JP4921091B2 - 複合構造物の製造方法、不純物除去処理装置、成膜装置、及び、複合構造物 - Google Patents

複合構造物の製造方法、不純物除去処理装置、成膜装置、及び、複合構造物 Download PDF

Info

Publication number
JP4921091B2
JP4921091B2 JP2006258902A JP2006258902A JP4921091B2 JP 4921091 B2 JP4921091 B2 JP 4921091B2 JP 2006258902 A JP2006258902 A JP 2006258902A JP 2006258902 A JP2006258902 A JP 2006258902A JP 4921091 B2 JP4921091 B2 JP 4921091B2
Authority
JP
Japan
Prior art keywords
raw material
material powder
carbon
substrate
composite structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006258902A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007119913A (ja
JP2007119913A5 (enExample
Inventor
哲 三好
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2006258902A priority Critical patent/JP4921091B2/ja
Publication of JP2007119913A publication Critical patent/JP2007119913A/ja
Publication of JP2007119913A5 publication Critical patent/JP2007119913A5/ja
Application granted granted Critical
Publication of JP4921091B2 publication Critical patent/JP4921091B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
JP2006258902A 2005-09-30 2006-09-25 複合構造物の製造方法、不純物除去処理装置、成膜装置、及び、複合構造物 Expired - Fee Related JP4921091B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006258902A JP4921091B2 (ja) 2005-09-30 2006-09-25 複合構造物の製造方法、不純物除去処理装置、成膜装置、及び、複合構造物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005289261 2005-09-30
JP2005289261 2005-09-30
JP2006258902A JP4921091B2 (ja) 2005-09-30 2006-09-25 複合構造物の製造方法、不純物除去処理装置、成膜装置、及び、複合構造物

Publications (3)

Publication Number Publication Date
JP2007119913A JP2007119913A (ja) 2007-05-17
JP2007119913A5 JP2007119913A5 (enExample) 2009-04-09
JP4921091B2 true JP4921091B2 (ja) 2012-04-18

Family

ID=38144051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006258902A Expired - Fee Related JP4921091B2 (ja) 2005-09-30 2006-09-25 複合構造物の製造方法、不純物除去処理装置、成膜装置、及び、複合構造物

Country Status (1)

Country Link
JP (1) JP4921091B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4879002B2 (ja) * 2006-12-04 2012-02-15 コバレントマテリアル株式会社 半導体製造装置用部材
EP2187708B1 (en) * 2007-09-10 2013-01-23 Ulvac, Inc. Film deposition apparatus with organic-material vapor generator
JP5130991B2 (ja) * 2008-03-27 2013-01-30 株式会社Ｉｈｉ コールドスプレー方法、コールドスプレー装置
JP2014145103A (ja) * 2013-01-29 2014-08-14 Hitachi Ltd 構造物作製装置および構造物作製方法
JP6122730B2 (ja) * 2013-08-08 2017-04-26 積水化学工業株式会社 成膜方法、成膜装置、光電極の製造方法および色素増感太陽電池の製造方法
KR102382221B1 (ko) * 2020-07-30 2022-04-04 한국핵융합에너지연구원 코팅용 분체 에어로졸 증착용 마이크로웨이브 플라즈마 노즐 및 이를 이용하는 코팅용 분체 에어로졸에 의한 코팅 장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001015472A (ja) * 1999-06-28 2001-01-19 Hoya Schott Kk 紫外光照射方法及び装置
JP2002235181A (ja) * 1999-10-12 2002-08-23 National Institute Of Advanced Industrial & Technology 複合構造物及びその製造方法並びに作製装置
JP3897623B2 (ja) * 2001-10-11 2007-03-28 独立行政法人産業技術総合研究所 複合構造物作製方法
TWI330672B (en) * 2002-05-28 2010-09-21 Nat Inst Of Advanced Ind Scien Method for forming ultrafine particle brittle material at low temperature
JP4075716B2 (ja) * 2003-07-16 2008-04-16 Ｔｏｔｏ株式会社 複合構造物作製装置
JP4094521B2 (ja) * 2003-10-17 2008-06-04 富士フイルム株式会社 構造物の製造方法

Also Published As

Publication number Publication date
JP2007119913A (ja) 2007-05-17

Similar Documents

Publication Publication Date Title
Reinhold et al. Argon plasma sintering of inkjet printed silver tracks on polymer substrates
EP1719735B1 (en) Ozone generator and ozone generating method
Calzada et al. Low‐temperature processing of ferroelectric thin films compatible with silicon integrated circuit technology
Stadnichenko et al. XPS, UPS, and STM studies of nanostructured CuO films
JP2012054586A (ja) 低比誘電率ＳｉＯｘ膜の製造方法
JP2006188046A (ja) セラミックス膜の製造方法及びセラミックス膜を含む構造物
US8268408B2 (en) Method of manufacturing composite structure, impurity removal processing apparatus, film forming apparatus, composite structure and raw material powder
Cho et al. Enhancement of nitridation in synthesis of aluminum nitride nanosize powders by pulsed wire discharge
JP4921091B2 (ja) 複合構造物の製造方法、不純物除去処理装置、成膜装置、及び、複合構造物
Oh et al. Fabrication and evaluation of lead-free piezoelectric ceramic LF4 thick film deposited by aerosol deposition method
Filipescu et al. Morphological and structural studies of WOx thin films deposited by laser ablation
CN101283118B (zh) 复合结构物
JP2011162855A (ja) イットリア膜の成膜方法
Canulescu et al. Properties of BaTiO3 thin films deposited by radiofrequency beam discharge assisted pulsed laser deposition
JP2004099400A (ja) 放電用電極部材およびこれを用いたオゾン発生器
Sankur Deposition of optical coatings by laser-assisted evaporation and by photo-assisted chemical vapor deposition
JP2004249157A (ja) 光触媒およびその製造方法
Kim et al. Thickness dependence of Pb (Zr0. 52Ti0. 48) O3 films prepared by pulsed laser deposition
JP6883274B2 (ja) 金属酸化物薄膜の製造方法及び薄膜製造装置
US7179718B2 (en) Structure and method of manufacturing the same
JP4885668B2 (ja) 構造物の製造方法、及び、複合構造物
JP3158310B2 (ja) 半導体装置、その製造方法及びＰｔ電極形成用スパッタリングターゲット
Watanabe et al. Direct patterning of crystallized BaTiO3 and TiO2 films in aqueous solutions
JP2006297270A (ja) 構造物の製造方法及び製造装置、構造物
JPH10130848A (ja) 酸化物の成膜方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090220

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090220

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20090427

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110830

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20111028

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120131

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120202

R150 Certificate of patent or registration of utility model

Ref document number: 4921091

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150210

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees