JP5137611B2 - 着色硬化性樹脂組成物、着色パターン形成方法、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示素子 - Google Patents

着色硬化性樹脂組成物、着色パターン形成方法、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示素子 Download PDF

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Publication number
JP5137611B2
JP5137611B2 JP2008036054A JP2008036054A JP5137611B2 JP 5137611 B2 JP5137611 B2 JP 5137611B2 JP 2008036054 A JP2008036054 A JP 2008036054A JP 2008036054 A JP2008036054 A JP 2008036054A JP 5137611 B2 JP5137611 B2 JP 5137611B2
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JP
Japan
Prior art keywords
group
color filter
resin composition
carbon atoms
curable resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2008036054A
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English (en)
Japanese (ja)
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JP2008268884A (ja
Inventor
豊 阿出川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2008036054A priority Critical patent/JP5137611B2/ja
Priority to CN2008100836605A priority patent/CN101533223B/zh
Priority to KR1020080024505A priority patent/KR101519428B1/ko
Publication of JP2008268884A publication Critical patent/JP2008268884A/ja
Application granted granted Critical
Publication of JP5137611B2 publication Critical patent/JP5137611B2/ja
Expired - Fee Related legal-status Critical Current
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
JP2008036054A 2007-03-28 2008-02-18 着色硬化性樹脂組成物、着色パターン形成方法、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示素子 Expired - Fee Related JP5137611B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2008036054A JP5137611B2 (ja) 2007-03-28 2008-02-18 着色硬化性樹脂組成物、着色パターン形成方法、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示素子
CN2008100836605A CN101533223B (zh) 2007-03-28 2008-03-14 着色固化性树脂组合物、着色图案及形成方法、滤色器及制造方法、液晶显示元件
KR1020080024505A KR101519428B1 (ko) 2007-03-28 2008-03-17 착색 경화성 수지 조성물, 착색 패턴 형성방법, 착색 패턴,컬러필터의 제조방법, 컬러필터, 및 액정표시소자

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007085383 2007-03-28
JP2007085383 2007-03-28
JP2008036054A JP5137611B2 (ja) 2007-03-28 2008-02-18 着色硬化性樹脂組成物、着色パターン形成方法、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示素子

Publications (2)

Publication Number Publication Date
JP2008268884A JP2008268884A (ja) 2008-11-06
JP5137611B2 true JP5137611B2 (ja) 2013-02-06

Family

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JP2008036054A Expired - Fee Related JP5137611B2 (ja) 2007-03-28 2008-02-18 着色硬化性樹脂組成物、着色パターン形成方法、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示素子

Country Status (3)

Country Link
JP (1) JP5137611B2 (ko)
KR (1) KR101519428B1 (ko)
CN (1) CN101533223B (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5317914B2 (ja) * 2009-09-29 2013-10-16 株式会社Ｄｎｐファインケミカル 着色樹脂組成物、カラーフィルター用感光性着色樹脂組成物、及びカラーフィルター
JP6047885B2 (ja) * 2011-03-08 2016-12-21 住友化学株式会社 着色感光性樹脂組成物
WO2014163035A1 (ja) * 2013-04-02 2014-10-09 旭硝子株式会社 被膜付きガラス基板およびその製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1010724A (ja) * 1996-06-27 1998-01-16 Hitachi Chem Co Ltd 着色画像形成用感光液、これを用いたカラーフィルタの製造法及びカラーフィルタ
JP3953625B2 (ja) * 1998-03-02 2007-08-08 太陽インキ製造株式会社 感光性組成物
JP3680128B2 (ja) * 2000-07-04 2005-08-10 富士フイルムエレクトロニクスマテリアルズ株式会社 感放射線硬化性組成物
JP2002109989A (ja) * 2000-09-27 2002-04-12 Oki Joho Systems:Kk 押釦スイッチ
DE60314794T2 (de) * 2002-03-20 2008-04-10 Fujifilm Corp. IR-photoempfindliche Zusammensetzung
JP2004109989A (ja) * 2002-08-27 2004-04-08 Fujifilm Arch Co Ltd 光硬化性組成物、それを用いたｌｃｄ用構成部品並びに固体撮像素子用構成部品及びそれらの製造方法
JP2004325968A (ja) * 2003-04-25 2004-11-18 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ及び液晶表示装置
JP4509638B2 (ja) * 2004-04-26 2010-07-21 東京応化工業株式会社 感光性樹脂組成物およびこれを用いた感光性ドライフィルム
JP4897270B2 (ja) * 2005-11-01 2012-03-14 富士フイルム株式会社 感光性樹脂組成物、カラーフィルタ及びその製造方法、並びに液晶表示装置

Also Published As

Publication number Publication date
CN101533223A (zh) 2009-09-16
CN101533223B (zh) 2012-08-29
JP2008268884A (ja) 2008-11-06
KR101519428B1 (ko) 2015-05-12
KR20080088405A (ko) 2008-10-02

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