JP4920048B2 - マスクと印刷版の接合 - Google Patents

マスクと印刷版の接合 Download PDF

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Publication number
JP4920048B2
JP4920048B2 JP2008556330A JP2008556330A JP4920048B2 JP 4920048 B2 JP4920048 B2 JP 4920048B2 JP 2008556330 A JP2008556330 A JP 2008556330A JP 2008556330 A JP2008556330 A JP 2008556330A JP 4920048 B2 JP4920048 B2 JP 4920048B2
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Japan
Prior art keywords
mask
cylinder
printing plate
drum
image
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JP2008556330A
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English (en)
Japanese (ja)
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JP2009527797A (ja
JP2009527797A5 (enExample
Inventor
グレゴリー ロイド ズワードロ
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イーストマン コダック カンパニー
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Publication of JP2009527797A5 publication Critical patent/JP2009527797A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Inking, Control Or Cleaning Of Printing Machines (AREA)
JP2008556330A 2006-02-24 2007-01-25 マスクと印刷版の接合 Active JP4920048B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/361,492 US20070202442A1 (en) 2006-02-24 2006-02-24 Method and apparatus for merging a mask and a printing plate
US11/361,492 2006-02-24
PCT/US2007/002222 WO2007106241A2 (en) 2006-02-24 2007-01-25 Merging a mask and a printing plate

Publications (3)

Publication Number Publication Date
JP2009527797A JP2009527797A (ja) 2009-07-30
JP2009527797A5 JP2009527797A5 (enExample) 2010-03-04
JP4920048B2 true JP4920048B2 (ja) 2012-04-18

Family

ID=38066420

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008556330A Active JP4920048B2 (ja) 2006-02-24 2007-01-25 マスクと印刷版の接合

Country Status (4)

Country Link
US (1) US20070202442A1 (enExample)
EP (1) EP1987399B1 (enExample)
JP (1) JP4920048B2 (enExample)
WO (1) WO2007106241A2 (enExample)

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KR101422298B1 (ko) * 2006-09-08 2014-08-13 가부시키가이샤 니콘 마스크, 노광 장치, 노광 방법 및 그 노광 장치 또는 노광 방법을 이용한 디바이스 제조 방법
JP2009093027A (ja) * 2007-10-10 2009-04-30 Csun Mfg Ltd マスクパターンフィルム圧着機の圧着構造及びその圧着方法
US8578853B2 (en) * 2008-12-24 2013-11-12 Printing Research, Inc. Anti-marking jackets comprised of attachment structure and methods of using in offset printing
US8281716B2 (en) * 2008-12-24 2012-10-09 Printing Research, Inc. Anti-marking jackets comprised of fluoropolymer and methods of using in offset printing
US8424453B2 (en) 2010-09-01 2013-04-23 Printing Research, Inc. Apparatus and method for adjusting anti-marking jackets
US8677899B2 (en) 2011-01-31 2014-03-25 Printing Research, Inc. Reversible anti-marking jackets and methods of using
TWI575330B (zh) * 2012-03-27 2017-03-21 尼康股份有限公司 光罩搬送裝置、光罩保持裝置、基板處理裝置、及元件製造方法
CN104246618B (zh) * 2012-04-19 2016-04-20 株式会社尼康 掩模单元以及基板处理装置
US9346258B2 (en) 2012-05-02 2016-05-24 Printing Research, Inc. Method for cleaning anti-marking jackets
US20140101915A1 (en) * 2012-10-17 2014-04-17 Macdermid Printing Solutions, Llc Loading/Unloading System for Printing Plates

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JPS58174950A (ja) * 1982-04-08 1983-10-14 Manabu Fukuda 輪転印刷用帯状凸版
US4515877A (en) * 1982-11-27 1985-05-07 Basf Aktiengesellschaft Image-recording materials and image-recording carried out using these to produce an optical mask
US4589338A (en) * 1984-02-17 1986-05-20 Billy Collins Flexographic plate mounting apparatus and method
US4727806A (en) * 1985-08-26 1988-03-01 Wilson Engraving Company, Inc. Pin register system for flexographic printing plates
DE3919281C1 (enExample) * 1989-06-13 1991-01-24 Heidelberger Druckmaschinen Ag, 6900 Heidelberg, De
US5262275A (en) * 1992-08-07 1993-11-16 E. I. Du Pont De Nemours And Company Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate
US5607814A (en) * 1992-08-07 1997-03-04 E. I. Du Pont De Nemours And Company Process and element for making a relief image using an IR sensitive layer
US5387496A (en) * 1993-07-30 1995-02-07 Eastman Kodak Company Interlayer for laser ablative imaging
DE69407888T2 (de) * 1993-07-30 1998-04-30 Eastman Kodak Co Sperrschicht für ein Bilderzeugungsverfahren durch Laserablation
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Also Published As

Publication number Publication date
WO2007106241A2 (en) 2007-09-20
JP2009527797A (ja) 2009-07-30
EP1987399B1 (en) 2013-05-22
WO2007106241A3 (en) 2008-01-10
EP1987399A2 (en) 2008-11-05
US20070202442A1 (en) 2007-08-30

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