JP4995974B2 - リアルタイム・インプリント・プロセス欠陥診断法 - Google Patents

リアルタイム・インプリント・プロセス欠陥診断法 Download PDF

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Publication number
JP4995974B2
JP4995974B2 JP2010548717A JP2010548717A JP4995974B2 JP 4995974 B2 JP4995974 B2 JP 4995974B2 JP 2010548717 A JP2010548717 A JP 2010548717A JP 2010548717 A JP2010548717 A JP 2010548717A JP 4995974 B2 JP4995974 B2 JP 4995974B2
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Japan
Prior art keywords
template
substrate
imprint lithography
transition zone
imprint
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Japanese (ja)
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JP2011513973A (ja
JP2011513973A5 (enExample
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スリニーヴァッサン，シトルガタ・ヴイ
シンガル，シュラワン
チョイ，ビュン−ジン
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モレキュラー・インプリンツ・インコーポレーテッド
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2010548717A 2008-02-26 2009-02-26 リアルタイム・インプリント・プロセス欠陥診断法 Active JP4995974B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US3142208P 2008-02-26 2008-02-26
US61/031,422 2008-02-26
US12/392,663 2009-02-25
US12/392,663 US7815824B2 (en) 2008-02-26 2009-02-25 Real time imprint process diagnostics for defects
PCT/US2009/001203 WO2009108323A2 (en) 2008-02-26 2009-02-26 Real time imprint process diagnostics for defects

Publications (3)

Publication Number Publication Date
JP2011513973A JP2011513973A (ja) 2011-04-28
JP2011513973A5 JP2011513973A5 (enExample) 2012-04-12
JP4995974B2 true JP4995974B2 (ja) 2012-08-08

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ID=40998580

Family Applications (1)

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JP2010548717A Active JP4995974B2 (ja) 2008-02-26 2009-02-26 リアルタイム・インプリント・プロセス欠陥診断法

Country Status (5)

Country Link
US (1) US7815824B2 (enExample)
EP (1) EP2252466A2 (enExample)
JP (1) JP4995974B2 (enExample)
TW (1) TWI392578B (enExample)
WO (1) WO2009108323A2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009153926A1 (ja) * 2008-06-18 2009-12-23 株式会社ニコン テンプレートの製造方法、テンプレートの検査方法及び検査装置、ナノインプリント装置、ナノインプリントシステム、並びにデバイス製造方法
JP4660581B2 (ja) * 2008-09-19 2011-03-30 株式会社東芝 パターン形成方法
US8715515B2 (en) * 2009-03-23 2014-05-06 Intevac, Inc. Process for optimization of island to trench ratio in patterned media
JP2010286309A (ja) * 2009-06-10 2010-12-24 Toshiba Corp ナノインプリント用テンプレートの検査方法
NL2006004A (en) * 2010-03-25 2011-09-27 Asml Netherlands Bv Imprint lithography.
JP5576822B2 (ja) * 2011-03-25 2014-08-20 富士フイルム株式会社 モールドに付着した異物の除去方法
US20120261849A1 (en) 2011-04-14 2012-10-18 Canon Kabushiki Kaisha Imprint apparatus, and article manufacturing method using same
JP6562707B2 (ja) * 2015-05-13 2019-08-21 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP6799397B2 (ja) * 2015-08-10 2020-12-16 キヤノン株式会社 インプリント装置、および物品の製造方法
JP6157579B2 (ja) * 2015-12-24 2017-07-05 キヤノン株式会社 インプリント方法、インプリント装置及び物品の製造方法
JP6450790B2 (ja) * 2017-03-02 2019-01-09 ファナック株式会社 表示システムおよび表示方法
CN117001964A (zh) * 2022-06-23 2023-11-07 万华化学（宁波）有限公司 一种解决厚薄印缺陷的方法和验证模具
US12326376B1 (en) * 2022-12-21 2025-06-10 Hrl Laboratories, Llc Spike arrays for small displacement force measurement

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03225476A (ja) * 1990-01-30 1991-10-04 Kanebo Ltd 捺印検査装置
JP3492446B2 (ja) * 1995-05-22 2004-02-03 株式会社リコー 光ディスク用スタンパ検査機
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
US7317531B2 (en) 2002-12-05 2008-01-08 Kla-Tencor Technologies Corporation Apparatus and methods for detecting overlay errors using scatterometry
EP1258915A1 (en) * 2001-05-17 2002-11-20 Infineon Technologies SC300 GmbH & Co. KG Method of detecting defects on a semiconductor device in a processing tool and an arrangement therefore
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
US7077992B2 (en) * 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
JP2005044843A (ja) * 2003-07-23 2005-02-17 Sii Nanotechnology Inc ナノインプリントリソグラフィ用の原版の欠陥修正方法
JPWO2005050132A1 (ja) * 2003-11-20 2007-06-07 Hoya株式会社 パターンのムラ欠陥検査方法及び装置
US7514114B2 (en) * 2005-09-01 2009-04-07 Palo Alto Research Center Incorporated Detecting defective ejector in digital lithography system
JP4735280B2 (ja) * 2006-01-18 2011-07-27 株式会社日立製作所 パターン形成方法
US7854867B2 (en) 2006-04-21 2010-12-21 Molecular Imprints, Inc. Method for detecting a particle in a nanoimprint lithography system
US20080026305A1 (en) 2006-07-26 2008-01-31 Wei Wu Apparatus and method for alignment using multiple wavelengths of light
US8142702B2 (en) * 2007-06-18 2012-03-27 Molecular Imprints, Inc. Solvent-assisted layer formation for imprint lithography

Also Published As

Publication number Publication date
JP2011513973A (ja) 2011-04-28
TW200940322A (en) 2009-10-01
WO2009108323A3 (en) 2010-01-07
TWI392578B (zh) 2013-04-11
WO2009108323A2 (en) 2009-09-03
US20090214761A1 (en) 2009-08-27
EP2252466A2 (en) 2010-11-24
US7815824B2 (en) 2010-10-19

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