JP5201630B2 - 水酸化テトラアルキルアンモニウム含有現像廃液の中和方法 - Google Patents

水酸化テトラアルキルアンモニウム含有現像廃液の中和方法 Download PDF

Info

Publication number
JP5201630B2
JP5201630B2 JP2008543090A JP2008543090A JP5201630B2 JP 5201630 B2 JP5201630 B2 JP 5201630B2 JP 2008543090 A JP2008543090 A JP 2008543090A JP 2008543090 A JP2008543090 A JP 2008543090A JP 5201630 B2 JP5201630 B2 JP 5201630B2
Authority
JP
Japan
Prior art keywords
carbon dioxide
gas
neutralization
tower
taah
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008543090A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2008056672A1 (ja
Inventor
喜文 山下
達也 中本
正晴 山内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuyama Corp
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Priority to JP2008543090A priority Critical patent/JP5201630B2/ja
Publication of JPWO2008056672A1 publication Critical patent/JPWO2008056672A1/ja
Application granted granted Critical
Publication of JP5201630B2 publication Critical patent/JP5201630B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/3092Recovery of material; Waste processing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D19/00Degasification of liquids
    • B01D19/0005Degasification of liquids with one or more auxiliary substances
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D19/00Degasification of liquids
    • B01D19/0073Degasification of liquids by a method not covered by groups B01D19/0005 - B01D19/0042
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D19/00Degasification of liquids
    • B01D19/02Foam dispersion or prevention
    • B01D19/04Foam dispersion or prevention by addition of chemical substances
    • B01D19/0404Foam dispersion or prevention by addition of chemical substances characterised by the nature of the chemical substance
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/20Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/66Treatment of water, waste water, or sewage by neutralisation; pH adjustment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Dispersion Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Gas Separation By Absorption (AREA)
JP2008543090A 2006-11-09 2007-11-06 水酸化テトラアルキルアンモニウム含有現像廃液の中和方法 Expired - Fee Related JP5201630B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008543090A JP5201630B2 (ja) 2006-11-09 2007-11-06 水酸化テトラアルキルアンモニウム含有現像廃液の中和方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2006304223 2006-11-09
JP2006304223 2006-11-09
PCT/JP2007/071568 WO2008056672A1 (fr) 2006-11-09 2007-11-06 Procédé de neutralisation d'une solution de révélateur épuisée contenant de l'hydroxyde de tétraalkylammonium
JP2008543090A JP5201630B2 (ja) 2006-11-09 2007-11-06 水酸化テトラアルキルアンモニウム含有現像廃液の中和方法

Publications (2)

Publication Number Publication Date
JPWO2008056672A1 JPWO2008056672A1 (ja) 2010-02-25
JP5201630B2 true JP5201630B2 (ja) 2013-06-05

Family

ID=39364487

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008543090A Expired - Fee Related JP5201630B2 (ja) 2006-11-09 2007-11-06 水酸化テトラアルキルアンモニウム含有現像廃液の中和方法

Country Status (5)

Country Link
JP (1) JP5201630B2 (fr)
KR (1) KR101193925B1 (fr)
CN (1) CN101558013A (fr)
TW (1) TWI396949B (fr)
WO (1) WO2008056672A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5166337B2 (ja) * 2009-03-30 2013-03-21 メタウォーター株式会社 メタン発酵処理方法及びメタン発酵処理装置
JP6063806B2 (ja) * 2012-08-16 2017-01-18 株式会社Ihi 中和装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5190065A (fr) * 1975-02-06 1976-08-06
JPS52142860A (en) * 1976-05-25 1977-11-29 Shimizu Construction Co Ltd Treating method for neutralizing alkalline drainage
JPH02160007A (ja) * 1988-12-13 1990-06-20 Nkk Corp 消泡方法および消泡装置
JPH0517889A (ja) * 1991-07-12 1993-01-26 Chlorine Eng Corp Ltd 水酸化テトラアルキルアンモニウムの再生方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5354434A (en) * 1991-07-12 1994-10-11 Chlorine Engineers Corp. Ltd. Method for regenerating tetraalkylammonium hydroxide

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5190065A (fr) * 1975-02-06 1976-08-06
JPS52142860A (en) * 1976-05-25 1977-11-29 Shimizu Construction Co Ltd Treating method for neutralizing alkalline drainage
JPH02160007A (ja) * 1988-12-13 1990-06-20 Nkk Corp 消泡方法および消泡装置
JPH0517889A (ja) * 1991-07-12 1993-01-26 Chlorine Eng Corp Ltd 水酸化テトラアルキルアンモニウムの再生方法

Also Published As

Publication number Publication date
TWI396949B (zh) 2013-05-21
TW200832085A (en) 2008-08-01
WO2008056672A1 (fr) 2008-05-15
JPWO2008056672A1 (ja) 2010-02-25
KR101193925B1 (ko) 2012-10-24
CN101558013A (zh) 2009-10-14
KR20090077932A (ko) 2009-07-16

Similar Documents

Publication Publication Date Title
JP5950790B2 (ja) 廃水処理方法およびシステム
TWI500445B (zh) A sulfur-containing gas-containing desulfurization method, and a desulfurization apparatus
US8057676B2 (en) Drainage water-treating method
US20090250396A1 (en) Drainage water-treating method and drainage water-treating apparatus
TWI416278B (zh) Neutralization method of developing waste liquid containing tetraalkylammonium hydroxide
JP2007243113A (ja) ガス溶解洗浄水の製造方法、製造装置及び洗浄装置
JP2011173086A (ja) 車両等大型製品のマイクロバブルによる脱脂システム
KR20200031649A (ko) 수처리막의 세정 장치 및 세정 방법
TW201222173A (en) Method for removal of photoresist
KR20150079580A (ko) 오존 가스 용해수의 제조 방법, 및 전자 재료의 세정 방법
JP5201630B2 (ja) 水酸化テトラアルキルアンモニウム含有現像廃液の中和方法
TWI509682B (zh) Substrate processing apparatus and processing method
JP6278796B2 (ja) 脱臭装置
JP6534245B2 (ja) 閉鎖循環型飼育用の飼育水循環システム
JP2865452B2 (ja) 原水中の溶存ガス除去装置
JP4369804B2 (ja) 有機性廃水の浮上分離処理方法
JP2005211825A (ja) 生物系廃液の処理装置
JP2010131536A (ja) 脱酸素脱炭酸装置
TW201115636A (en) Method and apparatus for treating substrates
JP3773640B2 (ja) 硫化水素の除去方法
JP6345466B2 (ja) 脱臭装置
JPH0663355A (ja) 脱臭装置
JP4030824B2 (ja) 排水処理装置および排水処理方法
JP2000271570A (ja) 純水製造方法
JP2004033880A (ja) 粉末活性炭循環型膜処理装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100809

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130116

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130206

R150 Certificate of patent or registration of utility model

Ref document number: 5201630

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20160222

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees