JP5313074B2 - 液処理装置、液処理方法、プログラムおよびプログラム記録媒体 - Google Patents

液処理装置、液処理方法、プログラムおよびプログラム記録媒体 Download PDF

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JP5313074B2
JP5313074B2 JP2009179479A JP2009179479A JP5313074B2 JP 5313074 B2 JP5313074 B2 JP 5313074B2 JP 2009179479 A JP2009179479 A JP 2009179479A JP 2009179479 A JP2009179479 A JP 2009179479A JP 5313074 B2 JP5313074 B2 JP 5313074B2
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liquid
line
supply
processing
supply line
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JP2011035135A5 (enExample
JP2011035135A (ja
Inventor
藤 規 宏 伊
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2009179479A priority Critical patent/JP5313074B2/ja
Priority to US12/837,840 priority patent/US8950414B2/en
Priority to KR1020100071348A priority patent/KR101401693B1/ko
Priority to TW099125099A priority patent/TWI483784B/zh
Priority to TW103133762A priority patent/TWI571313B/zh
Priority to CN201010243590.2A priority patent/CN101989538B/zh
Publication of JP2011035135A publication Critical patent/JP2011035135A/ja
Publication of JP2011035135A5 publication Critical patent/JP2011035135A5/ja
Priority to KR1020130091387A priority patent/KR101371107B1/ko
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JP2009179479A 2009-07-31 2009-07-31 液処理装置、液処理方法、プログラムおよびプログラム記録媒体 Active JP5313074B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2009179479A JP5313074B2 (ja) 2009-07-31 2009-07-31 液処理装置、液処理方法、プログラムおよびプログラム記録媒体
US12/837,840 US8950414B2 (en) 2009-07-31 2010-07-16 Liquid processing apparatus, liquid processing method, and storage medium
KR1020100071348A KR101401693B1 (ko) 2009-07-31 2010-07-23 액처리 장치, 액처리 방법 및 기록 매체
TW103133762A TWI571313B (zh) 2009-07-31 2010-07-29 液體處理裝置、液體處理方法及記憶媒體
TW099125099A TWI483784B (zh) 2009-07-31 2010-07-29 液體處理裝置、液體處理方法及記憶媒體
CN201010243590.2A CN101989538B (zh) 2009-07-31 2010-07-30 液体处理装置和液体处理方法
KR1020130091387A KR101371107B1 (ko) 2009-07-31 2013-08-01 액처리 장치, 액처리 방법 및 기록 매체

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Application Number Priority Date Filing Date Title
JP2009179479A JP5313074B2 (ja) 2009-07-31 2009-07-31 液処理装置、液処理方法、プログラムおよびプログラム記録媒体

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JP2011035135A JP2011035135A (ja) 2011-02-17
JP2011035135A5 JP2011035135A5 (enExample) 2011-12-08
JP5313074B2 true JP5313074B2 (ja) 2013-10-09

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5391217B2 (ja) * 2011-02-21 2014-01-15 Ｃｋｄ株式会社 流量制御ユニット
JP5893592B2 (ja) 2013-08-23 2016-03-23 東京エレクトロン株式会社 液処理装置
JP7499622B2 (ja) 2020-06-23 2024-06-14 東京エレクトロン株式会社 液処理装置および液処理方法
JP7520119B2 (ja) 2020-07-06 2024-07-22 東京エレクトロン株式会社 液処理装置および液処理方法
JP7671663B2 (ja) * 2021-09-24 2025-05-02 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02138427U (enExample) * 1989-04-24 1990-11-19
JPH08108125A (ja) * 1994-10-13 1996-04-30 Sony Disc Technol:Kk 液供給装置
JP2003017453A (ja) * 2001-04-27 2003-01-17 Dainippon Screen Mfg Co Ltd 基板処理方法および基板処理装置
JP4723268B2 (ja) * 2005-03-23 2011-07-13 大日本スクリーン製造株式会社 基板処理装置
JP4940123B2 (ja) * 2007-12-21 2012-05-30 東京エレクトロン株式会社 基板処理装置および基板処理方法

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