JP5194040B2 - 表示装置、及び検査装置 - Google Patents

表示装置、及び検査装置 Download PDF

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Publication number
JP5194040B2
JP5194040B2 JP2010048556A JP2010048556A JP5194040B2 JP 5194040 B2 JP5194040 B2 JP 5194040B2 JP 2010048556 A JP2010048556 A JP 2010048556A JP 2010048556 A JP2010048556 A JP 2010048556A JP 5194040 B2 JP5194040 B2 JP 5194040B2
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JP
Japan
Prior art keywords
display device
gas
unit
substrate
inspection
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Expired - Fee Related
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JP2010048556A
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English (en)
Japanese (ja)
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JP2010175551A5 (enExample
JP2010175551A (ja
Inventor
勝美 大山
昌幸 蜂谷
一浩 座間
恵一 長崎
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Priority to JP2010048556A priority Critical patent/JP5194040B2/ja
Publication of JP2010175551A publication Critical patent/JP2010175551A/ja
Publication of JP2010175551A5 publication Critical patent/JP2010175551A5/ja
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Publication of JP5194040B2 publication Critical patent/JP5194040B2/ja
Expired - Fee Related legal-status Critical Current
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  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2010048556A 2010-03-05 2010-03-05 表示装置、及び検査装置 Expired - Fee Related JP5194040B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010048556A JP5194040B2 (ja) 2010-03-05 2010-03-05 表示装置、及び検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010048556A JP5194040B2 (ja) 2010-03-05 2010-03-05 表示装置、及び検査装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2008003807A Division JP5241245B2 (ja) 2008-01-11 2008-01-11 検査装置及び検査方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013012767A Division JP5657039B2 (ja) 2013-01-28 2013-01-28 試料搭載装置

Publications (3)

Publication Number Publication Date
JP2010175551A JP2010175551A (ja) 2010-08-12
JP2010175551A5 JP2010175551A5 (enExample) 2012-05-10
JP5194040B2 true JP5194040B2 (ja) 2013-05-08

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JP2010048556A Expired - Fee Related JP5194040B2 (ja) 2010-03-05 2010-03-05 表示装置、及び検査装置

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JP (1) JP5194040B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021085680A1 (ko) * 2019-10-31 2021-05-06 (주)자비스 웨이퍼 검사용 엑스레이 장치 및 그에 의한 엑스레이 검사 방법

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5563648B2 (ja) * 2012-11-28 2014-07-30 キヤノン株式会社 測定装置、および物品の製造方法
JP6319193B2 (ja) * 2015-06-03 2018-05-09 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP7202828B2 (ja) * 2018-09-26 2023-01-12 東京エレクトロン株式会社 基板検査方法、基板検査装置および記録媒体
US12444629B2 (en) 2019-12-24 2025-10-14 Hitachi High-Tech Corporation Substrate inspection device
DE102020209638B3 (de) * 2020-07-30 2021-11-11 Carl Zeiss Smt Gmbh Verfahren und vorrichtung zum bestimmen einer ausrichtung einer fotomaske auf einem probentisch, der entlang zumindest einer achse verschiebbar und um zumindest eine achse drehbar ist
CN117268269A (zh) * 2023-09-28 2023-12-22 东莞市宇格自动化有限公司 瓶高检测装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04106914A (ja) * 1990-08-27 1992-04-08 Toshiba Corp ウエハ支持装置
JPH08125000A (ja) * 1994-10-24 1996-05-17 Nec Kyushu Ltd ウェーハチャック
JPH11111819A (ja) * 1997-09-30 1999-04-23 Asahi Kasei Micro Syst Co Ltd ウェハーの固定方法及び露光装置
JP4485374B2 (ja) * 2005-01-25 2010-06-23 東京エレクトロン株式会社 冷却処理装置
JP4908925B2 (ja) * 2006-02-08 2012-04-04 株式会社日立ハイテクノロジーズ ウェハ表面欠陥検査装置およびその方法
JP4668809B2 (ja) * 2006-02-24 2011-04-13 株式会社日立ハイテクノロジーズ 表面検査装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021085680A1 (ko) * 2019-10-31 2021-05-06 (주)자비스 웨이퍼 검사용 엑스레이 장치 및 그에 의한 엑스레이 검사 방법

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Publication number Publication date
JP2010175551A (ja) 2010-08-12

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