WO2007007003A3 - Procede de traitement par plasma d'effluents gazeux - Google Patents

Procede de traitement par plasma d'effluents gazeux Download PDF

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Publication number
WO2007007003A3
WO2007007003A3 PCT/FR2006/050699 FR2006050699W WO2007007003A3 WO 2007007003 A3 WO2007007003 A3 WO 2007007003A3 FR 2006050699 W FR2006050699 W FR 2006050699W WO 2007007003 A3 WO2007007003 A3 WO 2007007003A3
Authority
WO
WIPO (PCT)
Prior art keywords
plasma treatment
gas effluents
plasma
effluents
gas
Prior art date
Application number
PCT/FR2006/050699
Other languages
English (en)
Other versions
WO2007007003A2 (fr
Inventor
Daniel Guerin
Christian Larquet
Aicha El-Krid
Jean-Christophe Rostaing
Michel Moisan
Pascal Moine
Herve Dulphy
Anne-Laure Lesort
Etienne Sandre
Original Assignee
Air Liquide
Air Liquide Electronics Sys
Daniel Guerin
Christian Larquet
Aicha El-Krid
Jean-Christophe Rostaing
Michel Moisan
Pascal Moine
Herve Dulphy
Anne-Laure Lesort
Etienne Sandre
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR0552149A external-priority patent/FR2888519B1/fr
Priority claimed from FR0650761A external-priority patent/FR2898066B1/fr
Application filed by Air Liquide, Air Liquide Electronics Sys, Daniel Guerin, Christian Larquet, Aicha El-Krid, Jean-Christophe Rostaing, Michel Moisan, Pascal Moine, Herve Dulphy, Anne-Laure Lesort, Etienne Sandre filed Critical Air Liquide
Priority to JP2008520927A priority Critical patent/JP5335423B2/ja
Priority to EP06794474A priority patent/EP1904664A2/fr
Publication of WO2007007003A2 publication Critical patent/WO2007007003A2/fr
Publication of WO2007007003A3 publication Critical patent/WO2007007003A3/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/70—Organic halogen compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/42—Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder, liquid
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/4615—Microwave discharges using surface waves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/20—Capture or disposal of greenhouse gases of methane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Biomedical Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Electromagnetism (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Treating Waste Gases (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Water Treatments (AREA)

Abstract

L'invention concerne un procédé de traitement, par plasma, d'effluents gazeux à pression sensiblement atmosphérique, comportant - l'injection de l'effluent à traiter dans une torche à plasma, - l'injection de vapeur d'eau, en amont et/ou en aval du plasma.
PCT/FR2006/050699 2005-07-12 2006-07-10 Procede de traitement par plasma d'effluents gazeux WO2007007003A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008520927A JP5335423B2 (ja) 2005-07-12 2006-07-10 ガス流出物のプラズマ処理のための方法
EP06794474A EP1904664A2 (fr) 2005-07-12 2006-07-10 Procede de traitement par plasma d'effluents gazeux

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
FR0552149 2005-07-12
FR0552149A FR2888519B1 (fr) 2005-07-12 2005-07-12 Procede de traitement, par plasma, d'effluents gazeux
FR0650761 2006-03-03
FR0650761A FR2898066B1 (fr) 2006-03-03 2006-03-03 Procede de destruction d'effluents

Publications (2)

Publication Number Publication Date
WO2007007003A2 WO2007007003A2 (fr) 2007-01-18
WO2007007003A3 true WO2007007003A3 (fr) 2007-05-03

Family

ID=37637541

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/FR2006/050699 WO2007007003A2 (fr) 2005-07-12 2006-07-10 Procede de traitement par plasma d'effluents gazeux

Country Status (4)

Country Link
EP (1) EP1904664A2 (fr)
JP (1) JP5335423B2 (fr)
KR (1) KR20080032089A (fr)
WO (1) WO2007007003A2 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2898066B1 (fr) * 2006-03-03 2008-08-15 L'air Liquide Procede de destruction d'effluents
FR2927547B1 (fr) * 2008-02-14 2010-12-24 Air Liquide Procede de destruction de n20 par plasma micro-ondes a pression atmospherique.
DE102008009624A1 (de) * 2008-02-18 2009-08-20 Cs Clean Systems Ag Verfahren und Vorrichtung zur Reinigung der Abgase einer Prozessanlage
KR101026457B1 (ko) * 2008-09-02 2011-03-31 (주)트리플코어스코리아 저압 및 대기압 플라즈마를 이용한 폐가스 제거 시스템
KR101248625B1 (ko) * 2008-09-25 2013-04-02 세키스이가가쿠 고교가부시키가이샤 실리콘 함유막의 에칭 방법 및 장치
KR100987978B1 (ko) * 2008-10-27 2010-10-18 (주)트리플코어스코리아 가스 스크러빙 장치 및 가스 스크러빙 방법
KR101875421B1 (ko) * 2014-03-06 2018-07-06 어플라이드 머티어리얼스, 인코포레이티드 중원자들을 함유하는 화합물들의 플라즈마 저감
CN114797403A (zh) * 2017-02-09 2022-07-29 应用材料公司 利用水蒸气和氧试剂的等离子体减量技术
KR102122303B1 (ko) * 2019-10-02 2020-06-12 (주)쏠츠 과불화탄소가스의 고효율 처리를 위한 고에너지 열플라즈마와 고온챔버를 이용한 배기가스 처리장치
CN110935286B (zh) * 2020-01-16 2022-03-01 浙江工业大学 一种利用离子液体复合生物基溶剂吸收残留熏蒸剂硫酰氟的方法
CN117420083B (zh) * 2023-12-19 2024-04-09 哈尔滨工业大学 一种等离子体侵蚀痕量产物在线监测装置及方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11156156A (ja) * 1997-11-27 1999-06-15 Seiko Epson Corp ハロゲン系ガスの処理方法、処理装置および反応処理装置並びに半導体装置
US20020033377A1 (en) * 2000-03-13 2002-03-21 Isamu Namose Method of processing PFC and apparatus for processing PFC
FR2864795A1 (fr) * 2004-01-06 2005-07-08 Air Liquide Procede de traitement des gaz par des decharges hautes frequence
WO2005079958A1 (fr) * 2004-02-20 2005-09-01 The Boc Group Plc Procede et appareil de traitement d'un flux gazeux contenant un compose fluore

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002191963A (ja) * 2000-12-26 2002-07-10 Mitsubishi Heavy Ind Ltd 有機ハロゲン化合物の分解処理方法および分解装置
FR2898066B1 (fr) * 2006-03-03 2008-08-15 L'air Liquide Procede de destruction d'effluents

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11156156A (ja) * 1997-11-27 1999-06-15 Seiko Epson Corp ハロゲン系ガスの処理方法、処理装置および反応処理装置並びに半導体装置
US20020033377A1 (en) * 2000-03-13 2002-03-21 Isamu Namose Method of processing PFC and apparatus for processing PFC
FR2864795A1 (fr) * 2004-01-06 2005-07-08 Air Liquide Procede de traitement des gaz par des decharges hautes frequence
WO2005079958A1 (fr) * 2004-02-20 2005-09-01 The Boc Group Plc Procede et appareil de traitement d'un flux gazeux contenant un compose fluore

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 1999, no. 11 30 September 1999 (1999-09-30) *
VARTANIAN V ET AL: "REDUCTION OF SEMICONDUCTOR PROCESS EMISSIONS BY REACTIVE GAS OPTIMIZATION", IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, IEEE SERVICE CENTER, PISCATAWAY, NJ, US, vol. 17, no. 4, November 2004 (2004-11-01), pages 483 - 490, XP001209966, ISSN: 0894-6507 *

Also Published As

Publication number Publication date
JP2009501073A (ja) 2009-01-15
KR20080032089A (ko) 2008-04-14
EP1904664A2 (fr) 2008-04-02
WO2007007003A2 (fr) 2007-01-18
JP5335423B2 (ja) 2013-11-06

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