JP5131181B2 - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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- JP5131181B2 JP5131181B2 JP2008328794A JP2008328794A JP5131181B2 JP 5131181 B2 JP5131181 B2 JP 5131181B2 JP 2008328794 A JP2008328794 A JP 2008328794A JP 2008328794 A JP2008328794 A JP 2008328794A JP 5131181 B2 JP5131181 B2 JP 5131181B2
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 163
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 238000009792 diffusion process Methods 0.000 claims abstract description 89
- 239000012535 impurity Substances 0.000 claims abstract description 37
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 230000003071 parasitic effect Effects 0.000 description 40
- 230000003287 optical effect Effects 0.000 description 21
- 238000000034 method Methods 0.000 description 15
- 238000000605 extraction Methods 0.000 description 12
- 230000001965 increasing effect Effects 0.000 description 8
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 6
- 229910052796 boron Inorganic materials 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000005468 ion implantation Methods 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000002955 isolation Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier
- H01L31/103—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier the potential barrier being of the PN homojunction type
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
- G11B7/13—Optical detectors therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1463—Pixel isolation structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/04—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only
- H03F3/08—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only controlled by light
- H03F3/087—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only controlled by light with IC amplifier blocks
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optics & Photonics (AREA)
- Light Receiving Elements (AREA)
Description
前記カソード形成領域にN型半導体層を形成する工程と、を有し、前記P型半導体基板の表面と平行な方向の距離であって、前記N型半導体層の側端から前記第1のP型拡散層の側端までの距離を、3.0〜4.0μmとし、前記第1のP型拡散層の側端から前記第2のP型拡散層の側端までの距離を1.0〜2.0μmとし、前記第1のP型半導体層のP型不純物濃度を1×1017atoms/cm3以上1×1019atoms/cm3以下とし、前記第2のP型半導体層のP型不純物濃度を1×1013atoms/cm3以上5×1014atoms/cm3以下とし、前記第1のP型拡散層のP型不純物濃度を1×1016atoms/cm3以上1×1018atoms/cm3以下とし、前記第2のP型拡散層のP型不純物濃度を5×1014atoms/cm3以上1×1016atoms/cm3以下とし、前記N型半導体層のN型不純物濃度を1×1018atoms/cm3以上1×1021atoms/cm3以下としたこと。
1.本実施形態に係る半導体装置の回路構成
2.本実施形態に係る半導体装置の構成及び特性
3.本実施形態に係る半導体装置の製造方法
4.本実施形態に係る半導体装置を組み込んだ光ディスク装置の構成
まず、本実施形態に係る半導体装置の回路構成について図面を参照して具体的に説明する。図1は本実施形態に係る半導体装置の回路構成を示す図である。
以下、本実施形態に係る半導体装置1の構成を具体的に説明する。図2は本実施形態に係る半導体装置1の構成を示す図である。ここでは、半導体装置1は、0.25μm世代以降のCMOSプロセスにバイポーラトランジスタを同時形成するBiCMOSプロセスで形成された例について説明する。
(1)高濃度P型半導体層11:1×1017〜1×1019atoms/cm3
(2)低濃度P型半導体層12:1×1013〜5×1014atoms/cm3
(3)高濃度P型拡散層19:1×1016〜1×1018atoms/cm3
(4)低濃度P型拡散層15:5×1014〜1×1016atoms/cm3
(5)N型半導体層22:1×1018〜1×1021atoms/cm 3
次に、本実施形態に係る半導体装置1の製造方法について説明する。図6〜図11は半導体装置1の製造工程順の断面図である。ここでは、0.25μm世代以降のCMOSプロセスにバイポーラトランジスタを同時形成するBiCMOSプロセスの例を挙げて説明する。
次に、上述した半導体装置1はPDIC55やフロントモニタフォトディテクタIC60として光ディスク装置50に組み込まれる。図12は半導体装置1を組み込んだ光ディスク装置50の構成を示す図である。
2 フォトダイオード
3 NPNトランジスタ
4 光電変換回路
5 加算回路
6,7 RF増幅器
10 P型半導体基板
11 高濃度P型半導体層
12 低濃度P型半導体層
13 素子分離酸化膜
14 レジスト膜
15 低濃度P型拡散層
17 コレクタ拡散層領域
19 高濃度P型拡散層
22 N型半導体層(カソード領域)
23 第1反射防止膜
24 第2反射防止膜
25 アノード取り出し領域
50 光ディスク装置
Claims (1)
- P型半導体基板上に、平坦な第1のP型半導体層と、P型不純物濃度が前記第1のP型半導体層よりも低い第2のP型半導体層とを順次形成する工程と、
前記第2のP型半導体層の一部の領域であって前記第2のP型半導体層上のカソード形成領域の側端から前記P型半導体基板の表面と平行な方向に側端が離隔した領域に、P型不純物を拡散して第2のP型半導体層に隣接する第2のP型拡散層を形成する工程と、
前記第2のP型拡散層の一部及び前記第2のP型半導体層の一部の領域であって前記カソード形成領域の側端から前記P型半導体基板の表面と平行な方向に側端が離隔した領域に、P型不純物を拡散して前記第2のP型拡散層よりも不純物濃度が高い第1のP型拡散層を形成する工程と、
前記カソード形成領域にN型半導体層を形成する工程と、を有し、
前記P型半導体基板の表面と平行な方向の距離であって、前記N型半導体層の側端から前記第1のP型拡散層の側端までの距離を、3.0〜4.0μmとし、
前記第1のP型拡散層の側端から前記第2のP型拡散層の側端までの距離を1.0〜2.0μmとし、
前記第1のP型半導体層のP型不純物濃度を1×1017atoms/cm3以上1×1019atoms/cm3以下とし、
前記第2のP型半導体層のP型不純物濃度を1×1013atoms/cm3以上5×1014atoms/cm3以下とし、
前記第1のP型拡散層のP型不純物濃度を1×1016atoms/cm3以上1×1018atoms/cm3以下とし、
前記第2のP型拡散層のP型不純物濃度を5×1014atoms/cm3以上1×1016atoms/cm3以下とし、
前記N型半導体層のN型不純物濃度を1×1018atoms/cm3以上1×1021atoms/cm3以下とした半導体装置の製造方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008328794A JP5131181B2 (ja) | 2008-12-24 | 2008-12-24 | 半導体装置の製造方法 |
US12/591,710 US8803272B2 (en) | 2008-12-24 | 2009-11-30 | Semiconductor device provided with photodiode, manufacturing method thereof, and optical disc device |
CN2009102663643A CN101764138B (zh) | 2008-12-24 | 2009-12-24 | 设有光电二极管的半导体装置及其制造方法和光盘装置 |
US14/324,383 US20140319643A1 (en) | 2008-12-24 | 2014-07-07 | Semiconductor device provided with photodiode, manufacturing method thereof, and optical disc device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008328794A JP5131181B2 (ja) | 2008-12-24 | 2008-12-24 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010153515A JP2010153515A (ja) | 2010-07-08 |
JP5131181B2 true JP5131181B2 (ja) | 2013-01-30 |
Family
ID=42264800
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008328794A Expired - Fee Related JP5131181B2 (ja) | 2008-12-24 | 2008-12-24 | 半導体装置の製造方法 |
Country Status (3)
Country | Link |
---|---|
US (2) | US8803272B2 (ja) |
JP (1) | JP5131181B2 (ja) |
CN (1) | CN101764138B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014239201A (ja) * | 2013-05-08 | 2014-12-18 | ソニー株式会社 | 半導体装置、アンテナスイッチ回路、および無線通信装置 |
JP2015125786A (ja) * | 2013-12-26 | 2015-07-06 | 船井電機株式会社 | 光ディスク装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04151871A (ja) * | 1990-10-15 | 1992-05-25 | Hamamatsu Photonics Kk | 半導体装置 |
JP3975515B2 (ja) * | 1997-08-18 | 2007-09-12 | ソニー株式会社 | 受光素子を有する半導体装置とその製造方法 |
JP2000312021A (ja) * | 1999-04-26 | 2000-11-07 | Sony Corp | 半導体装置とその製造方法 |
JP2006210494A (ja) | 2005-01-26 | 2006-08-10 | Matsushita Electric Ind Co Ltd | 光半導体装置 |
US7808022B1 (en) * | 2005-03-28 | 2010-10-05 | Cypress Semiconductor Corporation | Cross talk reduction |
JP2007317767A (ja) * | 2006-05-24 | 2007-12-06 | Matsushita Electric Ind Co Ltd | 光半導体装置およびその製造方法 |
JP2007317768A (ja) * | 2006-05-24 | 2007-12-06 | Matsushita Electric Ind Co Ltd | 光半導体装置およびその製造方法 |
JP2007317975A (ja) * | 2006-05-29 | 2007-12-06 | Nec Electronics Corp | 光半導体装置 |
JP2008066446A (ja) * | 2006-09-06 | 2008-03-21 | Sony Corp | 半導体積層構造および半導体素子 |
-
2008
- 2008-12-24 JP JP2008328794A patent/JP5131181B2/ja not_active Expired - Fee Related
-
2009
- 2009-11-30 US US12/591,710 patent/US8803272B2/en not_active Expired - Fee Related
- 2009-12-24 CN CN2009102663643A patent/CN101764138B/zh not_active Expired - Fee Related
-
2014
- 2014-07-07 US US14/324,383 patent/US20140319643A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
CN101764138B (zh) | 2013-02-13 |
CN101764138A (zh) | 2010-06-30 |
JP2010153515A (ja) | 2010-07-08 |
US20140319643A1 (en) | 2014-10-30 |
US8803272B2 (en) | 2014-08-12 |
US20100155875A1 (en) | 2010-06-24 |
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