JP4975646B2 - 長波シフトしたベンゾトリアゾールuv吸収剤及びそれらの使用 - Google Patents

長波シフトしたベンゾトリアゾールuv吸収剤及びそれらの使用 Download PDF

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Publication number
JP4975646B2
JP4975646B2 JP2007553581A JP2007553581A JP4975646B2 JP 4975646 B2 JP4975646 B2 JP 4975646B2 JP 2007553581 A JP2007553581 A JP 2007553581A JP 2007553581 A JP2007553581 A JP 2007553581A JP 4975646 B2 JP4975646 B2 JP 4975646B2
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alkyl
carbon atoms
branched
linear
phenyl
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Japanese (ja)
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JP2008528657A5 (cg-RX-API-DMAC7.html
JP2008528657A (ja
Inventor
フリッチェ,カタリナ
ブライヒ,アーダルベルト
フレイ,マルクス
フィッシャー,ヴァルター
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BASF Schweiz AG
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Ciba Holding AG
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D487/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472Five-membered rings
    • C08K5/3475Five-membered rings condensed with carbocyclic rings

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Cosmetics (AREA)
  • Plural Heterocyclic Compounds (AREA)
JP2007553581A 2005-02-02 2006-01-23 長波シフトしたベンゾトリアゾールuv吸収剤及びそれらの使用 Active JP4975646B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP05100703 2005-02-02
EP05100703.7 2005-02-02
PCT/EP2006/050354 WO2006082145A1 (en) 2005-02-02 2006-01-23 Long wavelength shifted benzotriazole uv-absorbers and their use

Publications (3)

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JP2008528657A JP2008528657A (ja) 2008-07-31
JP2008528657A5 JP2008528657A5 (cg-RX-API-DMAC7.html) 2009-03-12
JP4975646B2 true JP4975646B2 (ja) 2012-07-11

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JP2007553581A Active JP4975646B2 (ja) 2005-02-02 2006-01-23 長波シフトしたベンゾトリアゾールuv吸収剤及びそれらの使用

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US (1) US7695643B2 (cg-RX-API-DMAC7.html)
EP (1) EP1844049B1 (cg-RX-API-DMAC7.html)
JP (1) JP4975646B2 (cg-RX-API-DMAC7.html)
KR (1) KR101322194B1 (cg-RX-API-DMAC7.html)
CN (1) CN101111496B (cg-RX-API-DMAC7.html)
AT (1) ATE502942T1 (cg-RX-API-DMAC7.html)
BR (1) BRPI0606893B1 (cg-RX-API-DMAC7.html)
DE (1) DE602006020839D1 (cg-RX-API-DMAC7.html)
MY (1) MY144674A (cg-RX-API-DMAC7.html)
RU (1) RU2414471C2 (cg-RX-API-DMAC7.html)
TW (1) TWI391393B (cg-RX-API-DMAC7.html)
WO (1) WO2006082145A1 (cg-RX-API-DMAC7.html)

Families Citing this family (96)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10214937A1 (de) * 2002-04-04 2003-10-16 Basf Ag Cyclische Verbindungen und ihre Verwendung als Lichtabsorber, Lichtemitter oder Komplexliganden
DE102005012056A1 (de) * 2005-03-16 2006-09-28 Basf Coatings Ag Mehrschichtlackierungen, Verfahren zu ihrer Herstellung und deren Verwendung im Automobilbau
BRPI0713466A2 (pt) * 2006-06-27 2012-01-24 Ciba Holding Inc Absorvedores de uv benzotriazol deslocados por cumprimento de onda longo e seu uso
WO2009065490A2 (de) * 2007-11-21 2009-05-28 Lofo High Tech Film Gmbh Verwendung bestimmter uv-absorber in flächigen materialien und/oder linsen und damit zusammenhängende erfindungsgegenstände
US20090291315A1 (en) * 2008-01-24 2009-11-26 Costin Darryl J Ultra Violet Resistant Coating for Wood Products
TWI453199B (zh) * 2008-11-04 2014-09-21 Alcon Inc 用於眼用鏡片材料之紫外光/可見光吸收劑
CN102292397B (zh) 2009-01-19 2014-12-10 巴斯夫欧洲公司 有机黑色颜料及其制备
TWI464151B (zh) * 2009-07-06 2014-12-11 Alcon Inc 用於眼用鏡片材料之uv/可見光吸收劑
WO2011137142A1 (en) * 2010-04-29 2011-11-03 Novartis Ag Intraocular lenses with combinations of uv absorbers and blue light chromophores
EP2481847A1 (en) 2011-01-31 2012-08-01 DSM IP Assets B.V. UV-Stabilized high strength fiber
US20120279566A1 (en) * 2011-05-02 2012-11-08 Basf Se Photovoltaic element with increased long-term stability
WO2014026780A1 (en) 2012-08-16 2014-02-20 Basf Coatings Gmbh Coating compositions containing benzotrizol based uv-absorbers
KR102041946B1 (ko) * 2013-01-15 2019-11-07 에스케이케미칼 주식회사 폴리에스테르계 열수축 필름
CN103965094B (zh) * 2013-01-31 2016-07-06 江苏道博化工有限公司 N-甲基-4-氨基-5-溴-邻苯二甲酰亚胺的合成方法
JP6309614B2 (ja) * 2013-04-02 2018-04-11 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 被覆されている炭素繊維強化プラスチック部品
MX2016000313A (es) 2013-07-08 2016-08-08 Basf Se Estabilizadores de luz novedosos.
KR101663280B1 (ko) * 2014-10-06 2016-10-06 에스케이씨하스디스플레이필름(유) 액정표시장치용 색순도 향상 필름 및 이를 포함하는 액정표시장치
CN104744675B (zh) * 2015-03-30 2017-10-20 华南理工大学 含6H–吡咯并[3,4–f]苯并三唑–5,7–二酮的共轭聚合物及其应用
TW201703879A (zh) 2015-06-02 2017-02-01 西克帕控股有限公司 用於生產光學效應層之製程
US20180243976A1 (en) 2015-09-30 2018-08-30 Carbon, Inc. Method and Apparatus for Producing Three- Dimensional Objects
WO2017112521A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Production of flexible products by additive manufacturing with dual cure resins
WO2017112682A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Fabrication of compound products from multiple intermediates by additive manufacturing with dual cure resins
WO2017112483A2 (en) 2015-12-22 2017-06-29 Carbon, Inc. Accelerants for additive manufacturing with dual cure resins
WO2017112653A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Dual precursor resin systems for additive manufacturing with dual cure resins
US9828467B2 (en) 2016-02-05 2017-11-28 International Business Machines Corporation Photoresponsive hexahydrotriazine polymers
CN105891915A (zh) * 2016-05-19 2016-08-24 江苏淘镜有限公司 一种新型uv420镜片的制造方法
WO2018094131A1 (en) 2016-11-21 2018-05-24 Carbon, Inc. Method of making three-dimensional object by delivering reactive component for subsequent cure
US11118064B2 (en) 2016-11-30 2021-09-14 Basf Se Photocurable hardcoat compositions, methods, and articles derived therefrom
WO2018129023A1 (en) 2017-01-05 2018-07-12 Carbon, Inc. Dual cure stereolithography resins containing diels-alder adducts
US11148357B2 (en) 2017-02-13 2021-10-19 Carbon, Inc. Method of making composite objects by additive manufacturing
WO2018165090A1 (en) 2017-03-09 2018-09-13 Carbon, Inc. Tough, high temperature polymers produced by stereolithography
JP2020512215A (ja) 2017-03-23 2020-04-23 カーボン,インコーポレイテッド 付加製造による物体の作製に有用なリップ支持体
US11312066B2 (en) 2017-03-27 2022-04-26 Carbon, Inc. Method of making three-dimensional objects by additive manufacturing
US10239255B2 (en) 2017-04-11 2019-03-26 Molecule Corp Fabrication of solid materials or films from a polymerizable liquid
JP2020523217A (ja) 2017-06-08 2020-08-06 カーボン,インコーポレイテッド 付加製造において有用な光重合性樹脂のブロッキング基
US11135766B2 (en) 2017-06-29 2021-10-05 Carbon, Inc. Products containing nylon 6 produced by stereolithography and methods of making the same
US11135765B2 (en) 2017-08-11 2021-10-05 Carbon, Inc. Serially curable resins useful in additive manufacturing
EP3684826B1 (en) 2017-09-22 2022-04-20 Carbon, Inc. Production of light-transmissive objects by additive manufacturing
TWI782105B (zh) * 2017-09-29 2022-11-01 日商積水化學工業股份有限公司 玻璃構成體
WO2019083876A1 (en) 2017-10-26 2019-05-02 Carbon, Inc. REDUCTION OF WITHDRAWAL OR LOWERING IN OBJECTS PRODUCED BY ADDITIVE MANUFACTURING
WO2019099347A1 (en) 2017-11-20 2019-05-23 Carbon, Inc. Light-curable siloxane resins for additive manufacturing
US11479628B2 (en) 2017-12-08 2022-10-25 Carbon, Inc. Shelf stable, low tin concentration, dual cure additive manufacturing resins
US11504115B2 (en) 2018-02-21 2022-11-22 Cilag Gmbh International Three dimensional adjuncts
USD882782S1 (en) 2018-02-21 2020-04-28 Ethicon Llc Three dimensional adjunct
US10959721B2 (en) 2018-02-21 2021-03-30 Ethicon Llc Three dimensional adjuncts
KR102790175B1 (ko) * 2018-02-27 2025-04-03 세키스이가가쿠 고교가부시키가이샤 접합 유리용 중간막, 및 접합 유리
US12042994B2 (en) 2018-03-02 2024-07-23 Carbon, Inc. Sustainable additive manufacturing resins and methods of recycling
US11390705B2 (en) 2018-05-11 2022-07-19 Carbon, Inc. Reactive particulate materials useful for additive manufacturing
WO2019245892A1 (en) 2018-06-20 2019-12-26 Carbon, Inc. Method of treating additive manufacturing objects with a compound of interest
WO2020023823A1 (en) 2018-07-27 2020-01-30 Carbon, Inc. Branched reactive blocked prepolymers for additive manufacturing
WO2020028232A1 (en) 2018-08-01 2020-02-06 Carbon, Inc. Production of low density products by additive manufacturing
KR102365792B1 (ko) * 2018-08-30 2022-02-21 삼성에스디아이 주식회사 유기발광소자 봉지용 조성물 및 이로부터 제조된 유기층을 포함하는 유기발광소자 표시장치
US11407890B2 (en) 2018-09-10 2022-08-09 Carbon, Inc. Dual cure additive manufacturing resins for production of flame retardant objects
WO2020055609A1 (en) 2018-09-13 2020-03-19 Carbon, Inc. Reversible thermosets for additive manufacturing
WO2020068720A1 (en) 2018-09-25 2020-04-02 Carbon, Inc. Dual cure resins for additive manufacturing
CN109456596B (zh) * 2018-10-30 2021-06-29 深圳市晨宇丰塑胶新材料有限公司 一种高温尼龙汽车材料
CN113195488A (zh) 2018-12-06 2021-07-30 巴斯夫欧洲公司 形成2h-苯并三唑主体和同类物的新方法
CN115745970B (zh) * 2018-12-10 2024-12-13 江苏裕事达新材料科技有限责任公司 一种多环化合物、制备方法以及膜
WO2020131675A1 (en) 2018-12-21 2020-06-25 Carbon, Inc. Energy absorbing dual cure polyurethane elastomers for additive manufacturing
EP3941996B1 (en) * 2019-03-18 2023-12-13 Merck Patent GmbH Polymerisable liquid crystal material and polymerised liquid crystal film
US11555095B2 (en) 2019-03-29 2023-01-17 Carbon, Inc. Dual cure resin for the production of moisture-resistant articles by additive manufacturing
US20220049066A1 (en) * 2019-06-06 2022-02-17 Paragon Films, Inc. Ultraviolet Inhibiting Stretch Film
WO2020263480A1 (en) 2019-06-28 2020-12-30 Carbon, Inc. Dual cure additive manufacturing resins for the production of objects with mixed tensile properties
EP3791806A1 (en) 2019-09-16 2021-03-17 Ethicon LLC Compressible non-fibrous adjuncts
US11534168B2 (en) 2019-09-16 2022-12-27 Cilag Gmbh International Compressible non-fibrous adjuncts
EP3791798B1 (en) 2019-09-16 2022-05-04 Ethicon LLC Compressible non-fibrous adjuncts
EP3791799B1 (en) 2019-09-16 2025-01-22 Ethicon LLC Compressible non-fibrous adjuncts
EP3791809B1 (en) 2019-09-16 2024-07-17 Ethicon LLC Compressible non-fibrous adjuncts
US11490890B2 (en) 2019-09-16 2022-11-08 Cilag Gmbh International Compressible non-fibrous adjuncts
EP3791808B1 (en) 2019-09-16 2024-09-25 Ethicon LLC Compressible non-fibrous adjuncts
EP3791807B1 (en) 2019-09-16 2023-10-04 Ethicon LLC Compressible non-fibrous adjuncts
EP3791810B1 (en) 2019-09-16 2023-12-20 Ethicon LLC Compressible non-fibrous adjuncts
EP3791800B1 (en) 2019-09-16 2024-09-25 Ethicon LLC Compressible non-fibrous adjuncts
EP4031020A1 (en) 2019-09-16 2022-07-27 Carbon, Inc. Bio absorbable resin for additive manufacturing
EP3791804B1 (en) 2019-09-16 2023-11-29 Ethicon LLC Compressible non-fibrous adjuncts
WO2021080974A1 (en) 2019-10-25 2021-04-29 Carbon, Inc. Mechanically anisotropic 3d printed flexible polymeric sheath
EP3838592A1 (en) 2019-12-17 2021-06-23 Evonik Operations GmbH Composition comprising polyesters for additive manufacturing
WO2021133585A1 (en) 2019-12-23 2021-07-01 Carbon, Inc. Inhibition of crystallization in polyurethane resins
US11981778B2 (en) 2020-01-17 2024-05-14 Carbon, Inc. Chemical recycling of additively manufactured objects
EP4110843A1 (en) 2020-02-28 2023-01-04 Carbon, Inc. One part moisture curable resins for additive manufacturing
JP7721551B2 (ja) 2020-02-28 2025-08-12 カーボン,インコーポレイテッド 三次元物体を製造する方法
WO2021183741A1 (en) 2020-03-12 2021-09-16 Carbon, Inc. Partially reversible thermosets useful for recycling
WO2021202655A1 (en) 2020-04-03 2021-10-07 Carbon, Inc. Resins and methods for additive manufacturing of energy absorbing three-dimensional objects
US11655329B2 (en) 2020-04-24 2023-05-23 Carbon, Inc. Delayed action catalysts for dual cure additive manufacturing resins
WO2021222086A1 (en) 2020-04-28 2021-11-04 Carbon, Inc. Methods of making a three-dimensional object
USD1029255S1 (en) 2020-09-01 2024-05-28 Cilag Gmbh International Stapling cartridge assembly with a compressible adjunct
WO2022066565A1 (en) 2020-09-25 2022-03-31 Carbon, Inc. Epoxy dual cure resin for the production of moisture-resistant articles by additive manufacturing
US20240101752A1 (en) 2021-01-15 2024-03-28 Evonik Operations Gmbh Silicone urethane (meth)acrylates and their use in 3d printing resins and coating compositions
WO2022256635A1 (en) 2021-06-03 2022-12-08 Carbon, Inc. Methods for the rapid production of blocked prepolymers
US11952457B2 (en) 2021-06-30 2024-04-09 Carbon, Inc. Bioabsorbable resin for additive manufacturing with non-cytotoxic photoinitiator
US11884000B2 (en) 2021-08-27 2024-01-30 Carbon, Inc. One part, catalyst containing, moisture curable dual cure resins for additive manufacturing
WO2024002742A1 (en) 2022-06-29 2024-01-04 Evonik Operations Gmbh Silicone urethane (meth)acrylates and their use in coating compositions
CN120958087A (zh) * 2023-03-31 2025-11-14 Gcp应用科技公司 日光固化混凝土底漆组合物
WO2025038337A1 (en) 2023-08-11 2025-02-20 Carbon, Inc. Dual cure resins having polyether and polyamide subunits and additive manufacturing methods using the same
WO2025080931A1 (en) 2023-10-12 2025-04-17 Carbon, Inc. Dual cure resins for mixed modulus materials
WO2025137013A1 (en) 2023-12-19 2025-06-26 Carbon, Inc. Silicone resin compositions and methods of using same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2054699T3 (es) * 1986-04-10 1994-08-16 Sandoz Ag Pigmentos que contienen grupos de piperidilo.
JPH03200788A (ja) * 1989-12-27 1991-09-02 Kuraray Co Ltd ベンゾトリアゾール系化合物およびその用途
JP2753921B2 (ja) * 1992-06-04 1998-05-20 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5585228A (en) * 1994-11-30 1996-12-17 Eastman Kodak Company Benzotriazole based UV absorbing compounds and photographic elements containing them
US6166218A (en) * 1996-11-07 2000-12-26 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability
JP2001323251A (ja) * 2000-05-15 2001-11-22 Asahi Denka Kogyo Kk 顆粒状紫外線吸収剤の製造方法
US6566507B2 (en) * 2000-08-03 2003-05-20 Ciba Specialty Chemicals Corporation Processes for the preparation of benzotriazole UV absorbers
EP1322640A1 (en) * 2000-10-03 2003-07-02 Ciba SC Holding AG Heteroaryl substituted hydroxyphenyltriazine uv-absorbers
WO2002077148A1 (en) * 2001-03-27 2002-10-03 Ciba Speciality Chemicals Holding Inc. Fabric rinse composition containing a benztriazole uv absorber
BR0213354A (pt) * 2001-10-17 2004-10-26 Ciba Sc Holding Ag Bases nitrogenadas fotoativáveis
JP2004277581A (ja) * 2003-03-17 2004-10-07 Konica Minolta Holdings Inc セルロースエステルフィルム、偏光板、液晶表示装置、セルロースエステルフィルムの製造方法、偏光板の製造方法

Also Published As

Publication number Publication date
WO2006082145A1 (en) 2006-08-10
KR20070104640A (ko) 2007-10-26
EP1844049A1 (en) 2007-10-17
MY144674A (en) 2011-10-31
CN101111496A (zh) 2008-01-23
KR101322194B1 (ko) 2013-10-30
CN101111496B (zh) 2010-12-29
TW200633988A (en) 2006-10-01
US20080157025A1 (en) 2008-07-03
US7695643B2 (en) 2010-04-13
ATE502942T1 (de) 2011-04-15
TWI391393B (zh) 2013-04-01
EP1844049B1 (en) 2011-03-23
JP2008528657A (ja) 2008-07-31
BRPI0606893A2 (pt) 2009-07-21
RU2007132974A (ru) 2009-03-10
RU2414471C2 (ru) 2011-03-20
BRPI0606893B1 (pt) 2014-10-14
DE602006020839D1 (de) 2011-05-05

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