JP5303568B2 - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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Description
まず、図7(a)のように、半導体基板上において配線102を有する下地膜101上に、エッチングストップ・拡散防止膜103を形成する。そして、低誘電率である多孔質絶縁層104にビア107とトレンチ108を所定の方法により形成する(図7(b))。
特許文献1に記載の方法においては、ビア底の配線表面にポリマー膜109cが形成されているため下層配線102とビア配線(Cu膜111)との間の接触抵抗が高くなることがあった。特に近年、LSIの性能向上を実現するため、配線ピッチの縮小化と多層配線層数の増大が進められている。ビア抵抗はビア底の面積に比例するので、配線ピッチの縮小化率以上にビア抵抗は増大化する傾向にある。また配線層数が増えるほど、配線抵抗に占めるビア抵抗の割合は大きくなる。
本実施形態の半導体装置は、図2(b)に示すように、第1配線2と、第1配線2上に形成された多孔質絶縁層4と、多孔質絶縁層4中に埋設され、第1配線2と電気的に接続された第2配線11と、多孔質絶縁層4と第2配線11との間に設けられ、これらの層を隔離する炭素含有金属膜9aとを備える。第1配線2と第2配線11との間には、金属膜9bを備える。第1配線2を含む下地膜1の上には、多孔質絶縁層4との間にエッチングストップ・拡散防止膜3を備える。
金属膜9bは、チタン(Ti)、タングステン(W)、アルミ(Al)、タンタル(Ta)等から形成されている。
本実施形態における半導体装置の製造方法は、以下の工程を備える。
(a)第1配線2上に多孔質絶縁層4を形成する工程(図1(a)〜(b))
(b)多孔質絶縁層4に配線溝(ビア7、トレンチ8)を形成する工程(図1(b))
(c)多孔質絶縁層4に反応性炭素含有化合物を含浸させる工程
(d)ビア7およびトレンチ8の側面に位置する多孔質絶縁層4表面およびビア7の底面に露出する第1配線2の表面に金属膜を堆積させ、該金属膜に反応性炭素含有化合物に含まれる炭素を導入することにより、多孔質絶縁層4表面に炭素含有金属膜9aを形成する工程(図1(c))
(e)炭素含有金属膜9aが形成された配線溝(ビア7、トレンチ8)に、第2配線11を形成する工程(図2(a)〜(b))
工程(a):第1配線2上に多孔質絶縁層4を形成する。
まず、図1(a)に示すように、図示しない半導体基板上において第1配線2を有する下地膜1上に、CVD(Chemical Vapor Deposition)法により20nm厚程度のエッチングストップ・拡散防止膜3を形成する。
多孔質絶縁層4を形成後、通常の方法により、フォトレジストマスクを用いて多孔質絶縁層4をエッチングし、ビア7とトレンチ8を形成する。そして、アッシングにてフォトレジストマスクを除去する(図1(b))。ビア7は、多孔質絶縁層4とエッチングストップ・拡散防止膜3を貫通し下地膜1に達しており、トレンチ8は多孔質絶縁層4の膜厚の約1/2の深さである。
工程(c)においては、ビア7およびトレンチ8が形成された多孔質絶縁層4を、気化された反応性炭素含有化合物を含む雰囲気下に曝すことにより、多孔質絶縁層4中に反応性炭素含有化合物を含浸させる。
本実施形態においては、給電膜を付けた後、めっき法にてビア7、トレンチ8にCuまたはAlを埋設する(図2(a))。そして、通常のCMP(Chemical Mechanical Polishing)法にて余分な金属等を除去し、第2配線11を形成する。
そして、その後通常の工程により半導体装置を製造する。
本実施形態の半導体装置は、多孔質絶縁層4と第2配線11とを隔離する炭素含有金属膜9aを有している。
これにより、第2配線11から多孔質絶縁層4への金属拡散が効果的に抑制され、接続信頼性に優れた半導体装置を得ることができる。
これにより、第2配線11から多孔質絶縁層4への金属拡散が効果的に抑制され、接続信頼性により優れた半導体装置を得ることができる。
この工程により、多孔質絶縁層4に反応性炭素含有化合物を効率的に含有させることができる。
本実施形態の半導体装置は、図4(b)に示すように、第1配線2と、第1配線2上に形成された多孔質絶縁層4と、多孔質絶縁層4中に埋設され、第1配線2と電気的に接続された第2配線11とを備える。さらに、多孔質絶縁層4と第2配線11との間には、多孔質絶縁層4側から順に、炭素含有金属膜9aと、バリアメタル膜10とを備える。第1配線2とバリアメタル膜10との間には、金属膜9bを備える
本実施形態において、バリアメタル膜10の膜厚は、10nm程度である。
本実施形態における半導体装置の製造方法は、以下の工程を備える。
(a)第1配線2上に多孔質絶縁層4を形成する工程(図3(a)〜(b))
(b)多孔質絶縁層4に配線溝(ビア7、トレンチ8)を形成する工程(図3(b))
(c)多孔質絶縁層4に反応性炭素含有化合物を含浸させる工程
(d)ビア7およびトレンチ8の側面に位置する多孔質絶縁層4表面およびビア7の底面に露出する第1配線2の表面に金属膜を堆積させ、該金属膜に反応性炭素含有化合物に含まれる炭素を導入することにより、多孔質絶縁層4表面に炭素含有金属膜9aを形成する工程(図3(c))
(e)炭素含有金属膜9aおよび金属膜9b上に、バリアメタル膜10を形成する工程(図4(a))
工程(e):炭素含有金属膜9aおよび金属膜9b上に、バリアメタル膜10を形成する(図4(a))。
本実施形態において、バリアメタル膜10は通常の方法で形成することができる。バリアメタル膜10を構成する金属としては、第2配線11を構成する金属の拡散を抑制する効果の大きいものを用いることができる。
本実施形態においては、炭素含有金属膜9a表面および金属膜9b表面に給電膜を付けた後、めっき法にてビア7、トレンチ8にCuまたはAlを埋設する(図4(a))。そして、通常のCMP法にて余分な金属等を除去し、第2配線11を形成する(図4(b))。
そして、その後通常の工程により半導体装置を製造する。
本実施形態の半導体装置は、炭素含有金属膜9a上に、バリアメタル膜10を備えているので、第2配線11から多孔質絶縁層4への金属拡散がより抑制される。そのため、エレクトロマイグレーションやストレスマイグレーション等の発生が抑制され、接続信頼性が向上するので、動作保証寿命の長い高品質な配線を有する半導体装置を提供することができる。
Claims (8)
- 第1配線上に多孔質絶縁層を形成する工程と、
前記多孔質絶縁層に配線溝を形成する工程と、
前記多孔質絶縁層に反応性炭素含有化合物を含浸する工程と、
前記配線溝の側面に位置する前記多孔質絶縁層表面および前記配線溝の底面に露出する前記第1配線の表面に金属膜を堆積させ、該金属膜に前記反応性炭素含有化合物に含まれる炭素を導入することにより、前記多孔質絶縁層表面に炭素含有金属膜を形成する工程と、
前記炭素含有金属膜が形成された前記配線溝に、第2配線を形成する工程と、
を含む半導体装置の製造方法。 - 請求項1に記載の半導体装置の製造方法において、
前記反応性炭素含有化合物を含浸する前記工程は、
気化した前記反応性炭素含有化合物を含む雰囲気下において、前記多孔質絶縁層に反応性炭素含有化合物を含浸する工程を含むことを特徴とする半導体装置の製造方法。 - 請求項1に記載の半導体装置の製造方法において、
前記反応性炭素含有化合物を含浸させる前記工程は、
前記反応性炭素含有化合物を含む溶液に、前記配線溝が形成された前記多孔質絶縁層を浸漬し、加熱乾燥する工程を含むことを特徴とする半導体装置の製造方法。 - 請求項1乃至3のいずれかに記載の半導体装置の製造方法において、
前記反応性炭素含有化合物は熱反応性であって、
前記炭素含有金属膜を形成する前記工程は、
前記多孔質絶縁層表面および前記配線溝の底面に露出する前記第1配線の表面にスパッタリングにより金属膜を堆積させ、このスパッタリングにおける熱により該金属膜に前記反応性炭素含有化合物に含まれる炭素を導入する工程を含むことを特徴とする半導体装置の製造方法。 - 請求項1乃至4のいずれかに記載の半導体装置の製造方法において、
前記炭素含有金属膜を形成する前記工程の後に、
前記炭素含有金属膜上に、バリアメタル膜を形成する工程を含むことを特徴とする半導体装置の製造方法。 - 請求項1乃至5のいずれかに記載の半導体装置の製造方法において、
前記反応性炭素含有化合物は、環状シロキサンおよび第2級アルコールから選択されることを特徴とする半導体装置の製造方法。 - 請求項1乃至6のいずれかに記載の半導体装置の製造方法において、
前記炭素含有金属膜は、TiC、TaC、WCまたはAlC3 を含むことを特徴とする半導体装置の製造方法。 - 請求項1乃至7のいずれかに記載の半導体装置の製造方法において、
前記炭素含有金属膜の膜厚は、3nm以上、50nm以下であることを特徴とする半導体装置の製造方法。
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