JP4938206B2 - ポリマー上へグラフト化されたスルホキシド又はスルホン - Google Patents

ポリマー上へグラフト化されたスルホキシド又はスルホン Download PDF

Info

Publication number
JP4938206B2
JP4938206B2 JP2002579420A JP2002579420A JP4938206B2 JP 4938206 B2 JP4938206 B2 JP 4938206B2 JP 2002579420 A JP2002579420 A JP 2002579420A JP 2002579420 A JP2002579420 A JP 2002579420A JP 4938206 B2 JP4938206 B2 JP 4938206B2
Authority
JP
Japan
Prior art keywords
group
carbon atoms
tert
butyl
bis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002579420A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004528442A5 (https=
JP2004528442A (ja
Inventor
メイエー，ハンス−ルドルフ
ノブロック，ゲーリット
ロタ−グラジオシ，ピエーレ
エバンス，サミュエル
ダブス，ポール
ゲーステー，ミケーレ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Holding AG filed Critical Ciba Holding AG
Publication of JP2004528442A publication Critical patent/JP2004528442A/ja
Publication of JP2004528442A5 publication Critical patent/JP2004528442A5/ja
Application granted granted Critical
Publication of JP4938206B2 publication Critical patent/JP4938206B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
    • C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
    • C07D303/20—Ethers with hydroxy compounds containing no oxirane rings
    • C07D303/22—Ethers with hydroxy compounds containing no oxirane rings with monohydroxy compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/20—Polysulfones
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00—Sulfones; Sulfoxides
    • C07C317/02—Sulfones; Sulfoxides having sulfone or sulfoxide groups bound to acyclic carbon atoms
    • C07C317/04—Sulfones; Sulfoxides having sulfone or sulfoxide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00—Sulfones; Sulfoxides
    • C07C317/02—Sulfones; Sulfoxides having sulfone or sulfoxide groups bound to acyclic carbon atoms
    • C07C317/10—Sulfones; Sulfoxides having sulfone or sulfoxide groups bound to acyclic carbon atoms of an unsaturated carbon skeleton containing rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00—Sulfones; Sulfoxides
    • C07C317/16—Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C317/18—Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton with sulfone or sulfoxide groups bound to acyclic carbon atoms of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00—Sulfones; Sulfoxides
    • C07C317/44—Sulfones; Sulfoxides having sulfone or sulfoxide groups and carboxyl groups bound to the same carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/10—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C323/11—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/12—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/24—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/25—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/64—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton
    • C07C323/65—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton containing sulfur atoms of sulfone or sulfoxide groups bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
    • C07D303/16—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by esterified hydroxyl radicals
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/12—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
    • C08C19/00—Chemical modification of rubber
    • C08C19/20—Incorporating sulfur atoms into the molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
    • C08C19/00—Chemical modification of rubber
    • C08C19/22—Incorporating nitrogen atoms into the molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14—The ring being saturated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Epoxy Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Hydrogenated Pyridines (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
JP2002579420A 2001-04-06 2002-03-26 ポリマー上へグラフト化されたスルホキシド又はスルホン Expired - Fee Related JP4938206B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH6592001 2001-04-06
CH659/01 2001-04-06
PCT/EP2002/003381 WO2002081432A2 (en) 2001-04-06 2002-03-26 Sulfoxides or sulfones grafted onto polymers

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008283767A Division JP2009108071A (ja) 2001-04-06 2008-11-04 ポリマー上へグラフト化するためのスルホキシド又はスルホン

Publications (3)

Publication Number Publication Date
JP2004528442A JP2004528442A (ja) 2004-09-16
JP2004528442A5 JP2004528442A5 (https=) 2005-12-22
JP4938206B2 true JP4938206B2 (ja) 2012-05-23

Family

ID=4526742

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2002579420A Expired - Fee Related JP4938206B2 (ja) 2001-04-06 2002-03-26 ポリマー上へグラフト化されたスルホキシド又はスルホン
JP2008283767A Ceased JP2009108071A (ja) 2001-04-06 2008-11-04 ポリマー上へグラフト化するためのスルホキシド又はスルホン

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2008283767A Ceased JP2009108071A (ja) 2001-04-06 2008-11-04 ポリマー上へグラフト化するためのスルホキシド又はスルホン

Country Status (20)

Country Link
US (2) US7160955B2 (https=)
EP (1) EP1373196A2 (https=)
JP (2) JP4938206B2 (https=)
KR (1) KR100873718B1 (https=)
CN (3) CN100406524C (https=)
BR (1) BR0208689A (https=)
CA (1) CA2440839C (https=)
CZ (1) CZ20032671A3 (https=)
HR (1) HRP20030800A2 (https=)
HU (1) HUP0303740A3 (https=)
MX (1) MXPA03009105A (https=)
NZ (1) NZ528592A (https=)
PL (1) PL363620A1 (https=)
RS (1) RS77403A (https=)
RU (1) RU2291874C2 (https=)
SK (1) SK12322003A3 (https=)
TW (1) TWI230149B (https=)
UA (1) UA76141C2 (https=)
WO (1) WO2002081432A2 (https=)
ZA (1) ZA200306720B (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2494341A1 (en) * 2002-10-07 2004-04-15 Ciba Specialty Chemicals Holding Inc. Graftable 4-amino-3-sulfinyl-substitued diphenylamine stabilizers for vulcanizates
WO2004072035A1 (en) * 2003-02-14 2004-08-26 Ciba Specialty Chemicals Holding Inc. Graftable hindered amine light stabilizers
WO2007039416A1 (en) * 2005-09-21 2007-04-12 Ciba Specialty Chemicals Holding Inc. Filled rubber compounds with improved processability
RU2356728C2 (ru) * 2007-02-21 2009-05-27 Людмила Карповна Семенова Способ изготовления плит из композиционного материала
WO2011093443A1 (ja) 2010-01-29 2011-08-04 日本ゼオン株式会社 縮合複素環化合物及び組成物
EP2530119B1 (en) * 2010-01-29 2015-09-30 Zeon Corporation Acrylic rubber composition and rubber crosslinked product
JP6264144B2 (ja) * 2014-03-27 2018-01-24 Jsr株式会社 重合体、感放射線性樹脂組成物及びレジストパターン形成方法
US10316024B2 (en) * 2014-08-05 2019-06-11 Miyoshi Oil & Fat Co., Ltd. Additive for imparting ultraviolet absorbency and/or high refractive index to matrix, and resin member using same
PL3189045T3 (pl) 2014-08-11 2022-04-04 Sun Pharmaceutical Industries Limited Nowe sole nilotynibu i jego polimorfy
CN114106033B (zh) * 2021-12-02 2024-02-27 山东阳谷华泰化工股份有限公司 一种3-烃基丙基硫醚基三乙氧基硅烷及其制备方法和应用
CN115417990B (zh) * 2022-08-18 2023-08-29 宁夏清研高分子新材料有限公司 一种高流动性的聚砜聚合物及其制备方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB922367A (en) * 1960-11-23 1963-03-27 Monsanto Chemicals Rubber-resin blends having improved processability
US3235532A (en) * 1961-12-08 1966-02-15 Exxon Research Engineering Co Polyolefins stabilized by a combination of boric acid, phenolic compounds, and sulfur containing compounds
US3226357A (en) * 1962-09-11 1965-12-28 Nat Distillers Chem Corp Polyolefins stabilized with derivatives of xylylene thioethers
DE1288604B (de) * 1966-08-18 1969-02-06 Advance Prod Gmbh Stabilisieren von organischen Stoffen gegen Zersetzung durch Sauerstoff in der Waerme
US3480581A (en) * 1966-10-20 1969-11-25 Nat Distillers Chem Corp Enhancement of resistance of olefin polymers to heat deterioration
JPS4946145B1 (https=) * 1970-03-31 1974-12-07
JPS4946144B1 (https=) * 1970-03-31 1974-12-07
US4021468A (en) * 1973-09-06 1977-05-03 Ciba-Geigy Corporation Thiaalkyl phenols
US4287320A (en) * 1974-08-01 1981-09-01 Minnesota Mining And Manufacturing Company Composition of fluoroelastomer and diorganosulfuroxide
US4001299A (en) * 1974-12-12 1977-01-04 Ciba-Geigy Corporation Hindered hydroxyphenylalkanoates of substituted isopropanols
JPS62121448A (ja) * 1985-11-22 1987-06-02 Dainippon Ink & Chem Inc 光重合性組成物
EP0473549B1 (de) * 1990-08-28 1995-01-25 Ciba-Geigy Ag Sulfoxide von Alkylthiomethylphenolen
RU2017715C1 (ru) * 1991-12-18 1994-08-15 Исмагилов Фоат Ришатович Способ получения диалкилсульфидов
JP3111714B2 (ja) * 1992-12-21 2000-11-27 住友化学工業株式会社 安定化有機材料組成物
EP0642056A3 (en) * 1993-09-02 1995-08-02 Minnesota Mining & Mfg Photothermographic elements.
DE69514604T2 (de) * 1994-10-04 2000-06-21 Aventis Research & Technologies Gmbh & Co Kg Verfahren zur Herstellung von Polymeren aus Alpha, Omega ungesättigten konjugierten Verbindungen
WO1997014678A1 (en) 1995-10-19 1997-04-24 Ciba Specialty Chemicals Holding Inc. Antioxidants containing phenol groups and aromatic amine groups
EP1228135B1 (en) * 1999-10-18 2004-04-14 Ciba SC Holding AG Stabilizers and antiozonants for elastomers
JP4815160B2 (ja) * 2005-06-28 2011-11-16 株式会社Ｌｉｘｉｌ 手摺

Also Published As

Publication number Publication date
CN1966492A (zh) 2007-05-23
NZ528592A (en) 2005-10-28
US20040152836A1 (en) 2004-08-05
US20070015870A1 (en) 2007-01-18
CN1500076A (zh) 2004-05-26
RU2003130643A (ru) 2005-04-10
PL363620A1 (en) 2004-11-29
CN100584891C (zh) 2010-01-27
BR0208689A (pt) 2004-03-30
MXPA03009105A (es) 2004-02-12
US7947831B2 (en) 2011-05-24
EP1373196A2 (en) 2004-01-02
ZA200306720B (en) 2004-04-29
JP2004528442A (ja) 2004-09-16
US7160955B2 (en) 2007-01-09
RS77403A (sr) 2007-02-05
CN1966492B (zh) 2011-05-04
CA2440839C (en) 2010-10-05
KR20030094315A (ko) 2003-12-11
HUP0303740A3 (en) 2007-10-29
HUP0303740A2 (hu) 2004-03-01
JP2009108071A (ja) 2009-05-21
CN1966584A (zh) 2007-05-23
HRP20030800A2 (en) 2005-12-31
KR100873718B1 (ko) 2008-12-12
TWI230149B (en) 2005-04-01
CA2440839A1 (en) 2002-10-17
RU2291874C2 (ru) 2007-01-20
CZ20032671A3 (cs) 2003-12-17
WO2002081432A2 (en) 2002-10-17
UA76141C2 (en) 2006-07-17
SK12322003A3 (sk) 2004-04-06
WO2002081432A3 (en) 2003-10-30
CN100406524C (zh) 2008-07-30

Similar Documents

Publication Publication Date Title
JP2009108071A (ja) ポリマー上へグラフト化するためのスルホキシド又はスルホン
US20030109611A1 (en) Stabilization of synthetic polymers
KR100525177B1 (ko) 유기재료에대한안정화제혼합물
CN102027056B (zh) 用于乳液聚合的橡胶的基本稳定体系
EP0855998B1 (en) Antioxidants containing phenol groups and aromatic amine groups
US6596796B1 (en) Stabilizers for emulsion crude rubbers, synthetic latex and natural rubber latex
JP2005528447A (ja) ビス（２，４−ジクミルフェニル）ペンタエリトリトールジホスフィットの非晶質ソリッド改質物
EP1228135B1 (en) Stabilizers and antiozonants for elastomers
EP1934278B1 (en) Non-staining antidegradants for vulcanized elastomers
JP2006502197A (ja) 加硫物のためのグラフト可能な４−アミノ−３−スルフィニル−置換ジフェニルアミン安定剤
AU2002302471A1 (en) Sulfoxides or sulfones grafted onto polymers
KR20090006194A (ko) 안정화된 스판덱스 조성물

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050325

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050325

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20071207

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20071219

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20080319

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20080402

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20080421

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20080519

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20080430

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20080612

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080617

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20080806

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20081104

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20081215

A912 Re-examination (zenchi) completed and case transferred to appeal board

Free format text: JAPANESE INTERMEDIATE CODE: A912

Effective date: 20090109

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20110906

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20110909

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20111012

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120116

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120223

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150302

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees