JP5032818B2 - 静電チャック - Google Patents

静電チャック Download PDF

Info

Publication number
JP5032818B2
JP5032818B2 JP2006266275A JP2006266275A JP5032818B2 JP 5032818 B2 JP5032818 B2 JP 5032818B2 JP 2006266275 A JP2006266275 A JP 2006266275A JP 2006266275 A JP2006266275 A JP 2006266275A JP 5032818 B2 JP5032818 B2 JP 5032818B2
Authority
JP
Japan
Prior art keywords
base plate
electrode
connection
hole
wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2006266275A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008085245A (ja
JP2008085245A5 (https=
Inventor
則雄 白岩
裕一 秦
直人 渡部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Industries Co Ltd
Original Assignee
Shinko Electric Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Electric Industries Co Ltd filed Critical Shinko Electric Industries Co Ltd
Priority to JP2006266275A priority Critical patent/JP5032818B2/ja
Priority to KR1020070092950A priority patent/KR101343456B1/ko
Priority to US11/857,681 priority patent/US7483256B2/en
Priority to TW096136152A priority patent/TWI423378B/zh
Publication of JP2008085245A publication Critical patent/JP2008085245A/ja
Publication of JP2008085245A5 publication Critical patent/JP2008085245A5/ja
Application granted granted Critical
Publication of JP5032818B2 publication Critical patent/JP5032818B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2006266275A 2006-09-29 2006-09-29 静電チャック Active JP5032818B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006266275A JP5032818B2 (ja) 2006-09-29 2006-09-29 静電チャック
KR1020070092950A KR101343456B1 (ko) 2006-09-29 2007-09-13 정전 척
US11/857,681 US7483256B2 (en) 2006-09-29 2007-09-19 Electrostatic chuck
TW096136152A TWI423378B (zh) 2006-09-29 2007-09-28 靜電夾盤

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006266275A JP5032818B2 (ja) 2006-09-29 2006-09-29 静電チャック

Publications (3)

Publication Number Publication Date
JP2008085245A JP2008085245A (ja) 2008-04-10
JP2008085245A5 JP2008085245A5 (https=) 2009-07-30
JP5032818B2 true JP5032818B2 (ja) 2012-09-26

Family

ID=39260903

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006266275A Active JP5032818B2 (ja) 2006-09-29 2006-09-29 静電チャック

Country Status (4)

Country Link
US (1) US7483256B2 (https=)
JP (1) JP5032818B2 (https=)
KR (1) KR101343456B1 (https=)
TW (1) TWI423378B (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5236448B2 (ja) * 2008-12-16 2013-07-17 アドヴァンスド・ディスプレイ・プロセス・エンジニアリング・コーポレーション・リミテッド 静電チャック及びそれを備えた基板合着装置
JP5816454B2 (ja) * 2011-05-09 2015-11-18 新光電気工業株式会社 基板温調固定装置
JP5733756B2 (ja) * 2011-08-31 2015-06-10 アルプス電気株式会社 高分子アクチュエータおよびその製造方法
US10388493B2 (en) * 2011-09-16 2019-08-20 Lam Research Corporation Component of a substrate support assembly producing localized magnetic fields
US20140318455A1 (en) * 2013-04-26 2014-10-30 Varian Semiconductor Equipment Associates, Inc. Low emissivity electrostatic chuck
CN110085546B (zh) * 2013-08-05 2023-05-16 应用材料公司 用于薄基板搬运的静电载体
JP6308871B2 (ja) * 2014-05-28 2018-04-11 新光電気工業株式会社 静電チャック及び半導体・液晶製造装置
JP6464071B2 (ja) * 2015-10-13 2019-02-06 日本特殊陶業株式会社 基板保持装置
US10460969B2 (en) * 2016-08-22 2019-10-29 Applied Materials, Inc. Bipolar electrostatic chuck and method for using the same
CN111357096A (zh) 2017-11-24 2020-06-30 东华隆株式会社 发热部件
KR101964631B1 (ko) * 2018-04-06 2019-04-02 (주)아폴로테크 완충력이 우수한 정전척

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2521471B2 (ja) * 1987-05-14 1996-08-07 富士通株式会社 静電吸着装置
JP3264391B2 (ja) * 1993-05-17 2002-03-11 東京エレクトロン株式会社 静電吸着体の離脱装置
US5528451A (en) * 1994-11-02 1996-06-18 Applied Materials, Inc Erosion resistant electrostatic chuck
JP2000100916A (ja) * 1998-09-18 2000-04-07 Tomoegawa Paper Co Ltd 静電チャック装置
JP4021661B2 (ja) * 2001-12-27 2007-12-12 株式会社巴川製紙所 静電チャック装置
JP2003324144A (ja) 2002-04-30 2003-11-14 Shin-Etsu Engineering Co Ltd 静電チャック及びそれを用いたフラットパネル用基板の貼り合わせ装置
KR100666039B1 (ko) * 2003-12-05 2007-01-10 동경 엘렉트론 주식회사 정전척
US7993489B2 (en) 2005-03-31 2011-08-09 Tokyo Electron Limited Capacitive coupling plasma processing apparatus and method for using the same

Also Published As

Publication number Publication date
JP2008085245A (ja) 2008-04-10
US7483256B2 (en) 2009-01-27
KR20080029801A (ko) 2008-04-03
US20080080118A1 (en) 2008-04-03
TW200816357A (en) 2008-04-01
KR101343456B1 (ko) 2013-12-20
TWI423378B (zh) 2014-01-11

Similar Documents

Publication Publication Date Title
KR101343456B1 (ko) 정전 척
CN100481369C (zh) 静电夹盘装置
JP6006972B2 (ja) 静電チャック
KR101416152B1 (ko) 정전 척
JP2008251737A (ja) 静電チャック装置用電極部材ならびにそれを用いた静電チャック装置および静電吸着解除方法
CN100358114C (zh) 形成穿透电极的方法以及具有穿透电极的基片
CN102860128A (zh) 有机el照明装置
CN102983282B (zh) 有机发光二极管模块
KR102744643B1 (ko) 정전 척 및 그 제조 방법
JP4021661B2 (ja) 静電チャック装置
JP2008112763A (ja) 静電チャック
TWI484198B (zh) Test vehicle and substrate assembly
KR20200000695A (ko) 라미네이팅 장치의 배면 전극형 정전척과, 이의 제조 방법 및 라미네이팅 장치
JP4677397B2 (ja) 静電吸着方法
JP2004241443A (ja) 半導体装置の製造方法
JP2011155135A (ja) 半導体素子移送用治具及び半導体素子移送方法
JP2024139669A (ja) 静電チャック
KR101419035B1 (ko) 후면 전극형 태양전지 모듈 및 그 제조 방법
KR102866417B1 (ko) 대면적 투명 정전척
JP2009246325A (ja) 静電チャック
JPH03129786A (ja) 積層型電歪体
WO2011118787A1 (ja) ガラス埋込シリコン基板の製造方法
CN102039521A (zh) 静电吸盘组装装置
JP2008027927A (ja) 真空貼り合わせ装置用静電チャック
TWI706911B (zh) 微機電系統元件及其靜電接合方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090615

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090615

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100614

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110628

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110818

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120228

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120413

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120626

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120629

R150 Certificate of patent or registration of utility model

Ref document number: 5032818

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150706

Year of fee payment: 3