CN101130184A - 涂敷装置 - Google Patents
涂敷装置 Download PDFInfo
- Publication number
- CN101130184A CN101130184A CNA2007101420306A CN200710142030A CN101130184A CN 101130184 A CN101130184 A CN 101130184A CN A2007101420306 A CNA2007101420306 A CN A2007101420306A CN 200710142030 A CN200710142030 A CN 200710142030A CN 101130184 A CN101130184 A CN 101130184A
- Authority
- CN
- China
- Prior art keywords
- moving body
- gap nozzle
- drive unit
- coating
- applying device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Coating Apparatus (AREA)
Abstract
Description
Claims (2)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006-225658 | 2006-08-22 | ||
JP2006225658A JP5208387B2 (ja) | 2006-08-22 | 2006-08-22 | 塗布装置 |
JP2006225658 | 2006-08-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101130184A true CN101130184A (zh) | 2008-02-27 |
CN101130184B CN101130184B (zh) | 2013-03-20 |
Family
ID=39127681
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007101420306A Active CN101130184B (zh) | 2006-08-22 | 2007-08-20 | 涂敷装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5208387B2 (zh) |
KR (1) | KR100900383B1 (zh) |
CN (1) | CN101130184B (zh) |
TW (1) | TW200815929A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106111011A (zh) * | 2016-06-24 | 2016-11-16 | 常州步干燥设备有限公司 | 带有喷嘴高度位置调节装置的密封容器 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101327144B1 (ko) * | 2011-10-04 | 2013-11-13 | 주식회사 케이씨텍 | 기판 코터 장치 |
KR102112352B1 (ko) * | 2013-10-04 | 2020-05-15 | 주식회사 케이씨텍 | 다수의 도포 영역이 정해진 피처리 기판의 표면에 약액을 도포하는 기판 코터 장치 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003243286A (ja) | 2002-02-14 | 2003-08-29 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP3965312B2 (ja) | 2002-03-20 | 2007-08-29 | アドバンスト・カラーテック株式会社 | 枚葉基板の製造装置 |
JP4316275B2 (ja) * | 2003-03-31 | 2009-08-19 | 大日本印刷株式会社 | 塗布装置 |
JP2005052822A (ja) * | 2003-07-18 | 2005-03-03 | Sumitomo Heavy Ind Ltd | テーブルコータ機用ステージ装置 |
KR100659486B1 (ko) * | 2003-07-18 | 2006-12-20 | 스미도모쥬기가이고교 가부시키가이샤 | 테이블 코터기용 스테이지 장치 |
-
2006
- 2006-08-22 JP JP2006225658A patent/JP5208387B2/ja active Active
-
2007
- 2007-05-29 TW TW096119187A patent/TW200815929A/zh unknown
- 2007-08-20 CN CN2007101420306A patent/CN101130184B/zh active Active
- 2007-08-20 KR KR1020070083178A patent/KR100900383B1/ko active IP Right Grant
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106111011A (zh) * | 2016-06-24 | 2016-11-16 | 常州步干燥设备有限公司 | 带有喷嘴高度位置调节装置的密封容器 |
CN106111011B (zh) * | 2016-06-24 | 2018-07-03 | 常州一步干燥设备有限公司 | 带有喷嘴高度位置调节装置的密封容器 |
Also Published As
Publication number | Publication date |
---|---|
TW200815929A (en) | 2008-04-01 |
TWI355561B (zh) | 2012-01-01 |
KR100900383B1 (ko) | 2009-06-02 |
CN101130184B (zh) | 2013-03-20 |
JP2008049231A (ja) | 2008-03-06 |
JP5208387B2 (ja) | 2013-06-12 |
KR20080018111A (ko) | 2008-02-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20230614 Address after: Kanagawa, Japan Patentee after: Process Equipment Business Division Preparation Co.,Ltd. Patentee after: TAZMO CO.,LTD. Address before: Kanagawa Patentee before: TOKYO OHKA KOGYO Co.,Ltd. Patentee before: TAZMO CO.,LTD. Effective date of registration: 20230614 Address after: Ibaraki Patentee after: Ameco Technology Co.,Ltd. Patentee after: TAZMO CO.,LTD. Address before: Kanagawa, Japan Patentee before: Process Equipment Business Division Preparation Co.,Ltd. Patentee before: TAZMO CO.,LTD. |
|
TR01 | Transfer of patent right |