JP5201630B2 - 水酸化テトラアルキルアンモニウム含有現像廃液の中和方法 - Google Patents
水酸化テトラアルキルアンモニウム含有現像廃液の中和方法 Download PDFInfo
- Publication number
- JP5201630B2 JP5201630B2 JP2008543090A JP2008543090A JP5201630B2 JP 5201630 B2 JP5201630 B2 JP 5201630B2 JP 2008543090 A JP2008543090 A JP 2008543090A JP 2008543090 A JP2008543090 A JP 2008543090A JP 5201630 B2 JP5201630 B2 JP 5201630B2
- Authority
- JP
- Japan
- Prior art keywords
- carbon dioxide
- gas
- neutralization
- tower
- taah
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 61
- 230000003472 neutralizing effect Effects 0.000 title claims description 8
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 title claims description 3
- 239000002351 wastewater Substances 0.000 title description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 204
- 238000006386 neutralization reaction Methods 0.000 claims description 128
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 102
- 239000001569 carbon dioxide Substances 0.000 claims description 101
- 239000007788 liquid Substances 0.000 claims description 75
- 239000002699 waste material Substances 0.000 claims description 75
- 238000010438 heat treatment Methods 0.000 claims description 38
- 239000006260 foam Substances 0.000 claims description 31
- 239000000126 substance Substances 0.000 claims description 13
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 5
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 claims description 4
- 229920002120 photoresistant polymer Polymers 0.000 claims description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims 1
- 239000007789 gas Substances 0.000 description 100
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 46
- 239000000243 solution Substances 0.000 description 36
- 150000001412 amines Chemical class 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 11
- 238000005868 electrolysis reaction Methods 0.000 description 11
- 230000000694 effects Effects 0.000 description 9
- 238000000354 decomposition reaction Methods 0.000 description 8
- 239000011261 inert gas Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 238000005187 foaming Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 239000000945 filler Substances 0.000 description 6
- 239000005416 organic matter Substances 0.000 description 6
- 230000018109 developmental process Effects 0.000 description 5
- 239000002518 antifoaming agent Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000011069 regeneration method Methods 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 3
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- -1 polypropylene Polymers 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 230000001172 regenerating effect Effects 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005465 channeling Effects 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D19/00—Degasification of liquids
- B01D19/0005—Degasification of liquids with one or more auxiliary substances
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D19/00—Degasification of liquids
- B01D19/0073—Degasification of liquids by a method not covered by groups B01D19/0005 - B01D19/0042
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D19/00—Degasification of liquids
- B01D19/02—Foam dispersion or prevention
- B01D19/04—Foam dispersion or prevention by addition of chemical substances
- B01D19/0404—Foam dispersion or prevention by addition of chemical substances characterised by the nature of the chemical substance
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/66—Treatment of water, waste water, or sewage by neutralisation; pH adjustment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Water Supply & Treatment (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Dispersion Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Degasification And Air Bubble Elimination (AREA)
- Gas Separation By Absorption (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008543090A JP5201630B2 (ja) | 2006-11-09 | 2007-11-06 | 水酸化テトラアルキルアンモニウム含有現像廃液の中和方法 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006304223 | 2006-11-09 | ||
JP2006304223 | 2006-11-09 | ||
PCT/JP2007/071568 WO2008056672A1 (fr) | 2006-11-09 | 2007-11-06 | Procédé de neutralisation d'une solution de révélateur épuisée contenant de l'hydroxyde de tétraalkylammonium |
JP2008543090A JP5201630B2 (ja) | 2006-11-09 | 2007-11-06 | 水酸化テトラアルキルアンモニウム含有現像廃液の中和方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2008056672A1 JPWO2008056672A1 (ja) | 2010-02-25 |
JP5201630B2 true JP5201630B2 (ja) | 2013-06-05 |
Family
ID=39364487
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008543090A Expired - Fee Related JP5201630B2 (ja) | 2006-11-09 | 2007-11-06 | 水酸化テトラアルキルアンモニウム含有現像廃液の中和方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5201630B2 (fr) |
KR (1) | KR101193925B1 (fr) |
CN (1) | CN101558013A (fr) |
TW (1) | TWI396949B (fr) |
WO (1) | WO2008056672A1 (fr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5166337B2 (ja) * | 2009-03-30 | 2013-03-21 | メタウォーター株式会社 | メタン発酵処理方法及びメタン発酵処理装置 |
JP6063806B2 (ja) * | 2012-08-16 | 2017-01-18 | 株式会社Ihi | 中和装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5190065A (fr) * | 1975-02-06 | 1976-08-06 | ||
JPS52142860A (en) * | 1976-05-25 | 1977-11-29 | Shimizu Construction Co Ltd | Treating method for neutralizing alkalline drainage |
JPH02160007A (ja) * | 1988-12-13 | 1990-06-20 | Nkk Corp | 消泡方法および消泡装置 |
JPH0517889A (ja) * | 1991-07-12 | 1993-01-26 | Chlorine Eng Corp Ltd | 水酸化テトラアルキルアンモニウムの再生方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5354434A (en) * | 1991-07-12 | 1994-10-11 | Chlorine Engineers Corp. Ltd. | Method for regenerating tetraalkylammonium hydroxide |
-
2007
- 2007-11-06 WO PCT/JP2007/071568 patent/WO2008056672A1/fr active Application Filing
- 2007-11-06 KR KR1020097008688A patent/KR101193925B1/ko not_active IP Right Cessation
- 2007-11-06 JP JP2008543090A patent/JP5201630B2/ja not_active Expired - Fee Related
- 2007-11-06 CN CNA2007800401005A patent/CN101558013A/zh active Pending
- 2007-11-08 TW TW96142219A patent/TWI396949B/zh not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5190065A (fr) * | 1975-02-06 | 1976-08-06 | ||
JPS52142860A (en) * | 1976-05-25 | 1977-11-29 | Shimizu Construction Co Ltd | Treating method for neutralizing alkalline drainage |
JPH02160007A (ja) * | 1988-12-13 | 1990-06-20 | Nkk Corp | 消泡方法および消泡装置 |
JPH0517889A (ja) * | 1991-07-12 | 1993-01-26 | Chlorine Eng Corp Ltd | 水酸化テトラアルキルアンモニウムの再生方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI396949B (zh) | 2013-05-21 |
TW200832085A (en) | 2008-08-01 |
WO2008056672A1 (fr) | 2008-05-15 |
JPWO2008056672A1 (ja) | 2010-02-25 |
KR101193925B1 (ko) | 2012-10-24 |
CN101558013A (zh) | 2009-10-14 |
KR20090077932A (ko) | 2009-07-16 |
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