JP4912561B2 - 光に安定なシリル化ベンゾトリアゾールuv吸収剤及びそれにより安定化された組成物 - Google Patents

光に安定なシリル化ベンゾトリアゾールuv吸収剤及びそれにより安定化された組成物 Download PDF

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Publication number
JP4912561B2
JP4912561B2 JP2002518227A JP2002518227A JP4912561B2 JP 4912561 B2 JP4912561 B2 JP 4912561B2 JP 2002518227 A JP2002518227 A JP 2002518227A JP 2002518227 A JP2002518227 A JP 2002518227A JP 4912561 B2 JP4912561 B2 JP 4912561B2
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Japan
Prior art keywords
tert
butyl
carbon atoms
benzotriazole
hydroxy
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Expired - Fee Related
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JP2002518227A
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English (en)
Japanese (ja)
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JP2004505984A5 (enExample
JP2004505984A (ja
Inventor
ラビチャンドラン,ラマナサン
スハドルニク,ヨセフ
ウッド,マービン・ゲイル
クシオン,ロン
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BASF Schweiz AG
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Ciba Holding AG
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Publication of JP2004505984A5 publication Critical patent/JP2004505984A5/ja
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/0803Compounds with Si-C or Si-Si linkages
    • C07F7/081Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • C07F7/0812Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te comprising a heterocyclic ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D249/00Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18Benzotriazoles
    • C07D249/20Benzotriazoles with aryl radicals directly attached in position 2
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804Compounds having Si-O-C linkages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472Five-membered rings
    • C08K5/3475Five-membered rings condensed with carbocyclic rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/54Silicon-containing compounds
    • C08K5/544Silicon-containing compounds containing nitrogen
    • C08K5/5477Silicon-containing compounds containing nitrogen containing nitrogen in a heterocyclic ring

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Paper (AREA)
JP2002518227A 2000-08-03 2001-07-26 光に安定なシリル化ベンゾトリアゾールuv吸収剤及びそれにより安定化された組成物 Expired - Fee Related JP4912561B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US22278300P 2000-08-03 2000-08-03
US60/222,783 2000-08-03
US30304801P 2001-07-05 2001-07-05
US60/303,048 2001-07-05
PCT/EP2001/008663 WO2002012252A1 (en) 2000-08-03 2001-07-26 Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith

Publications (3)

Publication Number Publication Date
JP2004505984A JP2004505984A (ja) 2004-02-26
JP2004505984A5 JP2004505984A5 (enExample) 2008-09-11
JP4912561B2 true JP4912561B2 (ja) 2012-04-11

Family

ID=26917137

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002518227A Expired - Fee Related JP4912561B2 (ja) 2000-08-03 2001-07-26 光に安定なシリル化ベンゾトリアゾールuv吸収剤及びそれにより安定化された組成物

Country Status (9)

Country Link
US (1) US6677392B2 (enExample)
EP (1) EP1305320B1 (enExample)
JP (1) JP4912561B2 (enExample)
KR (1) KR20030022347A (enExample)
AT (1) ATE327997T1 (enExample)
AU (1) AU2001293708A1 (enExample)
DE (1) DE60120178T2 (enExample)
TW (1) TW548303B (enExample)
WO (1) WO2002012252A1 (enExample)

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JP3829933B2 (ja) * 2002-05-16 2006-10-04 信越化学工業株式会社 難燃性シリコーン組成物
US20040185269A1 (en) * 2003-03-18 2004-09-23 Loper Scott W. Scratch and mar resistant low VOC coating composition
EP1620500B1 (en) * 2003-05-06 2012-07-11 Basf Se Photo-cured and stabilized coatings
US8053159B2 (en) * 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP2005343969A (ja) * 2004-06-01 2005-12-15 Showa Techno Coat Kk 紫外線遮蔽塗料
US7642303B2 (en) * 2004-10-15 2010-01-05 Shakely Thomas L Thermoplastic articles for packaging UV sensitive materials, processes for the articles production and use and novel UV absorbers
US7364672B2 (en) * 2004-12-06 2008-04-29 Arlon, Inc. Low loss prepregs, compositions useful for the preparation thereof and uses therefor
JP4595061B2 (ja) * 2005-03-24 2010-12-08 東レ・モノフィラメント株式会社 工業布帛用ポリアミドステープルおよび工業布帛
JP4595060B2 (ja) * 2005-03-24 2010-12-08 東レ・モノフィラメント株式会社 工業織物用ポリアミドモノフィラメントおよび工業織物
JP2007231099A (ja) * 2006-02-28 2007-09-13 Fujifilm Corp 分散物
US20080009211A1 (en) * 2006-07-07 2008-01-10 Matthew Raymond Himes Assemblies useful for the preparation of electronic components and methods for making same
KR101228650B1 (ko) * 2006-07-21 2013-01-31 코니카 미놀타 어드밴스드 레이어즈 인코포레이티드 광학 필름, 그의 제조 방법, 편광판 및 액정 표시 장치
JP5190650B2 (ja) * 2007-02-14 2013-04-24 シプロ化成株式会社 ベンゾトリアゾール誘導体化合物
US8642246B2 (en) * 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US7772355B2 (en) * 2008-01-28 2010-08-10 The United States Of America As Represented By The Secretary Of The Navy Divinylsilane-terminated aromatic ether-aromatic ketone-containing compounds
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP5907588B2 (ja) * 2011-04-04 2016-04-26 関西ペイント株式会社 シルセスキオキサン化合物及びこれを含むコーティング組成物
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
EP2781555A4 (en) * 2011-11-18 2015-10-07 Adeka Corp NEW COMPOUND AND SUPPORT SUPPORTING THIS NEW COMPOUND
JP5910478B2 (ja) * 2012-12-07 2016-04-27 信越化学工業株式会社 樹脂用コーティング剤組成物
WO2015130652A1 (en) 2014-02-25 2015-09-03 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Synthesis of oligomeric divinyldialkylsilane containing compositions
JP6908519B2 (ja) 2014-11-20 2021-07-28 サイテク・インダストリーズ・インコーポレーテツド 安定剤組成物、ならびに有機材料をuv線および熱劣化から保護するためのその使用方法
EP3194502A4 (en) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
JP6975705B2 (ja) 2015-07-07 2021-12-01 スリーエム イノベイティブ プロパティズ カンパニー 置換ベンゾトリアゾールフェノール
WO2017122503A1 (ja) 2016-01-12 2017-07-20 富士フイルム株式会社 組成物、膜、ガラス物品、化合物、高純度組成物、化合物の製造方法および膜の製造方法
WO2019091995A1 (en) 2017-11-10 2019-05-16 Merck Patent Gmbh Organic semiconducting compounds
EP3578599A1 (en) 2018-06-08 2019-12-11 Cytec Industries Inc. Granular stabilizer compositions for use in polymer resins and methods of making same
CN113728070B (zh) 2019-04-26 2024-03-08 三吉油脂株式会社 耐热性优异和长波长吸收优异的紫外线吸收剂
CN111548659A (zh) * 2020-06-01 2020-08-18 烟台布莱特光电材料有限公司 一种新型的uv固化物及其制备的mini led荧光膜片
CN120092045A (zh) 2022-10-18 2025-06-03 塞特工业公司 协同稳定剂组合物以及使用其保护有机材料免于uv线和热降解的方法
WO2025056330A1 (en) 2023-09-13 2025-03-20 Cytec Industries Inc. Stabilized polymer compositions with improved color resistance

Citations (10)

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Publication number Priority date Publication date Assignee Title
JPS5721431A (en) * 1980-05-30 1982-02-04 Gen Electric Silicone coated material and product and manufacture
JPS5721391A (en) * 1980-05-30 1982-02-04 Gen Electric Alkoxy silane and manufacture
US4439494A (en) * 1982-03-01 1984-03-27 General Electric Company Silyl-polyacrylates for polycarbonate substrates
JPH0196259A (ja) * 1987-10-09 1989-04-14 Adeka Argus Chem Co Ltd 耐光性の改善された高分子材料組成物
JPH06115270A (ja) * 1992-10-01 1994-04-26 Fuji Photo Film Co Ltd 熱転写受像材料
JPH08208665A (ja) * 1994-11-08 1996-08-13 L'oreal Sa 新規なサンスクリーン剤およびそれらを含有する化粧品組成物類とその使用方法
JPH08245944A (ja) * 1995-03-13 1996-09-24 Nippon Oil Co Ltd 紫外線吸収剤及びコーティング材料
JPH0973106A (ja) * 1995-07-04 1997-03-18 Nippon Oil Co Ltd 調光素子
JPH10219231A (ja) * 1997-01-31 1998-08-18 Nippon Oil Co Ltd 紫外線吸収材料の製造方法
JP2001214121A (ja) * 2000-02-04 2001-08-07 Shin Etsu Chem Co Ltd コーティング剤組成物並びにコーティング方法及びコーティング物品

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US4373061A (en) 1980-05-30 1983-02-08 General Electric Company Silicone coating for unprimed plastic substrate and coated articles
US4322455A (en) 1980-09-15 1982-03-30 General Electric Company Process for producing an ultraviolet radiation stabilized polymeric article
US4859759A (en) 1988-04-14 1989-08-22 Kimberly-Clark Corporation Siloxane containing benzotriazolyl/tetraalkylpiperidyl substituent
IT1243409B (it) 1990-12-17 1994-06-10 Ciba Geigy Spa Composti piperidinici contenenti gruppi silenici atti all'impiego come stabilizzanti per materiali organici
EP0502821B1 (de) 1991-03-05 1996-01-31 Ciba-Geigy Ag Silylierte 2-(2-Hydroxyphenyl)-4,6-diaryl-1,3,5-triazine
IT1270870B (it) 1993-03-11 1997-05-13 Ciba Geigy Ag Composti polimetilipeperidinici contenenti gruppi silanici atti all'impiego come stabilizzanti per materiali organici
EP0667379B1 (de) 1994-02-10 2002-07-17 Ciba SC Holding AG Holzschutzanstrich
US5391795A (en) 1994-02-18 1995-02-21 General Electric Company Silylated agents useful for absorbing ultraviolet light
US6576797B1 (en) 1994-03-31 2003-06-10 Ciba Specialty Chemicals Corporation Thioether substituted hydroxybenzophenones and stabilized compositions
TW325490B (en) 1995-06-23 1998-01-21 Ciba Sc Holding Ag Polysiloxane light stabilizers
JPH11508629A (ja) 1995-07-03 1999-07-27 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド ポリシラン
US6166218A (en) 1996-11-07 2000-12-26 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability
US5679820A (en) 1996-12-16 1997-10-21 General Electric Company Silylated ultraviolet light absorbers having resistance to humidity

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5721431A (en) * 1980-05-30 1982-02-04 Gen Electric Silicone coated material and product and manufacture
JPS5721391A (en) * 1980-05-30 1982-02-04 Gen Electric Alkoxy silane and manufacture
US4439494A (en) * 1982-03-01 1984-03-27 General Electric Company Silyl-polyacrylates for polycarbonate substrates
JPH0196259A (ja) * 1987-10-09 1989-04-14 Adeka Argus Chem Co Ltd 耐光性の改善された高分子材料組成物
JPH06115270A (ja) * 1992-10-01 1994-04-26 Fuji Photo Film Co Ltd 熱転写受像材料
JPH08208665A (ja) * 1994-11-08 1996-08-13 L'oreal Sa 新規なサンスクリーン剤およびそれらを含有する化粧品組成物類とその使用方法
JPH08245944A (ja) * 1995-03-13 1996-09-24 Nippon Oil Co Ltd 紫外線吸収剤及びコーティング材料
JPH0973106A (ja) * 1995-07-04 1997-03-18 Nippon Oil Co Ltd 調光素子
JPH10219231A (ja) * 1997-01-31 1998-08-18 Nippon Oil Co Ltd 紫外線吸収材料の製造方法
JP2001214121A (ja) * 2000-02-04 2001-08-07 Shin Etsu Chem Co Ltd コーティング剤組成物並びにコーティング方法及びコーティング物品

Also Published As

Publication number Publication date
EP1305320B1 (en) 2006-05-31
DE60120178D1 (de) 2006-07-06
KR20030022347A (ko) 2003-03-15
EP1305320A1 (en) 2003-05-02
US6677392B2 (en) 2004-01-13
US20020115753A1 (en) 2002-08-22
ATE327997T1 (de) 2006-06-15
JP2004505984A (ja) 2004-02-26
AU2001293708A1 (en) 2002-02-18
WO2002012252A1 (en) 2002-02-14
TW548303B (en) 2003-08-21
DE60120178T2 (de) 2007-04-26

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