JP5324742B2 - 光学フィルタ - Google Patents
光学フィルタ Download PDFInfo
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- JP5324742B2 JP5324742B2 JP2006295470A JP2006295470A JP5324742B2 JP 5324742 B2 JP5324742 B2 JP 5324742B2 JP 2006295470 A JP2006295470 A JP 2006295470A JP 2006295470 A JP2006295470 A JP 2006295470A JP 5324742 B2 JP5324742 B2 JP 5324742B2
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- substrate
- film
- synthetic resin
- optical filter
- light
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Description
図1は本発明の光学フィルタを製造する場合の蒸着時に用いる冷却機構の底面図、図2は断面図を示している。銅製の円板から成る冷却板1の裏面には溝が設けられ、この溝内に冷媒を流す冷却パイプ2が渦巻状に配置されている。そして、冷却板1上には合成樹脂基板3が配置される。
2 冷却パイプ
3 合成樹脂基板
21 マスク
22 孔部
31 光学フィルタ
41 SiO2膜
42 Nb2O5膜
Claims (3)
- 透明合成樹脂基板の両面にそれぞれ複数層から成る蒸着膜を成膜し、少なくとも紫外波長領域の範囲に含まれる波長の光の透過を制限する光学フィルタであって、前記透明合成樹脂基板は厚さを0.1mm以下、前記透明合成樹脂基板を形成する合成樹脂の曲げ弾性率を2400MPa以上、350〜450nmの範囲内の波長領域の光の透過率が90%以上のノルボルネン系樹脂とし、前記複数層の蒸着膜を前記透明合成樹脂基板の両面にほぼ同等の膜厚でそれぞれ成膜することにより前記350〜450nmの範囲内の波長領域の光のうち350〜370nmの近紫外波長領域の光の透過率を1.0%以下、前記350〜450nmの範囲内の波長領域の一部を含む395〜680nmの可視波長領域の光の透過率を90%以上、710〜1000nmの波長領域の透過率を1.0%以下としたことを特徴とする光学フィルタ。
- 前記透明合成樹脂基板を形成する合成樹脂のガラス転移温度は70℃以上であることを特徴とする請求項1に記載の光学フィルタ。
- 前記基板の両面に、それぞれ19層以上の前記蒸着膜を成膜したことを特徴とする請求項1又は2に記載の光学フィルタ。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006295470A JP5324742B2 (ja) | 2006-10-31 | 2006-10-31 | 光学フィルタ |
Applications Claiming Priority (1)
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JP2006295470A JP5324742B2 (ja) | 2006-10-31 | 2006-10-31 | 光学フィルタ |
Publications (2)
Publication Number | Publication Date |
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JP2008112033A JP2008112033A (ja) | 2008-05-15 |
JP5324742B2 true JP5324742B2 (ja) | 2013-10-23 |
Family
ID=39444567
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2006295470A Active JP5324742B2 (ja) | 2006-10-31 | 2006-10-31 | 光学フィルタ |
Country Status (1)
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JP (1) | JP5324742B2 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5823119B2 (ja) * | 2010-12-27 | 2015-11-25 | キヤノン電子株式会社 | 紫外赤外線カット用光学フィルタ |
CN104838294B (zh) | 2012-12-06 | 2017-03-08 | 旭硝子株式会社 | 近红外线截止滤波器 |
JP5854014B2 (ja) * | 2013-09-17 | 2016-02-09 | ソニー株式会社 | 光学装置及び撮像装置 |
JP6631521B2 (ja) * | 2014-08-01 | 2020-01-15 | Jsr株式会社 | 光学フィルター |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000221322A (ja) * | 1999-02-01 | 2000-08-11 | Sony Corp | 紫外赤外線カットフィルタ及び投射型表示装置 |
JP4540883B2 (ja) * | 2000-10-19 | 2010-09-08 | パナソニック電工株式会社 | 透視性電磁波シールド・近赤外線カット材料及びその製造方法 |
JP2002258035A (ja) * | 2001-02-27 | 2002-09-11 | Seiko Epson Corp | 多層膜カットフィルター及びその製造方法 |
JP3937823B2 (ja) * | 2001-11-29 | 2007-06-27 | 株式会社大真空 | 光線カットフィルタ |
JP2006030944A (ja) * | 2004-06-18 | 2006-02-02 | Jsr Corp | 近赤外線カットフィルター |
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2006
- 2006-10-31 JP JP2006295470A patent/JP5324742B2/ja active Active
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JP2008112033A (ja) | 2008-05-15 |
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