JP5002207B2 - パターンを有する構造体の製造方法 - Google Patents

パターンを有する構造体の製造方法 Download PDF

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Publication number
JP5002207B2
JP5002207B2 JP2006202802A JP2006202802A JP5002207B2 JP 5002207 B2 JP5002207 B2 JP 5002207B2 JP 2006202802 A JP2006202802 A JP 2006202802A JP 2006202802 A JP2006202802 A JP 2006202802A JP 5002207 B2 JP5002207 B2 JP 5002207B2
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Japan
Prior art keywords
pattern
stamper
manufacturing
forming
convex structure
Prior art date
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Expired - Fee Related
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JP2006202802A
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English (en)
Japanese (ja)
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JP2008034412A (ja
JP2008034412A5 (enExample
Inventor
彩 今田
透 田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2006202802A priority Critical patent/JP5002207B2/ja
Priority to US11/773,739 priority patent/US7976761B2/en
Priority to CN2007101391055A priority patent/CN101112789B/zh
Publication of JP2008034412A publication Critical patent/JP2008034412A/ja
Publication of JP2008034412A5 publication Critical patent/JP2008034412A5/ja
Application granted granted Critical
Publication of JP5002207B2 publication Critical patent/JP5002207B2/ja
Expired - Fee Related legal-status Critical Current
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023—Microembossing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/887—Nanoimprint lithography, i.e. nanostamp

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Micromachines (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2006202802A 2006-07-26 2006-07-26 パターンを有する構造体の製造方法 Expired - Fee Related JP5002207B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2006202802A JP5002207B2 (ja) 2006-07-26 2006-07-26 パターンを有する構造体の製造方法
US11/773,739 US7976761B2 (en) 2006-07-26 2007-07-05 Process of production of patterned structure
CN2007101391055A CN101112789B (zh) 2006-07-26 2007-07-25 制造图案化结构的工艺

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006202802A JP5002207B2 (ja) 2006-07-26 2006-07-26 パターンを有する構造体の製造方法

Publications (3)

Publication Number Publication Date
JP2008034412A JP2008034412A (ja) 2008-02-14
JP2008034412A5 JP2008034412A5 (enExample) 2009-09-10
JP5002207B2 true JP5002207B2 (ja) 2012-08-15

Family

ID=38985377

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006202802A Expired - Fee Related JP5002207B2 (ja) 2006-07-26 2006-07-26 パターンを有する構造体の製造方法

Country Status (3)

Country Link
US (1) US7976761B2 (enExample)
JP (1) JP5002207B2 (enExample)
CN (1) CN101112789B (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5294565B2 (ja) * 2006-03-17 2013-09-18 キヤノン株式会社 発光素子及び発光素子の製造方法
KR101456504B1 (ko) * 2006-10-25 2014-10-31 에이전시 포 사이언스, 테크놀로지 앤드 리서치 기판 표면의 젖음성 개질방법
EP2171538A4 (en) * 2007-06-27 2011-08-17 Agency Science Tech & Res METHOD FOR PRODUCING A SECONDARY PRINT ON A PRINTED POLYMER
JP2009238777A (ja) * 2008-03-25 2009-10-15 Toshiba Corp 半導体装置の製造方法
JP5376930B2 (ja) * 2008-12-19 2013-12-25 キヤノン株式会社 液体吐出ヘッドの製造方法
NL2003875A (en) 2009-02-04 2010-08-05 Asml Netherlands Bv Imprint lithography method and apparatus.
CN102566258B (zh) * 2010-12-29 2013-09-18 中芯国际集成电路制造(上海)有限公司 双压印方法
JP5499306B2 (ja) * 2011-07-11 2014-05-21 Ｓｃｉｖａｘ株式会社 加圧部用固定具を備えた流体圧インプリント装置
KR102296890B1 (ko) * 2014-02-18 2021-08-31 퀄컴 인코포레이티드 비허가된 스펙트럼을 갖는 lte/lte-a 네트워크들에서의 안테나 선택
CN110299284B (zh) * 2018-03-23 2020-11-03 联华电子股份有限公司 图案化方法以及图案化结构

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0521310A (ja) 1991-07-11 1993-01-29 Canon Inc 微細パタン形成方法
US20040137734A1 (en) 1995-11-15 2004-07-15 Princeton University Compositions and processes for nanoimprinting
US6482742B1 (en) 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
US6518189B1 (en) 1995-11-15 2003-02-11 Regents Of The University Of Minnesota Method and apparatus for high density nanostructures
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US6309580B1 (en) 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US6602620B1 (en) 1998-12-28 2003-08-05 Kabushiki Kaisha Toshiba Magnetic recording apparatus, magnetic recording medium and manufacturing method thereof
KR100335070B1 (ko) * 1999-04-21 2002-05-03 백승준 압축 성형 기법을 이용한 미세 패턴 형성 방법
US6498640B1 (en) * 1999-12-30 2002-12-24 Koninklijke Philips Electronics N.V. Method to measure alignment using latent image grating structures
US7322287B2 (en) 2000-07-18 2008-01-29 Nanonex Corporation Apparatus for fluid pressure imprint lithography
US7211214B2 (en) 2000-07-18 2007-05-01 Princeton University Laser assisted direct imprint lithography
JP2003068618A (ja) 2001-08-28 2003-03-07 Canon Inc 露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法
JP3830386B2 (ja) 2001-12-20 2006-10-04 英夫 吉田 陽極酸化法およびその処理装置
US6999156B2 (en) 2002-09-30 2006-02-14 Chou Stephen Y Tunable subwavelength resonant grating filter
AU2003291443A1 (en) 2002-11-12 2004-06-03 Princeton University Compositions and processes for nanoimprinting
JP2004296780A (ja) 2003-03-27 2004-10-21 Canon Inc Ｘ線露光装置
DE10330456B9 (de) * 2003-07-05 2007-11-08 Erich Thallner Vorrichtung zum Erstellen einer Oberflächenstruktur auf einem Wafer
JP4093574B2 (ja) * 2003-09-22 2008-06-04 株式会社東芝 インプリントスタンパの製造方法、および磁気記録媒体の製造方法
JP2005101201A (ja) 2003-09-24 2005-04-14 Canon Inc ナノインプリント装置
JP4937500B2 (ja) * 2004-06-15 2012-05-23 大日本印刷株式会社 インプリント方法
US7490547B2 (en) * 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US7209217B2 (en) * 2005-04-08 2007-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing plural patterning devices
JP5213335B2 (ja) * 2006-02-01 2013-06-19 キヤノン株式会社 インプリント用モールド、該モールドによる構造体の製造方法

Also Published As

Publication number Publication date
CN101112789B (zh) 2012-04-25
JP2008034412A (ja) 2008-02-14
CN101112789A (zh) 2008-01-30
US20080023880A1 (en) 2008-01-31
US7976761B2 (en) 2011-07-12

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