR100702845B1 (ko) * 2006-01-20 2007-04-03 삼성전자주식회사 엑시머 레이저 및 그의 협대역 모듈
JP2007329432A (ja) * 2006-06-09 2007-12-20 Canon Inc 露光装置
JP2008140956A (ja) * 2006-12-01 2008-06-19 Canon Inc 露光装置
USRE45957E1 (en) 2009-03-27 2016-03-29 Cymer, Llc Regenerative ring resonator
US8014432B2 (en) * 2009-03-27 2011-09-06 Cymer, Inc. Regenerative ring resonator
US8520186B2 (en) * 2009-08-25 2013-08-27 Cymer, Llc Active spectral control of optical source
JP5410396B2 (ja) 2010-03-23 2014-02-05 ギガフォトン株式会社 レーザ装置
US8837536B2 (en) 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
JP2013062484A (ja) 2011-08-24 2013-04-04 Gigaphoton Inc レーザ装置
JP2013070029A (ja) 2011-09-08 2013-04-18 Gigaphoton Inc マスタオシレータシステムおよびレーザ装置
JP6113426B2 (ja) 2011-09-08 2017-04-12 ギガフォトン株式会社 マスタオシレータシステムおよびレーザ装置
JP2013145863A (ja) 2011-11-29 2013-07-25 Gigaphoton Inc ２光束干渉装置および２光束干渉露光システム
JP6063133B2 (ja) 2012-02-15 2017-01-18 ギガフォトン株式会社 エキシマレーザおよびレーザ装置
CN102615425A (zh) * 2012-04-20 2012-08-01 上海市激光技术研究所 一种基于折射式扫描系统的激光异形微孔的加工系统
US9207119B2 (en) 2012-04-27 2015-12-08 Cymer, Llc Active spectral control during spectrum synthesis
JP2013247240A (ja) 2012-05-25 2013-12-09 Gigaphoton Inc レーザ装置
US9715180B2 (en) 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
JP5965454B2 (ja) * 2014-10-14 2016-08-03 株式会社アマダホールディングス ダイレクトダイオードレーザ加工装置及びこれを用いた板金の加工方法
WO2016084263A1 (ja) * 2014-11-28 2016-06-02 ギガフォトン株式会社 狭帯域化レーザ装置
US9778108B2 (en) * 2015-05-22 2017-10-03 Cymer, Llc Metrology system and method having a plurality of sensors for estimating a spectral feature of a pulsed light beam
US10012544B2 (en) 2016-11-29 2018-07-03 Cymer, Llc Homogenization of light beam for spectral feature metrology
CN118011728A (zh) 2017-10-19 2024-05-10 西默有限公司 在单次光刻曝光通过过程中形成多个空间图像
NL2022609A (en) 2018-03-12 2019-09-18 Asml Netherlands Bv Control System and Method
JP7044894B2 (ja) 2018-03-30 2022-03-30 サイマー リミテッド ライアビリティ カンパニー パルス光ビームのスペクトル特性選択及びパルスタイミング制御
CN109217076B (zh) * 2018-10-31 2019-10-25 中国科学院物理研究所 激光器调节方法和相应的装置
KR102548825B1 (ko) * 2018-12-03 2023-06-29 삼성디스플레이 주식회사 레이저 결정화 장치 및 표시 장치의 제조 방법
KR102649174B1 (ko) * 2019-03-03 2024-03-20 에이에스엠엘 네델란즈 비.브이. 협소화 대역폭을 이용한 이미징 방법 및 장치
TWI749546B (zh) 2019-05-14 2021-12-11 美商希瑪有限責任公司 用於調變光源波長的裝置及方法
JP7382424B2 (ja) 2019-05-22 2023-11-16 サイマー リミテッド ライアビリティ カンパニー 複数の深紫外光発振器のための制御システム
CN114144731B (zh) 2019-07-23 2024-04-09 西默有限公司 补偿由重复率偏差引起的波长误差的方法
WO2021186740A1 (ja) 2020-03-19 2021-09-23 ギガフォトン株式会社 狭帯域化ガスレーザ装置、その制御方法、及び電子デバイスの製造方法
CN115104064A (zh) * 2020-03-19 2022-09-23 极光先进雷射株式会社 曝光方法、曝光系统和电子器件的制造方法
WO2021234835A1 (ja) * 2020-05-20 2021-11-25 ギガフォトン株式会社 狭帯域化ガスレーザ装置、波長制御方法、及び電子デバイスの製造方法
JP7523587B2 (ja) * 2020-06-09 2024-07-26 サイマー リミテッド ライアビリティ カンパニー 中心波長を制御するためのシステム及び方法
WO2022085146A1 (ja) 2020-10-22 2022-04-28 ギガフォトン株式会社 レーザ装置、及び電子デバイスの製造方法
WO2022125289A1 (en) * 2020-12-10 2022-06-16 Cymer, Llc Multifocal imaging with increased wavelength separation
CN116670591A (zh) * 2021-02-24 2023-08-29 极光先进雷射株式会社 激光装置和电子器件的制造方法
JPWO2022219690A1 (enExample) * 2021-04-12 2022-10-20
EP4441564A1 (en) * 2021-11-29 2024-10-09 Cymer, LLC Control voltage threshold selection to facilitate multifocal imaging
WO2023135658A1 (ja) * 2022-01-11 2023-07-20 ギガフォトン株式会社 電子デバイスの製造方法、レーザ装置、及び波長シーケンス算出システム
DE102024111453A1 (de) * 2024-04-24 2025-10-30 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie

Family Cites Families (186)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2759106A (en) 1951-05-25 1956-08-14 Wolter Hans Optical image-forming mirror system providing for grazing incidence of rays
US3279176A (en) 1959-07-31 1966-10-18 North American Aviation Inc Ion rocket engine
US3150483A (en) 1962-05-10 1964-09-29 Aerospace Corp Plasma generator and accelerator
US3232046A (en) 1962-06-06 1966-02-01 Aerospace Corp Plasma generator and propulsion exhaust system
US3746870A (en) 1970-12-21 1973-07-17 Gen Electric Coated light conduit
US3969628A (en) 1974-04-04 1976-07-13 The United States Of America As Represented By The Secretary Of The Army Intense, energetic electron beam assisted X-ray generator
US4042848A (en) 1974-05-17 1977-08-16 Ja Hyun Lee Hypocycloidal pinch device
US3946332A (en) 1974-06-13 1976-03-23 Samis Michael A High power density continuous wave plasma glow jet laser system
US3961197A (en) 1974-08-21 1976-06-01 The United States Of America As Represented By The United States Energy Research And Development Administration X-ray generator
US3960473A (en) 1975-02-06 1976-06-01 The Glastic Corporation Die structure for forming a serrated rod
US4223279A (en) 1977-07-18 1980-09-16 Mathematical Sciences Northwest, Inc. Pulsed electric discharge laser utilizing water dielectric blumlein transmission line
US4162160A (en) 1977-08-25 1979-07-24 Fansteel Inc. Electrical contact material and method for making the same
US4143275A (en) 1977-09-28 1979-03-06 Battelle Memorial Institute Applying radiation
US4203393A (en) 1979-01-04 1980-05-20 Ford Motor Company Plasma jet ignition engine and method
US4410992A (en) 1980-03-26 1983-10-18 Laser Science, Inc. Generation of pulsed laser radiation at a finely controlled frequency by transient regerative amplification
US4550408A (en) 1981-02-27 1985-10-29 Heinrich Karning Method and apparatus for operating a gas laser
US4538291A (en) 1981-11-09 1985-08-27 Kabushiki Kaisha Suwa Seikosha X-ray source
US4455658A (en) 1982-04-20 1984-06-19 Sutter Jr Leroy V Coupling circuit for use with a transversely excited gas laser
US4536884A (en) 1982-09-20 1985-08-20 Eaton Corporation Plasma pinch X-ray apparatus
US4633492A (en) 1982-09-20 1986-12-30 Eaton Corporation Plasma pinch X-ray method
US4504964A (en) 1982-09-20 1985-03-12 Eaton Corporation Laser beam plasma pinch X-ray system
US4618971A (en) 1982-09-20 1986-10-21 Eaton Corporation X-ray lithography system
DE3332711A1 (de) 1983-09-10 1985-03-28 Fa. Carl Zeiss, 7920 Heidenheim Vorrichtung zur erzeugung einer plasmaquelle mit hoher strahlungsintensitaet im roentgenbereich
JPS60175351A (ja) 1984-02-14 1985-09-09 Nippon Telegr & Teleph Corp <Ntt> Ｘ線発生装置およびｘ線露光法
DE3406677A1 (de) 1984-02-24 1985-09-05 Fa. Carl Zeiss, 7920 Heidenheim Einrichtung zur kompensation der auswanderung eines laserstrahls
US4883352A (en) 1984-06-21 1989-11-28 American Telephone And Telegraph Company Deep-uv lithography
US4785192A (en) 1984-06-21 1988-11-15 American Telephone And Telegraph Company, At&T Bell Laboratories Maintaining optical signals in prescribed alignment with respect to workpiece in movable equipment
US4837794A (en) 1984-10-12 1989-06-06 Maxwell Laboratories Inc. Filter apparatus for use with an x-ray source
US4626193A (en) 1985-08-02 1986-12-02 Itt Corporation Direct spark ignition system
CA1239487A (en) 1985-10-03 1988-07-19 National Research Council Of Canada Multiple vacuum arc derived plasma pinch x-ray source
CA1239486A (en) 1985-10-03 1988-07-19 Rajendra P. Gupta Gas discharge derived annular plasma pinch x-ray source
US4891820A (en) 1985-12-19 1990-01-02 Rofin-Sinar, Inc. Fast axial flow laser circulating system
US4937619A (en) 1986-08-08 1990-06-26 Hitachi, Ltd. Projection aligner and exposure method
US4869999A (en) 1986-08-08 1989-09-26 Hitachi, Ltd. Method of forming pattern and projection aligner for carrying out the same
US4697270A (en) 1986-08-27 1987-09-29 The United States Of America As Represented By The United States Department Of Energy Copper vapor laser acoustic thermometry system
US4940331A (en) 1986-09-24 1990-07-10 The United States Of America As Represented By The United States Department Of Energy Heterodyne laser instantaneous frequency measurement system
US4798467A (en) 1986-09-24 1989-01-17 The United States Department Of Energy Heterodyne laser instantaneous frequency measurement system
US5315611A (en) 1986-09-25 1994-05-24 The United States Of America As Represented By The United States Department Of Energy High average power magnetic modulator for metal vapor lasers
US5189678A (en) 1986-09-29 1993-02-23 The United States Of America As Represented By The United States Department Of Energy Coupling apparatus for a metal vapor laser
US4817101A (en) 1986-09-26 1989-03-28 The United States Of America As Represented By The United States Department Of Energy Heterodyne laser spectroscopy system
DE3891284T1 (de) 1987-07-17 1990-04-26 Komatsu Mfg Co Ltd Laserwellenlaengen-regelvorrichtung
US4823354A (en) 1987-12-15 1989-04-18 Lumonics Inc. Excimer lasers
US4959840A (en) 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
US5023884A (en) 1988-01-15 1991-06-11 Cymer Laser Technologies Compact excimer laser
US5025446A (en) 1988-04-01 1991-06-18 Laserscope Intra-cavity beam relay for optical harmonic generation
US4881231A (en) 1988-11-28 1989-11-14 Kantilal Jain Frequency-stabilized line-narrowed excimer laser source system for high resolution lithography
IL91240A (en) 1989-08-07 1994-07-31 Quick Tech Ltd Pulsed laser apparatus and systems and techniques for its operation
DE3927089C1 (enExample) 1989-08-17 1991-04-25 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
US5005180A (en) 1989-09-01 1991-04-02 Schneider (Usa) Inc. Laser catheter system
US5102776A (en) 1989-11-09 1992-04-07 Cornell Research Foundation, Inc. Method and apparatus for microlithography using x-pinch x-ray source
US5025445A (en) 1989-11-22 1991-06-18 Cymer Laser Technologies System for, and method of, regulating the wavelength of a light beam
US5027076A (en) 1990-01-29 1991-06-25 Ball Corporation Open cage density sensor
US5095492A (en) 1990-07-17 1992-03-10 Cymer Laser Technologies Spectral narrowing technique
US5471965A (en) 1990-12-24 1995-12-05 Kapich; Davorin D. Very high speed radial inflow hydraulic turbine
US5126638A (en) 1991-05-13 1992-06-30 Maxwell Laboratories, Inc. Coaxial pseudospark discharge switch
US5691989A (en) 1991-07-26 1997-11-25 Accuwave Corporation Wavelength stabilized laser sources using feedback from volume holograms
US5142166A (en) 1991-10-16 1992-08-25 Science Research Laboratory, Inc. High voltage pulsed power source
KR100269350B1 (ko) 1991-11-26 2000-10-16 구본준 박막트랜지스터의제조방법
JP2696285B2 (ja) 1991-12-16 1998-01-14 株式会社小松製作所 狭帯域発振エキシマレーザ装置およびそのパージ方法
US5371587A (en) 1992-05-06 1994-12-06 The Boeing Company Chirped synthetic wavelength laser radar
US5416391A (en) 1992-07-31 1995-05-16 Correa; Paulo N. Electromechanical transduction of plasma pulses
JP3155837B2 (ja) 1992-09-14 2001-04-16 株式会社東芝 光伝送装置
DE4232915A1 (de) * 1992-10-01 1994-04-07 Hohla Kristian Vorrichtung zur Formung der Cornea durch Abtragen von Gewebe
US5359620A (en) 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
US5303002A (en) 1993-03-31 1994-04-12 Intel Corporation Method and apparatus for enhancing the focus latitude in lithography
US5411224A (en) 1993-04-08 1995-05-02 Dearman; Raymond M. Guard for jet engine
US5420877A (en) 1993-07-16 1995-05-30 Cymer Laser Technologies Temperature compensation method and apparatus for wave meters and tunable lasers controlled thereby
US5440578B1 (en) 1993-07-16 2000-10-24 Cymer Inc Gas replenishment method ad apparatus for excimer lasers
US5313481A (en) 1993-09-29 1994-05-17 The United States Of America As Represented By The United States Department Of Energy Copper laser modulator driving assembly including a magnetic compression laser
US5778016A (en) 1994-04-01 1998-07-07 Imra America, Inc. Scanning temporal ultrafast delay methods and apparatuses therefor
US5448580A (en) 1994-07-05 1995-09-05 The United States Of America As Represented By The United States Department Of Energy Air and water cooled modulator
US6300176B1 (en) 1994-07-22 2001-10-09 Semiconductor Energy Laboratory Co., Ltd. Laser processing method
JP3535241B2 (ja) 1994-11-18 2004-06-07 株式会社半導体エネルギー研究所 半導体デバイス及びその作製方法
JPH08172233A (ja) 1994-12-15 1996-07-02 Anritsu Corp 可変波長光源装置
JP3175515B2 (ja) 1994-12-26 2001-06-11 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
US5504795A (en) 1995-02-06 1996-04-02 Plex Corporation Plasma X-ray source
DE69628514T2 (de) 1995-02-17 2004-04-29 Cymer, Inc., San Diego Leistungspulsgenerator mit energierückgewinnung
GB9514558D0 (en) 1995-07-17 1995-09-13 Gersan Ets Marking diamond
US5706301A (en) 1995-08-16 1998-01-06 Telefonaktiebolaget L M Ericsson Laser wavelength control system
US5830336A (en) 1995-12-05 1998-11-03 Minnesota Mining And Manufacturing Company Sputtering of lithium
JP3421184B2 (ja) 1995-12-19 2003-06-30 理化学研究所 波長可変レーザーにおける波長選択方法および波長可変レーザーにおける波長選択可能なレーザー発振装置
US5863017A (en) 1996-01-05 1999-01-26 Cymer, Inc. Stabilized laser platform and module interface
US6109574A (en) 1996-01-05 2000-08-29 Cymer, Inc. Gas laser chamber/optics support structure
JP3917231B2 (ja) 1996-02-06 2007-05-23 株式会社半導体エネルギー研究所 レーザー照射装置およびレーザー照射方法
DE69729659T2 (de) 1996-02-28 2005-06-23 Johnson, Kenneth C., Santa Clara Mikrolinsen-rastereinrichtung für mikrolithografie und für konfokale mikroskopie mit grossem aufnahmefeld
US6555449B1 (en) 1996-05-28 2003-04-29 Trustees Of Columbia University In The City Of New York Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidfication
WO1997045827A1 (en) 1996-05-28 1997-12-04 The Trustees Of Columbia University In The City Of New York Crystallization processing of semiconductor film regions on a substrate, and devices made therewith
US5867514A (en) 1997-01-09 1999-02-02 Cymer, Inc. Laser wavelength control circuit having automatic DC offset and gain adjustment
US6829091B2 (en) * 1997-02-07 2004-12-07 Canon Kabushiki Kaisha Optical system and optical instrument with diffractive optical element
US5771258A (en) 1997-02-11 1998-06-23 Cymer, Inc. Aerodynamic chamber design for high pulse repetition rate excimer lasers
US6031241A (en) 1997-03-11 2000-02-29 University Of Central Florida Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
US5963616A (en) 1997-03-11 1999-10-05 University Of Central Florida Configurations, materials and wavelengths for EUV lithium plasma discharge lamps
US6128323A (en) 1997-04-23 2000-10-03 Cymer, Inc. Reliable modular production quality narrow-band high REP rate excimer laser
US5982800A (en) 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
US5936988A (en) 1997-12-15 1999-08-10 Cymer, Inc. High pulse rate pulse power system
US5991324A (en) 1998-03-11 1999-11-23 Cymer, Inc. Reliable. modular, production quality narrow-band KRF excimer laser
US5866871A (en) 1997-04-28 1999-02-02 Birx; Daniel Plasma gun and methods for the use thereof
US6172324B1 (en) 1997-04-28 2001-01-09 Science Research Laboratory, Inc. Plasma focus radiation source
US6744060B2 (en) 1997-05-12 2004-06-01 Cymer, Inc. Pulse power system for extreme ultraviolet and x-ray sources
US6566668B2 (en) 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with tandem ellipsoidal mirror units
US6452199B1 (en) 1997-05-12 2002-09-17 Cymer, Inc. Plasma focus high energy photon source with blast shield
US6815700B2 (en) 1997-05-12 2004-11-09 Cymer, Inc. Plasma focus light source with improved pulse power system
US6586757B2 (en) 1997-05-12 2003-07-01 Cymer, Inc. Plasma focus light source with active and buffer gas control
US6566667B1 (en) 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with improved pulse power system
US6064072A (en) 1997-05-12 2000-05-16 Cymer, Inc. Plasma focus high energy photon source
US5763930A (en) 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US6016216A (en) 1997-05-17 2000-01-18 Aurora Photonics, Inc. Polarization-independent acousto-optic tunable filter
EP0881515B1 (en) 1997-05-29 2004-03-17 Corning Incorporated Spatial filter for high power laser beam
US5856991A (en) 1997-06-04 1999-01-05 Cymer, Inc. Very narrow band laser
US6192064B1 (en) 1997-07-01 2001-02-20 Cymer, Inc. Narrow band laser with fine wavelength control
US6094448A (en) 1997-07-01 2000-07-25 Cymer, Inc. Grating assembly with bi-directional bandwidth control
US6018537A (en) 1997-07-18 2000-01-25 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US6330261B1 (en) 1997-07-18 2001-12-11 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
US6014398A (en) 1997-10-10 2000-01-11 Cymer, Inc. Narrow band excimer laser with gas additive
US5852621A (en) 1997-07-21 1998-12-22 Cymer, Inc. Pulse laser with pulse energy trimmer
US6621846B1 (en) 1997-07-22 2003-09-16 Cymer, Inc. Electric discharge laser with active wavelength chirp correction
US6721340B1 (en) 1997-07-22 2004-04-13 Cymer, Inc. Bandwidth control technique for a laser
US6078599A (en) 1997-07-22 2000-06-20 Cymer, Inc. Wavelength shift correction technique for a laser
US6317447B1 (en) 2000-01-25 2001-11-13 Cymer, Inc. Electric discharge laser with acoustic chirp correction
US6671294B2 (en) 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US6529531B1 (en) 1997-07-22 2003-03-04 Cymer, Inc. Fast wavelength correction technique for a laser
US6757316B2 (en) 1999-12-27 2004-06-29 Cymer, Inc. Four KHz gas discharge laser
US6853653B2 (en) * 1997-07-22 2005-02-08 Cymer, Inc. Laser spectral engineering for lithographic process
US6067306A (en) 1997-08-08 2000-05-23 Cymer, Inc. Laser-illuminated stepper or scanner with energy sensor feedback
US5870420A (en) 1997-08-18 1999-02-09 Cymer, Inc. Cross-flow blower with braces
WO1999012235A1 (en) 1997-09-05 1999-03-11 Micron Optics, Inc. Tunable fiber fabry-perot surface-emitting lasers
US6188710B1 (en) 1997-10-10 2001-02-13 Cymer, Inc. Narrow band gas discharge laser with gas additive
US5953360A (en) 1997-10-24 1999-09-14 Synrad, Inc. All metal electrode sealed gas laser
US6240117B1 (en) 1998-01-30 2001-05-29 Cymer, Inc. Fluorine control system with fluorine monitor
US5978406A (en) 1998-01-30 1999-11-02 Cymer, Inc. Fluorine control system for excimer lasers
US6151349A (en) 1998-03-04 2000-11-21 Cymer, Inc. Automatic fluorine control system
US6016325A (en) 1998-04-27 2000-01-18 Cymer, Inc. Magnetic modulator voltage and temperature timing compensation circuit
KR100292048B1 (ko) 1998-06-09 2001-07-12 구본준, 론 위라하디락사 박막트랜지스터액정표시장치의제조방법
US6477193B2 (en) 1998-07-18 2002-11-05 Cymer, Inc. Extreme repetition rate gas discharge laser with improved blower motor
US6618421B2 (en) 1998-07-18 2003-09-09 Cymer, Inc. High repetition rate gas discharge laser with precise pulse timing control
US6208675B1 (en) 1998-08-27 2001-03-27 Cymer, Inc. Blower assembly for a pulsed laser system incorporating ceramic bearings
US6067311A (en) 1998-09-04 2000-05-23 Cymer, Inc. Excimer laser with pulse multiplier
US6493374B1 (en) 1999-09-03 2002-12-10 Cymer, Inc. Smart laser with fast deformable grating
US6567450B2 (en) 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6208674B1 (en) 1998-09-18 2001-03-27 Cymer, Inc. Laser chamber with fully integrated electrode feedthrough main insulator
US6212211B1 (en) 1998-10-09 2001-04-03 Cymer, Inc. Shock wave dissipating laser chamber
US6313435B1 (en) 1998-11-20 2001-11-06 3M Innovative Properties Company Mask orbiting for laser ablated feature formation
US6678291B2 (en) * 1999-12-15 2004-01-13 Lambda Physik Ag Molecular fluorine laser
US6154470A (en) 1999-02-10 2000-11-28 Lamba Physik Gmbh Molecular fluorine (F2) laser with narrow spectral linewidth
US6219368B1 (en) 1999-02-12 2001-04-17 Lambda Physik Gmbh Beam delivery system for molecular fluorine (F2) laser
US6782031B1 (en) 1999-03-19 2004-08-24 Cymer, Inc. Long-pulse pulse power system for gas discharge laser
US6104735A (en) 1999-04-13 2000-08-15 Cymer, Inc. Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly
US6164116A (en) 1999-05-06 2000-12-26 Cymer, Inc. Gas module valve automated test fixture
US6625191B2 (en) 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6535531B1 (en) 2001-11-29 2003-03-18 Cymer, Inc. Gas discharge laser with pulse multiplier
US6556612B2 (en) 1999-05-10 2003-04-29 Cymer, Inc. Line narrowed laser with spatial filter
US6882674B2 (en) 1999-12-27 2005-04-19 Cymer, Inc. Four KHz gas discharge laser system
US6381257B1 (en) 1999-09-27 2002-04-30 Cymer, Inc. Very narrow band injection seeded F2 lithography laser
US6549551B2 (en) 1999-09-27 2003-04-15 Cymer, Inc. Injection seeded laser with precise timing control
US6865210B2 (en) 2001-05-03 2005-03-08 Cymer, Inc. Timing control for two-chamber gas discharge laser system
US6795474B2 (en) 2000-11-17 2004-09-21 Cymer, Inc. Gas discharge laser with improved beam path
US6414979B2 (en) 2000-06-09 2002-07-02 Cymer, Inc. Gas discharge laser with blade-dielectric electrode
US6034978A (en) 1999-05-12 2000-03-07 Cymer, Inc. Gas discharge laser with gas temperature control
KR100327087B1 (ko) 1999-06-28 2002-03-13 구본준, 론 위라하디락사 레이저 어닐링 방법
US6573531B1 (en) 1999-09-03 2003-06-03 The Trustees Of Columbia University In The City Of New York Systems and methods using sequential lateral solidification for producing single or polycrystalline silicon thin films at low temperatures
US6496528B2 (en) 1999-09-03 2002-12-17 Cymer, Inc. Line narrowing unit with flexural grating mount
US6359922B1 (en) 1999-10-20 2002-03-19 Cymer, Inc. Single chamber gas discharge laser with line narrowed seed beam
US6532247B2 (en) 2000-02-09 2003-03-11 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
US6650666B2 (en) 2000-02-09 2003-11-18 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
US6408260B1 (en) 2000-02-16 2002-06-18 Cymer, Inc. Laser lithography quality alarm system
US6368945B1 (en) 2000-03-16 2002-04-09 The Trustees Of Columbia University In The City Of New York Method and system for providing a continuous motion sequential lateral solidification
US6195272B1 (en) 2000-03-16 2001-02-27 Joseph E. Pascente Pulsed high voltage power supply radiography system having a one to one correspondence between low voltage input pulses and high voltage output pulses
US6466365B1 (en) 2000-04-07 2002-10-15 Corning Incorporated Film coated optical lithography elements and method of making
US6904073B2 (en) 2001-01-29 2005-06-07 Cymer, Inc. High power deep ultraviolet laser with long life optics
US6693939B2 (en) 2001-01-29 2004-02-17 Cymer, Inc. Laser lithography light source with beam delivery
JP2002006096A (ja) 2000-06-23 2002-01-09 Nikon Corp 電磁波発生装置、これを用いた半導体製造装置並びに半導体デバイスの製造方法
US6750972B2 (en) 2000-11-17 2004-06-15 Cymer, Inc. Gas discharge ultraviolet wavemeter with enhanced illumination
US6839372B2 (en) 2000-11-17 2005-01-04 Cymer, Inc. Gas discharge ultraviolet laser with enclosed beam path with added oxidizer
US6582827B1 (en) 2000-11-27 2003-06-24 The Trustees Of Columbia University In The City Of New York Specialized substrates for use in sequential lateral solidification processing
TW499591B (en) 2000-12-30 2002-08-21 Ind Tech Res Inst Apparatus and method for polarization independent acousto-optical tunable filtering
US6576912B2 (en) 2001-01-03 2003-06-10 Hugo M. Visser Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window
US6538737B2 (en) 2001-01-29 2003-03-25 Cymer, Inc. High resolution etalon-grating spectrometer
US6704340B2 (en) 2001-01-29 2004-03-09 Cymer, Inc. Lithography laser system with in-place alignment tool
JP2002287023A (ja) 2001-03-27 2002-10-03 Nikon Corp 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法
US6804327B2 (en) 2001-04-03 2004-10-12 Lambda Physik Ag Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
US6690704B2 (en) 2001-04-09 2004-02-10 Cymer, Inc. Control system for a two chamber gas discharge laser
US6735225B2 (en) 2001-06-07 2004-05-11 Lambda Physik Ag Chirp compensation method and apparatus
JP2003051634A (ja) * 2001-08-08 2003-02-21 Ushio Inc 放電励起型レーザ装置
DE10151080C1 (de) 2001-10-10 2002-12-05 Xtreme Tech Gmbh Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung
JP2003224320A (ja) * 2002-01-28 2003-08-08 Komatsu Ltd 狭帯域化レーザ装置用共振器、その設計方法、及び狭帯域化レーザ装置
JP2004119919A (ja) 2002-09-30 2004-04-15 Hitachi Ltd 半導体薄膜および半導体薄膜の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210057690A (ko) * 2019-11-12 2021-05-21 에스펙 가부시키가이샤 환경 형성 장치 및 환경 형성 장치용 촬영 장치

Also Published As

Publication number Publication date
WO2005046011A3 (en) 2005-12-22
JP2007511074A (ja) 2007-04-26
US20050083983A1 (en) 2005-04-21
US7088758B2 (en) 2006-08-08
WO2005046011A2 (en) 2005-05-19
TWI258257B (en) 2006-07-11
TW200520334A (en) 2005-06-16

Similar Documents

Publication Publication Date Title
JP5357393B2 (ja) Ｒｅｌａｘガス放電レーザリソグラフィ光源
US12001144B2 (en) Forming multiple aerial images in a single lithography exposure pass
KR101302244B1 (ko) 노광 장치, 노광 방법 및 디바이스 제조 방법, 및 시스템
US11768438B2 (en) Spectral feature selection and pulse timing control of a pulsed light beam
US12300962B2 (en) Laser device and electronic device manufacturing method
JP7714656B2 (ja) 放電励起型レーザ装置の制御方法、放電励起型レーザ装置、及び電子デバイスの製造方法
JP2025160290A (ja) 特にマイクロリソグラフィのための光学系および光学系を動作するための方法
US20250370346A1 (en) Control voltage threshold selection to facilitate multifocal imaging
US20250364775A1 (en) Laser device, exposure apparatus, and electronic device manufacturing method
TWI834879B (zh) 氣體放電雷射系統、微影裝置及在微影裝置中曝光基板之方法
WO2025133752A1 (en) Apparatus for and method of wavelength control for multifocal imaging
JP2023553244A (ja) 波長間隔が広い多焦点イメージング
WO2022046402A1 (en) Apparatus for and method of optical component alignment

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20071026

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20071026

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110228

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20110527

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20110603

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110831

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120319

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20120619

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20120626

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120719

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20121029

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130228

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130325

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130417

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20130422

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130624

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130626

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130812

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130830

R150 Certificate of patent or registration of utility model

Ref document number: 5357393

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: R3D02

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term