JP5027197B2 - 有機ケイ素化合物をベースとする架橋性材料 - Google Patents
有機ケイ素化合物をベースとする架橋性材料 Download PDFInfo
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- JP5027197B2 JP5027197B2 JP2009232399A JP2009232399A JP5027197B2 JP 5027197 B2 JP5027197 B2 JP 5027197B2 JP 2009232399 A JP2009232399 A JP 2009232399A JP 2009232399 A JP2009232399 A JP 2009232399A JP 5027197 B2 JP5027197 B2 JP 5027197B2
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- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- MGIYRDNGCNKGJU-UHFFFAOYSA-N isothiazolinone Chemical compound O=C1C=CSN1 MGIYRDNGCNKGJU-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000007527 lewis bases Chemical class 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid group Chemical group C(\C=C/C(=O)O)(=O)O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 125000005358 mercaptoalkyl group Chemical group 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- JZLMFLOCXAPMTK-UHFFFAOYSA-N methoxy(octyl)phosphinic acid Chemical compound CCCCCCCCP(O)(=O)OC JZLMFLOCXAPMTK-UHFFFAOYSA-N 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- QFWAHMAYYWUGTI-UHFFFAOYSA-N methyl-tris(prop-1-enoxy)silane Chemical compound CC=CO[Si](C)(OC=CC)OC=CC QFWAHMAYYWUGTI-UHFFFAOYSA-N 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 239000004005 microsphere Substances 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 1
- KYCGURZGBKFEQB-UHFFFAOYSA-N n',n'-dibutylpropane-1,3-diamine Chemical compound CCCCN(CCCC)CCCN KYCGURZGBKFEQB-UHFFFAOYSA-N 0.000 description 1
- NOUUUQMKVOUUNR-UHFFFAOYSA-N n,n'-diphenylethane-1,2-diamine Chemical compound C=1C=CC=CC=1NCCNC1=CC=CC=C1 NOUUUQMKVOUUNR-UHFFFAOYSA-N 0.000 description 1
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 1
- WUFHQGLVNNOXMP-UHFFFAOYSA-N n-(triethoxysilylmethyl)cyclohexanamine Chemical compound CCO[Si](OCC)(OCC)CNC1CCCCC1 WUFHQGLVNNOXMP-UHFFFAOYSA-N 0.000 description 1
- QRANWKHEGLJBQC-UHFFFAOYSA-N n-(trimethoxysilylmethyl)cyclohexanamine Chemical compound CO[Si](OC)(OC)CNC1CCCCC1 QRANWKHEGLJBQC-UHFFFAOYSA-N 0.000 description 1
- BLEJWUIEUACHKH-UHFFFAOYSA-N n-[[benzoyl(methyl)amino]-ethoxy-methylsilyl]-n-methylbenzamide Chemical compound C=1C=CC=CC=1C(=O)N(C)[Si](C)(OCC)N(C)C(=O)C1=CC=CC=C1 BLEJWUIEUACHKH-UHFFFAOYSA-N 0.000 description 1
- REODOQPOCJZARG-UHFFFAOYSA-N n-[[diethoxy(methyl)silyl]methyl]cyclohexanamine Chemical compound CCO[Si](C)(OCC)CNC1CCCCC1 REODOQPOCJZARG-UHFFFAOYSA-N 0.000 description 1
- COFBOACTGSWMJQ-UHFFFAOYSA-N n-[[dimethoxy(methyl)silyl]methyl]cyclohexanamine Chemical compound CO[Si](C)(OC)CNC1CCCCC1 COFBOACTGSWMJQ-UHFFFAOYSA-N 0.000 description 1
- WHIVNJATOVLWBW-UHFFFAOYSA-N n-butan-2-ylidenehydroxylamine Chemical compound CCC(C)=NO WHIVNJATOVLWBW-UHFFFAOYSA-N 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000002825 nitriles Chemical group 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- ODUCDPQEXGNKDN-UHFFFAOYSA-N nitroxyl Chemical compound O=N ODUCDPQEXGNKDN-UHFFFAOYSA-N 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- JGQJGKTVZXQCDO-UHFFFAOYSA-N octoxyboronic acid Chemical compound CCCCCCCCOB(O)O JGQJGKTVZXQCDO-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000005702 oxyalkylene group Chemical group 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 239000012188 paraffin wax Chemical group 0.000 description 1
- 235000011837 pasties Nutrition 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical class OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 1
- JQCXWCOOWVGKMT-UHFFFAOYSA-N phthalic acid diheptyl ester Natural products CCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC JQCXWCOOWVGKMT-UHFFFAOYSA-N 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920003009 polyurethane dispersion Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229940088417 precipitated calcium carbonate Drugs 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 235000013772 propylene glycol Nutrition 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000011814 protection agent Substances 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- YGSDEFSMJLZEOE-UHFFFAOYSA-M salicylate Chemical compound OC1=CC=CC=C1C([O-])=O YGSDEFSMJLZEOE-UHFFFAOYSA-M 0.000 description 1
- 229960001860 salicylate Drugs 0.000 description 1
- 229940116351 sebacate Drugs 0.000 description 1
- CXMXRPHRNRROMY-UHFFFAOYSA-L sebacate(2-) Chemical compound [O-]C(=O)CCCCCCCCC([O-])=O CXMXRPHRNRROMY-UHFFFAOYSA-L 0.000 description 1
- 150000004819 silanols Chemical class 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 125000005353 silylalkyl group Chemical group 0.000 description 1
- SVPYVBAHWDJDAX-UHFFFAOYSA-N silylmethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC[SiH3] SVPYVBAHWDJDAX-UHFFFAOYSA-N 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000003549 soybean oil Substances 0.000 description 1
- 235000012424 soybean oil Nutrition 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 239000011885 synergistic combination Substances 0.000 description 1
- 229940042055 systemic antimycotics triazole derivative Drugs 0.000 description 1
- MFDREUNIZFWMEZ-UHFFFAOYSA-N tert-butyl(trichloro)germane Chemical compound CC(C)(C)[Ge](Cl)(Cl)Cl MFDREUNIZFWMEZ-UHFFFAOYSA-N 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 1
- 125000005497 tetraalkylphosphonium group Chemical group 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- DFQPZDGUFQJANM-UHFFFAOYSA-M tetrabutylphosphanium;hydroxide Chemical compound [OH-].CCCC[P+](CCCC)(CCCC)CCCC DFQPZDGUFQJANM-UHFFFAOYSA-M 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- INPZSKMAWFGEOP-UHFFFAOYSA-N tetrapropylsilane Chemical compound CCC[Si](CCC)(CCC)CCC INPZSKMAWFGEOP-UHFFFAOYSA-N 0.000 description 1
- 239000004308 thiabendazole Substances 0.000 description 1
- 235000010296 thiabendazole Nutrition 0.000 description 1
- 229960004546 thiabendazole Drugs 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- URAYPUMNDPQOKB-UHFFFAOYSA-N triacetin Chemical compound CC(=O)OCC(OC(C)=O)COC(C)=O URAYPUMNDPQOKB-UHFFFAOYSA-N 0.000 description 1
- 229960002622 triacetin Drugs 0.000 description 1
- IZRJPHXTEXTLHY-UHFFFAOYSA-N triethoxy(2-triethoxysilylethyl)silane Chemical compound CCO[Si](OCC)(OCC)CC[Si](OCC)(OCC)OCC IZRJPHXTEXTLHY-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- UZIAQVMNAXPCJQ-UHFFFAOYSA-N triethoxysilylmethyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)COC(=O)C(C)=C UZIAQVMNAXPCJQ-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- JCGDCINCKDQXDX-UHFFFAOYSA-N trimethoxy(2-trimethoxysilylethyl)silane Chemical compound CO[Si](OC)(OC)CC[Si](OC)(OC)OC JCGDCINCKDQXDX-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- JGPNOKSAIMPTQL-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethylperoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOOCC1CO1 JGPNOKSAIMPTQL-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 229940113165 trimethylolpropane Drugs 0.000 description 1
- AAPLIUHOKVUFCC-UHFFFAOYSA-N trimethylsilanol Chemical compound C[Si](C)(C)O AAPLIUHOKVUFCC-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical class CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Chemical group 0.000 description 1
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical compound OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 description 1
- 235000019165 vitamin E Nutrition 0.000 description 1
- 229940046009 vitamin E Drugs 0.000 description 1
- 239000011709 vitamin E Substances 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
- C08L71/02—Polyalkylene oxides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
- C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J183/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
- C09J183/04—Polysiloxanes
- C09J183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Adhesives Or Adhesive Processes (AREA)
Description
(A)式
A−[(CR1 2)b−SiRa(OR2)3-a]x (I)
[式中、
Aは、窒素、リン、酸素、硫黄、炭素またはカルボニル基を介して結合しているx価のポリマー基を表し、
Rは、同じであっても異なっていてもよく、かつ置換されていてもよい一価の炭化水素基を表し、
R1は、同じであっても異なっていてもよく、かつ水素原子を表すか、または置換されていてもよい一価の炭化水素基を表し、該基は窒素、リン、酸素、硫黄またはカルボニル基を介して炭素原子に結合していてもよく、
R2は、同じであっても異なっていてもよく、かつ水素原子を表すか、または置換されていてもよい一価の炭化水素基を表し、
xは、1〜10、有利には1、2または3、特に有利には1または2の整数を表し、
aは、0、1または2、有利には0または1であり、かつ
bは、1〜10、有利には1、2、3または4、特に有利には1、2または3の整数である]の化合物、
(B)塩基性窒素を有する有機ケイ素化合物および
(C)式
R3−NH−C(=O)−C(=O)−NH−R3 (II)
[式中、
R3は、同じであっても異なっていてもよく、かつ置換されていてもよい一価のフェニル基を表す]のオキサルジアニリド
を含有する架橋性材料により解決された。
を介して、基−[(CR1 2)b−SiRa(OR2)3-a](式中、R′は、同じであっても異なっていてもよく、かつ水素原子を表すか、またはRに関して記載したものを表す)に結合している有機ポリマー基である。
−R7−O− (III)
[式中、
R7は、同じであっても異なっていてもよく、かつ1〜12個の炭素原子を有する、線状または分枝鎖状であってもよく、置換されていてもよい二価の基を表す]の繰り返し単位を有する。
−CH2−C(R8)(COOR9)− (IV)
[式中、
R8は、同じであっても異なっていてもよく、かつ水素原子またはメチル基を表し、かつ
R9は、同じであっても異なっていてもよく、かつ置換されていてもよい一価の炭化水素基を表す]の繰返単位を有する。
−NR10−C(=O)− (V)
[その際、
R10は、同じであっても異なっていてもよく、かつ水素原子を表すか、または置換されていてもよい一価の炭化水素基を表す]の単位を有する。
R12 kDlSi(OR13)mO(4-k-l-m)/2 (VI)
[式中、
R12は、同じであっても異なっていてもよく、かつ塩基性窒素を含んでいない、置換されていてもよい一価のSiC結合有機基を表し、
R13は、同じであっても異なっていてもよく、かつ水素原子を表すか、または置換されていてもよい炭化水素基を表し、
Dは、同じであっても異なっていてもよく、かつ塩基性窒素を有する一価のSi結合基を表し、
kは、0、1、2または3であり、
lは、0、1、2、3または4であり、かつ
mは、0、1、2または3であり、
ただしその際、k+l+mの合計は、4以下であり、かつ1分子あたり少なくとも1の基Dが存在している]の単位を有する有機ケイ素化合物である。
(A)式(I)の化合物、
(B)塩基性窒素を有する、式(VI)の単位を有する有機ケイ素化合物、
(C)式(II)のオキサルジアニリド、
(D)架橋剤、
場合により
(E)可塑剤、
場合により
(F)充填剤、
場合により
(G)カップリング剤、
場合により
(H)有機溶剤、
場合により
(K)触媒および
場合により
(L)添加剤
を使用して製造することができる。
被膜形成時間の測定
被膜形成時間を測定するために、実施例中で得られた架橋性材料を、厚さ2mmの層として、PEフィルム上に施与し、かつ標準条件で貯蔵した。硬化の間、5分おきに被膜の形成を試験した。このために乾燥した、かつ脂を有していない指を慎重に試料の表面におき、上方へ持ち上げる。試料が指に付着したままの場合には、まだ被膜は形成されていない。指に試料がそれ以上付着しない場合には、被膜は形成されているので、その時間を記録する。
黄変の評価
黄変の評価のために、実施例で得られた架橋性材料を、厚さ6mmの層としてPEフィルム上に施与し、かつ標準条件で貯蔵する。窓ガラスを通して昼間の光が入る部屋で7日間貯蔵した後に、PEフィルムの加硫物を除去し、かつCIE−LAB系による白色に関するb値を、detacolor international社(USA)のMicroflashタイプの分光光度計を用いて測定する。b値は5回の測定点からの平均値であり、最も近い整数で丸みつけをする。その際、b=0は、無色を意味し、bが0より大の場合には黄色を意味し、b値が大きいほど、加硫物は黄色い。5までのb値は、目視ではほとんど認識することができず、従ってポジティブである。
UV貯蔵後の黄変の評価
黄変を評価するために、実施例で得られた架橋性材料を、厚さ6mmの層として、PEフィルム上に施与し、かつ標準条件で貯蔵した。窓ガラスを通して昼間の光が入る部屋で7日間貯蔵した後に、得られた加硫物を290〜800nmの範囲の放射線に7日間、(550±75)W/m2の照射強度で曝露した。放射線はキセノンアークランプにより透過フィルターを用いて発生させたので、スペクトル分布はISO4892−2(方法A)の要求を満たしている。引き続き該加硫物をPEフィルムから除去し、かつb値をCIE−LAB系による白色に関するb値を、detacolor international社(USA)のMicroflashタイプの分光光度計を用いて測定する。b値は5回の測定点からの平均値であり、最も近い整数で丸みつけをする。その際、b=0は、無色を意味し、bが0より大の場合には黄色を意味し、b値が大きいほど、加硫物は黄色い。5までのb値は、目視ではほとんど認識することができず、従ってポジティブである。
付着性の評価
試験すべき下地は、付着している汚れを除去し、かつ適切な溶剤を用いて脱脂した。付着性を評価するために、実施例で得られた架橋性材料を、厚さ2mmの層として試験すべき下地上に施与し、かつ標準条件で7日間、貯蔵した。付着性を試験するために、加硫物の試験片の長さ約1cmを下地からはがし、なお付着しているゴムの方向で、破壊されるまで引っ張る。ゴム自体が裂ける場合は、付着性は問題なく、かつ1と評価する。ゴムが残留物を残すことなく下地からはく離されうる場合には、付着性は劣り、かつ5と評価する。
ポリマー1の製造
平均分子量18000g/モル、OH価7.0mgKOH/g、分子量分布Mw/Mn1.1および粘度23000mPa・sを有するモノオール含有率の低いポリ−(プロピレングリコール)−ジオール(Bayer MaterialScience AG社(ドイツ)から、商品名"Acclaim Polyol 18200N"で入手可能)970g、3−イソシアナトプロピル−トリメトキシシラン30gおよびビスマスオクトエート0.1gを、90℃で1時間反応させ、引き続きメタノール1gを添加して、イソシアネート基を捕捉した。反応生成物を室温に冷却し、かつ湿分の排除下で貯蔵した。清澄で無色のポリマーが得られ、粘度は35000mPa・sであった。
実施例1に記載されている方法を繰り返したが、ただし約25%のメチル−1,2,2,6,6−ペンタメチル−4−ピペリジルセバケートと約75%のビス(1,2,2,6,6−ペンタメチル−4−ピペリジル)セバケートとからなるHALS混合物3gに加えて、さらにCAS番号192268−64−7を有するポリマーHALS(商品名CHIMASSORB(登録商標)2020でBodo Moeller Chemie社(ドイツ)から入手可能)3gをジプロピレングリコール−ジメチルエーテル5g中に溶解して使用した点が異なっていた。
実施例1に記載されている方法を繰り返したが、ただしキシレン1.6g中に溶解したN−(2−エトキシ−フェニル)−N′−(4−イソドデシルフェニル)−エチレンジアミド6.4gに代えて、1−メチル−2−ピロリドン24g中に溶解したN−(2−エトキシフェニル)−N′−(2−エチルフェニル)−エチレンジアミド(商品名TINUVIN(登録商標)312でBodo Moeller Chemie社(ドイツ)から入手可能)6.0gを使用した点が異なっていた。
実施例1に記載されている方法を繰り返したが、ただしキシレン1.6g中に溶解したN−(2−エトキシ−フェニル)−N′−(4−イソドデシルフェニル)−エチレンジアミド6.4gに代えて、ポリプロピレングリコール−モノヒドロキシ−モノブチルエーテル24g中に溶解したN−(2−エトキシフェニル)−N′−(2−エチルフェニル)−エチレンジアミド(商品名TINUVIN(登録商標)312でBodo Moeller Chemie社(ドイツ)から入手可能)6.0gの分散液(50℃で240mPa・sの粘度と、カール・フィッシャーによる滴定を用いて測定して120ppmの水分含有率を有する分散液を、Hauschild aus Hamm社(ドイツ)のAM501タイプのミキサー中、2200rpmで10分間、直径2.0mmを有する特殊鋼ボールにより分散させた)を使用した点が異なっており、その際、該分散液は30μmより小さい微細分は有していた。
実施例1に記載されている方法を繰り返したが、ただしキシレン1.6g中に溶解したN−(2−エトキシ−フェニル)−N′−(4−イソドデシルフェニル)−エチレンジアミド6.4gに代えて、CAS153519−44−9を有するヒドロキシフェニルトリアジンタイプの液状UV吸収剤(商品名TINUVIN(登録商標)400でBodo Moeller Chemie社(ドイツ)から入手可能)6.0gを使用した点が異なっていた。
実施例1に記載されている方法を繰り返したが、ただしキシレン1.6g中に溶解したN−(2−エトキシ−フェニル)−N′−(4−イソドデシルフェニル)−エチレンジアミド6.4gに代えて、EG番号401−680−5を有するベンゾトリアゾールタイプのUV吸収剤(商品名TINUVIN(登録商標)571でBodo Moeller Chemie社(ドイツ)から入手可能)6.0gを使用した点が異なっていた。
実施例1に記載されている方法を繰り返したが、ただしキシレン1.6g中に溶解したN−(2−エトキシ−フェニル)−N′−(4−イソドデシルフェニル)−エチレンジアミド6.4gに代えて、CAS番号6197−30−4を有するシアノアクリレートタイプの2−(エチルヘキシル)−2−シアノ−3,3−ジフェニルアクリレート(商品名UVINUL(登録商標)3039CでBASF AG社(ドイツ)から入手可能)6.0gを使用した点が異なっていた。
ポリマー1(この製造は上記の例1に記載されている)225g、32μmより小さい粒径および0.01g/lより小さい水分含有率を有する、水素化ひまし油ベースの粉末20g、キシレン1.6g中に溶解したN−(2−エトキシフェニル)−N′−(4−イソドデシルフェニル)−Nエチレンジアミド(商品名SANDUVOR(登録商標)3206でClariant社(ドイツ)から入手可能)6.4g、約25%のメチル−1,2,2,6,6−ペンタメチル−4−ピペリジルセバケートと約75%のビス(1,2,2,6,6−ペンタメチル−4−ピペリジル)セバケートとからなるHALS混合物(商品名TINUVIN(登録商標)202でBodo Moeller Chemie社(ドイツ)で入手可能)3g、粉砕され、ステアリン酸で処理された、平均直径(D50%)5.7μmを有する炭酸カルシウム(OMYA BLR3でOMYA GmbH(ドイツ)から入手可能)105gおよび沈降され、ステアリン酸で処理された、平均直径(D50%)80nmを有する炭酸カルシウム(商品名Hakuenka CCRでShiraishi Kogyo Kaisha、Ltd.(日本)で入手可能)105gを、遊星型ミキサー中で混合し、かつ約100ミリバールの絶対圧力と、生成物温度が約50℃となるような回転数で15分間攪拌した。引き続き、50℃で粘度240mPa・sおよびカール・フィッシャーによる滴定により測定して120ppmの水分含有率を有するポリプロピレングリコール−モノヒドロキシ−モノブチルエーテル360g、(メタクリルオキシメチル)メチルジメトキシシラン(商品名GENIOSIL(登録商標)XL32でWacker Chemie AG社(D−Muenchen)から入手可能)5g及びビニルトリメトキシシラン(商品名GENIOSIL(登録商標)XL10でWacker Chemie AG社(D−Muenchen)から入手可能)12.5gを添加し、かつさらに5分間攪拌した。引き続き比表面積200m2/gを有する疎水性の熱分解法ケイ酸(商品名HDK(登録商標)H18でWacker Chemie AG社(D−Muenchen)から入手可能)42g、3−アミノプロピルトリメトキシシラン(商品名GENIOSIL(登録商標)GF96でWacker Chemie AG社(D−Muenchen)から入手可能)5.0gおよびジオクチルスズジラウレート(商品名WACKER(登録商標)Katalysator C39でWacker Chemie AG社(D−Muenchen)から入手可能)2.5gを均質に混合導入することにより該バッチを完了した。最後に該混合物を約100ミリバールの絶対圧力で5分間攪拌し、気密充填し、かつ貯蔵した。
例5に記載されている方法を繰り返したが、ただし、3−アミノプロピルトリメトキシシラン5.0gに代えて、3−アミノプロピル−トリメトキシシラン13.0gを使用した点が異なっていた。
例6に記載されている方法を繰り返したが、ただし、3−アミノプロピルトリメトキシシランに加えてさらに、3−グリシドキシプロピル−トリメトキシシラン5.0gを使用した点が異なっていた。
例5に記載されている方法を繰り返したが、ただし、3−アミノプロピルトリメトキシシラン5.0gに代えて、N−(2−アミノエチル)−3−アミノプロピル−トリメトキシシラン(商品名GENIOSIL(登録商標)GFでWacker Chemie AG社(D−Muenchen)から入手可能)5.0gを使用した点が異なっていた。
例8に記載されている方法を繰り返したが、ただし、3−アミノプロピルトリメトキシシラン5.0gに代えて、N−(2−アミノエチル)−3−アミノプロピル−トリメトキシシラン10.0gを使用した点が異なっていた。
例5に記載されている方法を繰り返したが、ただし、3−アミノプロピルトリメトキシシラン5.0gに代えて、3−(ジブチルアミノ)−1−プロピルアミン(Sigma−Aldrich Corporation、USAで入手可能)5.0gを使用した点が異なっていた。
例5に記載されている方法を繰り返したが、ただし、3−アミノプロピルトリメトキシシランに代えて、1,5,7−トリアザビシクロ[4.4.0]デセ−5−エン(商品名TBDでSigma−Aldrich Corporation、USAから入手可能)1.0gをメタノールp.A.1.0g中に溶解して使用した点が異なっていた。
Claims (7)
- (A)式
A−[(CR1 2)b−SiRa(OR2)3-a]x (I)
[式中、
Aは、窒素、リン、酸素、硫黄、炭素またはカルボニル基を介して結合しているx価のポリマー基を表し、
Rは、同じであっても異なっていてもよく、かつ置換されていてもよい一価の炭化水素基を表し、
R1は、同じであっても異なっていてもよく、かつ水素原子を表すか、または置換されていてもよい一価の炭化水素基を表し、該基は窒素、リン、酸素、硫黄またはカルボニル基を介して炭素原子に結合していてもよく、
R2は、同じであっても異なっていてもよく、かつ水素原子を表すか、または置換されていてもよい一価の炭化水素基を表し、
xは、1〜10の整数であり、
aは、0、1または2であり、かつ
bは、1〜10の整数である]の化合物、
(B)塩基性窒素を有する有機ケイ素化合物および
(C)式
R3−NH−C(=O)−C(=O)−NH−R3 (II)
[式中、
R3は、同じであっても異なっていてもよく、かつ置換されていてもよい一価のフェニル基を表す]のオキサルジアニリド
を含有する架橋性材料であって、
前記基Aが、−O−C(=O)−NH−、−C(=O)−O−、−O−C(=O)−O−、−O−、−O−CH 2 −C(OH)H−CH 2 −NR′−、−O−CH 2 −C(OH)H−CH 2 −S−、−O−CH 2 −C(OH)H−CH 2 −C(=O)−または−O−CH 2 −C(OH)H−CH 2 −O−を介して、基−[(CR 1 2 ) b −SiR a (OR 2 ) 3-a ](式中、R′は、同じであっても異なっていてもよく、かつ水素原子を表すか、または置換されていてもよい一価の炭化水素基を表す)に結合しているポリオキシアルキレン基であり、
前記成分(B)が、式
R 12 k D l Si(OR 13 ) m O (4-k-l-m)/2 (VI)
[式中、
R 12 は、同じであっても異なっていてもよく、かつ塩基性窒素を含んでいない、置換されていてもよい一価のSiC結合有機基を表し、
R 13 は、同じであっても異なっていてもよく、かつ水素原子を表すか、または置換されていてもよい炭化水素基を表し、
Dは、同じであっても異なっていてもよく、かつ塩基性窒素を有する一価のSi結合基を表し、
kは、0、1、2または3であり、
lは、0、1、2、3または4であり、かつ
mは、0、1、2または3であり、
ただしその際、k+l+mの合計は、4以下であり、かつ1分子あたり少なくとも1の基Dが存在している]の単位を有する有機ケイ素化合物であることを特徴とする、前記架橋性材料。 - 基Aが、式
−NR10−C(=O)− (V)
[式中、
R10は、同じであっても異なっていてもよく、かつ水素原子を表すか、または置換されていてもよい一価の炭化水素基を表す]の単位を有していることを特徴とする、請求項1記載の架橋性材料。 - 成分(B)が、成分(A)100質量部に対して、0.001〜10質量部の量で含有されていることを特徴とする、請求項1または2記載の架橋性材料。
- 基R3が、フェニル基、アルキルフェニル基、アルコキシフェニル基またはアルキル(アルコキシ)フェニル基であり、その際、アルキル基およびアルコキシ基はフェニル環の任意の箇所に結合していることを特徴とする、請求項1から3までのいずれか1項記載の架橋性材料。
- 成分(C)が、成分(A)100質量部に対して、0.01〜10質量部の量で含有されていることを特徴とする、請求項1から4までのいずれか1項記載の架橋性材料。
- (A)式(I)の化合物、
(B)塩基性窒素を有する、式(VI)の単位を有する有機ケイ素化合物、
(C)式(II)のオキサルジアニリド、
(D)架橋剤、
場合により
(E)可塑剤、
場合により
(F)充填剤、
場合により
(G)カップリング剤、
場合により
(H)有機溶剤、
場合により
(K)触媒および
場合により
(L)添加剤
を使用して製造することができる、請求項1から5までのいずれか1項記載の架橋性材料。 - 請求項1から6までのいずれか1項記載の材料を架橋することによって製造される成形体。
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JP2009232399A Expired - Fee Related JP5027197B2 (ja) | 2008-10-06 | 2009-10-06 | 有機ケイ素化合物をベースとする架橋性材料 |
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US (1) | US8399548B2 (ja) |
EP (1) | EP2172525B1 (ja) |
JP (1) | JP5027197B2 (ja) |
KR (1) | KR101141682B1 (ja) |
CN (1) | CN101712802B (ja) |
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DE (2) | DE102008042632A1 (ja) |
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JP5648594B2 (ja) * | 2011-06-22 | 2015-01-07 | 旭硝子株式会社 | 光安定剤組成物の製造方法および硬化性組成物の製造方法 |
JP2013091754A (ja) * | 2011-10-27 | 2013-05-16 | Yokohama Rubber Co Ltd:The | 湿気硬化型樹脂組成物 |
DE102012201734A1 (de) | 2012-02-06 | 2013-08-08 | Wacker Chemie Ag | Massen auf Basis von organyloxysilanterminierten Polymeren |
DE102012205306A1 (de) | 2012-03-30 | 2013-10-02 | Wacker Chemie Ag | Vernetzbare Massen auf Basis von organyloxysilanterminierten Polymeren |
JP6383163B2 (ja) * | 2013-03-29 | 2018-08-29 | 株式会社カネカ | 硬化性組成物およびその硬化物 |
TWI738743B (zh) | 2016-03-23 | 2021-09-11 | 美商道康寧公司 | 金屬-聚有機矽氧烷 |
EP3526301B1 (en) | 2016-10-14 | 2021-06-16 | Basf Se | Hardenable polymer composition |
CN111465659B (zh) * | 2017-12-15 | 2022-09-27 | 瓦克化学股份公司 | 用于密封表面的涂层组合物 |
US20220259410A1 (en) | 2019-07-10 | 2022-08-18 | Clariant International Ltd | Stabilizer composition for silyl-modified polymer sealants |
TW202237726A (zh) | 2021-01-12 | 2022-10-01 | 瑞士商克萊瑞特國際股份有限公司 | 用於矽基改質聚合物密封劑之穩定劑組成物 |
KR102643838B1 (ko) * | 2023-06-13 | 2024-03-06 | 박영진 | 우수한 난연성을 보여주는 변성 실리콘 접착제 조성물 및 이들의 제조 |
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JPS63260965A (ja) | 1987-04-20 | 1988-10-27 | Toa Paint Kk | ステンレス用透明塗料組成物 |
JPH0649348A (ja) * | 1992-08-04 | 1994-02-22 | Shin Etsu Chem Co Ltd | 常温硬化性ポリエーテル組成物 |
JPH0841355A (ja) * | 1994-08-02 | 1996-02-13 | Mazda Motor Corp | 低溶剤型樹脂組成物、それを用いた塗料組成物、並びにその塗装方法 |
JP2000159585A (ja) | 1998-11-27 | 2000-06-13 | Toagosei Co Ltd | セメント系基材の仕上げ方法 |
JP2000345136A (ja) | 1999-06-04 | 2000-12-12 | Toagosei Co Ltd | シーリング材組成物 |
DE10113980A1 (de) | 2001-03-22 | 2002-10-02 | Consortium Elektrochem Ind | Silanterminiertes Polydiorganosiloxan-Urethan-Copolymer |
JP3669299B2 (ja) * | 2001-07-12 | 2005-07-06 | 住友化学株式会社 | メタクリル酸メチル系樹脂組成物およびその成形体 |
US7211616B2 (en) | 2002-02-14 | 2007-05-01 | The Glidden Company | Moisture curable adhesive |
JP4365559B2 (ja) | 2002-05-08 | 2009-11-18 | 積水化学工業株式会社 | 合わせガラス用中間膜及び合わせガラス |
US7470452B1 (en) * | 2002-06-13 | 2008-12-30 | E. I. Du Pont De Nemours & Company | Process for multilayer coating of substrates |
DE10252421A1 (de) * | 2002-11-12 | 2004-05-19 | Bayer Ag | Beschichtungszusammensetzung und Verfahren zu deren Herstellung |
DE10330288A1 (de) * | 2003-07-04 | 2005-02-03 | Consortium für elektrochemische Industrie GmbH | Alkoxysilanterminierte Prepolymere |
DE10351804A1 (de) | 2003-11-06 | 2005-06-09 | Wacker-Chemie Gmbh | Verfahren zur Erhöhung der Elastizität von feuchtigkeitsgehärteten Elastomeren |
JP3817614B2 (ja) | 2003-11-21 | 2006-09-06 | 独立行政法人情報通信研究機構 | 位相雑音耐性の高い受信装置用の最適検波器 |
DE10360469A1 (de) * | 2003-12-22 | 2005-07-14 | Wacker-Chemie Gmbh | Vernetzbare Massen auf der Basis von Organosiliciumverbindungen |
CA2578351A1 (en) * | 2004-06-25 | 2006-01-05 | Kansai Paint Co., Ltd. | Surface-treatment agent |
MY139524A (en) | 2004-06-30 | 2009-10-30 | Ciba Holding Inc | Stabilization of polyether polyol, polyester polyol or polyurethane compositions |
DE102004050746A1 (de) * | 2004-10-19 | 2006-04-20 | Basf Coatings Ag | Hochkratzfeste und hochelastische Beschichtungsmittel auf Basis von Alkoxysilan-funktionellen Komponenten |
US8759435B2 (en) | 2005-04-15 | 2014-06-24 | Kaneka Corporation | Curable composition and cured article excellent in transparency |
DE102005051921A1 (de) * | 2005-10-29 | 2007-05-03 | Henkel Kgaa | α-Ethoxysilan modifizierte Polymere, deren Herstellung und Verwendung |
WO2008059873A1 (fr) | 2006-11-16 | 2008-05-22 | Toagosei Co., Ltd. | Composition pour matériau d'étanchéité |
DE102007041856A1 (de) * | 2007-09-03 | 2009-03-05 | Wacker Chemie Ag | Vernetzbare Massen auf der Basis von Organosiliciumverbindungen |
US20110293871A1 (en) * | 2010-05-28 | 2011-12-01 | Nathan Storfer-Isser | Laminating film and method of using same |
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2008
- 2008-10-06 DE DE102008042632A patent/DE102008042632A1/de not_active Withdrawn
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2009
- 2009-09-01 KR KR1020090082039A patent/KR101141682B1/ko not_active IP Right Cessation
- 2009-09-14 US US12/558,692 patent/US8399548B2/en active Active
- 2009-09-17 EP EP09170555A patent/EP2172525B1/de active Active
- 2009-09-17 DE DE502009000486T patent/DE502009000486D1/de active Active
- 2009-09-17 AT AT09170555T patent/ATE502980T1/de active
- 2009-10-06 JP JP2009232399A patent/JP5027197B2/ja not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
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CN101712802B (zh) | 2013-06-12 |
US20100087576A1 (en) | 2010-04-08 |
EP2172525B1 (de) | 2011-03-23 |
EP2172525A1 (de) | 2010-04-07 |
DE102008042632A1 (de) | 2010-04-08 |
CN101712802A (zh) | 2010-05-26 |
JP2010090381A (ja) | 2010-04-22 |
DE502009000486D1 (de) | 2011-05-05 |
US8399548B2 (en) | 2013-03-19 |
ATE502980T1 (de) | 2011-04-15 |
KR20100039217A (ko) | 2010-04-15 |
KR101141682B1 (ko) | 2012-05-24 |
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