JP5081443B2 - 光学素子およびその製造方法、ならびに光学素子作製用複製基板およびその製造方法 - Google Patents

光学素子およびその製造方法、ならびに光学素子作製用複製基板およびその製造方法 Download PDF

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Publication number
JP5081443B2
JP5081443B2 JP2006343644A JP2006343644A JP5081443B2 JP 5081443 B2 JP5081443 B2 JP 5081443B2 JP 2006343644 A JP2006343644 A JP 2006343644A JP 2006343644 A JP2006343644 A JP 2006343644A JP 5081443 B2 JP5081443 B2 JP 5081443B2
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Japan
Prior art keywords
substrate
optical element
arrangement pitch
cone shape
quasi
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JP2006343644A
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Japanese (ja)
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JP2008158013A5 (enExample
JP2008158013A (ja
Inventor
惣銘 遠藤
透 永井
和弥 林部
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Sony Corp
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Sony Corp
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Priority to JP2006343644A priority Critical patent/JP5081443B2/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Injection Moulding Of Plastics Or The Like (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Liquid Crystal (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
JP2006343644A 2006-12-20 2006-12-20 光学素子およびその製造方法、ならびに光学素子作製用複製基板およびその製造方法 Active JP5081443B2 (ja)

Priority Applications (1)

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JP2006343644A JP5081443B2 (ja) 2006-12-20 2006-12-20 光学素子およびその製造方法、ならびに光学素子作製用複製基板およびその製造方法

Applications Claiming Priority (1)

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JP2006343644A JP5081443B2 (ja) 2006-12-20 2006-12-20 光学素子およびその製造方法、ならびに光学素子作製用複製基板およびその製造方法

Publications (3)

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JP2008158013A JP2008158013A (ja) 2008-07-10
JP2008158013A5 JP2008158013A5 (enExample) 2010-02-12
JP5081443B2 true JP5081443B2 (ja) 2012-11-28

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JP2006343644A Active JP5081443B2 (ja) 2006-12-20 2006-12-20 光学素子およびその製造方法、ならびに光学素子作製用複製基板およびその製造方法

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JP (1) JP5081443B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5402929B2 (ja) * 2008-07-16 2014-01-29 ソニー株式会社 光学素子
JP5111305B2 (ja) * 2008-08-29 2013-01-09 富士フイルム株式会社 パターン形成体およびその製造方法
JP5439783B2 (ja) 2008-09-29 2014-03-12 ソニー株式会社 光学素子、反射防止機能付き光学部品、および原盤
JP4968953B2 (ja) * 2008-11-17 2012-07-04 修司 岩田 反射防止機能を有する機能性基板とその製造方法
JP5257066B2 (ja) * 2008-12-26 2013-08-07 ソニー株式会社 光学素子、表示装置、反射防止機能付き光学部品、および原盤
JP2011053495A (ja) * 2009-09-02 2011-03-17 Sony Corp 光学素子、およびその製造方法
JP2012208526A (ja) * 2009-09-02 2012-10-25 Sony Corp 光学素子、および表示装置
JP5075234B2 (ja) * 2009-09-02 2012-11-21 ソニー株式会社 光学素子、および表示装置
JP5490216B2 (ja) 2010-03-02 2014-05-14 パナソニック株式会社 光学素子及び光学素子の製造方法
JP6252047B2 (ja) * 2013-09-03 2017-12-27 大日本印刷株式会社 透過率異方性部材、透過率異方性部材の製造方法及び表示装置
JP6794308B2 (ja) * 2017-04-27 2020-12-02 富士フイルム株式会社 マイクロレンズアレイ製造用金型の作製方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4270806B2 (ja) * 2002-05-24 2009-06-03 大日本印刷株式会社 ゾルゲル法による反射防止物品の製造方法
JP4092723B2 (ja) * 2002-06-28 2008-05-28 太陽誘電株式会社 光情報記録媒体のスタンパー作成方法
JPWO2004031815A1 (ja) * 2002-10-07 2006-03-23 ナルックス株式会社 反射防止用回折格子
JP4457589B2 (ja) * 2003-04-07 2010-04-28 コニカミノルタホールディングス株式会社 透過型光学素子を有する光学装置
JP2006012854A (ja) * 2003-10-06 2006-01-12 Omron Corp 面光源装置及び表示装置
JP2006048848A (ja) * 2004-08-05 2006-02-16 Hitachi Maxell Ltd 光ディスク及び光ディスクの製造方法

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JP2008158013A (ja) 2008-07-10

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