JP6675865B2 - 液体材料気化装置 - Google Patents
液体材料気化装置 Download PDFInfo
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- JP6675865B2 JP6675865B2 JP2015241703A JP2015241703A JP6675865B2 JP 6675865 B2 JP6675865 B2 JP 6675865B2 JP 2015241703 A JP2015241703 A JP 2015241703A JP 2015241703 A JP2015241703 A JP 2015241703A JP 6675865 B2 JP6675865 B2 JP 6675865B2
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- gas
- liquid
- liquid mixture
- heating
- pipe
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- 239000011344 liquid material Substances 0.000 title claims description 66
- 239000006200 vaporizer Substances 0.000 title claims description 30
- 239000007788 liquid Substances 0.000 claims description 136
- 239000000203 mixture Substances 0.000 claims description 95
- 238000010438 heat treatment Methods 0.000 claims description 92
- 230000008016 vaporization Effects 0.000 claims description 50
- 238000009834 vaporization Methods 0.000 claims description 31
- 230000002093 peripheral effect Effects 0.000 claims description 8
- 239000012159 carrier gas Substances 0.000 description 19
- 239000007789 gas Substances 0.000 description 16
- 239000000463 material Substances 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000011144 upstream manufacturing Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000013307 optical fiber Substances 0.000 description 4
- 239000012530 fluid Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
- B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/02—Evaporators with heating coils
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/14—Evaporating with heated gases or vapours or liquids in contact with the liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/80—After-treatment of the mixture
- B01F23/806—Evaporating a carrier, e.g. liquid carbon dioxide used to dissolve, disperse, emulsify or other components that are difficult to be mixed; Evaporating liquid components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/80—After-treatment of the mixture
- B01F23/811—Heating the mixture
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
Description
この構成であれば、加熱ブロックの内部に気液混合体導出管の導出口が配置されることになり、気液混合体導出管の導出口から出た気液混合体の加熱を確実に行うことができる。
この構成であれば、加熱ブロックの外部に延出する第1接続部に、気液混合体導出管の外周部に設けられた第2接続部を接続するので、加熱ブロックから気液混合部への熱伝達を小さくすることができ、気液混合部での液体材料の気化を抑えることができる。なお、気化混合部において液体材料が気化してしまうと、気化部への液体材料の供給量が変動してしまい、気化部での安定した気化が阻害されてしまう。
この構成であれば、気液混合体導出管の内部にノズル構造がないので、ノズル構造の直後での気液混合体の滞留を解消することができ、気液混合体の液だまりを一層解消することができる。なお、気液混合体導出管の内部流路よりも加熱流路の方が流路断面が大きいため、当該加熱流路に流出した後に気液混合体の流速は低下するが、当該加熱流路に流出した時点で液体材料は加熱されるので、流速の低下は問題にはならない。また、気液混合体導出管の内部にノズル構造を設けないので、当該ノズル構造において気泡が詰まってしまうことも防ぐことができる。さらに、気液混合体導出管の構成を簡単にすることができる。
また、気液混合体導出管6と、加熱用配管32及び接続管70との間に隙間が形成されているので、接続構造7で両者を接続した場合に、気液混合体導出管6の加工精度又は取付精度により位置のバラつき(誤差)を吸収して、気液混合体導出管6を加熱用配管32に挿し込むことができる。さらに気液混合体導出管6と接続管70との間に隙間が形成されているので、接続管70の先端部に設けられた第2接続部72の内面の加工精度が問題になることも無い。
前記実施形態の液体材料気化装置を光ファイバ製造プロセスや半導体製造プロセスのみならず、それら以外の液体材料を気化するような用途全般に用いることができるのは勿論である。
2・・・気液混合部
3・・・気化部
31・・・加熱ブロック
HS・・・加熱流路
33(33x)・・・ヒータ(内側ヒータ)
33(33y)・・・ヒータ(外側ヒータ)
6・・・気液混合体導出管
6P・・・気液混合体導出管の導出口
71・・・第1接続部
72・・・第2接続部
Claims (4)
- 液体材料と気体とを混合して気液混合体を生成する気液混合部と、
前記気液混合体を加熱し、前記液体材料を気化する気化部とを備え、
前記気液混合部が、前記気液混合体を導出する気液混合体導出管を有し、
前記気化部が、前記気液混合体を加熱する加熱流路を形成する加熱用配管を有し、
前記気液混合体導出管の導出口を有する先端部分は、前記加熱用配管の内部において前記加熱用配管と隙間を空けて接触しないように配置されている液体材料気化装置。 - 前記加熱用配管が、ヒータが内蔵された加熱ブロックに内蔵されている請求項1記載の液体材料気化装置。
- 前記気化部が、前記加熱流路に連通するとともに、前記加熱ブロックの外部に延出する第1接続部を有し、
前記気液混合体導出管が、前記導出口とは反対側の外周部に設けられ、前記第1接続部に接続される第2接続部を有し、
前記気液混合体導出管の導出口が前記加熱流路内に配置された状態で、前記第1接続部及び前記第2接続部が互いに接続される請求項2記載の液体材料気化装置。 - 前記気液混合体導出管の内部流路は、全体に亘って等断面形状である請求項1乃至3の何れか一項に記載の液体材料気化装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015241703A JP6675865B2 (ja) | 2015-12-11 | 2015-12-11 | 液体材料気化装置 |
US15/372,231 US10391417B2 (en) | 2015-12-11 | 2016-12-07 | Liquid material vaporizaton apparatus |
CN201611127279.5A CN106906452B (zh) | 2015-12-11 | 2016-12-09 | 液体材料气化装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015241703A JP6675865B2 (ja) | 2015-12-11 | 2015-12-11 | 液体材料気化装置 |
Publications (2)
Publication Number | Publication Date |
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JP2017104815A JP2017104815A (ja) | 2017-06-15 |
JP6675865B2 true JP6675865B2 (ja) | 2020-04-08 |
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JP2015241703A Active JP6675865B2 (ja) | 2015-12-11 | 2015-12-11 | 液体材料気化装置 |
Country Status (3)
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US (1) | US10391417B2 (ja) |
JP (1) | JP6675865B2 (ja) |
CN (1) | CN106906452B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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CN110643975B (zh) * | 2018-06-27 | 2021-09-28 | 东北大学 | 一种金属有机化学源液体的蒸发输运装置 |
JP7402801B2 (ja) * | 2018-08-24 | 2023-12-21 | 株式会社堀場エステック | 気化器、液体材料気化装置、及び気化方法 |
JP7210253B2 (ja) * | 2018-12-06 | 2023-01-23 | 株式会社堀場エステック | 流体制御弁 |
CN109718661A (zh) * | 2019-02-22 | 2019-05-07 | 上海积世环保技术有限公司 | 一种除臭喷雾设备及方法 |
CN113692641A (zh) * | 2019-04-17 | 2021-11-23 | 株式会社威尔康 | 气化器和其制造方法 |
Family Cites Families (25)
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US4249965A (en) * | 1978-09-19 | 1981-02-10 | Midland-Ross Corporation | Method of generating carrier gas |
GB8823182D0 (en) * | 1988-10-03 | 1988-11-09 | Ici Plc | Reactor elements reactors containing them & processes performed therein |
JPH06291040A (ja) * | 1992-03-03 | 1994-10-18 | Rintetsuku:Kk | 液体気化供給方法と液体気化供給器 |
JP3893177B2 (ja) * | 1996-11-12 | 2007-03-14 | 松下電器産業株式会社 | 気化装置、cvd装置及び薄膜製造方法 |
US6039809A (en) * | 1998-01-27 | 2000-03-21 | Mitsubishi Materials Silicon Corporation | Method and apparatus for feeding a gas for epitaxial growth |
JP4393677B2 (ja) | 1999-09-14 | 2010-01-06 | 株式会社堀場エステック | 液体材料気化方法および装置並びに制御バルブ |
EP1211333A3 (en) * | 2000-12-01 | 2003-07-30 | Japan Pionics Co., Ltd. | Vaporizer for CVD apparatus |
JP2003268552A (ja) * | 2002-03-18 | 2003-09-25 | Watanabe Shoko:Kk | 気化器及びそれを用いた各種装置並びに気化方法 |
JP3822135B2 (ja) * | 2002-05-13 | 2006-09-13 | 日本パイオニクス株式会社 | 気化供給装置 |
US6734405B2 (en) * | 2002-06-12 | 2004-05-11 | Steris Inc. | Vaporizer using electrical induction to produce heat |
US6967315B2 (en) * | 2002-06-12 | 2005-11-22 | Steris Inc. | Method for vaporizing a fluid using an electromagnetically responsive heating apparatus |
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US8763928B2 (en) * | 2006-10-05 | 2014-07-01 | Horiba Stec, Co., Ltd. | Liquid material vaporizer |
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JP5104151B2 (ja) * | 2007-09-18 | 2012-12-19 | 東京エレクトロン株式会社 | 気化装置、成膜装置、成膜方法及び記憶媒体 |
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2015
- 2015-12-11 JP JP2015241703A patent/JP6675865B2/ja active Active
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2016
- 2016-12-07 US US15/372,231 patent/US10391417B2/en active Active
- 2016-12-09 CN CN201611127279.5A patent/CN106906452B/zh active Active
Also Published As
Publication number | Publication date |
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US10391417B2 (en) | 2019-08-27 |
JP2017104815A (ja) | 2017-06-15 |
CN106906452A (zh) | 2017-06-30 |
CN106906452B (zh) | 2020-12-04 |
US20170165620A1 (en) | 2017-06-15 |
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