JP5339678B2 - 活性材料を活性表面上に塗布する方法およびかかる方法によって製造される装置 - Google Patents
活性材料を活性表面上に塗布する方法およびかかる方法によって製造される装置 Download PDFInfo
- Publication number
- JP5339678B2 JP5339678B2 JP2006528165A JP2006528165A JP5339678B2 JP 5339678 B2 JP5339678 B2 JP 5339678B2 JP 2006528165 A JP2006528165 A JP 2006528165A JP 2006528165 A JP2006528165 A JP 2006528165A JP 5339678 B2 JP5339678 B2 JP 5339678B2
- Authority
- JP
- Japan
- Prior art keywords
- active
- fluorinated
- layer
- active material
- liquid medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/15—Deposition of organic active material using liquid deposition, e.g. spin coating characterised by the solvent used
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
- H10K85/1135—Polyethylene dioxythiophene [PEDOT]; Derivatives thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/311—Phthalocyanine
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/321—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3]
- H10K85/324—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3] comprising aluminium, e.g. Alq3
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/0198—Manufacture or treatment batch processes
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/669,403 | 2003-09-24 | ||
| US10/669,403 US7686978B2 (en) | 2003-09-24 | 2003-09-24 | Method for the application of active materials onto active surfaces and devices made with such methods |
| PCT/US2004/031246 WO2005031889A2 (en) | 2003-09-24 | 2004-09-22 | Method for the application of active materials onto active surfaces and devices made with such methods |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012065874A Division JP5602173B2 (ja) | 2003-09-24 | 2012-03-22 | 活性材料を活性表面上に塗布する方法およびかかる方法によって製造される装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007506547A JP2007506547A (ja) | 2007-03-22 |
| JP2007506547A5 JP2007506547A5 (https=) | 2007-11-15 |
| JP5339678B2 true JP5339678B2 (ja) | 2013-11-13 |
Family
ID=34313707
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006528165A Expired - Fee Related JP5339678B2 (ja) | 2003-09-24 | 2004-09-22 | 活性材料を活性表面上に塗布する方法およびかかる方法によって製造される装置 |
| JP2012065874A Expired - Fee Related JP5602173B2 (ja) | 2003-09-24 | 2012-03-22 | 活性材料を活性表面上に塗布する方法およびかかる方法によって製造される装置 |
| JP2013265744A Expired - Lifetime JP5757989B2 (ja) | 2003-09-24 | 2013-12-24 | 活性材料を活性表面上に塗布する方法によって製造される装置 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012065874A Expired - Fee Related JP5602173B2 (ja) | 2003-09-24 | 2012-03-22 | 活性材料を活性表面上に塗布する方法およびかかる方法によって製造される装置 |
| JP2013265744A Expired - Lifetime JP5757989B2 (ja) | 2003-09-24 | 2013-12-24 | 活性材料を活性表面上に塗布する方法によって製造される装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US7686978B2 (https=) |
| JP (3) | JP5339678B2 (https=) |
| KR (1) | KR101176678B1 (https=) |
| TW (1) | TW200525793A (https=) |
| WO (1) | WO2005031889A2 (https=) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7686978B2 (en) * | 2003-09-24 | 2010-03-30 | E. I. Du Pont De Nemours And Company | Method for the application of active materials onto active surfaces and devices made with such methods |
| US7709050B2 (en) * | 2004-08-02 | 2010-05-04 | Hewlett-Packard Development Company, L.P. | Surface treatment for OLED material |
| JP4876415B2 (ja) * | 2005-03-29 | 2012-02-15 | セイコーエプソン株式会社 | 有機el装置の製造方法、デバイスの製造方法 |
| US8563331B2 (en) * | 2005-06-03 | 2013-10-22 | E. I. Du Pont De Nemours And Company | Process for fabricating and repairing an electronic device |
| US20070170401A1 (en) * | 2005-12-28 | 2007-07-26 | Che-Hsiung Hsu | Cationic compositions of electrically conducting polymers doped with fully-fluorinated acid polymers |
| DE102006021410B4 (de) * | 2006-05-09 | 2009-07-16 | Leonhard Kurz Gmbh & Co. Kg | Verfahren zur Herstellung eines Mehrschichtgebildes und Verwendung des Verfahrens |
| US20080087882A1 (en) * | 2006-06-05 | 2008-04-17 | Lecloux Daniel D | Process for making contained layers and devices made with same |
| WO2007145977A1 (en) * | 2006-06-05 | 2007-12-21 | E. I. Du Pont De Nemours And Company | Process for making an organic electronic device |
| US20080020669A1 (en) * | 2006-06-05 | 2008-01-24 | Feehery William F | Process for making an organic light-emitting diode |
| JP2009076779A (ja) * | 2007-09-21 | 2009-04-09 | Casio Comput Co Ltd | 有機el素子およびその製造方法 |
| KR20100094475A (ko) * | 2007-10-26 | 2010-08-26 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 격납된 층을 제조하기 위한 방법 및 재료, 및 이를 사용하여 제조된 소자 |
| EP2109163A1 (de) * | 2008-04-08 | 2009-10-14 | Alcan Technology & Management Ltd. | Substrat mit aufgedruckter Struktur |
| US8759818B2 (en) | 2009-02-27 | 2014-06-24 | E I Du Pont De Nemours And Company | Deuterated compounds for electronic applications |
| US8592239B2 (en) * | 2009-07-27 | 2013-11-26 | E I Du Pont De Nemours And Company | Process and materials for making contained layers and devices made with same |
| KR101790854B1 (ko) | 2009-09-29 | 2017-10-26 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 발광 응용을 위한 중수소화된 화합물 |
| US20110101312A1 (en) | 2009-10-29 | 2011-05-05 | E. I. Du Pont De Nemours And Company | Deuterated compounds for electronic applications |
| FR2965089B1 (fr) * | 2010-09-20 | 2016-04-29 | Philippe Foucqueteau | Dispositif pour simuler un geste medical |
| JP5727038B2 (ja) | 2010-12-20 | 2015-06-03 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーE.I.Du Pont De Nemours And Company | 電子技術応用のための組成物 |
| JP2012212704A (ja) * | 2011-03-30 | 2012-11-01 | Sumitomo Chemical Co Ltd | 液状組成物及びそれを用いた積層膜の製造方法 |
| BR112015020725A2 (pt) | 2013-03-11 | 2017-07-18 | Saudi Basic Ind Corp | ariloxi-ftalocianinas de metais do grupo iv |
| US8933238B2 (en) | 2013-03-11 | 2015-01-13 | Saudi Basic Industries Corporation | Aryloxy-phthalocyanines of group III metals |
| WO2017132351A1 (en) * | 2016-01-28 | 2017-08-03 | Tokyo Electron Limited | Methods of spin-on deposition of metal oxides |
| US20220025240A1 (en) * | 2018-12-20 | 2022-01-27 | Solvay Specialty Polymers Italy S.P.A. | Method of manufacturing semiconductor devices using a heat transfer fluid comprising fluorinated compounds having a low gwp |
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| US2994664A (en) * | 1958-02-19 | 1961-08-01 | Nalco Chemical Co | Dry acid cleaning compositions |
| US2947703A (en) * | 1958-07-16 | 1960-08-02 | Nalco Chemical Co | Process of inhibiting corrosion of ferrous metals in contact with aqueous solutions of acids |
| US3282875A (en) | 1964-07-22 | 1966-11-01 | Du Pont | Fluorocarbon vinyl ether polymers |
| US3343976A (en) * | 1964-05-07 | 1967-09-26 | North American Aviation Inc | Surface preparation for fluorinated plastics |
| US3438907A (en) * | 1965-07-26 | 1969-04-15 | Wyandotte Chemicals Corp | Iodine-containing nonionic surfactant compositions |
| DE2029556A1 (de) | 1970-06-16 | 1971-12-23 | Farbwerke Hoechst AG, vormals Meister Lucius & Brumng, 6000 Frankfurt | Verfahren zur Herstellung von Aryl 1,1,2,2 tetrafluorathylathern |
| US3783499A (en) * | 1972-01-24 | 1974-01-08 | Bell Telephone Labor Inc | Semiconductor device fabrication using magnetic carrier |
| US4358545A (en) | 1980-06-11 | 1982-11-09 | The Dow Chemical Company | Sulfonic acid electrolytic cell having flourinated polymer membrane with hydration product less than 22,000 |
| US4470920A (en) * | 1981-05-11 | 1984-09-11 | Custom Research And Development | Metal oxide remover for stainless steels |
| US4802967A (en) | 1987-04-08 | 1989-02-07 | Andus Corporation | Surface treatment of polymers |
| DE3714043A1 (de) * | 1987-04-28 | 1988-11-17 | Merck Patent Gmbh | Elektrooptisches fluessigkristallanzeigeelement |
| US4940525A (en) | 1987-05-08 | 1990-07-10 | The Dow Chemical Company | Low equivalent weight sulfonic fluoropolymers |
| US4973391A (en) * | 1988-08-30 | 1990-11-27 | Osaka Gas Company, Ltd. | Composite polymers of polyaniline with metal phthalocyanine and polyaniline with organic sulfonic acid and nafion |
| GB8909011D0 (en) * | 1989-04-20 | 1989-06-07 | Friend Richard H | Electroluminescent devices |
| US5271867A (en) * | 1989-08-23 | 1993-12-21 | Sharp Kabushiki Kaisha | Liquid crystal composition and liquid crystal device containing the same |
| US5098618A (en) * | 1990-03-14 | 1992-03-24 | Joseph Zelez | Surface modification of plastic substrates |
| US5179188A (en) * | 1990-04-17 | 1993-01-12 | Raychem Corporation | Crosslinkable fluorinated aromatic ether composition |
| US5730922A (en) * | 1990-12-10 | 1998-03-24 | The Dow Chemical Company | Resin transfer molding process for composites |
| DE4221152C1 (de) * | 1992-06-27 | 1993-11-18 | Merck Patent Gmbh | Verfahren zur Herstellung von 4-Brom-2,6-difluortrifluormethoxybenzol und 2,6-Difluor-3-nitrotrifluormethoxybenzol |
| JPH06293691A (ja) * | 1993-02-12 | 1994-10-21 | Kanto Denka Kogyo Co Ltd | 高度弗素化フェニルプロピルエーテル及びその製造法 |
| US5431850A (en) * | 1993-08-09 | 1995-07-11 | Merck Patent Gensellschaft Mit Beschrankter Haftung | Nematic liquid-crystal composition for active matrix application |
| US5380644A (en) | 1993-08-10 | 1995-01-10 | Minnesota Mining And Manufacturing Company | Additive for the reduction of mottle in photothermographic and thermographic elements |
| JP2846571B2 (ja) * | 1994-02-25 | 1999-01-13 | 出光興産株式会社 | 有機エレクトロルミネッセンス素子 |
| ATE247149T1 (de) * | 1996-05-15 | 2003-08-15 | Kaneka Corp | Härtbare zusammensetzung, durch verwendung davon hergestellter schaum und verfahren zur herstellung |
| US6046348A (en) * | 1996-07-17 | 2000-04-04 | Fuji Xerox Co., Ltd. | Silane compound, method for making the same, and electrophotographic photoreceptor |
| DE69835366T2 (de) | 1997-03-31 | 2007-07-19 | Daikin Industries, Ltd. | Verfahren zur herstellung von perfluorvinylethersulfonsäure-derivaten |
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| KR100660384B1 (ko) * | 1998-03-17 | 2006-12-21 | 세이코 엡슨 가부시키가이샤 | 표시장치의 제조방법 |
| KR100869622B1 (ko) * | 1998-12-28 | 2008-11-21 | 이데미쓰 고산 가부시키가이샤 | 유기 전기발광 소자용 재료 및 이를 포함하는 유기전기발광 소자 |
| JP2001081394A (ja) * | 1999-09-14 | 2001-03-27 | Titan Kogyo Kk | プライマー組成物及び光触媒体 |
| HK1054816B (zh) * | 1999-12-21 | 2006-09-29 | 弗莱克因艾伯勒有限公司 | 溶液加工 |
| US6821645B2 (en) | 1999-12-27 | 2004-11-23 | Fuji Photo Film Co., Ltd. | Light-emitting material comprising orthometalated iridium complex, light-emitting device, high efficiency red light-emitting device, and novel iridium complex |
| US6955772B2 (en) * | 2001-03-29 | 2005-10-18 | Agfa-Gevaert | Aqueous composition containing a polymer or copolymer of a 3,4-dialkoxythiophene and a non-newtonian binder |
| US20020121638A1 (en) | 2000-06-30 | 2002-09-05 | Vladimir Grushin | Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds |
| JP5241053B2 (ja) | 2000-08-11 | 2013-07-17 | ザ、トラスティーズ オブ プリンストン ユニバーシティ | 有機金属化合物及び放射移行有機電気燐光体 |
| JP4154139B2 (ja) | 2000-09-26 | 2008-09-24 | キヤノン株式会社 | 発光素子 |
| JP4154140B2 (ja) | 2000-09-26 | 2008-09-24 | キヤノン株式会社 | 金属配位化合物 |
| WO2002072714A1 (de) * | 2001-03-10 | 2002-09-19 | Covion Organic Semiconductors Gmbh | Lösung und dispersionen organischer halbleiter |
| JP2002280177A (ja) * | 2001-03-15 | 2002-09-27 | Toshiba Corp | 有機el素子および表示装置 |
| JP2003080694A (ja) * | 2001-06-26 | 2003-03-19 | Seiko Epson Corp | 膜パターンの形成方法、膜パターン形成装置、導電膜配線、電気光学装置、電子機器、並びに非接触型カード媒体 |
| JP2003041192A (ja) * | 2001-07-27 | 2003-02-13 | Dainippon Toryo Co Ltd | 転写方法及び転写用被覆剤 |
| DE10141624A1 (de) * | 2001-08-24 | 2003-03-06 | Covion Organic Semiconductors | Lösungen polymerer Halbleiter |
| US6652661B2 (en) * | 2001-10-12 | 2003-11-25 | Bobolink, Inc. | Radioactive decontamination and translocation method |
| US6955773B2 (en) | 2002-02-28 | 2005-10-18 | E.I. Du Pont De Nemours And Company | Polymer buffer layers and their use in light-emitting diodes |
| CA2499364A1 (en) | 2002-09-24 | 2004-04-08 | E. I. Du Pont De Nemours And Company | Water dispersible polyanilines made with polymeric acid colloids for electronics applications |
| WO2004029128A2 (en) | 2002-09-24 | 2004-04-08 | E.I. Du Pont De Nemours And Company | Water dispersible polythiophenes made with polymeric acid colloids |
| US6916902B2 (en) | 2002-12-19 | 2005-07-12 | Dow Global Technologies Inc. | Tricyclic arylamine containing polymers and electronic devices therefrom |
| US7390438B2 (en) * | 2003-04-22 | 2008-06-24 | E.I. Du Pont De Nemours And Company | Water dispersible substituted polydioxythiophenes made with fluorinated polymeric sulfonic acid colloids |
| US7531700B2 (en) * | 2003-09-24 | 2009-05-12 | E.I. Du Pont De Nemours And Company | Fluorinated arylethers and methods for use thereof |
| US7686978B2 (en) * | 2003-09-24 | 2010-03-30 | E. I. Du Pont De Nemours And Company | Method for the application of active materials onto active surfaces and devices made with such methods |
-
2003
- 2003-09-24 US US10/669,403 patent/US7686978B2/en not_active Expired - Lifetime
-
2004
- 2004-09-22 KR KR1020067005767A patent/KR101176678B1/ko not_active Expired - Fee Related
- 2004-09-22 JP JP2006528165A patent/JP5339678B2/ja not_active Expired - Fee Related
- 2004-09-22 TW TW093128654A patent/TW200525793A/zh unknown
- 2004-09-22 WO PCT/US2004/031246 patent/WO2005031889A2/en not_active Ceased
-
2005
- 2005-06-16 US US11/154,925 patent/US8287766B2/en not_active Expired - Fee Related
-
2011
- 2011-04-05 US US13/080,317 patent/US8465850B2/en not_active Expired - Fee Related
-
2012
- 2012-03-22 JP JP2012065874A patent/JP5602173B2/ja not_active Expired - Fee Related
-
2013
- 2013-12-24 JP JP2013265744A patent/JP5757989B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007506547A (ja) | 2007-03-22 |
| JP5757989B2 (ja) | 2015-08-05 |
| JP2012157859A (ja) | 2012-08-23 |
| KR20070029625A (ko) | 2007-03-14 |
| US8287766B2 (en) | 2012-10-16 |
| KR101176678B1 (ko) | 2012-08-23 |
| US20110180761A1 (en) | 2011-07-28 |
| WO2005031889A3 (en) | 2005-06-23 |
| WO2005031889A2 (en) | 2005-04-07 |
| US7686978B2 (en) | 2010-03-30 |
| US20050062021A1 (en) | 2005-03-24 |
| JP5602173B2 (ja) | 2014-10-08 |
| TW200525793A (en) | 2005-08-01 |
| US8465850B2 (en) | 2013-06-18 |
| US20050269550A1 (en) | 2005-12-08 |
| JP2014090195A (ja) | 2014-05-15 |
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