TW200815929A - Coating apparatus - Google Patents

Coating apparatus Download PDF

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Publication number
TW200815929A
TW200815929A TW096119187A TW96119187A TW200815929A TW 200815929 A TW200815929 A TW 200815929A TW 096119187 A TW096119187 A TW 096119187A TW 96119187 A TW96119187 A TW 96119187A TW 200815929 A TW200815929 A TW 200815929A
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TW
Taiwan
Prior art keywords
slit nozzle
coating
gravity
center
nozzle
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TW096119187A
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Chinese (zh)
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TWI355561B (en
Inventor
Yoshiaki Masu
Hidenori Miyamoto
Kenji Yoshizawa
Yasuhiro Sone
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Tokyo Ohka Kogyo Co Ltd
Tazmo Co Ltd
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Publication of TW200815929A publication Critical patent/TW200815929A/en
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Publication of TWI355561B publication Critical patent/TWI355561B/zh

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)

Abstract

The invention provides a coating apparatus having a structure in which pitching is suppressed when a slit nozzle travels on coating. When a traveling body 3 is made to travel by a linear motor while discharging a coating liquid on the surface of a glass substrate W from the slit nozzle 10 to apply the coating liquid on the glass substrate W placed on a stage 2, the center of gravity G1 of the driving apparatus 11 is positioned at a place lower than that of the center of gravity G2 of the slit nozzle 10 and then, the pitching movement (up and down movement) occurring in the traveling of the traveling body 3 in the horizontal direction along rails 4,4 is suppressed to carry out stable coating.

Description

200815929 九、發明說明 【發明所屬之技術領域】 本發明是關於在玻璃基板等基板表面塗佈塗液的塗佈 裝置。 【先前技術】 於玻璃基板形成覆膜時,塗佈覆膜形成用的塗液,對 其加以乾燥(烘烤)形成覆膜。此時採用的塗佈裝置已知 有專利文獻1〜6所揭示的塗佈裝置。 專利文獻1所揭示的塗佈裝置,是於基台兩側設置軌 道,將移動台安裝在該等軌道,透過昇降缸體將窄縫噴嘴 安裝在該移動體。 專利文獻2所揭示的塗佈裝置是對玻璃基板載置用載 物台,配置有從下方跨在載物台,上方爲開放的U字形框 架,於該〕字形框架的上端間安裝有窄縫噴嘴。該先前技 術並未揭示窄縫噴嘴昇降用機構。 專利文獻3所揭示的塗佈裝置是於玻璃基板載置用底 座兩側設置軌道,將成爲門型的支柱可移動地卡合於該等 軌道,將模具(窄縫噴嘴)安裝在該支柱上部中央所設置 的昇降部。 專利文獻4所揭示的塗佈裝置是和專利文獻3的構成 相同,但是透過固定構件將窄縫噴嘴安裝在成爲門型的支 撐構件,並未揭示窄縫噴嘴昇降用機構。 專利文獻5所揭示的塗佈裝置是於由滾珠螺桿形成移 -5- 200815929 動的載物台上方配設2個窄縫噴嘴,將2片玻璃基板隔著 間隔載置在上述載物台上面,使用上述2個窄縫噴嘴同時 分別對2片玻璃基板進行噴塗,藉此相較於以1個噴嘴進 行噴塗時能夠節省時間。 專利文獻6所揭示的塗佈裝置是於一對軌道間配置基 板載置平台,在一對軌道間架設門型移動機構,並於該門 型移動機構安裝有由Z軸(上下方向)馬達昇降驅動的窄 縫噴嘴。 [專利文獻1]日本特開2003 -23 643 5號公報 [專利文獻2 ]日本特開平1 1 - 1 6 2 8 1 5號公報 [專利文獻3]日本特開2002- 1 0277 1號公報 [專利文獻4]日本特開2004-298775號公報 [專利文獻5]日本特開平1 0-2 1 6599號公報 [專利文獻6]日本特開2002-1 40982號公報 【發明內容】 [發明欲解決之課題] 專利文獻1〜專利文獻6的先前技術文獻當中,具有 窄縫噴嘴昇降用機構的先前技術文獻的狀況都是昇降機構 構成用的馬達或缸體的重心比窄縫噴嘴的重心還位於上方 位置。因此,於窄縫噴嘴水平方向移動時,門型移動機構 等的重心位置會變高,產生縱向振動,導致噴塗不穩定而 有無法獲得均勻膜厚的問題。 200815929 [用以解決課題之手段] , 爲解決上述課題’本發明是一種沿著基板載置平台兩 側將移動體設置成可移動,使窄縫噴嘴可昇降地保持在該 移動體的塗佈裝置,構成於上述移動體安裝有可使上述窄 縫噴嘴形成昇降的驅動裝置,該驅動裝置的重心是設定成 比窄縫噴嘴的重心還低。 上述移動體也可以是門型,但成爲門型時重量會變 大’所以還是構成爲各軌道安裝有移動體,使窄縫噴嘴可 昇降地支撐在該等移動體間爲佳。於該狀況時,若是只在 一方的移動體設有驅動裝置,則昇降時窄縫噴嘴容易產生 歪斜,因此還是以在各移動體安裝有馬達或缸體單元形成 的驅動裝置爲佳。 [發明效果] 根據本發明,可使窄縫噴嘴和移動體一起移動時維持 較低的重心,所以能夠抑制縱向振動產生,因此能夠執行 穩定的噴塗。 【實施方式】 [發明之最佳實施形態] 以下,根據附圖對本發明實施形態進行說明。第丨圖 爲本發明相關的塗佈裝置側面圖,第2圖爲第1圖要部平 面圖,第3圖爲驅動裝置放大圖,第4圖爲第3圖箭頭符 號A方向視圖,第5圖爲第3圖箭頭符號B方向視圖。 200815929 塗佈裝置是於基台1上固定著基板W載置用的載物 台2,沿著該載物台2的兩側配置有移動體3、3可朝水平 方向(第1圖紙面垂直方向)移動。 於本實施例,移動體3是由線性馬達驅動行駛。即是 於載物台2的側面框架設有軌道4、4,將移動體3的導件 5卡合於該軌道4,再加上將線性馬達的定子6配置成平 行於上述軌道4,將與該定子6維持成指定間隔的線性馬 達動子7安裝在移動體3,又利用空氣墊使上述軌道4和 導件5之間形成有一定間隙。 於移動體3的上部設有上下方向的導軌8,將支撐體 9昇降移動自如地卡合在該導軌8,於左右的支撐體9、9 間安裝著窄縫噴嘴1 〇。 此外,於各移動體安裝有可使支撐體9昇降移動的驅 動裝置11。驅動裝置11,具備有:固定在移動體3側面 的馬達12;由該馬達12驅動旋轉的螺旋軸13;及卡合於 該螺旋軸13的同時根據螺旋軸13的旋轉形成上下栓入的 螺帽構件1 4。接著,上述螺帽構件1 4的一部份是安裝在 上述支撐體9,藉由螺帽構件14的上下栓入使支撐體9及 窄縫噴嘴10昇降移動。 另,支撐體9昇降移動的上限及下限,如第4圖所 示,是由安裝在螺帽構件14的操作片14a抵接於安裝在 左右一方導軌8的限位開關8 a、8 b來決定。 於此,驅動裝置1 1構成用的構件當中,重量最重的 是馬達12,因此該馬達12是設置在比上述窄縫噴嘴10還 -8- 200815929 低的位置。其結果,使驅動裝置1 1的重心G1位於比 噴嘴1〇(正確地說是窄縫噴嘴1〇和支撐體9)的重> 還低的位置。 以上構成中,在對載物台2上所載置的玻璃基 塗佈塗液時,由驅動裝置11使窄縫噴嘴10下降至窄 嘴1 0下端和玻璃基板W上面的間隔爲指定値的位置 著從窄縫噴嘴1 〇對基板W表面噴出塗液的同時由線 達使左右的移動體3、3同步移動,藉此在基板w表 成均勻厚度的塗膜。 此時,驅動裝置1 1的重心G1因是位於比窄縫 1 0的重心G2還低的位置’所以能夠抑制移動體3沿 道4、4朝水平方向移動時產生的縱向振動(上下動) 實施例中,雖是於載物台2的兩側分別配置有獨 移動體3、3,但移動體的形狀也可形成爲門型的1個 體。另,即使是於該狀況時線性馬達還是需要設置在 以避免門型移動體產生歪斜。 [產業上之可利用性] 本發明的塗佈裝置是可利用做爲組入在各種顯示 置的玻璃基板塗膜形成用的塗佈裝置。 【圖式簡單說明】 第1圖爲本發明相關的塗佈裝置側面圖。 第2圖爲第1圖要部平面圖。 窄縫 Ci、G2 板W 縫噴 ,接 性馬 面形 噴嘴 著軌 〇 立的 移動 兩側 器裝 -9 - 200815929 第3圖爲驅動裝置放大圖。 第4圖爲第3圖箭頭符號A方向視圖。 第5圖爲第3圖箭頭符號B方向視圖。 【主要元件符號說明】 1 :基台 2 :載物台 3 :移動體 4 :軌道 5 :導件 6 :線性馬達的定子 7 :線性馬達的動子 8 :上下方向的導軌 8 a、8 b :限位開關 9 :支撐體 1 〇 :窄縫噴嘴 1 1 :驅動裝置 1 2 :馬達 13 :螺旋軸 1 4 :螺帽構件 1 4 a :操作片 G 1 :驅動裝置的重心 G2 :窄縫噴嘴的重心 W :基板 -10-[Technical Field] The present invention relates to a coating apparatus for applying a coating liquid on a surface of a substrate such as a glass substrate. [Prior Art] When a film is formed on a glass substrate, a coating liquid for forming a coating film is applied, and dried (baked) to form a coating film. The coating device disclosed in Patent Documents 1 to 6 is known as a coating device to be used at this time. In the coating apparatus disclosed in Patent Document 1, a rail is provided on both sides of a base, and a moving table is attached to the rails, and a slit nozzle is attached to the moving body through the lift cylinder. The coating device disclosed in Patent Document 2 is a U-shaped frame that is placed on a glass substrate, and has a U-shaped frame that is open above the stage from below, and a slit is attached between the upper ends of the U-shaped frame. nozzle. This prior art does not disclose a mechanism for lifting a narrow slit nozzle. In the coating apparatus disclosed in Patent Document 3, rails are provided on both sides of the base for mounting the glass substrate, and the pillars of the gate type are movably engaged with the rails, and the mold (narrow nozzle) is attached to the upper portion of the pillars. The lifting section provided by the center. The coating apparatus disclosed in Patent Document 4 is the same as the configuration of Patent Document 3, but the narrow slit nozzle is attached to the support member which is a gate type through the fixing member, and the slit nozzle lifting mechanism is not disclosed. In the coating apparatus disclosed in Patent Document 5, two slit nozzles are disposed above a stage on which the ball screw is moved to move from -5 to 200815, and two glass substrates are placed on the stage at intervals. By using the above two narrow slit nozzles, two glass substrates are simultaneously sprayed, thereby saving time compared to spraying with one nozzle. In the coating apparatus disclosed in Patent Document 6, a substrate mounting platform is disposed between a pair of rails, a gate type moving mechanism is disposed between the pair of rails, and a Z-axis (up and down direction) motor is mounted on the gate type moving mechanism. Driven narrow slit nozzle. [Patent Document 1] Japanese Laid-Open Patent Publication No. JP-A No. JP-A No. JP-A No. Hei. [Patent Document 5] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. 2002-1 40. In the prior art documents of Patent Document 1 to Patent Document 6, the state of the prior art document having the mechanism for elevating the slit nozzle is that the center of gravity of the motor or cylinder for constituting the elevating mechanism is located further than the center of gravity of the slit nozzle. Upper position. Therefore, when the slit nozzle moves in the horizontal direction, the position of the center of gravity of the door type moving mechanism or the like becomes high, causing longitudinal vibration, resulting in unstable spraying and a problem that a uniform film thickness cannot be obtained. 200815929 [Means for Solving the Problem] In order to solve the above problems, the present invention provides a method in which a movable body is disposed to be movable along both sides of a substrate mounting platform, so that the slit nozzle can be lifted and held in the movable body. In the apparatus, the driving body is provided with a driving device that allows the slit nozzle to be raised and lowered, and the center of gravity of the driving device is set to be lower than the center of gravity of the slit nozzle. The above-mentioned moving body may be of a gate type, but the weight is increased when it is a door type. Therefore, it is preferable that a moving body is attached to each of the rails, and it is preferable that the slit nozzles are supported between the moving bodies so as to be movable up and down. In this case, if only one of the moving bodies is provided with a driving device, the slit nozzle is likely to be skewed during lifting, and therefore it is preferable to use a driving device in which a motor or a cylinder unit is attached to each moving body. [Effect of the Invention] According to the present invention, it is possible to maintain a low center of gravity when the slit nozzle and the moving body move together, so that generation of longitudinal vibration can be suppressed, so that stable spraying can be performed. [Embodiment] BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 2 is a side view of a coating apparatus according to the present invention, FIG. 2 is a plan view of a principal part of FIG. 1, FIG. 3 is an enlarged view of a driving device, and FIG. 4 is a view of an arrow direction A of FIG. The arrow direction B view for the 3rd figure. 200815929 The coating apparatus fixes the stage 2 on which the substrate W is placed on the base 1, and the movable bodies 3 and 3 are arranged in the horizontal direction along the both sides of the stage 2 (the first drawing surface is vertical) Direction) move. In the present embodiment, the moving body 3 is driven by a linear motor. That is, the rails 4, 4 are provided on the side frames of the stage 2, the guides 5 of the moving body 3 are engaged with the rails 4, and the stator 6 of the linear motor is arranged parallel to the rails 4, A linear motor mover 7 that maintains a predetermined interval with the stator 6 is attached to the movable body 3, and a gap is formed between the rail 4 and the guide 5 by an air cushion. A guide rail 8 in the vertical direction is provided on the upper portion of the movable body 3, and the support body 9 is movably and detachably engaged with the guide rail 8, and a slit nozzle 1 is attached between the left and right support members 9, 9. Further, a driving device 11 for moving the support body 9 up and down is attached to each of the moving bodies. The driving device 11 includes a motor 12 fixed to the side surface of the moving body 3, a screw shaft 13 that is rotated by the motor 12, and a screw that is engaged with the screw shaft 13 while being screwed up and down according to the rotation of the screw shaft 13. Cap member 14. Next, a part of the nut member 14 is attached to the support body 9, and the support member 9 and the slit nozzle 10 are moved up and down by the upper and lower bolting of the nut member 14. Further, as shown in Fig. 4, the upper and lower limits of the lifting and lowering movement of the support body 9 are caused by the operation pieces 14a attached to the nut member 14 abutting on the limit switches 8a, 8b attached to the left and right guide rails 8, Decide. Here, among the members constituting the driving device 1 1, the motor 12 is the heaviest, and therefore the motor 12 is disposed at a position lower than the slit nozzle 10 -8 - 200815929. As a result, the center of gravity G1 of the drive unit 1 is positioned lower than the weight of the nozzle 1 (correctly, the slit nozzle 1 and the support 9). In the above configuration, when the coating liquid is applied to the glass substrate placed on the stage 2, the slit device 10 is lowered by the driving device 11 to the lower end of the narrow nozzle 10 and the space above the glass substrate W is designated. At the same time, the coating liquid is ejected from the slit nozzle 1 to the surface of the substrate W, and the left and right moving bodies 3 and 3 are synchronously moved by the line, whereby a coating film having a uniform thickness is formed on the substrate w. At this time, since the center of gravity G1 of the drive unit 1 is located at a position lower than the center of gravity G2 of the slit 10, it is possible to suppress longitudinal vibration (up and down movement) which occurs when the movable body 3 moves in the horizontal direction along the paths 4 and 4. In the example, the individual movable bodies 3 and 3 are disposed on both sides of the stage 2, but the shape of the moving body may be formed as a single door type. In addition, even in this situation, the linear motor needs to be set to avoid skewing of the door type moving body. [Industrial Applicability] The coating device of the present invention can be used as a coating device for forming a glass substrate coating film incorporated in various displays. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a side view of a coating apparatus according to the present invention. Figure 2 is a plan view of the main part of Figure 1. Narrow slits Ci, G2 plate W seam spray, joint horse face nozzle Rails 〇 Vertical movement Both sides -9 - 200815929 Fig. 3 is an enlarged view of the drive unit. Fig. 4 is a view of the arrow A direction in Fig. 3; Fig. 5 is a view in the B direction of the arrow symbol in Fig. 3. [Description of main component symbols] 1 : Abutment 2 : Stage 3 : Moving body 4 : Track 5 : Guide 6 : Stator 7 of linear motor : Moment of linear motor 8 : Guide rails 8 a, 8 b in the up and down direction : Limit switch 9 : Support body 1 窄: Narrow slit nozzle 1 1 : Drive unit 1 2 : Motor 13 : Screw shaft 1 4 : Nut member 1 4 a : Operation piece G 1 : Center of gravity G2 of the drive unit: Narrow slit The center of gravity of the nozzle W: substrate -10-

Claims (1)

200815929 十、申請專利範圍 1 · -Μ塗佈裝置’是沿著基板載置平台兩側將移動體 設置成可移動’使窄縫噴嘴可昇降地保持在該移動體的塗 佈裝置’其特徵爲··於上述移動體安裝有可使上述窄縫噴 嘴形成昇降的驅動裝置,該驅動裝置的重心是設定成比窄 縫噴嘴的重心還低。· 2.如申請專利範圍第1項所記載的塗佈裝置,其中, 上述移動體是分別獨立設置在基板載置平台的兩側,於各 移動體設有驅動裝置。 -11 -200815929 X. Patent Application No. 1 - The "coating device" is a coating device that moves the movable body along the two sides of the substrate mounting platform to enable the slit nozzle to be lifted and held in the moving body. A driving device for causing the narrow slit nozzle to be raised and lowered is attached to the moving body, and the center of gravity of the driving device is set to be lower than the center of gravity of the slit nozzle. 2. The coating device according to claim 1, wherein the moving bodies are independently provided on both sides of the substrate mounting platform, and each of the moving bodies is provided with a driving device. -11 -
TW096119187A 2006-08-22 2007-05-29 Coating apparatus TW200815929A (en)

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JP2006225658A JP5208387B2 (en) 2006-08-22 2006-08-22 Coating device

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TWI355561B TWI355561B (en) 2012-01-01

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KR101327144B1 (en) * 2011-10-04 2013-11-13 주식회사 케이씨텍 Substrate coating apparatus
KR102112352B1 (en) * 2013-10-04 2020-05-15 주식회사 케이씨텍 Substrate coater
CN106111011B (en) * 2016-06-24 2018-07-03 常州一步干燥设备有限公司 Sealing container with nozzle height apparatus for adjusting position

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JP2003243286A (en) 2002-02-14 2003-08-29 Dainippon Screen Mfg Co Ltd Substrate processing apparatus
JP3965312B2 (en) 2002-03-20 2007-08-29 アドバンスト・カラーテック株式会社 Single substrate manufacturing equipment
JP4316275B2 (en) * 2003-03-31 2009-08-19 大日本印刷株式会社 Coating device
KR100659486B1 (en) * 2003-07-18 2006-12-20 스미도모쥬기가이고교 가부시키가이샤 Stage apparatus for table coater
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CN101130184A (en) 2008-02-27
JP5208387B2 (en) 2013-06-12
TWI355561B (en) 2012-01-01
CN101130184B (en) 2013-03-20
JP2008049231A (en) 2008-03-06
KR20080018111A (en) 2008-02-27
KR100900383B1 (en) 2009-06-02

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