JP5208387B2 - 塗布装置 - Google Patents
塗布装置 Download PDFInfo
- Publication number
- JP5208387B2 JP5208387B2 JP2006225658A JP2006225658A JP5208387B2 JP 5208387 B2 JP5208387 B2 JP 5208387B2 JP 2006225658 A JP2006225658 A JP 2006225658A JP 2006225658 A JP2006225658 A JP 2006225658A JP 5208387 B2 JP5208387 B2 JP 5208387B2
- Authority
- JP
- Japan
- Prior art keywords
- slit nozzle
- traveling body
- driving device
- gravity
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011248 coating agent Substances 0.000 title claims description 28
- 238000000576 coating method Methods 0.000 title claims description 28
- 239000000758 substrate Substances 0.000 claims description 19
- 230000005484 gravity Effects 0.000 claims description 14
- 239000011521 glass Substances 0.000 description 9
- 239000007788 liquid Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Coating Apparatus (AREA)
Description
Claims (2)
- 基板載置ステージの両側に沿って移動可能に走行体を設け、この走行体にスリットノズルが昇降可能に保持された塗布装置であって、前記基板載置ステージの側面にはレールが設けられ、このレールに前記走行体が係合し、この走行体には前記スリットノズルを昇降せしめる駆動装置が取り付けられ、この駆動装置は前記走行体の側面で前記レールよりも下方位置に固定されるモータと、このモータにて回転せしめられるスクリューシャフトと、このスクリューシャフトに係合するとともにスクリューシャフトの回転に応じて上下に螺進するナット部材とからなり、このナット部材が前記スリットノズルを取付ける支持体に結合することで、前記駆動装置の重心がスリットノズルの重心よりも低く設定されていることを特徴とする塗布装置。
- 請求項1に記載の塗布装置において、前記走行体は基板載置ステージの両側にそれぞれ独立して設けられ、各走行体毎に駆動装置が設けられていることを特徴とする塗布装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006225658A JP5208387B2 (ja) | 2006-08-22 | 2006-08-22 | 塗布装置 |
TW096119187A TW200815929A (en) | 2006-08-22 | 2007-05-29 | Coating apparatus |
CN2007101420306A CN101130184B (zh) | 2006-08-22 | 2007-08-20 | 涂敷装置 |
KR1020070083178A KR100900383B1 (ko) | 2006-08-22 | 2007-08-20 | 도포장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006225658A JP5208387B2 (ja) | 2006-08-22 | 2006-08-22 | 塗布装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008049231A JP2008049231A (ja) | 2008-03-06 |
JP5208387B2 true JP5208387B2 (ja) | 2013-06-12 |
Family
ID=39127681
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006225658A Active JP5208387B2 (ja) | 2006-08-22 | 2006-08-22 | 塗布装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5208387B2 (ja) |
KR (1) | KR100900383B1 (ja) |
CN (1) | CN101130184B (ja) |
TW (1) | TW200815929A (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101327144B1 (ko) * | 2011-10-04 | 2013-11-13 | 주식회사 케이씨텍 | 기판 코터 장치 |
KR102112352B1 (ko) * | 2013-10-04 | 2020-05-15 | 주식회사 케이씨텍 | 다수의 도포 영역이 정해진 피처리 기판의 표면에 약액을 도포하는 기판 코터 장치 |
CN106111011B (zh) * | 2016-06-24 | 2018-07-03 | 常州一步干燥设备有限公司 | 带有喷嘴高度位置调节装置的密封容器 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003243286A (ja) | 2002-02-14 | 2003-08-29 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP3965312B2 (ja) | 2002-03-20 | 2007-08-29 | アドバンスト・カラーテック株式会社 | 枚葉基板の製造装置 |
JP4316275B2 (ja) * | 2003-03-31 | 2009-08-19 | 大日本印刷株式会社 | 塗布装置 |
JP2005052822A (ja) * | 2003-07-18 | 2005-03-03 | Sumitomo Heavy Ind Ltd | テーブルコータ機用ステージ装置 |
KR100659486B1 (ko) * | 2003-07-18 | 2006-12-20 | 스미도모쥬기가이고교 가부시키가이샤 | 테이블 코터기용 스테이지 장치 |
-
2006
- 2006-08-22 JP JP2006225658A patent/JP5208387B2/ja active Active
-
2007
- 2007-05-29 TW TW096119187A patent/TW200815929A/zh unknown
- 2007-08-20 KR KR1020070083178A patent/KR100900383B1/ko active IP Right Grant
- 2007-08-20 CN CN2007101420306A patent/CN101130184B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN101130184A (zh) | 2008-02-27 |
KR100900383B1 (ko) | 2009-06-02 |
TWI355561B (ja) | 2012-01-01 |
TW200815929A (en) | 2008-04-01 |
JP2008049231A (ja) | 2008-03-06 |
KR20080018111A (ko) | 2008-02-27 |
CN101130184B (zh) | 2013-03-20 |
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