JP5123379B2 - ネガ型画像形成性要素およびその使用方法 - Google Patents
ネガ型画像形成性要素およびその使用方法 Download PDFInfo
- Publication number
- JP5123379B2 JP5123379B2 JP2010510352A JP2010510352A JP5123379B2 JP 5123379 B2 JP5123379 B2 JP 5123379B2 JP 2010510352 A JP2010510352 A JP 2010510352A JP 2010510352 A JP2010510352 A JP 2010510352A JP 5123379 B2 JP5123379 B2 JP 5123379B2
- Authority
- JP
- Japan
- Prior art keywords
- groups
- group
- imageable
- carbon atoms
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/02—Cover layers; Protective layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/04—Intermediate layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/10—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by inorganic compounds, e.g. pigments
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/266—Polyurethanes; Polyureas
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/756,036 | 2007-05-31 | ||
| US11/756,036 US7781143B2 (en) | 2007-05-31 | 2007-05-31 | Negative-working imageable elements and methods of use |
| PCT/US2008/006846 WO2008150441A1 (en) | 2007-05-31 | 2008-05-30 | Imageable elements and methods of use in negative working lithographic printing plates |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010529490A JP2010529490A (ja) | 2010-08-26 |
| JP2010529490A5 JP2010529490A5 (enExample) | 2011-05-19 |
| JP5123379B2 true JP5123379B2 (ja) | 2013-01-23 |
Family
ID=39744778
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010510352A Active JP5123379B2 (ja) | 2007-05-31 | 2008-05-30 | ネガ型画像形成性要素およびその使用方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7781143B2 (enExample) |
| EP (1) | EP2152516B1 (enExample) |
| JP (1) | JP5123379B2 (enExample) |
| CN (1) | CN101687407B (enExample) |
| WO (1) | WO2008150441A1 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2098367A1 (en) * | 2008-03-05 | 2009-09-09 | Eastman Kodak Company | Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates |
| US8318405B2 (en) * | 2009-03-13 | 2012-11-27 | Eastman Kodak Company | Negative-working imageable elements with overcoat |
| US8383319B2 (en) | 2009-08-25 | 2013-02-26 | Eastman Kodak Company | Lithographic printing plate precursors and stacks |
| US8426104B2 (en) | 2009-10-08 | 2013-04-23 | Eastman Kodak Company | Negative-working imageable elements |
| US20110097666A1 (en) * | 2009-10-27 | 2011-04-28 | Celin Savariar-Hauck | Lithographic printing plate precursors |
| US8329383B2 (en) | 2009-11-05 | 2012-12-11 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| HUE028652T2 (en) | 2010-04-20 | 2016-12-28 | Mylan Group | Substrate for Lithographic Printer Plate |
| JP5705584B2 (ja) * | 2011-02-24 | 2015-04-22 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| JP5705969B2 (ja) * | 2011-03-28 | 2015-04-22 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| US8632941B2 (en) | 2011-09-22 | 2014-01-21 | Eastman Kodak Company | Negative-working lithographic printing plate precursors with IR dyes |
| US9029063B2 (en) | 2011-09-22 | 2015-05-12 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| BR112014007143A2 (pt) * | 2011-09-26 | 2017-06-13 | Fujifilm Corp | processo para fabricar chapa de impressão litográfica |
| EP2762974B1 (en) * | 2011-09-26 | 2017-07-26 | Fujifilm Corporation | Method for producing lithographic printing plate |
| US8889341B2 (en) | 2012-08-22 | 2014-11-18 | Eastman Kodak Company | Negative-working lithographic printing plate precursors and use |
| AU2014215300B2 (en) * | 2013-02-08 | 2017-03-30 | Kuraray Co., Ltd. | Multilayer structure and method for producing same |
| EP2778782B1 (en) * | 2013-03-13 | 2015-12-30 | Kodak Graphic Communications GmbH | Negative working radiation-sensitive elements |
| BR112019009802B1 (pt) | 2016-11-16 | 2022-12-13 | Fujifilm Corporation | Precursor de placa de impressão planográfica em prensa e método para fabricação de placa em prensa para placa de impressão planográfica |
| EP4540329A1 (en) * | 2022-06-15 | 2025-04-23 | Actega GmbH | Near-infrared light curable aqueous coating composition |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07103171B2 (ja) * | 1988-05-13 | 1995-11-08 | 日本ペイント株式会社 | 光重合性組成物 |
| JPH04134456A (ja) * | 1990-09-27 | 1992-05-08 | Toppan Printing Co Ltd | 感光性樹脂組成物 |
| JPH06175557A (ja) * | 1992-12-03 | 1994-06-24 | Toyo Ink Mfg Co Ltd | 体積位相型ホログラムの製造方法 |
| JP3907144B2 (ja) * | 1998-04-09 | 2007-04-18 | 富士フイルム株式会社 | 平版印刷版の製造方法、レーザ走査露光用平版印刷版原版、および光重合性組成物 |
| JP3674336B2 (ja) * | 1998-10-02 | 2005-07-20 | 凸版印刷株式会社 | 可視光重合性組成物 |
| JP2000187322A (ja) | 1998-10-15 | 2000-07-04 | Mitsubishi Chemicals Corp | 感光性組成物、画像形成材料及びそれを用いた画像形成方法 |
| DE19940921A1 (de) | 1999-08-27 | 2001-03-01 | Agfa Gevaert Ag | Photopolymerisierbares Gemisch und damit hergestelltes Aufzeichnungsmaterial |
| US6309792B1 (en) | 2000-02-18 | 2001-10-30 | Kodak Polychrome Graphics Llc | IR-sensitive composition and use thereof for the preparation of printing plate precursors |
| ATE345928T1 (de) * | 2000-08-21 | 2006-12-15 | Fuji Photo Film Co Ltd | Bildaufzeichnungsmaterial |
| JP4319363B2 (ja) * | 2001-01-15 | 2009-08-26 | 富士フイルム株式会社 | ネガ型画像記録材料 |
| US6899994B2 (en) * | 2001-04-04 | 2005-05-31 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments |
| US6893797B2 (en) | 2001-11-09 | 2005-05-17 | Kodak Polychrome Graphics Llc | High speed negative-working thermal printing plates |
| US20030118939A1 (en) | 2001-11-09 | 2003-06-26 | Kodak Polychrome Graphics, L.L.C. | High speed negative working thermal printing plates |
| JP2003050442A (ja) | 2001-06-01 | 2003-02-21 | Fuji Photo Film Co Ltd | 記録材料 |
| JP4181312B2 (ja) * | 2001-06-25 | 2008-11-12 | 富士フイルム株式会社 | ネガ型画像記録材料 |
| US6702437B2 (en) | 2001-08-23 | 2004-03-09 | Fuji Photo Film Co., Ltd. | Image recording material |
| JP2003098674A (ja) | 2001-09-21 | 2003-04-04 | Fuji Photo Film Co Ltd | 光重合性平版印刷版 |
| JP4244274B2 (ja) | 2001-09-27 | 2009-03-25 | 富士フイルム株式会社 | 光重合性組成物及び記録材料 |
| JP3901595B2 (ja) * | 2002-02-25 | 2007-04-04 | 富士フイルム株式会社 | 平版印刷用原版 |
| US6787281B2 (en) | 2002-05-24 | 2004-09-07 | Kodak Polychrome Graphics Llc | Selected acid generating agents and their use in processes for imaging radiation-sensitive elements |
| US7569328B2 (en) * | 2002-08-16 | 2009-08-04 | Fujifilm Corporation | Resin composition and thermo/photosensitive composition |
| JP2004252285A (ja) | 2003-02-21 | 2004-09-09 | Fuji Photo Film Co Ltd | 感光性組成物及びそれを用いた平版印刷版原版 |
| US7368215B2 (en) * | 2003-05-12 | 2008-05-06 | Eastman Kodak Company | On-press developable IR sensitive printing plates containing an onium salt initiator system |
| US7179582B2 (en) * | 2003-07-28 | 2007-02-20 | Fuji Photo Film Co., Ltd. | Radical polymerizable composition and lithographic printing plate precursor using the same |
| JP4248345B2 (ja) * | 2003-09-01 | 2009-04-02 | 富士フイルム株式会社 | 感光性組成物 |
| JP2005232306A (ja) * | 2004-02-19 | 2005-09-02 | Fuji Photo Film Co Ltd | 光重合性組成物及びそれを用いた記録材料 |
| JP4460986B2 (ja) * | 2004-09-24 | 2010-05-12 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| JP2006181838A (ja) | 2004-12-27 | 2006-07-13 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| JP4796851B2 (ja) * | 2005-01-21 | 2011-10-19 | 富士フイルム株式会社 | 感光性平版印刷版 |
| JP2007079153A (ja) * | 2005-09-14 | 2007-03-29 | Nippon Paint Co Ltd | 感光性樹脂組成物 |
| JP2007108722A (ja) * | 2005-09-14 | 2007-04-26 | Nippon Paint Co Ltd | 感光性樹脂組成物用保護層 |
| US7524614B2 (en) | 2006-05-26 | 2009-04-28 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable materials |
| US7332253B1 (en) * | 2006-07-27 | 2008-02-19 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable materials |
| US7575844B2 (en) * | 2007-04-27 | 2009-08-18 | Hewlett-Packard Development Company, L.P. | Color forming composites capable of multi-colored imaging and associated systems and methods |
-
2007
- 2007-05-31 US US11/756,036 patent/US7781143B2/en active Active
-
2008
- 2008-05-30 WO PCT/US2008/006846 patent/WO2008150441A1/en not_active Ceased
- 2008-05-30 EP EP08767965.0A patent/EP2152516B1/en active Active
- 2008-05-30 JP JP2010510352A patent/JP5123379B2/ja active Active
- 2008-05-30 CN CN2008800178168A patent/CN101687407B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2008150441A1 (en) | 2008-12-11 |
| JP2010529490A (ja) | 2010-08-26 |
| CN101687407B (zh) | 2011-11-16 |
| EP2152516B1 (en) | 2014-01-08 |
| US7781143B2 (en) | 2010-08-24 |
| EP2152516A1 (en) | 2010-02-17 |
| US20080299488A1 (en) | 2008-12-04 |
| CN101687407A (zh) | 2010-03-31 |
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