JP5124424B2 - 光学式変位計 - Google Patents

光学式変位計 Download PDF

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Publication number
JP5124424B2
JP5124424B2 JP2008293851A JP2008293851A JP5124424B2 JP 5124424 B2 JP5124424 B2 JP 5124424B2 JP 2008293851 A JP2008293851 A JP 2008293851A JP 2008293851 A JP2008293851 A JP 2008293851A JP 5124424 B2 JP5124424 B2 JP 5124424B2
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JP
Japan
Prior art keywords
light
phase
relative phase
detection
maximum point
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JP2008293851A
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English (en)
Japanese (ja)
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JP2010121977A (ja
JP2010121977A5 (enExample
Inventor
雄二 秋柴
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Keyence Corp
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Keyence Corp
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Priority to JP2008293851A priority Critical patent/JP5124424B2/ja
Priority to US12/607,357 priority patent/US8102537B2/en
Publication of JP2010121977A publication Critical patent/JP2010121977A/ja
Publication of JP2010121977A5 publication Critical patent/JP2010121977A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/026—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring distance between sensor and object

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2008293851A 2008-11-17 2008-11-17 光学式変位計 Active JP5124424B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008293851A JP5124424B2 (ja) 2008-11-17 2008-11-17 光学式変位計
US12/607,357 US8102537B2 (en) 2008-11-17 2009-10-28 Optical displacement gage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008293851A JP5124424B2 (ja) 2008-11-17 2008-11-17 光学式変位計

Publications (3)

Publication Number Publication Date
JP2010121977A JP2010121977A (ja) 2010-06-03
JP2010121977A5 JP2010121977A5 (enExample) 2011-11-10
JP5124424B2 true JP5124424B2 (ja) 2013-01-23

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ID=42171788

Family Applications (1)

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JP2008293851A Active JP5124424B2 (ja) 2008-11-17 2008-11-17 光学式変位計

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US (1) US8102537B2 (enExample)
JP (1) JP5124424B2 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5382038B2 (ja) * 2011-03-23 2014-01-08 パルステック工業株式会社 透光性管状物体の厚さ測定装置
JP5961938B2 (ja) * 2011-07-15 2016-08-03 国立大学法人山梨大学 モノスペクトル・マーカならびにその検出方法および装置
JP5674701B2 (ja) * 2012-03-22 2015-02-25 株式会社東芝 情報処理端末装置
JP2014013150A (ja) * 2012-07-03 2014-01-23 Shimadzu Corp 光照射装置
EP4487773A3 (en) * 2014-01-31 2025-01-15 The General Hospital Corporation Method and apparatus for performing multidimensional velocity measurements based on amplitude and phase signals in the field of optical interferometry
DE102015200034A1 (de) 2014-03-31 2015-10-01 Micro-Epsilon Optronic Gmbh Spektrometer
WO2015199054A1 (ja) 2014-06-27 2015-12-30 株式会社キーエンス 多波長光電測定装置、共焦点測定装置、干渉測定装置及びカラー測定装置
JP6309366B2 (ja) * 2014-06-30 2018-04-11 株式会社ホロン 荷電粒子線装置における高さ測定装置およびオートフォーカス装置
JP6767753B2 (ja) * 2015-03-02 2020-10-14 株式会社ミツトヨ クロマティック共焦点センサ及び測定方法
JP6725988B2 (ja) 2016-01-26 2020-07-22 大塚電子株式会社 厚み測定装置および厚み測定方法
JP6692651B2 (ja) * 2016-02-05 2020-05-13 株式会社ミツトヨ クロマティック共焦点センサ
JP6859098B2 (ja) 2016-12-28 2021-04-14 株式会社キーエンス 光走査高さ測定装置
JP6829993B2 (ja) 2016-12-28 2021-02-17 株式会社キーエンス 光走査高さ測定装置
JP6829992B2 (ja) 2016-12-28 2021-02-17 株式会社キーエンス 光走査高さ測定装置
JP7143057B2 (ja) 2016-12-28 2022-09-28 株式会社キーエンス 三次元測定装置
JP7018098B2 (ja) * 2020-08-13 2022-02-09 株式会社ホロン オートフォーカス装置
CN112556579A (zh) * 2020-12-25 2021-03-26 深圳市中图仪器股份有限公司 一种六自由度空间坐标位置和姿态测量装置
JP7699728B1 (ja) * 2024-07-17 2025-06-27 三菱電機株式会社 制御装置、レーザ加工ヘッド、レーザ加工装置、レーザ加工システムおよびレーザ加工方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3148001B2 (ja) * 1992-06-05 2001-03-19 オリンパス光学工業株式会社 フリンジスキャニング干渉測定方式による波面の位相つなぎ方法
JP3382011B2 (ja) 1993-04-06 2003-03-04 株式会社東芝 膜厚測定装置、ポリシング装置および半導体製造装置
JPH09210628A (ja) * 1996-01-30 1997-08-12 Sefuto Kenkyusho:Kk 位置測定装置
US5610716A (en) * 1995-08-28 1997-03-11 Hewlett-Packard Company Method and apparatus for measuring film thickness utilizing the slope of the phase of the Fourier transform of an autocorrelator signal
JP2001093885A (ja) * 1999-09-22 2001-04-06 Olympus Optical Co Ltd エッチング監視装置
JP2003279324A (ja) * 2002-03-22 2003-10-02 Toppan Printing Co Ltd 膜厚測定方法および膜厚測定装置
US7426038B2 (en) * 2003-08-12 2008-09-16 Fujikura Ltd. Detection device, optical path length measurement device, measurement instrument, optical member evaluation method, and temperature change detection method
JP4398277B2 (ja) * 2004-01-15 2010-01-13 株式会社山武 ３次元計測装置、３次元計測方法及び３次元計測プログラム
US7158240B2 (en) * 2004-06-16 2007-01-02 The United States Of America As Represented By The Secretary Of The Army Measurement device and method
TWI278682B (en) * 2004-11-23 2007-04-11 Ind Tech Res Inst Fiber optic interferometric position sensor and measuring method thereof
US7187816B2 (en) * 2004-12-13 2007-03-06 Purdue Research Foundation In-fiber whitelight interferometry using long-period fiber grating
US7515275B2 (en) * 2006-07-18 2009-04-07 Institut National D'optique Optical apparatus and method for distance measuring

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Publication number Publication date
JP2010121977A (ja) 2010-06-03
US20100123898A1 (en) 2010-05-20
US8102537B2 (en) 2012-01-24

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