JP5357053B2 - 液体材料気化装置 - Google Patents
液体材料気化装置 Download PDFInfo
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- JP5357053B2 JP5357053B2 JP2009546220A JP2009546220A JP5357053B2 JP 5357053 B2 JP5357053 B2 JP 5357053B2 JP 2009546220 A JP2009546220 A JP 2009546220A JP 2009546220 A JP2009546220 A JP 2009546220A JP 5357053 B2 JP5357053 B2 JP 5357053B2
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- carrier gas
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- 239000011344 liquid material Substances 0.000 title claims description 80
- 239000006200 vaporizer Substances 0.000 title claims description 19
- 239000012159 carrier gas Substances 0.000 claims description 95
- 230000008016 vaporization Effects 0.000 claims description 70
- 239000007789 gas Substances 0.000 claims description 48
- 238000009834 vaporization Methods 0.000 claims description 35
- 239000007788 liquid Substances 0.000 claims description 31
- 230000007246 mechanism Effects 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 10
- 230000002093 peripheral effect Effects 0.000 description 7
- 230000002265 prevention Effects 0.000 description 7
- 238000011144 upstream manufacturing Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005192 partition Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
- B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
- B01B1/005—Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/0082—Regulation; Control
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/16—Evaporating by spraying
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Nozzles (AREA)
- Electrodes Of Semiconductors (AREA)
- Accessories For Mixers (AREA)
Description
LM・・・液体材料
CG・・・キャリアガス
MG・・・混合ガス
1・・・気液混合室
2・・・液体材料導入路
3・・・キャリアガス導入路
4・・・気化ノズル部
5・・・混合ガス導出路
6・・・バイパス路
9・・・流れ制御部(開閉機構、流量制御機構)
以下に本発明の第1実施形態について図面を参照して説明する。なお、図1は、本実施形態に係る液体材料気化装置100の縦断面図であり、図2は、気化ノズル部4及びバイパス路6を主として示す部分拡大断面図であり、図3は、本体ブロック200の内部構成を示す断面斜視図である。
このように構成した本実施形態に係る液体材料気化装置100によれば、キャリアガス導入路3を流れるキャリアガスCGの全量がノズル部31、4を通過するのではなく、その一部がバイパス路6を通過して混合ガス導出路5内に流入するため、キャリアガスCGを大流量化することができる。その結果、液体材料LMの分圧を下げることができ、液体材料LMの気化量を増大化することができる。
次に本発明の第2実施形態に係る液体材料気化装置100について図面を参照して説明する。なお、前記第1実施形態の液体材料気化装置100と同一又は対応する部材には、同一の符号を用いている。なお、なお、図5は、本実施形態に係る液体材料気化装置100の縦断面図であり、図6は、気化ノズル部4及びバイパス路6を主として示す部分拡大断面図であり、
このように構成した本実施形態の液体材料気化装置100によれば、前記第1実施形態の効果に加えて、バイパス路6を流れるキャリアガスCGの流量を直接制御することができるので、種々の液体材料LMに合わせて的確な流量制御を行うことができ、気化効率を向上させることができる。
Claims (4)
- 液体材料及びキャリアガスが混合される気液混合部と、
前記気液混合部に前記液体材料を導入する液体材料導入路と、
前記気液混合部に前記キャリアガスを導入するキャリアガス導入路と、
前記気液混合部に連通し、前記液体材料及び前記キャリアガスからなる混合体を減圧気化させる気化ノズル部と、
前記気化ノズル部に連通し、前記気化ノズル部により気化された混合ガスを導出する混合ガス導出路と、
前記キャリアガス導入路及び前記混合ガス導出路を連通し、前記キャリアガス導入路から前記混合ガス導出路へ前記キャリアガスを流すバイパス路と、を具備し、
前記キャリアガスが、前記気化ノズル部と前記バイパス路とに分かれて流れるように構成された液体材料気化装置。 - 前記バイパス路の前記混合ガス導出路における開口が、前記気化ノズル部の下流側開口近傍に設けられている請求項1記載の液体材料気化装置。
- 前記バイパス路の開閉を行う開閉機構を備えている請求項1記載の液体材料気化装置。
- 前記バイパス路内を流れるキャリアガスの流量制御を行う流量制御機構を備えている請求項1記載の液体材料気化装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009546220A JP5357053B2 (ja) | 2007-12-19 | 2008-12-05 | 液体材料気化装置 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007326748 | 2007-12-19 | ||
JP2007326748 | 2007-12-19 | ||
PCT/JP2008/072153 WO2009078293A1 (ja) | 2007-12-19 | 2008-12-05 | 液体材料気化装置 |
JP2009546220A JP5357053B2 (ja) | 2007-12-19 | 2008-12-05 | 液体材料気化装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2009078293A1 JPWO2009078293A1 (ja) | 2011-04-28 |
JP5357053B2 true JP5357053B2 (ja) | 2013-12-04 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009546220A Active JP5357053B2 (ja) | 2007-12-19 | 2008-12-05 | 液体材料気化装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8544828B2 (ja) |
JP (1) | JP5357053B2 (ja) |
KR (1) | KR101501311B1 (ja) |
CN (1) | CN101903561B (ja) |
TW (1) | TWI501290B (ja) |
WO (1) | WO2009078293A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101078411B1 (ko) | 2011-07-06 | 2011-10-31 | 주식회사 신명 | 액체의 기화장치 |
US9454158B2 (en) | 2013-03-15 | 2016-09-27 | Bhushan Somani | Real time diagnostics for flow controller systems and methods |
KR102483924B1 (ko) | 2016-02-18 | 2023-01-02 | 삼성전자주식회사 | 기화기 및 이를 구비하는 박막 증착 장치 |
US10983538B2 (en) | 2017-02-27 | 2021-04-20 | Flow Devices And Systems Inc. | Systems and methods for flow sensor back pressure adjustment for mass flow controller |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06220641A (ja) * | 1992-12-15 | 1994-08-09 | Applied Materials Inc | 化学的蒸着膜工程のための反応液体の気化 |
JP2000334005A (ja) * | 1999-05-31 | 2000-12-05 | Field Science:Kk | 床ずれ防止マット用植物エキス気化装置およびそれを使用した床ずれ防止マット装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0784662B2 (ja) * | 1989-12-12 | 1995-09-13 | アプライドマテリアルズジャパン株式会社 | 化学的気相成長方法とその装置 |
JPH11106921A (ja) | 1997-09-30 | 1999-04-20 | Nissan Motor Co Ltd | バブリング型液体原料気化装置及びその原料蒸気輸送開始操作方法 |
KR100649852B1 (ko) * | 1999-09-09 | 2006-11-24 | 동경 엘렉트론 주식회사 | 기화기 및 이것을 이용한 반도체 제조 시스템 |
JP4393677B2 (ja) | 1999-09-14 | 2010-01-06 | 株式会社堀場エステック | 液体材料気化方法および装置並びに制御バルブ |
JP3881569B2 (ja) | 2002-03-13 | 2007-02-14 | 株式会社堀場エステック | 液体材料気化装置 |
JP4276409B2 (ja) | 2002-06-21 | 2009-06-10 | 株式会社堀場エステック | 液体材料気化装置 |
JP4696561B2 (ja) | 2005-01-14 | 2011-06-08 | 東京エレクトロン株式会社 | 気化装置及び処理装置 |
JP4601535B2 (ja) * | 2005-09-09 | 2010-12-22 | 株式会社リンテック | 低温度で液体原料を気化させることのできる気化器 |
-
2008
- 2008-12-05 KR KR1020107014983A patent/KR101501311B1/ko active IP Right Grant
- 2008-12-05 CN CN2008801217225A patent/CN101903561B/zh active Active
- 2008-12-05 US US12/809,051 patent/US8544828B2/en active Active
- 2008-12-05 JP JP2009546220A patent/JP5357053B2/ja active Active
- 2008-12-05 WO PCT/JP2008/072153 patent/WO2009078293A1/ja active Application Filing
- 2008-12-11 TW TW097148233A patent/TWI501290B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06220641A (ja) * | 1992-12-15 | 1994-08-09 | Applied Materials Inc | 化学的蒸着膜工程のための反応液体の気化 |
JP2000334005A (ja) * | 1999-05-31 | 2000-12-05 | Field Science:Kk | 床ずれ防止マット用植物エキス気化装置およびそれを使用した床ずれ防止マット装置 |
Also Published As
Publication number | Publication date |
---|---|
JPWO2009078293A1 (ja) | 2011-04-28 |
TW200931502A (en) | 2009-07-16 |
KR101501311B1 (ko) | 2015-03-10 |
TWI501290B (zh) | 2015-09-21 |
US20110115104A1 (en) | 2011-05-19 |
CN101903561A (zh) | 2010-12-01 |
KR20100093588A (ko) | 2010-08-25 |
US8544828B2 (en) | 2013-10-01 |
WO2009078293A1 (ja) | 2009-06-25 |
CN101903561B (zh) | 2012-08-22 |
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