DE60120178T2 - Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden - Google Patents

Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden Download PDF

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Publication number
DE60120178T2
DE60120178T2 DE60120178T DE60120178T DE60120178T2 DE 60120178 T2 DE60120178 T2 DE 60120178T2 DE 60120178 T DE60120178 T DE 60120178T DE 60120178 T DE60120178 T DE 60120178T DE 60120178 T2 DE60120178 T2 DE 60120178T2
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DE
Germany
Prior art keywords
carbon atoms
tert
alkyl
phenyl
hydroxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60120178T
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German (de)
English (en)
Other versions
DE60120178D1 (de
Inventor
Ramanathan Suffern RAVICHANDRAN
Joseph Yorktown Heights SUHADOLNIK
Gale Mervin Poughquag WOOD
Rong Dobbs Ferry XIONG
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Application granted granted Critical
Publication of DE60120178D1 publication Critical patent/DE60120178D1/de
Publication of DE60120178T2 publication Critical patent/DE60120178T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • C07F7/0812—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te comprising a heterocyclic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472—Five-membered rings
    • C08K5/3475—Five-membered rings condensed with carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/544—Silicon-containing compounds containing nitrogen
    • C08K5/5477—Silicon-containing compounds containing nitrogen containing nitrogen in a heterocyclic ring

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Paper (AREA)
DE60120178T 2000-08-03 2001-07-26 Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden Expired - Lifetime DE60120178T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US22278300P 2000-08-03 2000-08-03
US222783P 2000-08-03
US30304801P 2001-07-05 2001-07-05
US303048P 2001-07-05
PCT/EP2001/008663 WO2002012252A1 (en) 2000-08-03 2001-07-26 Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith

Publications (2)

Publication Number Publication Date
DE60120178D1 DE60120178D1 (de) 2006-07-06
DE60120178T2 true DE60120178T2 (de) 2007-04-26

Family

ID=26917137

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60120178T Expired - Lifetime DE60120178T2 (de) 2000-08-03 2001-07-26 Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden

Country Status (9)

Country Link
US (1) US6677392B2 (enExample)
EP (1) EP1305320B1 (enExample)
JP (1) JP4912561B2 (enExample)
KR (1) KR20030022347A (enExample)
AT (1) ATE327997T1 (enExample)
AU (1) AU2001293708A1 (enExample)
DE (1) DE60120178T2 (enExample)
TW (1) TW548303B (enExample)
WO (1) WO2002012252A1 (enExample)

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JP2005343969A (ja) * 2004-06-01 2005-12-15 Showa Techno Coat Kk 紫外線遮蔽塗料
US7642303B2 (en) * 2004-10-15 2010-01-05 Shakely Thomas L Thermoplastic articles for packaging UV sensitive materials, processes for the articles production and use and novel UV absorbers
US7364672B2 (en) * 2004-12-06 2008-04-29 Arlon, Inc. Low loss prepregs, compositions useful for the preparation thereof and uses therefor
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US20080009211A1 (en) * 2006-07-07 2008-01-10 Matthew Raymond Himes Assemblies useful for the preparation of electronic components and methods for making same
WO2008010421A1 (en) * 2006-07-21 2008-01-24 Konica Minolta Opto, Inc. Optical film, process for producing the same, polarizing plate and liquid crystal display device
JP5190650B2 (ja) * 2007-02-14 2013-04-24 シプロ化成株式会社 ベンゾトリアゾール誘導体化合物
US8642246B2 (en) * 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US7772355B2 (en) 2008-01-28 2010-08-10 The United States Of America As Represented By The Secretary Of The Navy Divinylsilane-terminated aromatic ether-aromatic ketone-containing compounds
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP5907588B2 (ja) * 2011-04-04 2016-04-26 関西ペイント株式会社 シルセスキオキサン化合物及びこれを含むコーティング組成物
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
KR20140094507A (ko) * 2011-11-18 2014-07-30 가부시키가이샤 아데카 신규 화합물 및 이 신규 화합물을 담지한 담지체
JP5910478B2 (ja) * 2012-12-07 2016-04-27 信越化学工業株式会社 樹脂用コーティング剤組成物
WO2015130652A1 (en) 2014-02-25 2015-09-03 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Synthesis of oligomeric divinyldialkylsilane containing compositions
CN115368629B (zh) 2014-11-20 2025-09-02 塞特工业公司 稳定剂组合物以及使用该稳定剂组合物保护有机材料免受uv光和热降解的方法
WO2016167892A1 (en) 2015-04-13 2016-10-20 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
WO2017007672A1 (en) 2015-07-07 2017-01-12 3M Innovative Properties Company Substituted benzotriazole phenols
EP3404055B1 (en) 2016-01-12 2023-08-16 FUJIFILM Corporation Composition, film, glass article, compound, high purity composition, method for producing compound, and method for producing film
US12101992B2 (en) 2017-11-10 2024-09-24 Raynergy Tek Incorporation Organic semiconducting compounds
EP3578599A1 (en) 2018-06-08 2019-12-11 Cytec Industries Inc. Granular stabilizer compositions for use in polymer resins and methods of making same
WO2020218609A1 (ja) 2019-04-26 2020-10-29 ミヨシ油脂株式会社 耐熱性と長波長吸収に優れた紫外線吸収剤
CN111548659A (zh) * 2020-06-01 2020-08-18 烟台布莱特光电材料有限公司 一种新型的uv固化物及其制备的mini led荧光膜片
CN120092045A (zh) 2022-10-18 2025-06-03 塞特工业公司 协同稳定剂组合物以及使用其保护有机材料免于uv线和热降解的方法
TWI832549B (zh) 2022-11-11 2024-02-11 財團法人工業技術研究院 核殼粒子與鋰離子電池
CN121925446A (zh) 2023-09-13 2026-04-24 塞特工业公司 具有改善的耐变色性的稳定的聚合物组合物
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Also Published As

Publication number Publication date
JP4912561B2 (ja) 2012-04-11
JP2004505984A (ja) 2004-02-26
TW548303B (en) 2003-08-21
EP1305320B1 (en) 2006-05-31
KR20030022347A (ko) 2003-03-15
DE60120178D1 (de) 2006-07-06
WO2002012252A1 (en) 2002-02-14
US6677392B2 (en) 2004-01-13
ATE327997T1 (de) 2006-06-15
US20020115753A1 (en) 2002-08-22
AU2001293708A1 (en) 2002-02-18
EP1305320A1 (en) 2003-05-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: CIBA HOLDING INC., BASEL, CH

8328 Change in the person/name/address of the agent

Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC