JP5270800B2 - 炭化ケイ素上のグラフェン・バッファ層の活性化のための方法およびデバイス - Google Patents
炭化ケイ素上のグラフェン・バッファ層の活性化のための方法およびデバイス Download PDFInfo
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- JP5270800B2 JP5270800B2 JP2012527301A JP2012527301A JP5270800B2 JP 5270800 B2 JP5270800 B2 JP 5270800B2 JP 2012527301 A JP2012527301 A JP 2012527301A JP 2012527301 A JP2012527301 A JP 2012527301A JP 5270800 B2 JP5270800 B2 JP 5270800B2
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims description 121
- 229910021389 graphene Inorganic materials 0.000 title claims description 99
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims description 51
- 229910010271 silicon carbide Inorganic materials 0.000 title claims description 45
- 238000000034 method Methods 0.000 title claims description 42
- 230000004913 activation Effects 0.000 title description 2
- 230000003647 oxidation Effects 0.000 claims description 28
- 238000007254 oxidation reaction Methods 0.000 claims description 28
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 19
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 17
- 230000008569 process Effects 0.000 claims description 13
- 230000003213 activating effect Effects 0.000 claims description 6
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 3
- 229910001882 dioxygen Inorganic materials 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 97
- 239000000758 substrate Substances 0.000 description 20
- 239000002356 single layer Substances 0.000 description 18
- 229910052799 carbon Inorganic materials 0.000 description 12
- 229910004298 SiO 2 Inorganic materials 0.000 description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 229910003472 fullerene Inorganic materials 0.000 description 4
- 230000003993 interaction Effects 0.000 description 4
- 238000001340 low-energy electron microscopy Methods 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 238000000859 sublimation Methods 0.000 description 4
- 230000008022 sublimation Effects 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
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- 239000010439 graphite Substances 0.000 description 2
- 238000005087 graphitization Methods 0.000 description 2
- 238000009396 hybridization Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002071 nanotube Substances 0.000 description 2
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- 239000010936 titanium Substances 0.000 description 2
- 230000005355 Hall effect Effects 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000011066 ex-situ storage Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
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- 239000002344 surface layer Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/1606—Graphene
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/1608—Silicon carbide
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- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Description
本発明の実施形態の有効性を実証するため、低エネルギ電子顕微鏡検査(LEEM)を備えた超高真空システムにおいて、SiC(0001)(Si面)上にエピタキシャル・バッファ層を成長させた。Si蒸着によってグラフェン・バッファ層を形成した。有効性の実証のためにバッファ層のみの構造を成長させた。これによって、この方法の有効性の最も明確かつ印象的な実例が与えられるからである。しかしながら、上述のように、この方法は多層グラフェン上層と組み合わせて用いることも可能である。LEEM分析を用いて、バッファ層のみで構成される基板上の領域の位置を特定した。次いで、このバッファ層のみの領域上にデバイスを形成可能とするように、フォーカス・イオン・ビームを用いてサンプル上に位置合わせマークをエッチングした。
Claims (15)
- 炭化ケイ素層上に形成された1つ以上のグラフェン層を有する構造を電気的に活性化させる方法であって、
前記炭化ケイ素層と前記1つ以上のグラフェン層の最下層との間に配置された酸化シリコン層を形成するように、前記構造に酸化プロセスを行うことによって、前記最下層グラフェン層を電気的に活性化するステップを含む、方法。 - 10−3トール(0.1Pa)以下のベース圧力に最初に排気したチャンバにおいて前記酸化プロセスを実行することを更に含む、請求項1に記載の方法。
- 1トール(130Pa)と760トール(100kPa)との間の圧力で前記チャンバ内に酸素ガスを導入することによって前記酸化プロセスを実行することを更に含む、請求項2に記載の方法。
- 前記構造を450℃未満の温度に加熱することによって前記酸化プロセスを実行することを更に含む、請求項1〜3のいずれか1項に記載の方法。
- 前記チャンバが10−6トール(0.1mPa)未満のベース圧力に最初に排気される、請求項1〜4のいずれか1項に記載の方法。
- 大気圧酸化炉において前記酸化プロセスを実行することを更に含む、請求項1に記載の方法。
- 前記構造が200℃と400℃との間の温度に加熱される、請求項1〜6のいずれか1項に記載の方法。
- 前記構造が250℃以下の温度に加熱される、請求項1〜7のいずれか1項に記載の方法。
- 前記構造が5秒間から1時間の時間にわたって加熱される、請求項1〜8のいずれか1項に記載の方法。
- グラフェン・ベースの電子デバイスを形成する方法であって、
炭化ケイ素層上に1つ以上のグラフェン層を形成するステップであって、前記炭化ケイ素層に結合された前記1つ以上のグラフェン層の最下層が最初に非導電性のバッファ層を含む、ステップと、
前記炭化ケイ素層と前記1つ以上のグラフェン層の前記最下層との間に配置された酸化シリコン層を形成するように酸化プロセスを行うことによって、前記最下層グラフェン層を電気的に活性化するステップと、
を含む、方法。 - 10−3トール以下のベース圧力に最初に排気したチャンバにおいて前記酸化プロセスを実行することを更に含む、請求項10に記載の方法。
- 1トールと760トールとの間の圧力で前記チャンバ内に酸素ガスを導入することによって前記酸化プロセスを実行することを更に含む、請求項11に記載の方法。
- 450℃未満の温度に加熱することによって前記酸化プロセスを実行することを更に含む、請求項10、11、または12に記載の方法。
- 前記チャンバが10−6トール未満のベース圧力に最初に排気される、請求項11から13のいずれか1項に記載の方法。
- 前記酸化シリコン層が二酸化シリコンを含む、請求項10から14のいずれか1項に記載の方法。
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Application Number | Priority Date | Filing Date | Title |
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US12/566,870 | 2009-09-25 | ||
US12/566,870 US8242030B2 (en) | 2009-09-25 | 2009-09-25 | Activation of graphene buffer layers on silicon carbide by ultra low temperature oxidation |
PCT/EP2010/062723 WO2011036037A1 (en) | 2009-09-25 | 2010-08-31 | Activation of graphene buffer layers on silicon carbide |
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JP2013504192A JP2013504192A (ja) | 2013-02-04 |
JP5270800B2 true JP5270800B2 (ja) | 2013-08-21 |
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JP2012527301A Expired - Fee Related JP5270800B2 (ja) | 2009-09-25 | 2010-08-31 | 炭化ケイ素上のグラフェン・バッファ層の活性化のための方法およびデバイス |
Country Status (7)
Country | Link |
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US (1) | US8242030B2 (ja) |
JP (1) | JP5270800B2 (ja) |
CN (1) | CN102576724B (ja) |
DE (1) | DE112010003772B4 (ja) |
GB (1) | GB2486116B (ja) |
TW (1) | TWI503866B (ja) |
WO (1) | WO2011036037A1 (ja) |
Families Citing this family (15)
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JP5656212B2 (ja) * | 2010-01-15 | 2015-01-21 | 国立大学法人九州工業大学 | グラフェン膜を有する基板の製造方法 |
WO2012044284A1 (en) * | 2010-09-28 | 2012-04-05 | Empire Technology Development Llc | Directionally recrystallized graphene growth substrates |
FR2980786B1 (fr) * | 2011-09-30 | 2013-10-25 | Centre Nat Rech Scient | Procede de formation d'une couche de graphene a la surface d'un substrat comprenant une couche de silicium |
US10079389B2 (en) | 2012-05-18 | 2018-09-18 | Xg Sciences, Inc. | Silicon-graphene nanocomposites for electrochemical applications |
US10957816B2 (en) | 2013-02-05 | 2021-03-23 | International Business Machines Corporation | Thin film wafer transfer and structure for electronic devices |
US8916451B2 (en) | 2013-02-05 | 2014-12-23 | International Business Machines Corporation | Thin film wafer transfer and structure for electronic devices |
MX363125B (es) | 2013-03-15 | 2019-03-11 | Univ West Virginia | Proceso para la produccion de carbono puro, composiciones, y sus metodos. |
US9059013B2 (en) | 2013-03-21 | 2015-06-16 | International Business Machines Corporation | Self-formation of high-density arrays of nanostructures |
KR101487729B1 (ko) * | 2013-07-03 | 2015-01-29 | 코닝정밀소재 주식회사 | 광전소자용 기판 및 이를 포함하는 광전소자 |
EP3069398B1 (en) * | 2013-11-13 | 2019-03-13 | XG Sciences Inc. | Silicon-graphene nanocomposites for electrochemical applications |
US10403509B2 (en) * | 2014-04-04 | 2019-09-03 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Basal plane dislocation elimination in 4H—SiC by pulsed rapid thermal annealing |
WO2016064713A2 (en) | 2014-10-21 | 2016-04-28 | West Virginia University Research Corporation | Methods and apparatuses for production of carbon, carbide electrodes, and carbon compositions |
MX2018012885A (es) | 2016-04-20 | 2019-07-04 | Univ West Virginia | Metodos, aparatos y electrodos para la conversion de carburo a carbono con compuestos quimicos de carburo nanoestructurados. |
US9978590B1 (en) * | 2017-05-24 | 2018-05-22 | National Chung Shan Institute Of Science And Technology | Method of manufacturing epitaxiable heat-dissipating substrate |
CN108854898B (zh) * | 2018-07-10 | 2020-07-17 | 杭州高烯科技有限公司 | 一种光催化反应器和催化还原二氧化碳的方法 |
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US5612260A (en) * | 1992-06-05 | 1997-03-18 | Cree Research, Inc. | Method of obtaining high quality silicon dioxide passivation on silicon carbide and resulting passivated structures |
US5759908A (en) * | 1995-05-16 | 1998-06-02 | University Of Cincinnati | Method for forming SiC-SOI structures |
SE9600524D0 (sv) * | 1996-02-14 | 1996-02-14 | Abb Research Ltd | A method and a device for oxidation of a semiconductor layer of SiC |
JP4647211B2 (ja) * | 2001-11-30 | 2011-03-09 | パナソニック株式会社 | 半導体装置及びその製造方法 |
CN100490077C (zh) * | 2004-02-06 | 2009-05-20 | 松下电器产业株式会社 | 碳化硅半导体元件及其制造方法 |
JP4961805B2 (ja) * | 2006-04-03 | 2012-06-27 | 株式会社デンソー | 炭化珪素半導体装置の製造方法 |
US7732859B2 (en) * | 2007-07-16 | 2010-06-08 | International Business Machines Corporation | Graphene-based transistor |
US8440467B2 (en) * | 2007-09-28 | 2013-05-14 | William Marsh Rice University | Electronic switching, memory, and sensor devices from a discontinuous graphene and/or graphite carbon layer on dielectric materials |
WO2009043023A2 (en) * | 2007-09-28 | 2009-04-02 | William Marsh Rice University | Electronic switching, memory, and sensor devices from carbon sheets on dielectric materials |
JP5245385B2 (ja) * | 2007-12-13 | 2013-07-24 | 富士通株式会社 | グラフェンシートの製造方法、半導体装置の製造方法および半導体装置 |
US7772059B2 (en) * | 2008-01-16 | 2010-08-10 | Texas Instruments Incorporated | Method for fabricating graphene transistors on a silicon or SOI substrate |
GB0802912D0 (en) * | 2008-02-15 | 2008-03-26 | Carben Semicon Ltd | Thin-film transistor, carbon-based layer and method of production thereof |
US8173095B2 (en) * | 2008-03-18 | 2012-05-08 | Georgia Tech Research Corporation | Method and apparatus for producing graphene oxide layers on an insulating substrate |
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- 2010-08-31 DE DE112010003772.8T patent/DE112010003772B4/de active Active
- 2010-08-31 WO PCT/EP2010/062723 patent/WO2011036037A1/en active Application Filing
- 2010-08-31 GB GB1204308.9A patent/GB2486116B/en not_active Expired - Fee Related
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Publication number | Publication date |
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DE112010003772B4 (de) | 2015-05-28 |
CN102576724A (zh) | 2012-07-11 |
GB201204308D0 (en) | 2012-04-25 |
US8242030B2 (en) | 2012-08-14 |
CN102576724B (zh) | 2015-11-25 |
GB2486116B (en) | 2013-02-13 |
GB2486116A (en) | 2012-06-06 |
TW201120940A (en) | 2011-06-16 |
JP2013504192A (ja) | 2013-02-04 |
US20110073834A1 (en) | 2011-03-31 |
WO2011036037A1 (en) | 2011-03-31 |
DE112010003772T5 (de) | 2012-10-04 |
TWI503866B (zh) | 2015-10-11 |
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