JP5285530B2 - 塗膜形成ムラ検査装置 - Google Patents
塗膜形成ムラ検査装置 Download PDFInfo
- Publication number
- JP5285530B2 JP5285530B2 JP2009177678A JP2009177678A JP5285530B2 JP 5285530 B2 JP5285530 B2 JP 5285530B2 JP 2009177678 A JP2009177678 A JP 2009177678A JP 2009177678 A JP2009177678 A JP 2009177678A JP 5285530 B2 JP5285530 B2 JP 5285530B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- substrate
- film formation
- coating
- coating film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000015572 biosynthetic process Effects 0.000 title claims description 46
- 238000007689 inspection Methods 0.000 title claims description 40
- 239000011248 coating agent Substances 0.000 claims description 58
- 238000000576 coating method Methods 0.000 claims description 58
- 238000006243 chemical reaction Methods 0.000 claims description 39
- 238000003384 imaging method Methods 0.000 claims description 34
- 230000008859 change Effects 0.000 claims description 21
- 238000001514 detection method Methods 0.000 claims description 12
- 239000010453 quartz Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 239000010408 film Substances 0.000 description 68
- 239000000758 substrate Substances 0.000 description 62
- 238000010586 diagram Methods 0.000 description 15
- 238000000034 method Methods 0.000 description 13
- 239000004065 semiconductor Substances 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 9
- 230000007547 defect Effects 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000005286 illumination Methods 0.000 description 4
- 230000010354 integration Effects 0.000 description 4
- 239000013307 optical fiber Substances 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000000284 extract Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
Images
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Description
100 塗膜形成ムラ検査装置
2 光照射手段
21 光源
3 光学系
4 光電変換手段
5 回転テーブル
6 画像処理装置
61 変換処理部
10 制御部
L 撮像領域
L11 同心円加算値
W 基板
Claims (3)
- 表面に膜を塗布した被塗布物を保持し回転する回転手段と、
前記被塗布物に光を照射する光照射手段と、
前記光照射手段による被塗布物表面からの正反射光を受光し、被塗布物の表面を撮像し、撮像画像の信号出力する光電変換手段と、
前記光電変換手段で撮像した正反射光をその光量に応じた電気信号に変換する変換手段と、
前記変換手段により変換された電気信号を被塗布物の回転中心を含んで回転中心から半径方向の一走査分の電気信号の同一の距離の一周分の検出値を加算して複数の同心円加算値を求め、複数の同心円加算値から変化点を判断する画像処理部と、
を具備することを特徴とする塗膜形成ムラ検査装置。 - 請求項1記載の塗膜形成ムラ検査装置において、前記画像処理部は、前記同心円加算値の一定間隔ごとの差分の微分値から変化点を求めることを特徴とする塗膜形成ムラ検査装置。
- 請求項1記載の塗膜形成ムラ検査装置において、前記光照射手段は、石英ロッドによる導光管による光源と、前記光源が挿入されたスリット状の開口を有する円筒支持部と、を具備することを特徴とする塗膜形成ムラ検査装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009177678A JP5285530B2 (ja) | 2009-07-30 | 2009-07-30 | 塗膜形成ムラ検査装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009177678A JP5285530B2 (ja) | 2009-07-30 | 2009-07-30 | 塗膜形成ムラ検査装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011033388A JP2011033388A (ja) | 2011-02-17 |
JP5285530B2 true JP5285530B2 (ja) | 2013-09-11 |
Family
ID=43762616
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009177678A Active JP5285530B2 (ja) | 2009-07-30 | 2009-07-30 | 塗膜形成ムラ検査装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5285530B2 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5847419B2 (ja) * | 2011-03-31 | 2016-01-20 | 京セラクリスタルデバイス株式会社 | ウエハの接合方法 |
JP5875405B2 (ja) * | 2012-02-22 | 2016-03-02 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61201107A (ja) * | 1985-03-05 | 1986-09-05 | Toshiba Corp | 透明な膜の表面検査方法 |
JPH05338121A (ja) * | 1992-06-10 | 1993-12-21 | Dainippon Printing Co Ltd | 印刷物検査装置 |
JPH0712747A (ja) * | 1993-06-25 | 1995-01-17 | Toshiba Corp | 薄膜付きディスク表面検査方法及びその装置 |
JPH10123014A (ja) * | 1996-10-17 | 1998-05-15 | Toshiba Corp | 欠陥検査装置 |
JP3435326B2 (ja) * | 1997-10-29 | 2003-08-11 | ペンタックス株式会社 | 光学部材検査装置 |
JP2003166941A (ja) * | 2001-11-29 | 2003-06-13 | Asahi Glass Co Ltd | 膜厚むら検査装置、膜厚むら検査方法および膜厚むら検査プログラム |
JP4520880B2 (ja) * | 2005-02-17 | 2010-08-11 | 富士フイルム株式会社 | しみ検査方法及びしみ検査装置 |
JP4322890B2 (ja) * | 2005-06-13 | 2009-09-02 | シャープ株式会社 | 起伏検査装置、起伏検査方法、起伏検査装置の制御プログラム、記録媒体 |
JP4961777B2 (ja) * | 2006-03-09 | 2012-06-27 | 凸版印刷株式会社 | 塗布ムラ検査方法 |
JP2008003018A (ja) * | 2006-06-26 | 2008-01-10 | Dainippon Screen Mfg Co Ltd | ムラ検査装置およびムラ検査方法 |
-
2009
- 2009-07-30 JP JP2009177678A patent/JP5285530B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2011033388A (ja) | 2011-02-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5769572B2 (ja) | 基板検査装置および基板検査方法 | |
US5135303A (en) | Method of and apparatus for inspecting surface defects | |
US8411264B2 (en) | Method and apparatus for inspecting defects | |
KR100472129B1 (ko) | 결함 검사 장치 및 결함 검사 방법 | |
JP2006005360A (ja) | ウエハ検査方法及びシステム | |
KR101237583B1 (ko) | 촬영 화상에 기초한 검사 방법 및 검사 장치 | |
CN102473600A (zh) | 曝光条件设定方法及表面检查装置 | |
JP2011122935A (ja) | 検査方法および検査装置 | |
JP2003202677A (ja) | ドラム型画像処理システム上に取付けられた印刷版のエッジ検出をするための方法および装置 | |
KR20170062516A (ko) | 에지 프로파일을 따르는 궤적을 이용한 웨이퍼 에지 검사 | |
JP5285530B2 (ja) | 塗膜形成ムラ検査装置 | |
JP2014020961A (ja) | 異物検出方法および異物検査装置 | |
JP2008020371A (ja) | 検査装置 | |
TW200527405A (en) | Appearance inspector | |
JP2009222516A (ja) | 端部検査装置、及び、端部検査方法 | |
JP5868203B2 (ja) | 検査装置 | |
JP2006017685A (ja) | 表面欠陥検査装置 | |
JP5476069B2 (ja) | 塗膜形成ムラ検査装置 | |
JP2007005690A (ja) | 半導体装置用検査装置およびこれを用いた半導体装置の検査方法 | |
JP4866029B2 (ja) | ウェーハ外周検査装置 | |
JP2006003168A (ja) | 表面形状の測定方法およびその装置 | |
JP3326276B2 (ja) | 光学ディスクの保護コート膜検査方法及びそれを使用した検査装置 | |
JP3406951B2 (ja) | 表面状態検査装置 | |
JPH09218162A (ja) | 表面欠陥検査装置 | |
KR102650388B1 (ko) | 검사 장치 및 그를 이용한 반도체 소자의 제조 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20120322 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20120322 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130228 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130305 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130328 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130328 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130521 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130531 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5285530 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |