JP5268061B2 - 基板検査装置 - Google Patents
基板検査装置 Download PDFInfo
- Publication number
- JP5268061B2 JP5268061B2 JP2008284702A JP2008284702A JP5268061B2 JP 5268061 B2 JP5268061 B2 JP 5268061B2 JP 2008284702 A JP2008284702 A JP 2008284702A JP 2008284702 A JP2008284702 A JP 2008284702A JP 5268061 B2 JP5268061 B2 JP 5268061B2
- Authority
- JP
- Japan
- Prior art keywords
- inspection
- substrate
- light
- inspection apparatus
- focus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007689 inspection Methods 0.000 title claims abstract description 273
- 239000000758 substrate Substances 0.000 claims abstract description 243
- 230000003287 optical effect Effects 0.000 claims abstract description 71
- 238000001514 detection method Methods 0.000 claims description 96
- 230000007547 defect Effects 0.000 claims description 58
- 239000011521 glass Substances 0.000 claims description 50
- 239000013307 optical fiber Substances 0.000 claims description 28
- 230000007246 mechanism Effects 0.000 claims description 17
- 238000012545 processing Methods 0.000 claims description 14
- 239000000126 substance Substances 0.000 claims description 11
- 230000002093 peripheral effect Effects 0.000 claims description 9
- 238000006073 displacement reaction Methods 0.000 claims description 6
- 239000010453 quartz Substances 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 238000005520 cutting process Methods 0.000 claims description 2
- 239000010408 film Substances 0.000 description 12
- 238000010586 diagram Methods 0.000 description 10
- 230000010287 polarization Effects 0.000 description 7
- 238000003384 imaging method Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000004575 stone Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 201000009310 astigmatism Diseases 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000006210 lotion Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008284702A JP5268061B2 (ja) | 2008-11-05 | 2008-11-05 | 基板検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008284702A JP5268061B2 (ja) | 2008-11-05 | 2008-11-05 | 基板検査装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010112803A JP2010112803A (ja) | 2010-05-20 |
| JP2010112803A5 JP2010112803A5 (enrdf_load_stackoverflow) | 2011-12-01 |
| JP5268061B2 true JP5268061B2 (ja) | 2013-08-21 |
Family
ID=42301469
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008284702A Expired - Fee Related JP5268061B2 (ja) | 2008-11-05 | 2008-11-05 | 基板検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5268061B2 (enrdf_load_stackoverflow) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014238534A (ja) | 2013-06-10 | 2014-12-18 | シャープ株式会社 | 光制御フィルムの検査装置および光制御フィルムの製造装置 |
| US10495446B2 (en) | 2015-06-29 | 2019-12-03 | Kla-Tencor Corporation | Methods and apparatus for measuring height on a semiconductor wafer |
| JP5961909B1 (ja) * | 2015-11-17 | 2016-08-03 | 列真株式会社 | 欠陥検査装置 |
| JP6517734B2 (ja) * | 2016-06-09 | 2019-05-22 | 列真株式会社 | 散乱光検出ヘッド |
| JP6783644B2 (ja) * | 2016-12-12 | 2020-11-11 | 株式会社日立製作所 | 異物検査装置 |
| JP2019082496A (ja) * | 2019-03-11 | 2019-05-30 | 列真株式会社 | 欠陥検査装置 |
| JP7247075B2 (ja) * | 2019-11-11 | 2023-03-28 | 株式会社東芝 | レーザ光集光装置、レーザ光受光装置、およびレーザ光集光方法 |
| JP7247077B2 (ja) * | 2019-11-21 | 2023-03-28 | 株式会社東芝 | 受信用レーザ光受信装置、レーザ超音波計測装置およびレーザ超音波計測方法 |
| JP7405685B2 (ja) * | 2020-05-07 | 2023-12-26 | レーザーテック株式会社 | 検査装置 |
| KR20230090740A (ko) | 2021-12-15 | 2023-06-22 | 삼성전자주식회사 | 광학 계측 설비, 그를 이용한 광학 계측 방법 및 그를 이용한 반도체 장치의 제조 방법 |
| WO2023135681A1 (ja) * | 2022-01-12 | 2023-07-20 | 株式会社日立ハイテク | 表面検査装置 |
| JP7692878B2 (ja) * | 2022-06-23 | 2025-06-16 | クアーズテック合同会社 | 光透過性板状体の欠陥検査方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61260211A (ja) * | 1985-05-15 | 1986-11-18 | Hitachi Ltd | 自動異物検出方法及びその装置 |
| JPH04194609A (ja) * | 1990-11-27 | 1992-07-14 | Kobe Steel Ltd | 透明円板の欠陥検査装置 |
| JPH05180778A (ja) * | 1991-04-11 | 1993-07-23 | Hitachi Electron Eng Co Ltd | ガラス基板異物検査装置 |
| JPH04120364U (ja) * | 1991-04-12 | 1992-10-28 | 三菱重工業株式会社 | 欠陥検出装置 |
| JPH10160683A (ja) * | 1996-11-29 | 1998-06-19 | Matsushita Electric Ind Co Ltd | 異物検査方法とその装置 |
| JP4543141B2 (ja) * | 1999-07-13 | 2010-09-15 | レーザーテック株式会社 | 欠陥検査装置 |
| JP2001284423A (ja) * | 2000-03-29 | 2001-10-12 | Mitsubishi Electric Corp | 半導体検査装置及び半導体装置の製造方法 |
| JP4175766B2 (ja) * | 2000-09-07 | 2008-11-05 | 株式会社日立ハイテクノロジーズ | 透明基板検査装置 |
| JP4547562B2 (ja) * | 2005-01-17 | 2010-09-22 | レーザーテック株式会社 | 検査装置 |
| TWI428686B (zh) * | 2006-12-05 | 2014-03-01 | Hoya Corp | 光罩之檢查裝置、光罩之檢查方法、液晶裝置製造用光罩之製造方法以及圖案轉印方法 |
| JP4822548B2 (ja) * | 2007-04-23 | 2011-11-24 | レーザーテック株式会社 | 欠陥検査装置 |
-
2008
- 2008-11-05 JP JP2008284702A patent/JP5268061B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010112803A (ja) | 2010-05-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5268061B2 (ja) | 基板検査装置 | |
| KR102362657B1 (ko) | 웨이퍼 검사 | |
| US9546962B2 (en) | Multi-spot scanning collection optics | |
| JP3258385B2 (ja) | 光学式基板検査装置 | |
| KR102077064B1 (ko) | 자동초점 제어장치, 반도체 검사장치 및 현미경 | |
| JP2010112803A5 (enrdf_load_stackoverflow) | ||
| JP4359689B2 (ja) | 検査装置及び検査方法、パターン基板の製造方法 | |
| JP4822548B2 (ja) | 欠陥検査装置 | |
| JP4325909B2 (ja) | 欠陥検査装置、欠陥検査方法、光学式走査装置、半導体デバイス製造方法 | |
| JP2003004654A (ja) | 光学式走査装置及び欠陥検出装置 | |
| JP3282790B2 (ja) | 位相シフトマスクの欠陥検査装置 | |
| JP5046054B2 (ja) | 欠陥検査装置、欠陥検査方法、光学式走査装置、半導体デバイス製造方法 | |
| JPH10293102A (ja) | 半導体等における欠陥の検出方法 | |
| JP4708292B2 (ja) | 基板検査装置及び基板検査方法 | |
| JP4654408B2 (ja) | 検査装置、検査方法及びパターン基板の製造方法 | |
| JP3328573B2 (ja) | 斜光軸光学系を用いた位置検出装置及び方法 | |
| JP2010266452A (ja) | 走査型近接場光学顕微鏡 | |
| JP5614759B2 (ja) | 検査装置 | |
| JPH09281401A (ja) | 物体検査装置 | |
| JP2001324314A (ja) | 測定装置 | |
| JPH10133117A (ja) | 焦点検出装置を備えた顕微鏡 | |
| JPH10122831A (ja) | 表面検査装置 | |
| JPH10239014A (ja) | 焦点検出装置及び検査装置 | |
| JP5961909B1 (ja) | 欠陥検査装置 | |
| JP2006313107A (ja) | 検査装置及び検査方法並びにそれを用いたパターン基板の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111019 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20111019 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20121226 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130108 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130205 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130402 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130430 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 5268061 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |