JP5335423B2 - ガス流出物のプラズマ処理のための方法 - Google Patents

ガス流出物のプラズマ処理のための方法 Download PDF

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Publication number
JP5335423B2
JP5335423B2 JP2008520927A JP2008520927A JP5335423B2 JP 5335423 B2 JP5335423 B2 JP 5335423B2 JP 2008520927 A JP2008520927 A JP 2008520927A JP 2008520927 A JP2008520927 A JP 2008520927A JP 5335423 B2 JP5335423 B2 JP 5335423B2
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JP
Japan
Prior art keywords
plasma
gas
water vapor
effluent
pfc
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Expired - Fee Related
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JP2008520927A
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English (en)
Japanese (ja)
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JP2009501073A (ja
Inventor
ゲラン、ダニエル
ラルケ、クリスティアン
エル−クリド、アイシャ
ロスティン、ジャン−クリストフ
モワサン、ミシェル
モワーヌ、パスカル
ダルフィ、エルベ
ルソール、アンヌ−ロール
サンドール、エティエンヌ
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Air Liquide Electronics Systems SA
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Air Liquide Electronics Systems SA
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Priority claimed from FR0552149A external-priority patent/FR2888519B1/fr
Priority claimed from FR0650761A external-priority patent/FR2898066B1/fr
Application filed by Air Liquide Electronics Systems SA filed Critical Air Liquide Electronics Systems SA
Publication of JP2009501073A publication Critical patent/JP2009501073A/ja
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Publication of JP5335423B2 publication Critical patent/JP5335423B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/70—Organic halogen compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/42—Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder, liquid
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/4615—Microwave discharges using surface waves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/20—Capture or disposal of greenhouse gases of methane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Biomedical Technology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Treating Waste Gases (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Water Treatments (AREA)
JP2008520927A 2005-07-12 2006-07-10 ガス流出物のプラズマ処理のための方法 Expired - Fee Related JP5335423B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
FR0552149A FR2888519B1 (fr) 2005-07-12 2005-07-12 Procede de traitement, par plasma, d'effluents gazeux
FR0552149 2005-07-12
FR0650761 2006-03-03
FR0650761A FR2898066B1 (fr) 2006-03-03 2006-03-03 Procede de destruction d'effluents
PCT/FR2006/050699 WO2007007003A2 (fr) 2005-07-12 2006-07-10 Procede de traitement par plasma d'effluents gazeux

Publications (2)

Publication Number Publication Date
JP2009501073A JP2009501073A (ja) 2009-01-15
JP5335423B2 true JP5335423B2 (ja) 2013-11-06

Family

ID=37637541

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008520927A Expired - Fee Related JP5335423B2 (ja) 2005-07-12 2006-07-10 ガス流出物のプラズマ処理のための方法

Country Status (4)

Country Link
EP (1) EP1904664A2 (fr)
JP (1) JP5335423B2 (fr)
KR (1) KR20080032089A (fr)
WO (1) WO2007007003A2 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2898066B1 (fr) * 2006-03-03 2008-08-15 L'air Liquide Procede de destruction d'effluents
FR2927547B1 (fr) * 2008-02-14 2010-12-24 Air Liquide Procede de destruction de n20 par plasma micro-ondes a pression atmospherique.
DE102008009624A1 (de) * 2008-02-18 2009-08-20 Cs Clean Systems Ag Verfahren und Vorrichtung zur Reinigung der Abgase einer Prozessanlage
KR101026457B1 (ko) * 2008-09-02 2011-03-31 (주)트리플코어스코리아 저압 및 대기압 플라즈마를 이용한 폐가스 제거 시스템
CN102132386B (zh) * 2008-09-25 2013-04-03 积水化学工业株式会社 含硅膜的蚀刻方法以及装置
KR100987978B1 (ko) * 2008-10-27 2010-10-18 (주)트리플코어스코리아 가스 스크러빙 장치 및 가스 스크러빙 방법
JP2017517380A (ja) * 2014-03-06 2017-06-29 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 重原子を含有する化合物のプラズマ軽減
WO2018148062A1 (fr) * 2017-02-09 2018-08-16 Applied Materials, Inc. Technologie de réduction de plasma utilisant de la vapeur d'eau et un réactif à l'oxygène
KR102122303B1 (ko) * 2019-10-02 2020-06-12 (주)쏠츠 과불화탄소가스의 고효율 처리를 위한 고에너지 열플라즈마와 고온챔버를 이용한 배기가스 처리장치
CN110935286B (zh) * 2020-01-16 2022-03-01 浙江工业大学 一种利用离子液体复合生物基溶剂吸收残留熏蒸剂硫酰氟的方法
CN117420083B (zh) * 2023-12-19 2024-04-09 哈尔滨工业大学 一种等离子体侵蚀痕量产物在线监测装置及方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11156156A (ja) * 1997-11-27 1999-06-15 Seiko Epson Corp ハロゲン系ガスの処理方法、処理装置および反応処理装置並びに半導体装置
JP2001252527A (ja) * 2000-03-13 2001-09-18 Seiko Epson Corp Ｐｆｃの処理方法および処理装置
JP2002191963A (ja) * 2000-12-26 2002-07-10 Mitsubishi Heavy Ind Ltd 有機ハロゲン化合物の分解処理方法および分解装置
FR2864795B1 (fr) * 2004-01-06 2008-04-18 Air Liquide Procede de traitement des gaz par des decharges hautes frequence
GB0403797D0 (en) * 2004-02-20 2004-03-24 Boc Group Plc Gas abatement
FR2898066B1 (fr) * 2006-03-03 2008-08-15 L'air Liquide Procede de destruction d'effluents

Also Published As

Publication number Publication date
JP2009501073A (ja) 2009-01-15
EP1904664A2 (fr) 2008-04-02
KR20080032089A (ko) 2008-04-14
WO2007007003A3 (fr) 2007-05-03
WO2007007003A2 (fr) 2007-01-18

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