JP4912561B2 - 光に安定なシリル化ベンゾトリアゾールuv吸収剤及びそれにより安定化された組成物 - Google Patents
光に安定なシリル化ベンゾトリアゾールuv吸収剤及びそれにより安定化された組成物 Download PDFInfo
- Publication number
- JP4912561B2 JP4912561B2 JP2002518227A JP2002518227A JP4912561B2 JP 4912561 B2 JP4912561 B2 JP 4912561B2 JP 2002518227 A JP2002518227 A JP 2002518227A JP 2002518227 A JP2002518227 A JP 2002518227A JP 4912561 B2 JP4912561 B2 JP 4912561B2
- Authority
- JP
- Japan
- Prior art keywords
- tert
- butyl
- carbon atoms
- benzotriazole
- hydroxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 239000012964 benzotriazole Substances 0.000 title claims description 26
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- -1 alpha-cumyl Chemical group 0.000 claims abstract description 109
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- 239000011241 protective layer Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000012088 reference solution Substances 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- IJRHDFLHUATAOS-DPMBMXLASA-M sodium ricinoleate Chemical compound [Na+].CCCCCC[C@@H](O)C\C=C/CCCCCCCC([O-])=O IJRHDFLHUATAOS-DPMBMXLASA-M 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- WWJZWCUNLNYYAU-UHFFFAOYSA-N temephos Chemical compound C1=CC(OP(=S)(OC)OC)=CC=C1SC1=CC=C(OP(=S)(OC)OC)C=C1 WWJZWCUNLNYYAU-UHFFFAOYSA-N 0.000 description 1
- MHSKRLJMQQNJNC-UHFFFAOYSA-N terephthalamide Chemical compound NC(=O)C1=CC=C(C(N)=O)C=C1 MHSKRLJMQQNJNC-UHFFFAOYSA-N 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 238000004809 thin layer chromatography Methods 0.000 description 1
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
- CLBRRQXSGPYXBX-UHFFFAOYSA-N tribenzylsilane Chemical compound C=1C=CC=CC=1C[SiH](CC=1C=CC=CC=1)CC1=CC=CC=C1 CLBRRQXSGPYXBX-UHFFFAOYSA-N 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- IVIIAEVMQHEPAY-UHFFFAOYSA-N tridodecyl phosphite Chemical compound CCCCCCCCCCCCOP(OCCCCCCCCCCCC)OCCCCCCCCCCCC IVIIAEVMQHEPAY-UHFFFAOYSA-N 0.000 description 1
- 125000005591 trimellitate group Chemical group 0.000 description 1
- CNUJLMSKURPSHE-UHFFFAOYSA-N trioctadecyl phosphite Chemical compound CCCCCCCCCCCCCCCCCCOP(OCCCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCCCC CNUJLMSKURPSHE-UHFFFAOYSA-N 0.000 description 1
- AKQNYQDSIDKVJZ-UHFFFAOYSA-N triphenylsilane Chemical compound C1=CC=CC=C1[SiH](C=1C=CC=CC=1)C1=CC=CC=C1 AKQNYQDSIDKVJZ-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 235000015112 vegetable and seed oil Nutrition 0.000 description 1
- 235000019871 vegetable fat Nutrition 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
- C07F7/0812—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te comprising a heterocyclic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
- C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
- C08K5/3475—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/544—Silicon-containing compounds containing nitrogen
- C08K5/5477—Silicon-containing compounds containing nitrogen containing nitrogen in a heterocyclic ring
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Paper (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US22278300P | 2000-08-03 | 2000-08-03 | |
| US60/222,783 | 2000-08-03 | ||
| US30304801P | 2001-07-05 | 2001-07-05 | |
| US60/303,048 | 2001-07-05 | ||
| PCT/EP2001/008663 WO2002012252A1 (en) | 2000-08-03 | 2001-07-26 | Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004505984A JP2004505984A (ja) | 2004-02-26 |
| JP2004505984A5 JP2004505984A5 (enExample) | 2008-09-11 |
| JP4912561B2 true JP4912561B2 (ja) | 2012-04-11 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002518227A Expired - Fee Related JP4912561B2 (ja) | 2000-08-03 | 2001-07-26 | 光に安定なシリル化ベンゾトリアゾールuv吸収剤及びそれにより安定化された組成物 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6677392B2 (enExample) |
| EP (1) | EP1305320B1 (enExample) |
| JP (1) | JP4912561B2 (enExample) |
| KR (1) | KR20030022347A (enExample) |
| AT (1) | ATE327997T1 (enExample) |
| AU (1) | AU2001293708A1 (enExample) |
| DE (1) | DE60120178T2 (enExample) |
| TW (1) | TW548303B (enExample) |
| WO (1) | WO2002012252A1 (enExample) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20040066124A (ko) * | 2001-11-15 | 2004-07-23 | 허니웰 인터내셔널 인코포레이티드 | 포토리소그라피용 스핀온 반사 방지 피막 |
| JP3829933B2 (ja) * | 2002-05-16 | 2006-10-04 | 信越化学工業株式会社 | 難燃性シリコーン組成物 |
| US20040185269A1 (en) * | 2003-03-18 | 2004-09-23 | Loper Scott W. | Scratch and mar resistant low VOC coating composition |
| EP1620500B1 (en) * | 2003-05-06 | 2012-07-11 | Basf Se | Photo-cured and stabilized coatings |
| US8053159B2 (en) * | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| JP2005343969A (ja) * | 2004-06-01 | 2005-12-15 | Showa Techno Coat Kk | 紫外線遮蔽塗料 |
| US7642303B2 (en) * | 2004-10-15 | 2010-01-05 | Shakely Thomas L | Thermoplastic articles for packaging UV sensitive materials, processes for the articles production and use and novel UV absorbers |
| US7364672B2 (en) * | 2004-12-06 | 2008-04-29 | Arlon, Inc. | Low loss prepregs, compositions useful for the preparation thereof and uses therefor |
| JP4595061B2 (ja) * | 2005-03-24 | 2010-12-08 | 東レ・モノフィラメント株式会社 | 工業布帛用ポリアミドステープルおよび工業布帛 |
| JP4595060B2 (ja) * | 2005-03-24 | 2010-12-08 | 東レ・モノフィラメント株式会社 | 工業織物用ポリアミドモノフィラメントおよび工業織物 |
| JP2007231099A (ja) * | 2006-02-28 | 2007-09-13 | Fujifilm Corp | 分散物 |
| US20080009211A1 (en) * | 2006-07-07 | 2008-01-10 | Matthew Raymond Himes | Assemblies useful for the preparation of electronic components and methods for making same |
| KR101228650B1 (ko) * | 2006-07-21 | 2013-01-31 | 코니카 미놀타 어드밴스드 레이어즈 인코포레이티드 | 광학 필름, 그의 제조 방법, 편광판 및 액정 표시 장치 |
| JP5190650B2 (ja) * | 2007-02-14 | 2013-04-24 | シプロ化成株式会社 | ベンゾトリアゾール誘導体化合物 |
| US8642246B2 (en) * | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
| US7772355B2 (en) * | 2008-01-28 | 2010-08-10 | The United States Of America As Represented By The Secretary Of The Navy | Divinylsilane-terminated aromatic ether-aromatic ketone-containing compounds |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| JP5907588B2 (ja) * | 2011-04-04 | 2016-04-26 | 関西ペイント株式会社 | シルセスキオキサン化合物及びこれを含むコーティング組成物 |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| EP2781555A4 (en) * | 2011-11-18 | 2015-10-07 | Adeka Corp | NEW COMPOUND AND SUPPORT SUPPORTING THIS NEW COMPOUND |
| JP5910478B2 (ja) * | 2012-12-07 | 2016-04-27 | 信越化学工業株式会社 | 樹脂用コーティング剤組成物 |
| WO2015130652A1 (en) | 2014-02-25 | 2015-09-03 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Synthesis of oligomeric divinyldialkylsilane containing compositions |
| JP6908519B2 (ja) | 2014-11-20 | 2021-07-28 | サイテク・インダストリーズ・インコーポレーテツド | 安定剤組成物、ならびに有機材料をuv線および熱劣化から保護するためのその使用方法 |
| EP3194502A4 (en) | 2015-04-13 | 2018-05-16 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
| JP6975705B2 (ja) | 2015-07-07 | 2021-12-01 | スリーエム イノベイティブ プロパティズ カンパニー | 置換ベンゾトリアゾールフェノール |
| WO2017122503A1 (ja) | 2016-01-12 | 2017-07-20 | 富士フイルム株式会社 | 組成物、膜、ガラス物品、化合物、高純度組成物、化合物の製造方法および膜の製造方法 |
| WO2019091995A1 (en) | 2017-11-10 | 2019-05-16 | Merck Patent Gmbh | Organic semiconducting compounds |
| EP3578599A1 (en) | 2018-06-08 | 2019-12-11 | Cytec Industries Inc. | Granular stabilizer compositions for use in polymer resins and methods of making same |
| CN113728070B (zh) | 2019-04-26 | 2024-03-08 | 三吉油脂株式会社 | 耐热性优异和长波长吸收优异的紫外线吸收剂 |
| CN111548659A (zh) * | 2020-06-01 | 2020-08-18 | 烟台布莱特光电材料有限公司 | 一种新型的uv固化物及其制备的mini led荧光膜片 |
| CN120092045A (zh) | 2022-10-18 | 2025-06-03 | 塞特工业公司 | 协同稳定剂组合物以及使用其保护有机材料免于uv线和热降解的方法 |
| WO2025056330A1 (en) | 2023-09-13 | 2025-03-20 | Cytec Industries Inc. | Stabilized polymer compositions with improved color resistance |
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| JPS5721431A (en) * | 1980-05-30 | 1982-02-04 | Gen Electric | Silicone coated material and product and manufacture |
| JPS5721391A (en) * | 1980-05-30 | 1982-02-04 | Gen Electric | Alkoxy silane and manufacture |
| US4439494A (en) * | 1982-03-01 | 1984-03-27 | General Electric Company | Silyl-polyacrylates for polycarbonate substrates |
| JPH0196259A (ja) * | 1987-10-09 | 1989-04-14 | Adeka Argus Chem Co Ltd | 耐光性の改善された高分子材料組成物 |
| JPH06115270A (ja) * | 1992-10-01 | 1994-04-26 | Fuji Photo Film Co Ltd | 熱転写受像材料 |
| JPH08208665A (ja) * | 1994-11-08 | 1996-08-13 | L'oreal Sa | 新規なサンスクリーン剤およびそれらを含有する化粧品組成物類とその使用方法 |
| JPH08245944A (ja) * | 1995-03-13 | 1996-09-24 | Nippon Oil Co Ltd | 紫外線吸収剤及びコーティング材料 |
| JPH0973106A (ja) * | 1995-07-04 | 1997-03-18 | Nippon Oil Co Ltd | 調光素子 |
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| JP2001214121A (ja) * | 2000-02-04 | 2001-08-07 | Shin Etsu Chem Co Ltd | コーティング剤組成物並びにコーティング方法及びコーティング物品 |
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2001
- 2001-07-26 AU AU2001293708A patent/AU2001293708A1/en not_active Abandoned
- 2001-07-26 EP EP01974090A patent/EP1305320B1/en not_active Expired - Lifetime
- 2001-07-26 DE DE60120178T patent/DE60120178T2/de not_active Expired - Lifetime
- 2001-07-26 WO PCT/EP2001/008663 patent/WO2002012252A1/en not_active Ceased
- 2001-07-26 AT AT01974090T patent/ATE327997T1/de not_active IP Right Cessation
- 2001-07-26 KR KR10-2003-7001515A patent/KR20030022347A/ko not_active Ceased
- 2001-07-26 JP JP2002518227A patent/JP4912561B2/ja not_active Expired - Fee Related
- 2001-08-01 TW TW090118730A patent/TW548303B/zh not_active IP Right Cessation
- 2001-08-01 US US09/919,974 patent/US6677392B2/en not_active Expired - Fee Related
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| JPS5721431A (en) * | 1980-05-30 | 1982-02-04 | Gen Electric | Silicone coated material and product and manufacture |
| JPS5721391A (en) * | 1980-05-30 | 1982-02-04 | Gen Electric | Alkoxy silane and manufacture |
| US4439494A (en) * | 1982-03-01 | 1984-03-27 | General Electric Company | Silyl-polyacrylates for polycarbonate substrates |
| JPH0196259A (ja) * | 1987-10-09 | 1989-04-14 | Adeka Argus Chem Co Ltd | 耐光性の改善された高分子材料組成物 |
| JPH06115270A (ja) * | 1992-10-01 | 1994-04-26 | Fuji Photo Film Co Ltd | 熱転写受像材料 |
| JPH08208665A (ja) * | 1994-11-08 | 1996-08-13 | L'oreal Sa | 新規なサンスクリーン剤およびそれらを含有する化粧品組成物類とその使用方法 |
| JPH08245944A (ja) * | 1995-03-13 | 1996-09-24 | Nippon Oil Co Ltd | 紫外線吸収剤及びコーティング材料 |
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Also Published As
| Publication number | Publication date |
|---|---|
| EP1305320B1 (en) | 2006-05-31 |
| DE60120178D1 (de) | 2006-07-06 |
| KR20030022347A (ko) | 2003-03-15 |
| EP1305320A1 (en) | 2003-05-02 |
| US6677392B2 (en) | 2004-01-13 |
| US20020115753A1 (en) | 2002-08-22 |
| ATE327997T1 (de) | 2006-06-15 |
| JP2004505984A (ja) | 2004-02-26 |
| AU2001293708A1 (en) | 2002-02-18 |
| WO2002012252A1 (en) | 2002-02-14 |
| TW548303B (en) | 2003-08-21 |
| DE60120178T2 (de) | 2007-04-26 |
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