JP5064604B1 - 基板エッチング装置 - Google Patents

基板エッチング装置 Download PDF

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Publication number
JP5064604B1
JP5064604B1 JP2012096811A JP2012096811A JP5064604B1 JP 5064604 B1 JP5064604 B1 JP 5064604B1 JP 2012096811 A JP2012096811 A JP 2012096811A JP 2012096811 A JP2012096811 A JP 2012096811A JP 5064604 B1 JP5064604 B1 JP 5064604B1
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JP
Japan
Prior art keywords
etching
substrate
frame
nozzle
injection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2012096811A
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English (en)
Japanese (ja)
Other versions
JP2013162119A (ja
Inventor
張承逸
Original Assignee
エムエム テック カンパニー，リミテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by エムエム テック カンパニー，リミテッド filed Critical エムエム テック カンパニー，リミテッド
Application granted granted Critical
Publication of JP5064604B1 publication Critical patent/JP5064604B1/ja
Publication of JP2013162119A publication Critical patent/JP2013162119A/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133302—Rigid substrates, e.g. inorganic substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • ing And Chemical Polishing (AREA)
  • Surface Treatment Of Glass (AREA)
JP2012096811A 2012-02-03 2012-04-20 基板エッチング装置 Expired - Fee Related JP5064604B1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020120011490A KR101151296B1 (ko) 2012-02-03 2012-02-03 기판 에칭 장치
KR10-2012-0011490 2012-02-03

Publications (2)

Publication Number Publication Date
JP5064604B1 true JP5064604B1 (ja) 2012-10-31
JP2013162119A JP2013162119A (ja) 2013-08-19

Family

ID=46688532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012096811A Expired - Fee Related JP5064604B1 (ja) 2012-02-03 2012-04-20 基板エッチング装置

Country Status (4)

Country Link
JP (1) JP5064604B1 (zh)
KR (1) KR101151296B1 (zh)
CN (1) CN103241956B (zh)
TW (1) TWI489574B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110078381A (zh) * 2019-05-05 2019-08-02 蚌埠市羚旺新工艺材料研发科技有限公司 一种喷淋式玻璃基板减薄线

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101491069B1 (ko) * 2013-07-12 2015-02-10 주식회사 위스코하이텍 기판연마장치
CN104888996B (zh) * 2015-06-29 2017-08-11 深圳市华星光电技术有限公司 喷淋组件以及具有该喷淋组件的湿刻设备
CN115094420B (zh) * 2022-07-12 2023-09-26 深圳市杰昌实业有限公司 一种金属表面化学刻蚀处理装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080088949A (ko) * 2007-03-30 2008-10-06 김용노 유리기판 에칭장치
JP2009161429A (ja) * 2008-01-09 2009-07-23 Econy Co Ltd 硝子基板のエッチング装置と前記エッチング装置によって製造された硝子薄板
JP2009249276A (ja) * 2008-04-10 2009-10-29 M M Tech Co Ltd 下向き式基板薄型化装置及びこれを用いた薄型化システム
KR101108974B1 (ko) * 2009-09-29 2012-01-31 주식회사 이코니 잔류 에칭액 제거 기능을 구비한 유리기판 에칭장치

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070105699A (ko) * 2006-04-27 2007-10-31 삼성전자주식회사 기판 식각 장치 및 이를 이용한 기판 식각 방법
KR101300524B1 (ko) * 2006-09-19 2013-09-02 (주)에스티아이 식각장치 및 식각방법
KR101007306B1 (ko) * 2010-02-23 2011-01-13 주식회사 엠엠테크 상부 하향 분사식 기판 에칭 장치

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080088949A (ko) * 2007-03-30 2008-10-06 김용노 유리기판 에칭장치
JP2009161429A (ja) * 2008-01-09 2009-07-23 Econy Co Ltd 硝子基板のエッチング装置と前記エッチング装置によって製造された硝子薄板
JP2009249276A (ja) * 2008-04-10 2009-10-29 M M Tech Co Ltd 下向き式基板薄型化装置及びこれを用いた薄型化システム
KR101108974B1 (ko) * 2009-09-29 2012-01-31 주식회사 이코니 잔류 에칭액 제거 기능을 구비한 유리기판 에칭장치

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110078381A (zh) * 2019-05-05 2019-08-02 蚌埠市羚旺新工艺材料研发科技有限公司 一种喷淋式玻璃基板减薄线
CN110078381B (zh) * 2019-05-05 2023-06-09 蚌埠市羚旺新工艺材料研发科技有限公司 一种喷淋式玻璃基板减薄线

Also Published As

Publication number Publication date
TWI489574B (zh) 2015-06-21
KR101151296B1 (ko) 2012-06-08
CN103241956B (zh) 2014-10-08
CN103241956A (zh) 2013-08-14
JP2013162119A (ja) 2013-08-19
TW201334096A (zh) 2013-08-16

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