JP5092950B2 - エキシマランプ - Google Patents
エキシマランプ Download PDFInfo
- Publication number
- JP5092950B2 JP5092950B2 JP2008177792A JP2008177792A JP5092950B2 JP 5092950 B2 JP5092950 B2 JP 5092950B2 JP 2008177792 A JP2008177792 A JP 2008177792A JP 2008177792 A JP2008177792 A JP 2008177792A JP 5092950 B2 JP5092950 B2 JP 5092950B2
- Authority
- JP
- Japan
- Prior art keywords
- particles
- ultraviolet
- alumina particles
- excimer lamp
- discharge vessel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002245 particle Substances 0.000 claims description 156
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 87
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 80
- 238000007496 glass forming Methods 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims 1
- 239000007789 gas Substances 0.000 description 16
- 238000009826 distribution Methods 0.000 description 14
- 230000007423 decrease Effects 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 239000006185 dispersion Substances 0.000 description 6
- 230000005484 gravity Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229910052724 xenon Inorganic materials 0.000 description 6
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 241000282341 Mustela putorius furo Species 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- IDLFZVILOHSSID-OVLDLUHVSA-N corticotropin Chemical compound C([C@@H](C(=O)N[C@@H](CO)C(=O)N[C@@H](CCSC)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](CC=1NC=NC=1)C(=O)N[C@@H](CC=1C=CC=CC=1)C(=O)N[C@@H](CCCNC(N)=N)C(=O)N[C@@H](CC=1C2=CC=CC=C2NC=1)C(=O)NCC(=O)N[C@@H](CCCCN)C(=O)N1[C@@H](CCC1)C(=O)N[C@@H](C(C)C)C(=O)NCC(=O)N[C@@H](CCCCN)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](CCCNC(N)=N)C(=O)N[C@@H](CCCNC(N)=N)C(=O)N1[C@@H](CCC1)C(=O)N[C@@H](C(C)C)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](C(C)C)C(=O)N[C@@H](CC=1C=CC(O)=CC=1)C(=O)N1[C@@H](CCC1)C(=O)N[C@@H](CC(N)=O)C(=O)NCC(=O)N[C@@H](C)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](CC(O)=O)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](CO)C(=O)N[C@@H](C)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](C)C(=O)N[C@@H](CC=1C=CC=CC=1)C(=O)N1[C@@H](CCC1)C(=O)N[C@@H](CC(C)C)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](CC=1C=CC=CC=1)C(O)=O)NC(=O)[C@@H](N)CO)C1=CC=C(O)C=C1 IDLFZVILOHSSID-OVLDLUHVSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000011802 pulverized particle Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 238000010532 solid phase synthesis reaction Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- -1 that is Substances 0.000 description 1
Images
Landscapes
- Vessels And Coating Films For Discharge Lamps (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008177792A JP5092950B2 (ja) | 2007-10-10 | 2008-07-08 | エキシマランプ |
| TW97131729A TWI399786B (zh) | 2007-10-10 | 2008-08-20 | Excimer lamp |
| KR1020080085742A KR101158962B1 (ko) | 2007-10-10 | 2008-09-01 | 엑시머 램프 |
| AT08017647T ATE511700T1 (de) | 2007-10-10 | 2008-10-08 | Excimerlampen |
| EP08017647A EP2056335B1 (de) | 2007-10-10 | 2008-10-08 | Excimerlampen |
| US12/248,453 US8164239B2 (en) | 2007-10-10 | 2008-10-09 | Excimer lamps |
| CN2008101692682A CN101409206B (zh) | 2007-10-10 | 2008-10-10 | 准分子灯 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007264275 | 2007-10-10 | ||
| JP2007264275 | 2007-10-10 | ||
| JP2008177792A JP5092950B2 (ja) | 2007-10-10 | 2008-07-08 | エキシマランプ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009110927A JP2009110927A (ja) | 2009-05-21 |
| JP5092950B2 true JP5092950B2 (ja) | 2012-12-05 |
Family
ID=40572149
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008177792A Active JP5092950B2 (ja) | 2007-10-10 | 2008-07-08 | エキシマランプ |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5092950B2 (de) |
| CN (1) | CN101409206B (de) |
| AT (1) | ATE511700T1 (de) |
| TW (1) | TWI399786B (de) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5278648B2 (ja) * | 2007-12-11 | 2013-09-04 | ウシオ電機株式会社 | エキシマランプ |
| JP5293430B2 (ja) * | 2009-06-11 | 2013-09-18 | ウシオ電機株式会社 | エキシマランプ |
| CN105957799A (zh) * | 2016-06-23 | 2016-09-21 | 卜弘昊 | 一种大功率真空紫外放电灯 |
| CN105977131A (zh) * | 2016-06-23 | 2016-09-28 | 卜弘昊 | 一种高频激励介质放电灯 |
| CN106098531A (zh) * | 2016-06-23 | 2016-11-09 | 卜弘昊 | 一种窄波紫外光源放电灯 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5263244A (en) * | 1975-11-20 | 1977-05-25 | Matsushita Electronics Corp | Method of coating lighttscattering film onto inner surface of tube valve |
| JPS57172653A (en) * | 1981-04-16 | 1982-10-23 | Tokyo Shibaura Electric Co | Method of forming scattering film of bulb |
| JPH09153344A (ja) * | 1995-11-30 | 1997-06-10 | Toshiba Lighting & Technol Corp | 蛍光ランプおよび照明装置 |
| JP3580233B2 (ja) * | 2000-09-19 | 2004-10-20 | ウシオ電機株式会社 | 誘電体バリア放電ランプ装置 |
| US7563512B2 (en) * | 2004-08-23 | 2009-07-21 | Heraeus Quarzglas Gmbh & Co. Kg | Component with a reflector layer and method for producing the same |
| TWM269431U (en) * | 2004-11-11 | 2005-07-01 | C Sun Mfg Ltd | Structure of ultraviolet lamp tube with low infrared illumination |
| US20090039757A1 (en) * | 2005-04-22 | 2009-02-12 | Hiroyoshi Ohshima | Excimer Lamp |
| CN101031993B (zh) * | 2005-07-29 | 2010-12-01 | 株式会社杰士汤浅 | 紫外线灯及紫外线照射装置 |
| JP4857939B2 (ja) * | 2006-06-19 | 2012-01-18 | ウシオ電機株式会社 | 放電ランプ |
| JP4788534B2 (ja) * | 2006-09-07 | 2011-10-05 | ウシオ電機株式会社 | エキシマランプ |
-
2008
- 2008-07-08 JP JP2008177792A patent/JP5092950B2/ja active Active
- 2008-08-20 TW TW97131729A patent/TWI399786B/zh active
- 2008-10-08 AT AT08017647T patent/ATE511700T1/de active
- 2008-10-10 CN CN2008101692682A patent/CN101409206B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN101409206B (zh) | 2012-09-05 |
| TW200917325A (en) | 2009-04-16 |
| JP2009110927A (ja) | 2009-05-21 |
| ATE511700T1 (de) | 2011-06-15 |
| TWI399786B (zh) | 2013-06-21 |
| CN101409206A (zh) | 2009-04-15 |
Similar Documents
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|---|---|---|
| KR101158962B1 (ko) | 엑시머 램프 | |
| JP5092950B2 (ja) | エキシマランプ | |
| JP4946772B2 (ja) | エキシマランプ | |
| KR101246431B1 (ko) | 엑시머 램프 | |
| JP5303891B2 (ja) | エキシマランプ | |
| JP5303890B2 (ja) | エキシマランプ | |
| JP5163175B2 (ja) | エキシマランプ | |
| JP2009146589A (ja) | エキシマ放電ランプ | |
| TWI434321B (zh) | Excimer lamp | |
| JP2009295469A (ja) | エキシマランプ |
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