JP5264113B2 - 光硬化性樹脂組成物及び、成型体及び、成型体の製造方法 - Google Patents

光硬化性樹脂組成物及び、成型体及び、成型体の製造方法 Download PDF

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Publication number
JP5264113B2
JP5264113B2 JP2007184759A JP2007184759A JP5264113B2 JP 5264113 B2 JP5264113 B2 JP 5264113B2 JP 2007184759 A JP2007184759 A JP 2007184759A JP 2007184759 A JP2007184759 A JP 2007184759A JP 5264113 B2 JP5264113 B2 JP 5264113B2
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resin composition
photocurable resin
weight
range
molded body
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Japanese (ja)
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JP2009019174A (ja
JP2009019174A5 (enExample
Inventor
宏 横山
裕二 田中
一行 藤原
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Asahi Kasei Corp
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Asahi Kasei E Materials Corp
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  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Polymerisation Methods In General (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
JP2007184759A 2007-07-13 2007-07-13 光硬化性樹脂組成物及び、成型体及び、成型体の製造方法 Active JP5264113B2 (ja)

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JP2007184759A JP5264113B2 (ja) 2007-07-13 2007-07-13 光硬化性樹脂組成物及び、成型体及び、成型体の製造方法

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JP2007184759A JP5264113B2 (ja) 2007-07-13 2007-07-13 光硬化性樹脂組成物及び、成型体及び、成型体の製造方法

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JP2009019174A JP2009019174A (ja) 2009-01-29
JP2009019174A5 JP2009019174A5 (enExample) 2010-08-26
JP5264113B2 true JP5264113B2 (ja) 2013-08-14

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Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5483083B2 (ja) * 2010-02-03 2014-05-07 富士フイルム株式会社 微細パターン製造方法
US20130146138A1 (en) 2010-06-08 2013-06-13 Dic Corporation Shaped article having fine surface irregularities and method for producing the shaped article
RU2013106521A (ru) 2010-07-15 2014-08-20 Асахи Гласс Компани, Лимитед Способ получения метаматериала и метаматериал
DK2602088T3 (en) 2010-08-06 2018-05-07 Soken Kagaku Kk RESINFORM FOR NANO PREPARATION
CN104349892B (zh) * 2012-06-15 2017-06-09 三菱丽阳株式会社 层积体
JP6165493B2 (ja) * 2013-04-19 2017-07-19 株式会社Ｄｎｐファインケミカル 加飾用フィルムの製造方法、加飾成型品の製造方法、エネルギー線硬化型インクジェット組成物
KR101423618B1 (ko) * 2013-06-17 2014-07-28 주식회사 위즈켐 도광판 미세 패턴 형성용 광경화형 임프린팅 조성물 및 그 임프린팅 도광판과, 이를 포함하는 백라이트 유니트 및 디스플레이 장치
EP3289604B1 (en) * 2015-04-29 2022-07-13 3M Innovative Properties Company Swellable film forming compositions and methods of nanoimprint lithography employing same
JP6818761B2 (ja) * 2016-10-14 2021-01-20 デンカ株式会社 組成物

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008512281A (ja) * 2004-09-13 2008-04-24 ダウ・コーニング・コーポレイション シリコーン型を使用するリソグラフィ技法
JP2006150741A (ja) * 2004-11-29 2006-06-15 Asahi Glass Co Ltd 転写層にパターンを形成する方法
JP2007030212A (ja) * 2005-07-22 2007-02-08 Ricoh Co Ltd プラスチック成形用スタンパの製造方法
US20090137771A1 (en) * 2005-08-11 2009-05-28 Satoshi Moriyama Resin composition
JP4770354B2 (ja) * 2005-09-20 2011-09-14 日立化成工業株式会社 光硬化性樹脂組成物及びこれを用いたパターン形成方法
JP5117002B2 (ja) * 2006-07-10 2013-01-09 富士フイルム株式会社 光硬化性組成物およびそれを用いたパターン形成方法

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