JP5081916B2 - ナノファイバーを含む多孔質基体、製品、システム及び組成物並びにその使用及び製造方法 - Google Patents
ナノファイバーを含む多孔質基体、製品、システム及び組成物並びにその使用及び製造方法 Download PDFInfo
- Publication number
- JP5081916B2 JP5081916B2 JP2009526640A JP2009526640A JP5081916B2 JP 5081916 B2 JP5081916 B2 JP 5081916B2 JP 2009526640 A JP2009526640 A JP 2009526640A JP 2009526640 A JP2009526640 A JP 2009526640A JP 5081916 B2 JP5081916 B2 JP 5081916B2
- Authority
- JP
- Japan
- Prior art keywords
- nanofibers
- substrate
- nanofiber
- nanowires
- porous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002121 nanofiber Substances 0.000 title claims description 442
- 239000000758 substrate Substances 0.000 title claims description 406
- 238000000034 method Methods 0.000 title claims description 122
- 238000004519 manufacturing process Methods 0.000 title claims description 29
- 239000000203 mixture Substances 0.000 title description 34
- 239000002070 nanowire Substances 0.000 claims description 179
- 239000000463 material Substances 0.000 claims description 133
- 229910052710 silicon Inorganic materials 0.000 claims description 50
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 46
- 239000010703 silicon Substances 0.000 claims description 46
- 239000002245 particle Substances 0.000 claims description 45
- 239000004065 semiconductor Substances 0.000 claims description 42
- 239000003054 catalyst Substances 0.000 claims description 39
- 238000003786 synthesis reaction Methods 0.000 claims description 36
- 230000015572 biosynthetic process Effects 0.000 claims description 35
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 30
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 30
- 239000006229 carbon black Substances 0.000 claims description 26
- 239000011859 microparticle Substances 0.000 claims description 24
- 239000002105 nanoparticle Substances 0.000 claims description 24
- 238000000151 deposition Methods 0.000 claims description 22
- 229910052799 carbon Inorganic materials 0.000 claims description 19
- 230000002194 synthesizing effect Effects 0.000 claims description 19
- 238000000926 separation method Methods 0.000 claims description 18
- 239000007787 solid Substances 0.000 claims description 18
- 239000000084 colloidal system Substances 0.000 claims description 17
- 229910052737 gold Inorganic materials 0.000 claims description 15
- 239000010931 gold Substances 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 claims description 10
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 5
- 239000000835 fiber Substances 0.000 description 104
- 239000011148 porous material Substances 0.000 description 87
- 239000010410 layer Substances 0.000 description 64
- 239000000047 product Substances 0.000 description 49
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 45
- 238000001914 filtration Methods 0.000 description 39
- 238000000576 coating method Methods 0.000 description 38
- 239000011159 matrix material Substances 0.000 description 38
- 229920000642 polymer Polymers 0.000 description 37
- 230000004888 barrier function Effects 0.000 description 35
- 239000011248 coating agent Substances 0.000 description 35
- 239000007789 gas Substances 0.000 description 35
- 239000000126 substance Substances 0.000 description 33
- 239000002131 composite material Substances 0.000 description 31
- 229910052751 metal Inorganic materials 0.000 description 31
- 239000002184 metal Substances 0.000 description 31
- 239000002159 nanocrystal Substances 0.000 description 28
- 239000012528 membrane Substances 0.000 description 21
- 239000010453 quartz Substances 0.000 description 19
- 239000011521 glass Substances 0.000 description 18
- 239000002086 nanomaterial Substances 0.000 description 18
- 239000007788 liquid Substances 0.000 description 17
- 239000010408 film Substances 0.000 description 16
- 229920000049 Carbon (fiber) Polymers 0.000 description 15
- 229910052782 aluminium Inorganic materials 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 14
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 13
- 206010052428 Wound Diseases 0.000 description 13
- 208000027418 Wounds and injury Diseases 0.000 description 13
- 239000012530 fluid Substances 0.000 description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
- 230000006870 function Effects 0.000 description 12
- 238000011065 in-situ storage Methods 0.000 description 12
- 235000012431 wafers Nutrition 0.000 description 12
- 238000000635 electron micrograph Methods 0.000 description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 10
- 230000008901 benefit Effects 0.000 description 10
- 230000008021 deposition Effects 0.000 description 10
- 239000002019 doping agent Substances 0.000 description 10
- 230000002209 hydrophobic effect Effects 0.000 description 10
- 230000001965 increasing effect Effects 0.000 description 10
- 239000000843 powder Substances 0.000 description 10
- 229910052719 titanium Inorganic materials 0.000 description 10
- 239000010936 titanium Substances 0.000 description 10
- 238000005516 engineering process Methods 0.000 description 9
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 9
- -1 polyethylene Polymers 0.000 description 9
- 239000002759 woven fabric Substances 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 239000004917 carbon fiber Substances 0.000 description 8
- 238000004132 cross linking Methods 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 8
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 8
- 239000000919 ceramic Substances 0.000 description 7
- 239000003365 glass fiber Substances 0.000 description 7
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 7
- 239000004005 microsphere Substances 0.000 description 7
- 229910052697 platinum Inorganic materials 0.000 description 7
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- 239000011152 fibreglass Substances 0.000 description 6
- 238000010348 incorporation Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 229910000077 silane Inorganic materials 0.000 description 6
- 238000000527 sonication Methods 0.000 description 6
- 239000000725 suspension Substances 0.000 description 6
- 238000001308 synthesis method Methods 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 229910021393 carbon nanotube Inorganic materials 0.000 description 5
- 239000002041 carbon nanotube Substances 0.000 description 5
- 239000004744 fabric Substances 0.000 description 5
- 239000011777 magnesium Substances 0.000 description 5
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 4
- 229920001410 Microfiber Polymers 0.000 description 4
- 239000004677 Nylon Substances 0.000 description 4
- 108010039918 Polylysine Proteins 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 4
- 229920003235 aromatic polyamide Polymers 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910010272 inorganic material Inorganic materials 0.000 description 4
- 239000011147 inorganic material Substances 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 239000003658 microfiber Substances 0.000 description 4
- 239000002114 nanocomposite Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 229920001778 nylon Polymers 0.000 description 4
- 230000000737 periodic effect Effects 0.000 description 4
- 230000035699 permeability Effects 0.000 description 4
- 239000012466 permeate Substances 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 229920000656 polylysine Polymers 0.000 description 4
- 229920005594 polymer fiber Polymers 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- 229920005591 polysilicon Polymers 0.000 description 4
- 229910052711 selenium Inorganic materials 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 229910052714 tellurium Inorganic materials 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 230000000844 anti-bacterial effect Effects 0.000 description 3
- 238000003491 array Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000005553 drilling Methods 0.000 description 3
- 239000000446 fuel Substances 0.000 description 3
- 230000001976 improved effect Effects 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 3
- 229910000457 iridium oxide Inorganic materials 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229920001643 poly(ether ketone) Polymers 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 229920000307 polymer substrate Polymers 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 230000002787 reinforcement Effects 0.000 description 3
- 230000002940 repellent Effects 0.000 description 3
- 239000005871 repellent Substances 0.000 description 3
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 3
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 230000000087 stabilizing effect Effects 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 3
- 229910001936 tantalum oxide Inorganic materials 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 229910001930 tungsten oxide Inorganic materials 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000004813 Perfluoroalkoxy alkane Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 229910021607 Silver chloride Inorganic materials 0.000 description 2
- 229910021608 Silver(I) fluoride Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000000845 anti-microbial effect Effects 0.000 description 2
- 230000001580 bacterial effect Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000000513 bioprotective effect Effects 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 210000004027 cell Anatomy 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000013375 chromatographic separation Methods 0.000 description 2
- 239000011362 coarse particle Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 150000002118 epoxides Chemical class 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- 239000011491 glass wool Substances 0.000 description 2
- ZBKIUFWVEIBQRT-UHFFFAOYSA-N gold(1+) Chemical compound [Au+] ZBKIUFWVEIBQRT-UHFFFAOYSA-N 0.000 description 2
- 239000007943 implant Substances 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000009830 intercalation Methods 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- VASIZKWUTCETSD-UHFFFAOYSA-N manganese(II) oxide Inorganic materials [Mn]=O VASIZKWUTCETSD-UHFFFAOYSA-N 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000011325 microbead Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 239000013618 particulate matter Substances 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 229920011301 perfluoro alkoxyl alkane Polymers 0.000 description 2
- 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- YBNMDCCMCLUHBL-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 4-pyren-1-ylbutanoate Chemical compound C=1C=C(C2=C34)C=CC3=CC=CC4=CC=C2C=1CCCC(=O)ON1C(=O)CCC1=O YBNMDCCMCLUHBL-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 229910017115 AlSb Inorganic materials 0.000 description 1
- 229910015894 BeTe Inorganic materials 0.000 description 1
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 229920013683 Celanese Polymers 0.000 description 1
- 229910021589 Copper(I) bromide Inorganic materials 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 229910021593 Copper(I) fluoride Inorganic materials 0.000 description 1
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 229910016344 CuSi Inorganic materials 0.000 description 1
- 101710145505 Fiber protein Proteins 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- 229910005540 GaP Inorganic materials 0.000 description 1
- 229910005542 GaSb Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910005829 GeS Inorganic materials 0.000 description 1
- 229910005866 GeSe Inorganic materials 0.000 description 1
- 229910005900 GeTe Inorganic materials 0.000 description 1
- 229910005939 Ge—Sn Inorganic materials 0.000 description 1
- 229910004262 HgTe Inorganic materials 0.000 description 1
- 229910000673 Indium arsenide Inorganic materials 0.000 description 1
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 208000012868 Overgrowth Diseases 0.000 description 1
- 229910002665 PbTe Inorganic materials 0.000 description 1
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000012494 Quartz wool Substances 0.000 description 1
- 229910018540 Si C Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910008310 Si—Ge Inorganic materials 0.000 description 1
- 229910005642 SnTe Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 241001455273 Tetrapoda Species 0.000 description 1
- 208000031737 Tissue Adhesions Diseases 0.000 description 1
- 241000700605 Viruses Species 0.000 description 1
- 206010048038 Wound infection Diseases 0.000 description 1
- 229910007709 ZnTe Inorganic materials 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 210000003484 anatomy Anatomy 0.000 description 1
- 230000002421 anti-septic effect Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 238000000231 atomic layer deposition Methods 0.000 description 1
- 230000003190 augmentative effect Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 239000003124 biologic agent Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 150000001735 carboxylic acids Chemical group 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 210000000170 cell membrane Anatomy 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010382 chemical cross-linking Methods 0.000 description 1
- 125000003636 chemical group Chemical group 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 210000005069 ears Anatomy 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000002783 friction material Substances 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 125000003827 glycol group Chemical group 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 239000013056 hazardous product Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 1
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 208000015181 infectious disease Diseases 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000002687 intercalation Effects 0.000 description 1
- ODNHQUQWHMGWGT-UHFFFAOYSA-N iridium;oxotin Chemical compound [Ir].[Sn]=O ODNHQUQWHMGWGT-UHFFFAOYSA-N 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000006262 metallic foam Substances 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- 238000005555 metalworking Methods 0.000 description 1
- 238000005232 molecular self-assembly Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000002077 nanosphere Substances 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 235000015097 nutrients Nutrition 0.000 description 1
- 238000000879 optical micrograph Methods 0.000 description 1
- 238000007500 overflow downdraw method Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 230000006320 pegylation Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000005373 porous glass Substances 0.000 description 1
- 238000011045 prefiltration Methods 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 239000012783 reinforcing fiber Substances 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000000241 respiratory effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
- 239000012056 semi-solid material Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- REYHXKZHIMGNSE-UHFFFAOYSA-M silver monofluoride Chemical compound [F-].[Ag+] REYHXKZHIMGNSE-UHFFFAOYSA-M 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000002195 soluble material Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 230000004936 stimulating effect Effects 0.000 description 1
- 230000000638 stimulation Effects 0.000 description 1
- 230000003075 superhydrophobic effect Effects 0.000 description 1
- 230000008093 supporting effect Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- OCGWQDWYSQAFTO-UHFFFAOYSA-N tellanylidenelead Chemical compound [Pb]=[Te] OCGWQDWYSQAFTO-UHFFFAOYSA-N 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004634 thermosetting polymer Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0215—Coating
- B01J37/0221—Coating of particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D39/00—Filtering material for liquid or gaseous fluids
- B01D39/08—Filter cloth, i.e. woven, knitted or interlaced material
- B01D39/083—Filter cloth, i.e. woven, knitted or interlaced material of organic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D39/00—Filtering material for liquid or gaseous fluids
- B01D39/08—Filter cloth, i.e. woven, knitted or interlaced material
- B01D39/086—Filter cloth, i.e. woven, knitted or interlaced material of inorganic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D39/00—Filtering material for liquid or gaseous fluids
- B01D39/14—Other self-supporting filtering material ; Other filtering material
- B01D39/20—Other self-supporting filtering material ; Other filtering material of inorganic material, e.g. asbestos paper, metallic filtering material of non-woven wires
- B01D39/2055—Carbonaceous material
- B01D39/2065—Carbonaceous material the material being fibrous
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/18—Carbon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/40—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
- B01J23/42—Platinum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/48—Silver or gold
- B01J23/52—Gold
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/20—Catalysts, in general, characterised by their form or physical properties characterised by their non-solid state
- B01J35/23—Catalysts, in general, characterised by their form or physical properties characterised by their non-solid state in a colloidal state
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/50—Catalysts, in general, characterised by their form or physical properties characterised by their shape or configuration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
- D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
- D06M11/44—Oxides or hydroxides of elements of Groups 2 or 12 of the Periodic Table; Zincates; Cadmates
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
- D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
- D06M11/45—Oxides or hydroxides of elements of Groups 3 or 13 of the Periodic Table; Aluminates
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
- D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
- D06M11/46—Oxides or hydroxides of elements of Groups 4 or 14 of the Periodic Table; Titanates; Zirconates; Stannates; Plumbates
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
- D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
- D06M11/49—Oxides or hydroxides of elements of Groups 8, 9,10 or 18 of the Periodic Table; Ferrates; Cobaltates; Nickelates; Ruthenates; Osmates; Rhodates; Iridates; Palladates; Platinates
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/83—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with metals; with metal-generating compounds, e.g. metal carbonyls; Reduction of metal compounds on textiles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/04—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of carbon-silicon compounds, carbon or silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02164—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon oxide, e.g. SiO2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02551—Group 12/16 materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02587—Structure
- H01L21/0259—Microstructure
- H01L21/02603—Nanowires
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02587—Structure
- H01L21/0259—Microstructure
- H01L21/02606—Nanotubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
- H01L21/02639—Preparation of substrate for selective deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
- H01L21/02639—Preparation of substrate for selective deposition
- H01L21/02645—Seed materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
- H01L21/02653—Vapour-liquid-solid growth
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02664—Aftertreatments
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/02—Types of fibres, filaments or particles, self-supporting or supported materials
- B01D2239/0208—Single-component fibres
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/02—Types of fibres, filaments or particles, self-supporting or supported materials
- B01D2239/0216—Bicomponent or multicomponent fibres
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/02—Types of fibres, filaments or particles, self-supporting or supported materials
- B01D2239/025—Types of fibres, filaments or particles, self-supporting or supported materials comprising nanofibres
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/04—Additives and treatments of the filtering material
- B01D2239/0407—Additives and treatments of the filtering material comprising particulate additives, e.g. adsorbents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/04—Additives and treatments of the filtering material
- B01D2239/0414—Surface modifiers, e.g. comprising ion exchange groups
- B01D2239/0421—Rendering the filter material hydrophilic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/04—Additives and treatments of the filtering material
- B01D2239/0414—Surface modifiers, e.g. comprising ion exchange groups
- B01D2239/0428—Rendering the filter material hydrophobic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/04—Additives and treatments of the filtering material
- B01D2239/0471—Surface coating material
- B01D2239/0492—Surface coating material on fibres
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/06—Filter cloth, e.g. knitted, woven non-woven; self-supported material
- B01D2239/0604—Arrangement of the fibres in the filtering material
- B01D2239/064—The fibres being mixed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/06—Filter cloth, e.g. knitted, woven non-woven; self-supported material
- B01D2239/065—More than one layer present in the filtering material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/06—Filter cloth, e.g. knitted, woven non-woven; self-supported material
- B01D2239/065—More than one layer present in the filtering material
- B01D2239/0654—Support layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/10—Filtering material manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/12—Special parameters characterising the filtering material
- B01D2239/1216—Pore size
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/12—Special parameters characterising the filtering material
- B01D2239/1225—Fibre length
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
- G01N30/02—Column chromatography
- G01N30/50—Conditioning of the sorbent material or stationary liquid
- G01N30/52—Physical parameters
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Textile Engineering (AREA)
- Organic Chemistry (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Composite Materials (AREA)
- Geology (AREA)
- Inorganic Chemistry (AREA)
- Nonwoven Fabrics (AREA)
- Carbon And Carbon Compounds (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Fibers (AREA)
- Micro-Organisms Or Cultivation Processes Thereof (AREA)
- Silicon Compounds (AREA)
Description
本願は米国特許出願第11/511,886号(出願日2006年8月29日、発明の名称「ナノファイバーを含む多孔質基体、製品、システム及び組成物並びにその使用及び製造方法(POROUS SUBSTRATES,ARTICLES,SYSTEMS AND COMPOSITIONS COMPRISING NANOFIBERS AND METHODS OF THEIR USE AND PRODUCTION)」、発明者Chunming Niu)の優先権と特典を主張する非仮特許出願であり、その開示内容全体を全目的で本明細書に援用する。
本発明は主にナノテクノロジーの分野に関する。より詳細には、本発明はナノファイバーに関し、ナノファイバーの合成又は安定化方法、ナノファイバーを含む製品、及び各種用途におけるナノファイバーの使用を含む。
本発明は一般に、ユニークな物理的、化学的及び電気的性質を付与するためにナノワイヤー表面又は表面部分を利用する新規製品及び組成物を特に提供する。特に、本発明は一面において、多種多様な用途に適した多様なユニークで有用な性質をもつ材料を提供するために、ナノワイヤーを多孔質基体の総表面の少なくとも一部に結合した多孔質基体に関する。
上記のように、1側面において、本発明の製品は製品の基材として多孔質基体を組込む。本発明により使用される多孔質基体としては一般に、ナノワイヤーを結合することができ且つアパーチャが存在する各種固体又は半固体材料の任意のものが挙げられる。従って、これらの基体としては可撓性でも剛性でもよく、アパーチャを配置した固体連続基体(例えばプレート、フィルム、又はウェーハ)(例えば打抜き又はエッチングした金属又は無機穿孔プレート、ウェーハ等、有孔又は穿孔フィルム)でもよいし、基体は固体又は半固体コンポーネントの凝集体、例えばファイバーマット、メッシュスクリーン、非晶質マトリックス、複合材料、織布(例えばファイバーグラス、カーボンファイバー、ポリアラミド又はポリエステル繊維等)でもよい。当然のことながら、多様な各種材料の任意のものから基体を構成することができ、有機材料(例えばポリマー、カーボンシート等)、セラミック、無機材料(例えば半導体、絶縁体、ガラス、例えばシリカ系材料(例えばシリコン、SiO2)等)、金属、半金属、並びにこれらの全材料の複合材料が挙げられる。
本明細書中に示唆するように、その表面の部分にナノファイバーを結合した本発明の多孔質基体はこのような材料の特に有利な多様な性質を活用する無数の用途に利用される。所定用途では、ナノワイヤーの存在により特性を強化した多孔質材料が得られる。他の用途では、多孔質基体とナノワイヤーの併用により実質的に新規な性質と有用性をもつ材料が得られる。
第1の特に好ましい用途では、本発明の多孔質基体は半透性バリアとして有用である。半透性バリア全般もその透過性レベル、コスト等に応じて多種多様な用途に利用される。例えば、このようなバリアは気体を透過し、液体を透過しないものでもよいし、空気又は気体を透過し、粒状物質を透過しないものでもよい。更に、このような半透性バリアはその用途に防腐性又は抗菌性を提供することができる。
その最も単純な側面において、半透性バリアは気体又は液体を粒状物質から分離するための濾過媒体として使用される。例えば、多種多様な濾過選択肢が例えば空気濾過に利用可能であり、例えば家庭用暖炉、エアコン、空気清浄器等の単純な消費者濾過ニーズから例えば産業用HEPA濾過、防護服用有害物質濾過、クリーンルーム用途、自動車用途等のより高度なニーズに至る多様な用途がある。液体用途では、このようなフィルターは水精製、産業用又は消費者用機械(例えば自動車)用燃料及び潤滑油の粒状物質分離等を実施することができる。
1関連側面において、基体は液体不透過性を維持しながら気体(例えば空気)を透過するように構成される。例えば、このようなバリアは水蒸気、酸素及び他の気体を自由にバリアに透過させるが、液体を透過させない衣類及び医療用通気性防湿バリアとして特に有用である。本発明によると、これは多孔質基体を貫通するように配置されたアパーチャの内側にナノファイバーを配置することにより達成される。しかし、本発明の他の側面とは異なり、防湿バリア用ナノファイバーは疎水性を増すように選択又は処理される。疎水性を増すためのナノファイバー表面の処理はその開示内容全体を全目的で本明細書に援用する米国特許出願公開第20050181195号に詳細に記載されている。特に、疎水性化学部分をその表面に結合して材料の疎水性を増すようにナノファイバー及び/又は基体表面を誘導体化することができる。疎水性化学部分を基体に結合することは当業者に周知であり、例えばシラン系基体を処理するためのシラン化学等が挙げられる。下層多孔質基体上にこのような超疎水性ナノファイバー表面を配置することにより、空気、水蒸気又は他の気体を透過させながら液体(例えば液体水又は他の水溶液)の透過を防止することができる。一般に、このようなバリアは実質的に水分を透過せず、例えば周囲条件下で表面と接触する水分の実質的に大半の透過を防止する。
別の好ましい態様において、これらの通気性防湿バリアは液体水や他の有害物質/摩耗等を創傷部に接触させずに酸素を創傷部に到達させ、創傷部からガスや蒸気を逃がすことができるので、包帯又は創傷包帯剤として有用である。半透性バリアとしての利点に加え、ナノファイバーを被覆した表面は包帯を固定するための接着性も提供することができ、例えば包帯を創傷部自体又はその周囲の皮膚に接着させることができる。乾燥接着剤又は高摩擦材料としてのナノファイバー表面の使用はその開示内容全体を全目的で本明細書に援用する米国特許第7,056,409号に詳細に記載されている。更に、このようなナノファイバーコーティングは創傷部の感染予防を助長するために抗微生物材料(例えばZnO等)を含むことができる。
1関連側面において、本発明の多孔質基体は各種有機又は無機蒸気を吸収又は分解するために、通気性化学/生物防護衣類及び装置で有用である。本発明の蒸気バリア用途によると、多孔質基体(例えば布製又は可撓性メッシュ)を基材として使用する。活性炭繊維を使用することが好ましい。活性炭繊維は有機蒸気を吸収し、支持構造として機能する。活性炭繊維は例えばSpectracorpから市販されている。
上記に示唆したように、上記用途は多孔質基体の特性を強化するため、例えば濾過気孔率、撥水性等を強化するために多孔質基体に配置したナノファイバーを一般に利用する。しかし、多数の用途では、ナノファイバーを多孔質基体に付加することにより、単にその多孔性により利用されるのではなく、下層大表面積基体に結合した小寸法の材料の相乗的構造特性により強化される他の性質により利用されるユニークな材料が得られる。
上記性質以外に、多孔質基体はナノファイバーを維持、操作、保存及び他の方法で使用するための軽量で高密度の格子として利用することもできる。ナノファイバーをこの格子から回収することもできるし、例えば半導体素子、構造又は電気強化用複合充填材、例えば分離用の大表面積マトリックス等としてよりナノファイバーに特異的な用途で格子の部分をそのまま利用することもできる。
本発明の更に別の側面において、本発明のナノファイバーを担持する多孔質基体は複合材料の格子を形成し、格子の組込みを強化すると共に複合材料全体の構造特性を改善する。特に、多くの複合材料は付加的材料(例えばエポキシドや他のポリマー、セラミック、ガラス等)を支持する下層構造一体性を提供する格子を含む。例えば、エポキシ樹脂又は他のポリマーに封入したファイバーグラスクロスの複合材料は例えば家具、サーフボード及び他のスポーツ用品、車体修理等の各種用途で日常的に使用されている。同様に、カーボンファイバークロス又は基体も所望形状に成形する前に一般にポリマー又はエポキシ樹脂に封入される。最終的に、これらの複合材料は一般に大半の他の材料よりも良好な構造特性(例えば強度対重量比)をもつ。特定作用理論に結び付けるものではないが、封入材料と格子材料の相互作用がこれらの構造特性において非常に重要であると考えられる。具体的には、複合材料の2成分の相互作用を強化(例えば相互組込みを改善)することにより最終複合材料の強度が改善されると考えられる。本発明のナノファイバーを担持する多孔質基体は多孔質基体単体に比較して表面積が非常に大きいので、周囲の封入材(例えばエポキシ)との相互反応性が実質的に増加すると予想される。従って、本発明の別の側面は複合材料用格子材料としての、ナノファイバーを堆積した多孔質基体の使用を含む。
上記のように、ナノファイバー強化表面をもつ製品には各種の用途があり、例えば、埋込型医療装置(例えばステント)、ナノファイバー強化繊維、ナノファイバーアレイ、膜等が挙げられる。しかし、このようなナノファイバー装置はナノファイバー表面が比較的脆弱であることが多く、他の物体(例えば包装材料、皮膚等)と軽く接触しただけでもナノファイバー破損、マット化、及び剥離を生じる場合がある。従って、ナノファイバー表面を強化及び/又は保護する技術が望ましい。
1側面において、本発明の多孔質基体は大量及び/又は高密度の長尺非分岐型ナノファイバー、特にナノワイヤーの合成用格子として有用である。シリコンナノワイヤーは例えば特に各種マクロ電子用途に望ましい材料である。このようなナノワイヤーは一般に、特に各種マクロ電子用に望ましい材料である。このようなナノワイヤーは一般に長尺(例えば少なくとも約40、50、又は60μmの長さ)、直線状、及び非分岐であることが必要とされる。しかし、現在の合成技術では大量のこのような長尺非分岐型ナノワイヤーは容易に得られない。
Claims (13)
- 触媒材料を堆積したカーボン粒子を含む複数のマイクロ粒子又はナノ粒子を準備する段階と;
マイクロ粒子又はナノ粒子上で触媒材料から複数のナノファイバーを合成する段階を含むナノファイバーの製造方法であって、
ナノファイバーがナノワイヤーを含み、
複数のナノワイヤーを合成する段階が、
マイクロ粒子又はナノ粒子の総表面積の少なくとも一部に金コロイドを堆積する段階と;
VLS合成技術により金コロイドからナノワイヤーを成長させる段階を含む、方法。 - 触媒材料を堆積したカーボン粒子を含む複数のマイクロ粒子又はナノ粒子を準備する段階と;
マイクロ粒子又はナノ粒子上で触媒材料から複数のナノファイバーを合成する段階を含むナノファイバーの製造方法であって、
ナノファイバーの合成後にマイクロ粒子又はナノ粒子の表面からナノファイバーを分離し、孤立ナノファイバー集団を製造する段階を含み、
前記分離段階がマイクロ粒子又はナノ粒子上でナノファイバーの合成後にマイクロ粒子又はナノ粒子を加熱し、ナノファイバーからマイクロ粒子又はナノ粒子を分離する段階を含み、
前記加熱段階が500℃を上回る温度までマイクロ粒子又はナノ粒子を加熱する段階を含む、方法。 - 複数のナノファイバーがIV族、II−VI族及びIII−V族半導体から選択される半導体材料を含むか、あるいは
複数のナノファイバーがシリコン又はシリコン酸化物から構成される請求項1又は2に記載の方法。 - 触媒材料をカーボン粒子の複数の表面上に堆積させる請求項1乃至3のいずれか一項に記載の方法。
- カーボン粒子がカーボンブラックを含む請求項1乃至4のいずれか一項に記載の方法。
- 基体を準備する段階と;
基体の表面で複数のナノファイバーを合成する段階と;
ナノファイバーの合成後に基体を加熱してナノファイバーから基体を分離することにより、孤立ナノファイバーを製造する段階を含み、
前記加熱段階が500℃を上回る温度まで基体を加熱する段階を含む、孤立ナノファイバー集団の製造方法。 - 基体がカーボンブラックを含む請求項6に記載の方法。
- 基体がカーボン粒子を含む請求項6に記載の方法。
- カーボン粒子が別の固体担体に結合していない請求項1に記載の方法、又は請求項8に記載の方法。
- カーボン粒子が球形である請求項1に記載の方法、又は請求項8に記載の方法。
- カーボン粒子がマイクロ粒子又はナノ粒子である請求項8に記載の方法。
- カーボン粒子の1以上の表面が湾曲している請求項1に記載の方法、又は請求項8に記載の方法。
- カーボン粒子の複数の表面上でナノファイバーを合成する請求項8に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/511,886 US20110039690A1 (en) | 2004-02-02 | 2006-08-29 | Porous substrates, articles, systems and compositions comprising nanofibers and methods of their use and production |
US11/511,886 | 2006-08-29 | ||
PCT/US2007/018605 WO2008027265A2 (en) | 2006-08-29 | 2007-08-22 | Porous substrates, articles, systems and compositions comprising nanofibers and method of their use and production |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010511794A JP2010511794A (ja) | 2010-04-15 |
JP2010511794A5 JP2010511794A5 (ja) | 2010-09-09 |
JP5081916B2 true JP5081916B2 (ja) | 2012-11-28 |
Family
ID=39136483
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009526640A Active JP5081916B2 (ja) | 2006-08-29 | 2007-08-22 | ナノファイバーを含む多孔質基体、製品、システム及び組成物並びにその使用及び製造方法 |
Country Status (3)
Country | Link |
---|---|
US (3) | US20110039690A1 (ja) |
JP (1) | JP5081916B2 (ja) |
WO (1) | WO2008027265A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200125802A (ko) * | 2019-04-25 | 2020-11-05 | (주)엘지하우시스 | 창호용 필터 및 이의 제조 방법 |
Families Citing this family (101)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7854756B2 (en) * | 2004-01-22 | 2010-12-21 | Boston Scientific Scimed, Inc. | Medical devices |
US20110039690A1 (en) | 2004-02-02 | 2011-02-17 | Nanosys, Inc. | Porous substrates, articles, systems and compositions comprising nanofibers and methods of their use and production |
GB0601319D0 (en) | 2006-01-23 | 2006-03-01 | Imp Innovations Ltd | A method of fabricating pillars composed of silicon-based material |
GB0709165D0 (en) | 2007-05-11 | 2007-06-20 | Nexeon Ltd | A silicon anode for a rechargeable battery |
GB0713898D0 (en) | 2007-07-17 | 2007-08-29 | Nexeon Ltd | A method of fabricating structured particles composed of silcon or a silicon-based material and their use in lithium rechargeable batteries |
EP3476368B1 (en) * | 2008-06-06 | 2020-01-01 | Edwards Lifesciences Corporation | Low profile transcatheter heart valve |
US20110049045A1 (en) * | 2008-10-07 | 2011-03-03 | Brown University | Nanostructured sorbent materials for capturing environmental mercury vapor |
DE102008058400A1 (de) * | 2008-11-21 | 2010-05-27 | Istituto Italiano Di Tecnologia | Nanodrähte auf Substratoberflächen, Verfahren zu deren Herstellung sowie deren Verwendung |
GB2467928A (en) * | 2009-02-19 | 2010-08-25 | Amit Kumar Roy | Inorganic Fibre Coating by Atomic Layer Deposition |
FR2944783B1 (fr) * | 2009-04-28 | 2011-06-03 | Commissariat Energie Atomique | Procede d'elaboration de nanofils de silicium et/ou de germanium. |
ES2910086T3 (es) | 2009-05-19 | 2022-05-11 | Oned Mat Inc | Materiales nanoestructurados para aplicaciones de batería |
KR101636907B1 (ko) * | 2009-12-08 | 2016-07-07 | 삼성전자주식회사 | 다공성 나노 구조체 및 그 제조 방법 |
US20110265862A1 (en) | 2010-04-29 | 2011-11-03 | Donald James Highgate | Photovoltaic cell containing a polymer electrolyte |
CA2800142C (en) | 2010-05-24 | 2018-06-05 | Siluria Technologies, Inc. | Nanowire catalysts |
US8349761B2 (en) * | 2010-07-27 | 2013-01-08 | Toyota Motor Engineering & Manufacturing North America, Inc. | Dual-oxide sinter resistant catalyst |
KR101765243B1 (ko) * | 2010-09-03 | 2017-08-07 | 삼성전자주식회사 | 반도체 나노 결정-고분자 복합체 섬유 및 이의 제조방법 |
FI20106086A0 (fi) * | 2010-10-21 | 2010-10-21 | Oulun Yliopisto | Fotokatalyyttinen materiaali |
DE102010062726A1 (de) * | 2010-12-09 | 2012-06-14 | Robert Bosch Gmbh | Natriumionenleiter auf Natriumtitanatbasis |
US8932898B2 (en) | 2011-01-14 | 2015-01-13 | The Board Of Trustees Of The Leland Stanford Junior Univerity | Deposition and post-processing techniques for transparent conductive films |
EP2694196B1 (en) | 2011-04-01 | 2021-07-21 | EMD Millipore Corporation | Nanofiber containing composite structures |
US8961599B2 (en) | 2011-04-01 | 2015-02-24 | W. L. Gore & Associates, Inc. | Durable high strength polymer composite suitable for implant and articles produced therefrom |
US9744033B2 (en) | 2011-04-01 | 2017-08-29 | W.L. Gore & Associates, Inc. | Elastomeric leaflet for prosthetic heart valves |
US9554900B2 (en) * | 2011-04-01 | 2017-01-31 | W. L. Gore & Associates, Inc. | Durable high strength polymer composites suitable for implant and articles produced therefrom |
US8945212B2 (en) | 2011-04-01 | 2015-02-03 | W. L. Gore & Associates, Inc. | Durable multi-layer high strength polymer composite suitable for implant and articles produced therefrom |
US20130197631A1 (en) | 2011-04-01 | 2013-08-01 | W. L. Gore & Associates, Inc. | Durable multi-layer high strength polymer composite suitable for implant and articles produced therefrom |
US9801712B2 (en) * | 2011-04-01 | 2017-10-31 | W. L. Gore & Associates, Inc. | Coherent single layer high strength synthetic polymer composites for prosthetic valves |
EP2517788B1 (en) * | 2011-04-27 | 2017-11-22 | King Abdulaziz City for Science & Technology (KACST) | Synthesizing and utilizing novel ruthenium nanoparticle-activated charcoal-nano-zinc oxide composite catalyst |
EP3702028A1 (en) | 2011-05-24 | 2020-09-02 | Siluria Technologies, Inc. | Catalysts for petrochemical catalysis |
GB2492167C (en) | 2011-06-24 | 2018-12-05 | Nexeon Ltd | Structured particles |
JP6142362B2 (ja) | 2011-07-26 | 2017-06-07 | ワンディー マテリアル エルエルシー | ナノ構造化電池活性物質およびその生成方法 |
US9554806B2 (en) | 2011-09-16 | 2017-01-31 | W. L. Gore & Associates, Inc. | Occlusive devices |
WO2013082318A2 (en) | 2011-11-29 | 2013-06-06 | Siluria Technologies, Inc. | Nanowire catalysts and methods for their use and preparation |
KR20140128379A (ko) | 2012-01-30 | 2014-11-05 | 넥세온 엘티디 | 에스아이/씨 전기활성 물질의 조성물 |
US9446397B2 (en) * | 2012-02-03 | 2016-09-20 | Siluria Technologies, Inc. | Method for isolation of nanomaterials |
GB2499984B (en) | 2012-02-28 | 2014-08-06 | Nexeon Ltd | Composite particles comprising a removable filler |
WO2013163208A1 (en) * | 2012-04-23 | 2013-10-31 | Mazyck David W | Helmet air purification system |
EP2855011A2 (en) | 2012-05-24 | 2015-04-08 | Siluria Technologies, Inc. | Catalytic forms and formulations |
GB2502625B (en) | 2012-06-06 | 2015-07-29 | Nexeon Ltd | Method of forming silicon |
CN104487864B (zh) | 2012-08-27 | 2017-06-23 | 伊莱克斯公司 | 机器人定位系统 |
GB2507535B (en) | 2012-11-02 | 2015-07-15 | Nexeon Ltd | Multilayer electrode |
US20160008783A1 (en) * | 2013-02-15 | 2016-01-14 | Empire Technology Development Llc | Photocatalytic degradation of sugar |
US20140274671A1 (en) | 2013-03-15 | 2014-09-18 | Siluria Technologies, Inc. | Catalysts for petrochemical catalysis |
CN105101855A (zh) | 2013-04-15 | 2015-11-25 | 伊莱克斯公司 | 具有伸出的侧刷的机器人真空吸尘器 |
WO2014169943A1 (en) | 2013-04-15 | 2014-10-23 | Aktiebolaget Electrolux | Robotic vacuum cleaner |
US11911258B2 (en) | 2013-06-26 | 2024-02-27 | W. L. Gore & Associates, Inc. | Space filling devices |
US20150001156A1 (en) * | 2013-06-26 | 2015-01-01 | Corning Incorporated | Methods and apparatus for treatment of liquids containing contaminants using zero valent nanoparticles |
EP3071403A4 (en) * | 2013-11-20 | 2017-07-05 | Kimberly-Clark Worldwide, Inc. | Eyewear containing a porous polymeric material |
US9811089B2 (en) | 2013-12-19 | 2017-11-07 | Aktiebolaget Electrolux | Robotic cleaning device with perimeter recording function |
CN105744872B (zh) | 2013-12-19 | 2020-01-14 | 伊莱克斯公司 | 旋转侧刷的自适应速度控制 |
EP3082544B1 (en) | 2013-12-19 | 2020-10-07 | Aktiebolaget Electrolux | Robotic vacuum cleaner with side brush moving in spiral pattern |
WO2015090397A1 (en) | 2013-12-19 | 2015-06-25 | Aktiebolaget Electrolux | Robotic cleaning device |
US10617271B2 (en) | 2013-12-19 | 2020-04-14 | Aktiebolaget Electrolux | Robotic cleaning device and method for landmark recognition |
EP3082542B1 (en) | 2013-12-19 | 2018-11-28 | Aktiebolaget Electrolux | Sensing climb of obstacle of a robotic cleaning device |
EP3084539B1 (en) | 2013-12-19 | 2019-02-20 | Aktiebolaget Electrolux | Prioritizing cleaning areas |
US10231591B2 (en) | 2013-12-20 | 2019-03-19 | Aktiebolaget Electrolux | Dust container |
KR101567203B1 (ko) | 2014-04-09 | 2015-11-09 | (주)오렌지파워 | 이차 전지용 음극 활물질 및 이의 방법 |
KR101604352B1 (ko) | 2014-04-22 | 2016-03-18 | (주)오렌지파워 | 음극 활물질 및 이를 포함하는 리튬 이차 전지 |
WO2015168601A2 (en) | 2014-05-02 | 2015-11-05 | Siluria Technologies, Inc. | Heterogeneous catalysts |
JP7182758B2 (ja) | 2014-05-12 | 2022-12-05 | アンプリウス テクノロジーズ インコーポレイテッド | リチウムバッテリのためのアノードおよびその製造方法 |
CN106415423B (zh) | 2014-07-10 | 2021-01-01 | 伊莱克斯公司 | 用于检测机器人清洁装置的测量误差的方法 |
WO2016037635A1 (en) | 2014-09-08 | 2016-03-17 | Aktiebolaget Electrolux | Robotic vacuum cleaner |
US10729297B2 (en) | 2014-09-08 | 2020-08-04 | Aktiebolaget Electrolux | Robotic vacuum cleaner |
CA3192508A1 (en) | 2014-09-17 | 2016-03-24 | Lummus Technology Llc | Catalysts for oxidative coupling of methane and oxidative dehydrogenation of ethane |
US9942979B2 (en) * | 2014-11-03 | 2018-04-10 | Samsung Electronics Co., Ltd. | Flexible printed circuit board |
WO2016091291A1 (en) | 2014-12-10 | 2016-06-16 | Aktiebolaget Electrolux | Using laser sensor for floor type detection |
CN114668335A (zh) | 2014-12-12 | 2022-06-28 | 伊莱克斯公司 | 侧刷和机器人吸尘器 |
GB2533161C (en) | 2014-12-12 | 2019-07-24 | Nexeon Ltd | Electrodes for metal-ion batteries |
CN107003669B (zh) | 2014-12-16 | 2023-01-31 | 伊莱克斯公司 | 用于机器人清洁设备的基于经验的路标 |
EP3234713B1 (en) | 2014-12-16 | 2022-06-15 | Aktiebolaget Electrolux | Cleaning method for a robotic cleaning device |
US11099554B2 (en) | 2015-04-17 | 2021-08-24 | Aktiebolaget Electrolux | Robotic cleaning device and a method of controlling the robotic cleaning device |
KR102140862B1 (ko) | 2015-05-14 | 2020-08-03 | 더블유.엘. 고어 앤드 어소시에이트스, 인코포레이티드 | 심방이의 폐색을 위한 디바이스 및 방법 |
JP6736831B2 (ja) | 2015-09-03 | 2020-08-05 | アクチエボラゲット エレクトロルックス | ロボット清掃デバイスのシステム、清掃デバイスを制御する方法、コンピュータプログラム及びコンピュータプログラム製品 |
GB2548156A (en) * | 2016-03-11 | 2017-09-13 | Paul James Bishop Ip Holdings Ltd | Improvements in or relating to a visible flexible facing layer |
KR102588486B1 (ko) | 2016-03-15 | 2023-10-11 | 에이비 엘렉트로룩스 | 로봇 청소 장치 및 로봇 청소 장치에서의 절벽 검출 실시 방법 |
TW201806911A (zh) * | 2016-04-27 | 2018-03-01 | 維蘇威克魯什伯公司 | 輕量陶瓷隔熱材料 |
CN109689366B (zh) | 2016-05-05 | 2022-12-02 | 西南研究院 | 用于细胞扩增和相关应用的三维生物反应器 |
WO2017194102A1 (en) | 2016-05-11 | 2017-11-16 | Aktiebolaget Electrolux | Robotic cleaning device |
RU2624216C1 (ru) * | 2016-06-02 | 2017-07-03 | Федеральное государственное бюджетное учреждение науки Институт катализа им. Г.К. Борескова Сибирского отделения Российской академии наук (ИК СО РАН) | Микроволокнистый носитель для катализаторов и способ его приготовления |
CN107473434B (zh) * | 2016-06-07 | 2023-12-22 | 苏州苏瑞膜纳米科技有限公司 | 流体处理装置及其制备方法 |
KR102413416B1 (ko) | 2016-06-14 | 2022-06-27 | 넥세온 엘티디 | 금속-이온 전지들용 전극들 |
DK3778471T3 (da) | 2016-07-15 | 2022-05-23 | Oned Mat Inc | Fremstillingsfremgangsmåde til fremstilling af siliciumnanowirer på carbonbaserede pulvere til anvendelse i batterier |
KR102249076B1 (ko) * | 2016-07-27 | 2021-05-06 | 이프로 디벨롭먼트 리미티드 | 실리콘 나노입자의 제조 향상 및 그 용도 |
CN108072683B (zh) * | 2016-11-10 | 2021-04-23 | 元太科技工业股份有限公司 | 感测元件及其形成方法 |
US10543441B2 (en) | 2016-12-15 | 2020-01-28 | Hollingsworth & Vose Company | Filter media including adhesives and/or oleophobic properties |
US11474533B2 (en) | 2017-06-02 | 2022-10-18 | Aktiebolaget Electrolux | Method of detecting a difference in level of a surface in front of a robotic cleaning device |
US10856591B2 (en) * | 2017-08-29 | 2020-12-08 | To2M Corporation | Breathable mask capable of transmitting sound |
EP3687357A1 (en) | 2017-09-26 | 2020-08-05 | Aktiebolaget Electrolux | Controlling movement of a robotic cleaning device |
US11173023B2 (en) | 2017-10-16 | 2021-11-16 | W. L. Gore & Associates, Inc. | Medical devices and anchors therefor |
US11124901B2 (en) | 2017-11-27 | 2021-09-21 | First Step Holdings, Llc | Composite fabric, method for forming composite fabric, and use of a composite matter fabric |
US11149244B2 (en) | 2018-04-04 | 2021-10-19 | Southwest Research Institute | Three-dimensional bioreactor for T-cell activation and expansion for immunotherapy |
US20210106711A1 (en) * | 2018-04-18 | 2021-04-15 | Virginia Commonwealth University Intellectual Property Foundation | Iron oxide nanowires based filter for the inactivation of pathogens |
ES2927778T3 (es) * | 2018-05-25 | 2022-11-10 | Carbonx Ip 5 B V | Uso de redes de carbono que comprenden nanofibras de carbono |
WO2019241223A1 (en) * | 2018-06-11 | 2019-12-19 | The Regents Of The University Of Colorado, A Body Corporate | Single and multi-layer mesh structures for enhanced thermal transport |
KR101971645B1 (ko) * | 2018-06-29 | 2019-04-23 | 한국기계연구원 | 플레이크 형상의 분말 코팅층을 포함하는 필터 및 이의 제조방법 |
GB2575307B (en) * | 2018-07-05 | 2022-11-23 | Paul James Bishop Ip Holdings Ltd | Building-wall flexible cladding |
US11447731B2 (en) | 2018-09-24 | 2022-09-20 | Southwest Research Institute | Three-dimensional bioreactors |
US11554550B2 (en) * | 2019-12-02 | 2023-01-17 | The Boeing Company | Methods for forming strengthened additive manufacturing materials and strengthened filaments for use |
CN111359307A (zh) * | 2020-03-31 | 2020-07-03 | 青岛澳波环保科技有限责任公司 | 一种油品处理用吸水过滤材料、制备方法及其应用 |
US10994387B1 (en) * | 2020-09-09 | 2021-05-04 | King Abdulaziz University | Fabrication of flexible conductive films, with semiconductive material, formed with rubbing-in technology for elastic or deformable devices |
US11470892B1 (en) * | 2021-11-18 | 2022-10-18 | King Abdulaziz University | Antimicrobial metal nanoparticle mesh air filter |
CN115504678B (zh) * | 2022-11-03 | 2023-09-29 | 业泓科技(成都)有限公司 | 触控识别模组的减薄方法 |
Family Cites Families (188)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1203283A (en) * | 1967-06-26 | 1970-08-26 | Ici Ltd | Synthetic polyamide compositions |
US3651030A (en) * | 1968-07-05 | 1972-03-21 | Amicon Corp | Process for making a membrane |
JPS62299569A (ja) | 1986-06-19 | 1987-12-26 | 株式会社豊田中央研究所 | 複合材料用繊維体とその製造方法 |
JPS63286327A (ja) | 1987-05-19 | 1988-11-24 | Asahi Chem Ind Co Ltd | 長繊維、炭素質ウィスカ−含有複合材 |
GB2206572B (en) * | 1987-06-26 | 1991-07-31 | Tokai Carbon Kk | Surface-coated sic whiskers, processes for preparing the same, ceramic reinforced with the same, and process for preparing said reinforced ceramic |
DE3726076C1 (de) * | 1987-08-06 | 1989-03-09 | Thyssen Edelstahlwerke Ag | Filterkoerper zum Ausfiltrieren von Feststoffpartikeln mit Durchmessern ueberwiegend kleiner als 5 mum aus stroemenden Fluiden und Verfahren zu seiner Herstellung |
US5226913A (en) * | 1988-09-01 | 1993-07-13 | Corvita Corporation | Method of making a radially expandable prosthesis |
JPH04270199A (ja) * | 1991-02-25 | 1992-09-25 | Tokai Carbon Co Ltd | 炭化珪素ウイスカーの製造方法 |
US5332910A (en) * | 1991-03-22 | 1994-07-26 | Hitachi, Ltd. | Semiconductor optical device with nanowhiskers |
US5196396A (en) * | 1991-07-16 | 1993-03-23 | The President And Fellows Of Harvard College | Method of making a superconducting fullerene composition by reacting a fullerene with an alloy containing alkali metal |
US5274602A (en) * | 1991-10-22 | 1993-12-28 | Florida Atlantic University | Large capacity solid-state memory |
US5505928A (en) * | 1991-11-22 | 1996-04-09 | The Regents Of University Of California | Preparation of III-V semiconductor nanocrystals |
WO1993010564A1 (en) * | 1991-11-22 | 1993-05-27 | The Regents Of The University Of California | Semiconductor nanocrystals covalently bound to solid inorganic surfaces using self-assembled monolayers |
US5252835A (en) * | 1992-07-17 | 1993-10-12 | President And Trustees Of Harvard College | Machining oxide thin-films with an atomic force microscope: pattern and object formation on the nanometer scale |
US5338430A (en) * | 1992-12-23 | 1994-08-16 | Minnesota Mining And Manufacturing Company | Nanostructured electrode membranes |
US6048616A (en) * | 1993-04-21 | 2000-04-11 | Philips Electronics N.A. Corp. | Encapsulated quantum sized doped semiconductor particles and method of manufacturing same |
AU8070294A (en) * | 1993-07-15 | 1995-02-13 | President And Fellows Of Harvard College | Extended nitride material comprising beta -c3n4 |
US5962863A (en) * | 1993-09-09 | 1999-10-05 | The United States Of America As Represented By The Secretary Of The Navy | Laterally disposed nanostructures of silicon on an insulating substrate |
US5512131A (en) * | 1993-10-04 | 1996-04-30 | President And Fellows Of Harvard College | Formation of microstamped patterns on surfaces and derivative articles |
US20030044777A1 (en) * | 1993-10-28 | 2003-03-06 | Kenneth L. Beattie | Flowthrough devices for multiple discrete binding reactions |
JP3613486B2 (ja) * | 1995-02-23 | 2005-01-26 | 大倉工業株式会社 | 炭化珪素ウイスカーの製造方法 |
EP0812434B1 (en) | 1995-03-01 | 2013-09-18 | President and Fellows of Harvard College | Microcontact printing on surfaces and derivative articles |
US5814031A (en) * | 1995-03-02 | 1998-09-29 | Mooney; Mark | Structured occllusive dressings |
US5674592A (en) * | 1995-05-04 | 1997-10-07 | Minnesota Mining And Manufacturing Company | Functionalized nanostructured films |
US6190634B1 (en) * | 1995-06-07 | 2001-02-20 | President And Fellows Of Harvard College | Carbide nanomaterials |
US5690807A (en) * | 1995-08-03 | 1997-11-25 | Massachusetts Institute Of Technology | Method for producing semiconductor particles |
GB9611437D0 (en) | 1995-08-03 | 1996-08-07 | Secr Defence | Biomaterial |
JP3478012B2 (ja) * | 1995-09-29 | 2003-12-10 | ソニー株式会社 | 薄膜半導体装置の製造方法 |
US5869405A (en) * | 1996-01-03 | 1999-02-09 | Micron Technology, Inc. | In situ rapid thermal etch and rapid thermal oxidation |
US6036774A (en) * | 1996-02-26 | 2000-03-14 | President And Fellows Of Harvard College | Method of producing metal oxide nanorods |
US5897945A (en) * | 1996-02-26 | 1999-04-27 | President And Fellows Of Harvard College | Metal oxide nanorods |
EP0792688A1 (en) * | 1996-03-01 | 1997-09-03 | Dow Corning Corporation | Nanoparticles of silicon oxide alloys |
US5800706A (en) * | 1996-03-06 | 1998-09-01 | Hyperion Catalysis International, Inc. | Nanofiber packed beds having enhanced fluid flow characteristics |
US5640343A (en) * | 1996-03-18 | 1997-06-17 | International Business Machines Corporation | Magnetic memory array using magnetic tunnel junction devices in the memory cells |
JPH10106960A (ja) * | 1996-09-25 | 1998-04-24 | Sony Corp | 量子細線の製造方法 |
US5976957A (en) | 1996-10-28 | 1999-11-02 | Sony Corporation | Method of making silicon quantum wires on a substrate |
US7285422B1 (en) * | 1997-01-23 | 2007-10-23 | Sequenom, Inc. | Systems and methods for preparing and analyzing low volume analyte array elements |
US5997832A (en) * | 1997-03-07 | 1999-12-07 | President And Fellows Of Harvard College | Preparation of carbide nanorods |
US5850064A (en) | 1997-04-11 | 1998-12-15 | Starfire Electronics Development & Marketing, Ltd. | Method for photolytic liquid phase synthesis of silicon and germanium nanocrystalline materials |
US6413489B1 (en) * | 1997-04-15 | 2002-07-02 | Massachusetts Institute Of Technology | Synthesis of nanometer-sized particles by reverse micelle mediated techniques |
US6231744B1 (en) | 1997-04-24 | 2001-05-15 | Massachusetts Institute Of Technology | Process for fabricating an array of nanowires |
US6106913A (en) | 1997-10-10 | 2000-08-22 | Quantum Group, Inc | Fibrous structures containing nanofibrils and other textile fibers |
AU1075699A (en) | 1997-10-10 | 1999-05-03 | Allegheny Health, Education And Research Foundation | Hybrid nanofibril matrices for use as tissue engineering devices |
US5879827A (en) * | 1997-10-10 | 1999-03-09 | Minnesota Mining And Manufacturing Company | Catalyst for membrane electrode assembly and method of making |
US6004444A (en) * | 1997-11-05 | 1999-12-21 | The Trustees Of Princeton University | Biomimetic pathways for assembling inorganic thin films and oriented mesoscopic silicate patterns through guided growth |
US6322901B1 (en) * | 1997-11-13 | 2001-11-27 | Massachusetts Institute Of Technology | Highly luminescent color-selective nano-crystalline materials |
US5990479A (en) * | 1997-11-25 | 1999-11-23 | Regents Of The University Of California | Organo Luminescent semiconductor nanocrystal probes for biological applications and process for making and using such probes |
EP1054607A4 (en) | 1998-02-12 | 2004-02-25 | Univ Michigan State | MICROCLOSURE AND METHOD FOR THE PRODUCTION THEREOF |
US7181811B1 (en) | 1998-02-12 | 2007-02-27 | Board Of Trustees Operating Michigan State University | Micro-fastening system and method of manufacture |
US6265333B1 (en) | 1998-06-02 | 2001-07-24 | Board Of Regents, University Of Nebraska-Lincoln | Delamination resistant composites prepared by small diameter fiber reinforcement at ply interfaces |
US6159742A (en) * | 1998-06-05 | 2000-12-12 | President And Fellows Of Harvard College | Nanometer-scale microscopy probes |
US7416699B2 (en) * | 1998-08-14 | 2008-08-26 | The Board Of Trustees Of The Leland Stanford Junior University | Carbon nanotube devices |
US6235675B1 (en) * | 1998-09-22 | 2001-05-22 | Idaho Research Foundation, Inc. | Methods of forming materials containing carbon and boron, methods of forming catalysts, filaments comprising boron and carbon, and catalysts |
US6630231B2 (en) * | 1999-02-05 | 2003-10-07 | 3M Innovative Properties Company | Composite articles reinforced with highly oriented microfibers |
US6155432A (en) * | 1999-02-05 | 2000-12-05 | Hitco Carbon Composites, Inc. | High performance filters based on inorganic fibers and inorganic fiber whiskers |
US20020090725A1 (en) | 2000-11-17 | 2002-07-11 | Simpson David G. | Electroprocessed collagen |
US6256767B1 (en) * | 1999-03-29 | 2001-07-03 | Hewlett-Packard Company | Demultiplexer for a molecular wire crossbar network (MWCN DEMUX) |
JP3211203B2 (ja) | 1999-03-29 | 2001-09-25 | 川崎重工業株式会社 | 高強度繊維強化複合材料及びその製造方法 |
US6128214A (en) * | 1999-03-29 | 2000-10-03 | Hewlett-Packard | Molecular wire crossbar memory |
US7112315B2 (en) * | 1999-04-14 | 2006-09-26 | The Regents Of The University Of California | Molecular nanowires from single walled carbon nanotubes |
DE19921088C2 (de) | 1999-04-30 | 2003-08-07 | Magforce Applic Gmbh | Stent zur Offenhaltung gangartiger Strukturen |
US6313015B1 (en) | 1999-06-08 | 2001-11-06 | City University Of Hong Kong | Growth method for silicon nanowires and nanoparticle chains from silicon monoxide |
US6815218B1 (en) | 1999-06-09 | 2004-11-09 | Massachusetts Institute Of Technology | Methods for manufacturing bioelectronic devices |
US6270347B1 (en) | 1999-06-10 | 2001-08-07 | Rensselaer Polytechnic Institute | Nanostructured ceramics and composite materials for orthopaedic-dental implants |
US7132161B2 (en) * | 1999-06-14 | 2006-11-07 | Energy Science Laboratories, Inc. | Fiber adhesive material |
WO2001003208A1 (en) * | 1999-07-02 | 2001-01-11 | President And Fellows Of Harvard College | Nanoscopic wire-based devices, arrays, and methods of their manufacture |
DE10023456A1 (de) | 1999-07-29 | 2001-02-01 | Creavis Tech & Innovation Gmbh | Meso- und Nanoröhren |
WO2001008781A2 (en) | 1999-07-30 | 2001-02-08 | Donaldson Company, Inc. | Cellulose based filter media and cartridge apparatus |
US6438025B1 (en) * | 1999-09-08 | 2002-08-20 | Sergei Skarupo | Magnetic memory device |
US6286226B1 (en) | 1999-09-24 | 2001-09-11 | Agere Systems Guardian Corp. | Tactile sensor comprising nanowires and method for making the same |
US6340822B1 (en) * | 1999-10-05 | 2002-01-22 | Agere Systems Guardian Corp. | Article comprising vertically nano-interconnected circuit devices and method for making the same |
US6741019B1 (en) * | 1999-10-18 | 2004-05-25 | Agere Systems, Inc. | Article comprising aligned nanowires |
US7195780B2 (en) | 2002-10-21 | 2007-03-27 | University Of Florida | Nanoparticle delivery system |
RU2173003C2 (ru) * | 1999-11-25 | 2001-08-27 | Септре Электроникс Лимитед | Способ образования кремниевой наноструктуры, решетки кремниевых квантовых проводков и основанных на них устройств |
US6737160B1 (en) | 1999-12-20 | 2004-05-18 | The Regents Of The University Of California | Adhesive microstructure and method of forming same |
US6248674B1 (en) * | 2000-02-02 | 2001-06-19 | Hewlett-Packard Company | Method of aligning nanowires |
US6225198B1 (en) * | 2000-02-04 | 2001-05-01 | The Regents Of The University Of California | Process for forming shaped group II-VI semiconductor nanocrystals, and product formed using process |
US6306736B1 (en) * | 2000-02-04 | 2001-10-23 | The Regents Of The University Of California | Process for forming shaped group III-V semiconductor nanocrystals, and product formed using process |
US7335603B2 (en) * | 2000-02-07 | 2008-02-26 | Vladimir Mancevski | System and method for fabricating logic devices comprising carbon nanotube transistors |
US6360736B1 (en) | 2000-02-18 | 2002-03-26 | Yung Che Cheng | Air gun firing system |
KR20020006708A (ko) | 2000-03-08 | 2002-01-24 | 요시카즈 나카야마 | 나노핀셋 및 나노매니퓰레이터 |
CN100506293C (zh) | 2000-03-15 | 2009-07-01 | 祥丰医疗有限公司 | 促进内皮细胞粘附的涂层 |
US20030229393A1 (en) | 2001-03-15 | 2003-12-11 | Kutryk Michael J. B. | Medical device with coating that promotes cell adherence and differentiation |
US6720240B2 (en) | 2000-03-29 | 2004-04-13 | Georgia Tech Research Corporation | Silicon based nanospheres and nanowires |
JP2001288626A (ja) | 2000-04-03 | 2001-10-19 | Nissan Motor Co Ltd | カーボンナノ繊維固着体の製造方法 |
AU2001253442A1 (en) | 2000-04-14 | 2001-10-30 | Claus, Richard O | Self-assembled thin film coating to enhance the biocompatibility of materials |
US6471761B2 (en) * | 2000-04-21 | 2002-10-29 | University Of New Mexico | Prototyping of patterned functional nanostructures |
KR100360476B1 (ko) * | 2000-06-27 | 2002-11-08 | 삼성전자 주식회사 | 탄소나노튜브를 이용한 나노 크기 수직 트랜지스터 및 그제조방법 |
US6723606B2 (en) * | 2000-06-29 | 2004-04-20 | California Institute Of Technology | Aerosol process for fabricating discontinuous floating gate microelectronic devices |
EP1299914B1 (de) | 2000-07-04 | 2008-04-02 | Qimonda AG | Feldeffekttransistor |
CN1251962C (zh) * | 2000-07-18 | 2006-04-19 | Lg电子株式会社 | 水平生长碳纳米管的方法和使用碳纳米管的场效应晶体管 |
US6447663B1 (en) * | 2000-08-01 | 2002-09-10 | Ut-Battelle, Llc | Programmable nanometer-scale electrolytic metal deposition and depletion |
TWI294636B (en) * | 2000-08-22 | 2008-03-11 | Harvard College | Doped elongated semiconductor articles, growing such articles, devices including such articles and fabricating such devices |
US7301199B2 (en) * | 2000-08-22 | 2007-11-27 | President And Fellows Of Harvard College | Nanoscale wires and related devices |
WO2002016089A2 (en) | 2000-08-25 | 2002-02-28 | Danmarks Tekniske Universitet | Fabrication and application of nano-manipulators with induced growth |
US6673136B2 (en) * | 2000-09-05 | 2004-01-06 | Donaldson Company, Inc. | Air filtration arrangements having fluted media constructions and methods |
US6495258B1 (en) * | 2000-09-20 | 2002-12-17 | Auburn University | Structures with high number density of carbon nanotubes and 3-dimensional distribution |
AU2001294876A1 (en) | 2000-09-29 | 2002-04-08 | President And Fellows Of Harvard College | Direct growth of nanotubes, and their use in nanotweezers |
AU2002229046B2 (en) * | 2000-12-11 | 2006-05-18 | President And Fellows Of Harvard College | Nanosensors |
FR2819108B1 (fr) * | 2000-12-29 | 2003-01-31 | Commissariat Energie Atomique | Element de base composite et son joint pour pile a combustible et procede de fabrication de l'ensemble |
WO2002079514A1 (en) | 2001-01-10 | 2002-10-10 | The Trustees Of Boston College | Dna-bridged carbon nanotube arrays |
JP2002220300A (ja) | 2001-01-18 | 2002-08-09 | Vision Arts Kk | ナノファイバーおよびナノファイバーの作製方法 |
EP1362367A2 (en) * | 2001-01-23 | 2003-11-19 | Quantum Polymer Technologies, Inc. | Conductive polymer materials and methods for their manufacture and use |
AU2002251946A1 (en) * | 2001-02-14 | 2002-08-28 | Science And Technology Corporation @ Unm | Nanostructured devices for separation and analysis |
US6593065B2 (en) * | 2001-03-12 | 2003-07-15 | California Institute Of Technology | Method of fabricating nanometer-scale flowchannels and trenches with self-aligned electrodes and the structures formed by the same |
CA2451882A1 (en) * | 2001-03-14 | 2002-09-19 | University Of Massachusetts | Nanofabrication |
US6709622B2 (en) | 2001-03-23 | 2004-03-23 | Romain Billiet | Porous nanostructures and method of fabrication thereof |
MXPA03008935A (es) * | 2001-03-30 | 2004-06-30 | Univ California | Metodos de fabricacion de nanoestructuras y nanocables y dispositivos fabricados a partir de ellos. |
WO2002081372A2 (en) * | 2001-04-06 | 2002-10-17 | Carnegie Mellon University | A process for the preparation of nanostructured materials |
US7232460B2 (en) | 2001-04-25 | 2007-06-19 | Xillus, Inc. | Nanodevices, microdevices and sensors on in-vivo structures and method for the same |
US7084507B2 (en) * | 2001-05-02 | 2006-08-01 | Fujitsu Limited | Integrated circuit device and method of producing the same |
US6858455B2 (en) | 2001-05-25 | 2005-02-22 | Ut-Battelle, Llc | Gated fabrication of nanostructure field emission cathode material within a device |
US6896864B2 (en) * | 2001-07-10 | 2005-05-24 | Battelle Memorial Institute | Spatial localization of dispersed single walled carbon nanotubes into useful structures |
US20040009598A1 (en) | 2001-07-11 | 2004-01-15 | Hench Larry L | Use of bioactive glass compositions to stimulate osteoblast production |
US6670179B1 (en) | 2001-08-01 | 2003-12-30 | University Of Kentucky Research Foundation | Molecular functionalization of carbon nanotubes and use as substrates for neuronal growth |
NZ513637A (en) | 2001-08-20 | 2004-02-27 | Canterprise Ltd | Nanoscale electronic devices & fabrication methods |
EP1423861A1 (en) * | 2001-08-30 | 2004-06-02 | Koninklijke Philips Electronics N.V. | Magnetoresistive device and electronic device |
US20030059742A1 (en) | 2001-09-24 | 2003-03-27 | Webster Thomas J. | Osteointegration device and method |
JP2005503865A (ja) | 2001-09-28 | 2005-02-10 | ボストン サイエンティフィック リミテッド | ナノ材料からなる医療デバイス及びそれを利用した治療方法 |
US20030072942A1 (en) * | 2001-10-17 | 2003-04-17 | Industrial Technology Research Institute | Combinative carbon material |
US6773616B1 (en) | 2001-11-13 | 2004-08-10 | Hewlett-Packard Development Company, L.P. | Formation of nanoscale wires |
US20040005258A1 (en) * | 2001-12-12 | 2004-01-08 | Fonash Stephen J. | Chemical reactor templates: sacrificial layer fabrication and template use |
GB0130608D0 (en) | 2001-12-21 | 2002-02-06 | Psimedica Ltd | Medical fibres and fabrics |
US7335271B2 (en) | 2002-01-02 | 2008-02-26 | Lewis & Clark College | Adhesive microstructure and method of forming same |
WO2003063208A2 (en) * | 2002-01-18 | 2003-07-31 | California Institute Of Technology | Array-based architecture for molecular electronics |
US6746597B2 (en) * | 2002-01-31 | 2004-06-08 | Hydrocarbon Technologies, Inc. | Supported noble metal nanometer catalyst particles containing controlled (111) crystal face exposure |
JP3972674B2 (ja) | 2002-02-14 | 2007-09-05 | 東レ株式会社 | 炭素繊維その製造方法および炭素繊維強化樹脂組成物 |
FR2836280B1 (fr) * | 2002-02-19 | 2004-04-02 | Commissariat Energie Atomique | Structure de cathode a couche emissive formee sur une couche resistive |
US7049625B2 (en) * | 2002-03-18 | 2006-05-23 | Max-Planck-Gesellschaft Zur Fonderung Der Wissenschaften E.V. | Field effect transistor memory cell, memory device and method for manufacturing a field effect transistor memory cell |
US7147894B2 (en) | 2002-03-25 | 2006-12-12 | The University Of North Carolina At Chapel Hill | Method for assembling nano objects |
US7863038B2 (en) | 2002-03-29 | 2011-01-04 | Board Of Regents, The University Of Texas System | Implantable biosensor from stratified nanostructured membranes |
US20040026684A1 (en) * | 2002-04-02 | 2004-02-12 | Nanosys, Inc. | Nanowire heterostructures for encoding information |
US6872645B2 (en) * | 2002-04-02 | 2005-03-29 | Nanosys, Inc. | Methods of positioning and/or orienting nanostructures |
US6831017B1 (en) | 2002-04-05 | 2004-12-14 | Integrated Nanosystems, Inc. | Catalyst patterning for nanowire devices |
US20030189202A1 (en) * | 2002-04-05 | 2003-10-09 | Jun Li | Nanowire devices and methods of fabrication |
US20050187605A1 (en) * | 2002-04-11 | 2005-08-25 | Greenhalgh Skott E. | Electrospun skin capable of controlling drug release rates and method |
US20030195611A1 (en) * | 2002-04-11 | 2003-10-16 | Greenhalgh Skott E. | Covering and method using electrospinning of very small fibers |
US6760245B2 (en) * | 2002-05-01 | 2004-07-06 | Hewlett-Packard Development Company, L.P. | Molecular wire crossbar flash memory |
US6872439B2 (en) | 2002-05-13 | 2005-03-29 | The Regents Of The University Of California | Adhesive microstructure and method of forming same |
US6815750B1 (en) | 2002-05-22 | 2004-11-09 | Hewlett-Packard Development Company, L.P. | Field effect transistor with channel extending through layers on a substrate |
DE10223234B4 (de) | 2002-05-24 | 2005-02-03 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Verfahren zur Herstellung mikrostrukturierter Oberflächen mit gesteigerter Adhäsion und adhäsionssteigernd modifizierte Oberflächen |
JP4160781B2 (ja) * | 2002-05-27 | 2008-10-08 | 三菱重工業株式会社 | 繊維状ナノ炭素の製造方法及び装置 |
US6756084B2 (en) * | 2002-05-28 | 2004-06-29 | Battelle Memorial Institute | Electrostatic deposition of particles generated from rapid expansion of supercritical fluid solutions |
JP2005527339A (ja) | 2002-05-29 | 2005-09-15 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | コンフォーマルな接触および接着のためのフィブリル状の微細構造 |
US7358121B2 (en) * | 2002-08-23 | 2008-04-15 | Intel Corporation | Tri-gate devices and methods of fabrication |
CN100584921C (zh) * | 2002-09-05 | 2010-01-27 | 奈米系统股份有限公司 | 促进电荷转移至纳米结构或自纳米结构转移出电荷的有机物 |
AU2003298998A1 (en) * | 2002-09-05 | 2004-04-08 | Nanosys, Inc. | Oriented nanostructures and methods of preparing |
TW200425530A (en) * | 2002-09-05 | 2004-11-16 | Nanosys Inc | Nanostructure and nanocomposite based compositions and photovoltaic devices |
US20040115239A1 (en) | 2002-09-20 | 2004-06-17 | Shastri Venkatram P. | Engineering of material surfaces |
US7115916B2 (en) * | 2002-09-26 | 2006-10-03 | International Business Machines Corporation | System and method for molecular optical emission |
US7135728B2 (en) | 2002-09-30 | 2006-11-14 | Nanosys, Inc. | Large-area nanoenabled macroelectronic substrates and uses therefor |
KR101043578B1 (ko) * | 2002-09-30 | 2011-06-23 | 나노시스, 인크. | 나노와이어 트랜지스터를 사용하는 집적 디스플레이 |
US7067867B2 (en) | 2002-09-30 | 2006-06-27 | Nanosys, Inc. | Large-area nonenabled macroelectronic substrates and uses therefor |
US7051945B2 (en) * | 2002-09-30 | 2006-05-30 | Nanosys, Inc | Applications of nano-enabled large area macroelectronic substrates incorporating nanowires and nanowire composites |
US7378347B2 (en) | 2002-10-28 | 2008-05-27 | Hewlett-Packard Development Company, L.P. | Method of forming catalyst nanoparticles for nanowire growth and other applications |
US20040098023A1 (en) | 2002-11-15 | 2004-05-20 | Scimed Life Systems, Inc. | Embolic device made of nanofibers |
US7163659B2 (en) | 2002-12-03 | 2007-01-16 | Hewlett-Packard Development Company, L.P. | Free-standing nanowire sensor and method for detecting an analyte in a fluid |
US20040121681A1 (en) * | 2002-12-23 | 2004-06-24 | Kimberly-Clark Worldwide, Inc. | Absorbent articles containing an activated carbon substrate |
US7211320B1 (en) * | 2003-03-07 | 2007-05-01 | Seldon Technologies, Llc | Purification of fluids with nanomaterials |
US7608147B2 (en) | 2003-04-04 | 2009-10-27 | Qunano Ab | Precisely positioned nanowhiskers and nanowhisker arrays and method for preparing them |
DE10316156B3 (de) * | 2003-04-09 | 2004-10-14 | Beiersdorf Ag | Antimikrobiell ausgerüstete Polymermaterialien und deren Verwendung als Wundauflage |
US7056409B2 (en) * | 2003-04-17 | 2006-06-06 | Nanosys, Inc. | Structures, systems and methods for joining articles and materials and uses therefor |
US7579077B2 (en) | 2003-05-05 | 2009-08-25 | Nanosys, Inc. | Nanofiber surfaces for use in enhanced surface area applications |
US7074294B2 (en) | 2003-04-17 | 2006-07-11 | Nanosys, Inc. | Structures, systems and methods for joining articles and materials and uses therefor |
US20050038498A1 (en) | 2003-04-17 | 2005-02-17 | Nanosys, Inc. | Medical device applications of nanostructured surfaces |
US20050221072A1 (en) | 2003-04-17 | 2005-10-06 | Nanosys, Inc. | Medical device applications of nanostructured surfaces |
AU2004256392B2 (en) | 2003-04-28 | 2009-10-01 | Oned Material Llc | Super-hydrophobic surfaces, methods of their construction and uses therefor |
US20050017171A1 (en) | 2003-07-08 | 2005-01-27 | Btg International Limited | Probe structures incorporating nanowhiskers, production methods thereof and methods of forming nanowhiskers |
US20050026526A1 (en) * | 2003-07-30 | 2005-02-03 | Verdegan Barry M. | High performance filter media with internal nanofiber structure and manufacturing methodology |
JP2007505991A (ja) | 2003-09-04 | 2007-03-15 | ナノシス・インク. | ナノ結晶の処理方法、並びに前記ナノ結晶を含む組成物、装置及びシステム |
US7351444B2 (en) * | 2003-09-08 | 2008-04-01 | Intematix Corporation | Low platinum fuel cell catalysts and method for preparing the same |
US7067328B2 (en) | 2003-09-25 | 2006-06-27 | Nanosys, Inc. | Methods, devices and compositions for depositing and orienting nanostructures |
US20050096509A1 (en) | 2003-11-04 | 2005-05-05 | Greg Olson | Nanotube treatments for internal medical devices |
US20050118494A1 (en) | 2003-12-01 | 2005-06-02 | Choi Sung H. | Implantable biofuel cell system based on nanostructures |
US7811272B2 (en) | 2003-12-29 | 2010-10-12 | Kimberly-Clark Worldwide, Inc. | Nanofabricated gecko-like fasteners with adhesive hairs for disposable absorbent articles |
WO2005065425A2 (en) * | 2003-12-30 | 2005-07-21 | The Regents Of The University Of California | Localized synthesis and self-assembly of nanostructures |
WO2005069955A2 (en) | 2004-01-21 | 2005-08-04 | Idaho Research Foundation, Inc. | Supercritical fluids in the formation and modification of nanostructures and nanocomposites |
US7553371B2 (en) * | 2004-02-02 | 2009-06-30 | Nanosys, Inc. | Porous substrates, articles, systems and compositions comprising nanofibers and methods of their use and production |
US20110039690A1 (en) | 2004-02-02 | 2011-02-17 | Nanosys, Inc. | Porous substrates, articles, systems and compositions comprising nanofibers and methods of their use and production |
US8025960B2 (en) | 2004-02-02 | 2011-09-27 | Nanosys, Inc. | Porous substrates, articles, systems and compositions comprising nanofibers and methods of their use and production |
JP2005219950A (ja) * | 2004-02-04 | 2005-08-18 | Nikon Corp | 炭素材料、炭素材料の製造方法、ガス吸着装置及び複合材料 |
US7057881B2 (en) | 2004-03-18 | 2006-06-06 | Nanosys, Inc | Nanofiber surface based capacitors |
US20050279274A1 (en) | 2004-04-30 | 2005-12-22 | Chunming Niu | Systems and methods for nanowire growth and manufacturing |
US7820732B2 (en) | 2004-04-30 | 2010-10-26 | Advanced Cardiovascular Systems, Inc. | Methods for modulating thermal and mechanical properties of coatings on implantable devices |
US20050260355A1 (en) | 2004-05-20 | 2005-11-24 | Jan Weber | Medical devices and methods of making the same |
US7838165B2 (en) * | 2004-07-02 | 2010-11-23 | Kabushiki Kaisha Toshiba | Carbon fiber synthesizing catalyst and method of making thereof |
CN102593466A (zh) * | 2004-12-09 | 2012-07-18 | 奈米系统股份有限公司 | 用于燃料电池的基于纳米线的膜电极组件 |
US7816031B2 (en) * | 2007-08-10 | 2010-10-19 | The Board Of Trustees Of The Leland Stanford Junior University | Nanowire battery methods and arrangements |
-
2006
- 2006-08-29 US US11/511,886 patent/US20110039690A1/en not_active Abandoned
-
2007
- 2007-08-22 WO PCT/US2007/018605 patent/WO2008027265A2/en active Application Filing
- 2007-08-22 JP JP2009526640A patent/JP5081916B2/ja active Active
-
2010
- 2010-03-01 US US12/715,126 patent/US20100173070A1/en not_active Abandoned
-
2014
- 2014-10-03 US US14/506,591 patent/US10279341B2/en active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200125802A (ko) * | 2019-04-25 | 2020-11-05 | (주)엘지하우시스 | 창호용 필터 및 이의 제조 방법 |
KR102553408B1 (ko) * | 2019-04-25 | 2023-07-11 | (주)엘엑스하우시스 | 창호용 필터 및 이의 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
US20100173070A1 (en) | 2010-07-08 |
WO2008027265A2 (en) | 2008-03-06 |
US20150140333A1 (en) | 2015-05-21 |
US20110039690A1 (en) | 2011-02-17 |
US10279341B2 (en) | 2019-05-07 |
JP2010511794A (ja) | 2010-04-15 |
WO2008027265A3 (en) | 2008-04-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5081916B2 (ja) | ナノファイバーを含む多孔質基体、製品、システム及び組成物並びにその使用及び製造方法 | |
JP5604620B2 (ja) | 基板及びシリコンナノファイバーを含む物品 | |
US7553371B2 (en) | Porous substrates, articles, systems and compositions comprising nanofibers and methods of their use and production | |
Qi et al. | Review on the improvement of the photocatalytic and antibacterial activities of ZnO | |
El-Aswar et al. | A comprehensive review on preparation, functionalization and recent applications of nanofiber membranes in wastewater treatment | |
US10434505B1 (en) | Photocatalyst | |
Cai et al. | Soft BiOBr@ TiO 2 nanofibrous membranes with hierarchical heterostructures as efficient and recyclable visible-light photocatalysts | |
Viter et al. | Enhancement of electronic and optical properties of ZnO/Al2O3 nanolaminate coated electrospun nanofibers | |
CN107794588B (zh) | 纳米复合纤维材料、纳米复合纤维材料的制造方法及口罩 | |
Li et al. | Daylight-driven rechargeable, antibacterial, filtrating micro/nanofibrous composite membranes with bead-on-string structure for medical protection | |
Chang | “Firecracker-shaped” ZnO/polyimide hybrid nanofibers via electrospinning and hydrothermal process | |
Lee et al. | Preparation of flexible zeolite‐tethering vegetable fibers | |
Wang et al. | Facile fabrication of porous ZnS and ZnO films by coaxial electrospinning for highly efficient photodegradation of organic dyes | |
Zhao et al. | Smart integration of MOFs and CQDs to fabricate defect-free and self-cleaning TFN membranes for dye removal | |
Liu et al. | One-pot in situ microwave hydrothermally grown zeolitic imidazolate framework-8 on ZnIn-layered double oxides toward enhanced methylene blue photodegradation | |
CN112900081B (zh) | 一种疏水球晶、疏水材料、疏水复合材料、Janus复合材料及其制备方法和应用 | |
Aroosh et al. | Construction of Te-ZnO@ SG-C3N4Heterojunction Nanocomposites for the Efficient Removal of Methylene Blue, Antifungal Activity, and Adsorption of Cr (VI) Ion | |
Ranjith et al. | Membrane-based electrospun poly-cyclodextrin nanofibers coated with ZnO nanograins by ALD: Ultrafiltration blended photocatalysis for degradation of organic micropollutants | |
CN110354700B (zh) | 聚合物石墨烯复合过滤膜、其制造方法及应用 | |
CN112781164B (zh) | 光催化空气净化和灭菌纤维及制造方法和应用、光催化空气净化和灭菌过滤器及制造方法 | |
Miao et al. | Hierarchically organized nanocomposites derived from low-dimensional nanomaterials for efficient removal of organic pollutants | |
Wang et al. | Functionalization of Electrospun Nanofibrous Materials | |
Shen et al. | Design principle and synthetic strategy for metal-organic framework composites | |
Mohamed | Applications of nanocomposites in environmental remediation | |
Gordano | Hybrid inorganic membranes |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100722 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100722 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20100830 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20100831 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100915 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20110623 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110802 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111102 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20111102 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120703 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120712 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120821 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120903 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150907 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5081916 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |