JP5293790B2 - 液処理装置、液処理方法及び記憶媒体 - Google Patents

液処理装置、液処理方法及び記憶媒体 Download PDF

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JP5293790B2
JP5293790B2 JP2011207933A JP2011207933A JP5293790B2 JP 5293790 B2 JP5293790 B2 JP 5293790B2 JP 2011207933 A JP2011207933 A JP 2011207933A JP 2011207933 A JP2011207933 A JP 2011207933A JP 5293790 B2 JP5293790 B2 JP 5293790B2
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liquid
processing
nozzle
unit
wafer
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JP2012060137A (ja
JP2012060137A5 (de
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靖史 滝口
好貴 吉村
雄一郎 宮田
裕介 山本
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2011207933A 2011-09-22 2011-09-22 液処理装置、液処理方法及び記憶媒体 Active JP5293790B2 (ja)

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JP2011207933A JP5293790B2 (ja) 2011-09-22 2011-09-22 液処理装置、液処理方法及び記憶媒体

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JP2011207933A JP5293790B2 (ja) 2011-09-22 2011-09-22 液処理装置、液処理方法及び記憶媒体

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JP2009031889A Division JP2010186974A (ja) 2009-02-13 2009-02-13 液処理装置、液処理方法及び記憶媒体

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JP2012060137A JP2012060137A (ja) 2012-03-22
JP2012060137A5 JP2012060137A5 (de) 2012-09-27
JP5293790B2 true JP5293790B2 (ja) 2013-09-18

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI544291B (zh) 2012-05-22 2016-08-01 斯克林半導體科技有限公司 顯像處理裝置
JP6236328B2 (ja) * 2014-02-06 2017-11-22 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP6447354B2 (ja) * 2014-07-23 2019-01-09 東京エレクトロン株式会社 現像装置
CN113759675A (zh) * 2020-06-05 2021-12-07 长鑫存储技术有限公司 半导体设备及其操作方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0430521A (ja) * 1990-05-28 1992-02-03 Dainippon Screen Mfg Co Ltd 基板用回転式表面処理装置
JP2811247B2 (ja) * 1991-12-13 1998-10-15 東京エレクトロン株式会社 処理装置
JP4024351B2 (ja) * 1997-08-11 2007-12-19 大日本スクリーン製造株式会社 現像装置
JP3679904B2 (ja) * 1997-08-29 2005-08-03 大日本スクリーン製造株式会社 ノズル洗浄装置および該ノズル洗浄装置を備えた塗布装置
JP2004209313A (ja) * 2002-12-27 2004-07-29 Dainippon Screen Mfg Co Ltd 基板塗布装置および基板塗布方法
JP4901200B2 (ja) * 2005-11-30 2012-03-21 東京応化工業株式会社 溶剤回収システム
JP5045218B2 (ja) * 2006-10-25 2012-10-10 東京エレクトロン株式会社 液処理装置、液処理方法及び記憶媒体
JP4900117B2 (ja) * 2007-07-30 2012-03-21 東京エレクトロン株式会社 現像装置、現像方法及び記憶媒体
JP2010186974A (ja) * 2009-02-13 2010-08-26 Tokyo Electron Ltd 液処理装置、液処理方法及び記憶媒体

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