JP2008085245A5 - - Google Patents
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- Publication number
- JP2008085245A5 JP2008085245A5 JP2006266275A JP2006266275A JP2008085245A5 JP 2008085245 A5 JP2008085245 A5 JP 2008085245A5 JP 2006266275 A JP2006266275 A JP 2006266275A JP 2006266275 A JP2006266275 A JP 2006266275A JP 2008085245 A5 JP2008085245 A5 JP 2008085245A5
- Authority
- JP
- Japan
- Prior art keywords
- base plate
- electrostatic chuck
- conductive component
- wiring
- chuck according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000853 adhesive Substances 0.000 claims 1
- 230000001070 adhesive effect Effects 0.000 claims 1
- 239000004020 conductor Substances 0.000 claims 1
- 239000012212 insulator Substances 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006266275A JP5032818B2 (ja) | 2006-09-29 | 2006-09-29 | 静電チャック |
| KR1020070092950A KR101343456B1 (ko) | 2006-09-29 | 2007-09-13 | 정전 척 |
| US11/857,681 US7483256B2 (en) | 2006-09-29 | 2007-09-19 | Electrostatic chuck |
| TW096136152A TWI423378B (zh) | 2006-09-29 | 2007-09-28 | 靜電夾盤 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006266275A JP5032818B2 (ja) | 2006-09-29 | 2006-09-29 | 静電チャック |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008085245A JP2008085245A (ja) | 2008-04-10 |
| JP2008085245A5 true JP2008085245A5 (https=) | 2009-07-30 |
| JP5032818B2 JP5032818B2 (ja) | 2012-09-26 |
Family
ID=39260903
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006266275A Active JP5032818B2 (ja) | 2006-09-29 | 2006-09-29 | 静電チャック |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7483256B2 (https=) |
| JP (1) | JP5032818B2 (https=) |
| KR (1) | KR101343456B1 (https=) |
| TW (1) | TWI423378B (https=) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5236448B2 (ja) * | 2008-12-16 | 2013-07-17 | アドヴァンスド・ディスプレイ・プロセス・エンジニアリング・コーポレーション・リミテッド | 静電チャック及びそれを備えた基板合着装置 |
| JP5816454B2 (ja) * | 2011-05-09 | 2015-11-18 | 新光電気工業株式会社 | 基板温調固定装置 |
| JP5733756B2 (ja) * | 2011-08-31 | 2015-06-10 | アルプス電気株式会社 | 高分子アクチュエータおよびその製造方法 |
| US10388493B2 (en) * | 2011-09-16 | 2019-08-20 | Lam Research Corporation | Component of a substrate support assembly producing localized magnetic fields |
| US20140318455A1 (en) * | 2013-04-26 | 2014-10-30 | Varian Semiconductor Equipment Associates, Inc. | Low emissivity electrostatic chuck |
| CN110085546B (zh) * | 2013-08-05 | 2023-05-16 | 应用材料公司 | 用于薄基板搬运的静电载体 |
| JP6308871B2 (ja) * | 2014-05-28 | 2018-04-11 | 新光電気工業株式会社 | 静電チャック及び半導体・液晶製造装置 |
| JP6464071B2 (ja) * | 2015-10-13 | 2019-02-06 | 日本特殊陶業株式会社 | 基板保持装置 |
| US10460969B2 (en) * | 2016-08-22 | 2019-10-29 | Applied Materials, Inc. | Bipolar electrostatic chuck and method for using the same |
| CN111357096A (zh) | 2017-11-24 | 2020-06-30 | 东华隆株式会社 | 发热部件 |
| KR101964631B1 (ko) * | 2018-04-06 | 2019-04-02 | (주)아폴로테크 | 완충력이 우수한 정전척 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2521471B2 (ja) * | 1987-05-14 | 1996-08-07 | 富士通株式会社 | 静電吸着装置 |
| JP3264391B2 (ja) * | 1993-05-17 | 2002-03-11 | 東京エレクトロン株式会社 | 静電吸着体の離脱装置 |
| US5528451A (en) * | 1994-11-02 | 1996-06-18 | Applied Materials, Inc | Erosion resistant electrostatic chuck |
| JP2000100916A (ja) * | 1998-09-18 | 2000-04-07 | Tomoegawa Paper Co Ltd | 静電チャック装置 |
| JP4021661B2 (ja) * | 2001-12-27 | 2007-12-12 | 株式会社巴川製紙所 | 静電チャック装置 |
| JP2003324144A (ja) | 2002-04-30 | 2003-11-14 | Shin-Etsu Engineering Co Ltd | 静電チャック及びそれを用いたフラットパネル用基板の貼り合わせ装置 |
| KR100666039B1 (ko) * | 2003-12-05 | 2007-01-10 | 동경 엘렉트론 주식회사 | 정전척 |
| US7993489B2 (en) | 2005-03-31 | 2011-08-09 | Tokyo Electron Limited | Capacitive coupling plasma processing apparatus and method for using the same |
-
2006
- 2006-09-29 JP JP2006266275A patent/JP5032818B2/ja active Active
-
2007
- 2007-09-13 KR KR1020070092950A patent/KR101343456B1/ko active Active
- 2007-09-19 US US11/857,681 patent/US7483256B2/en active Active
- 2007-09-28 TW TW096136152A patent/TWI423378B/zh active
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