JP4880820B2 - レーザ支援加工方法 - Google Patents
レーザ支援加工方法 Download PDFInfo
- Publication number
- JP4880820B2 JP4880820B2 JP2001012372A JP2001012372A JP4880820B2 JP 4880820 B2 JP4880820 B2 JP 4880820B2 JP 2001012372 A JP2001012372 A JP 2001012372A JP 2001012372 A JP2001012372 A JP 2001012372A JP 4880820 B2 JP4880820 B2 JP 4880820B2
- Authority
- JP
- Japan
- Prior art keywords
- laser
- processing method
- laser beam
- processed
- assisted processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
- B23K26/0853—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
- B23K26/0861—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane in at least in three axial directions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Laser Beam Processing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001012372A JP4880820B2 (ja) | 2001-01-19 | 2001-01-19 | レーザ支援加工方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001012372A JP4880820B2 (ja) | 2001-01-19 | 2001-01-19 | レーザ支援加工方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002210730A JP2002210730A (ja) | 2002-07-30 |
| JP2002210730A5 JP2002210730A5 (enExample) | 2008-04-10 |
| JP4880820B2 true JP4880820B2 (ja) | 2012-02-22 |
Family
ID=18879388
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001012372A Expired - Lifetime JP4880820B2 (ja) | 2001-01-19 | 2001-01-19 | レーザ支援加工方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4880820B2 (enExample) |
Cited By (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103111762A (zh) * | 2013-01-29 | 2013-05-22 | 无锡鼎晶光电科技有限公司 | 一种将激光打孔应用于蓝宝石片打孔的方法 |
| US9676167B2 (en) | 2013-12-17 | 2017-06-13 | Corning Incorporated | Laser processing of sapphire substrate and related applications |
| US9701563B2 (en) | 2013-12-17 | 2017-07-11 | Corning Incorporated | Laser cut composite glass article and method of cutting |
| US9815730B2 (en) | 2013-12-17 | 2017-11-14 | Corning Incorporated | Processing 3D shaped transparent brittle substrate |
| US9815144B2 (en) | 2014-07-08 | 2017-11-14 | Corning Incorporated | Methods and apparatuses for laser processing materials |
| US9850160B2 (en) | 2013-12-17 | 2017-12-26 | Corning Incorporated | Laser cutting of display glass compositions |
| US9850159B2 (en) | 2012-11-20 | 2017-12-26 | Corning Incorporated | High speed laser processing of transparent materials |
| US10047001B2 (en) | 2014-12-04 | 2018-08-14 | Corning Incorporated | Glass cutting systems and methods using non-diffracting laser beams |
| US10144093B2 (en) | 2013-12-17 | 2018-12-04 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
| US10173916B2 (en) | 2013-12-17 | 2019-01-08 | Corning Incorporated | Edge chamfering by mechanically processing laser cut glass |
| US10233112B2 (en) | 2013-12-17 | 2019-03-19 | Corning Incorporated | Laser processing of slots and holes |
| US10252931B2 (en) | 2015-01-12 | 2019-04-09 | Corning Incorporated | Laser cutting of thermally tempered substrates |
| US10280108B2 (en) | 2013-03-21 | 2019-05-07 | Corning Laser Technologies GmbH | Device and method for cutting out contours from planar substrates by means of laser |
| US10335902B2 (en) | 2014-07-14 | 2019-07-02 | Corning Incorporated | Method and system for arresting crack propagation |
| US10377658B2 (en) | 2016-07-29 | 2019-08-13 | Corning Incorporated | Apparatuses and methods for laser processing |
| US10421683B2 (en) | 2013-01-15 | 2019-09-24 | Corning Laser Technologies GmbH | Method and device for the laser-based machining of sheet-like substrates |
| US10522963B2 (en) | 2016-08-30 | 2019-12-31 | Corning Incorporated | Laser cutting of materials with intensity mapping optical system |
| US10525657B2 (en) | 2015-03-27 | 2020-01-07 | Corning Incorporated | Gas permeable window and method of fabricating the same |
| US10526234B2 (en) | 2014-07-14 | 2020-01-07 | Corning Incorporated | Interface block; system for and method of cutting a substrate being transparent within a range of wavelengths using such interface block |
| US10611667B2 (en) | 2014-07-14 | 2020-04-07 | Corning Incorporated | Method and system for forming perforations |
| US10688599B2 (en) | 2017-02-09 | 2020-06-23 | Corning Incorporated | Apparatus and methods for laser processing transparent workpieces using phase shifted focal lines |
| US10730783B2 (en) | 2016-09-30 | 2020-08-04 | Corning Incorporated | Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots |
| US10752534B2 (en) | 2016-11-01 | 2020-08-25 | Corning Incorporated | Apparatuses and methods for laser processing laminate workpiece stacks |
| US11062986B2 (en) | 2017-05-25 | 2021-07-13 | Corning Incorporated | Articles having vias with geometry attributes and methods for fabricating the same |
| US11078112B2 (en) | 2017-05-25 | 2021-08-03 | Corning Incorporated | Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same |
| US11111170B2 (en) | 2016-05-06 | 2021-09-07 | Corning Incorporated | Laser cutting and removal of contoured shapes from transparent substrates |
| US11114309B2 (en) | 2016-06-01 | 2021-09-07 | Corning Incorporated | Articles and methods of forming vias in substrates |
| US11186060B2 (en) | 2015-07-10 | 2021-11-30 | Corning Incorporated | Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same |
| US11478874B2 (en) | 2019-04-05 | 2022-10-25 | Tdk Corporation | Method of processing inorganic material substrate, device, and method of manufacturing device |
| US11542190B2 (en) | 2016-10-24 | 2023-01-03 | Corning Incorporated | Substrate processing station for laser-based machining of sheet-like glass substrates |
| US11556039B2 (en) | 2013-12-17 | 2023-01-17 | Corning Incorporated | Electrochromic coated glass articles and methods for laser processing the same |
| US11554984B2 (en) | 2018-02-22 | 2023-01-17 | Corning Incorporated | Alkali-free borosilicate glasses with low post-HF etch roughness |
| US11648623B2 (en) | 2014-07-14 | 2023-05-16 | Corning Incorporated | Systems and methods for processing transparent materials using adjustable laser beam focal lines |
| US11773004B2 (en) | 2015-03-24 | 2023-10-03 | Corning Incorporated | Laser cutting and processing of display glass compositions |
| US11774233B2 (en) | 2016-06-29 | 2023-10-03 | Corning Incorporated | Method and system for measuring geometric parameters of through holes |
| US12180108B2 (en) | 2017-12-19 | 2024-12-31 | Corning Incorporated | Methods for etching vias in glass-based articles employing positive charge organic molecules |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006142335A (ja) * | 2004-11-19 | 2006-06-08 | National Institute Of Advanced Industrial & Technology | レーザー加工装置 |
| JP4630971B2 (ja) * | 2004-12-21 | 2011-02-09 | 並木精密宝石株式会社 | パルスレーザによる微小構造の形成方法 |
| JP2006303360A (ja) * | 2005-04-25 | 2006-11-02 | Fujikura Ltd | 貫通配線基板、複合基板及び電子装置 |
| WO2007061018A1 (ja) * | 2005-11-22 | 2007-05-31 | Olympus Corporation | ガラス基材の加工方法およびガラス部品 |
| JP4402708B2 (ja) * | 2007-08-03 | 2010-01-20 | 浜松ホトニクス株式会社 | レーザ加工方法、レーザ加工装置及びその製造方法 |
| JP5478009B2 (ja) | 2007-11-09 | 2014-04-23 | 株式会社フジクラ | 半導体パッケージの製造方法 |
| JP5702556B2 (ja) | 2010-07-26 | 2015-04-15 | 浜松ホトニクス株式会社 | レーザ加工方法 |
| EP2599580A4 (en) | 2010-07-26 | 2016-12-28 | Hamamatsu Photonics Kk | LASER PROCESSING PROCESS |
| EP2599583B1 (en) | 2010-07-26 | 2020-04-01 | Hamamatsu Photonics K.K. | Substrate processing method |
| JP5574866B2 (ja) | 2010-07-26 | 2014-08-20 | 浜松ホトニクス株式会社 | レーザ加工方法 |
| JP5693074B2 (ja) | 2010-07-26 | 2015-04-01 | 浜松ホトニクス株式会社 | レーザ加工方法 |
| CN103026486B (zh) | 2010-07-26 | 2016-08-03 | 浜松光子学株式会社 | 中介物的制造方法 |
| EP2599582B1 (en) | 2010-07-26 | 2020-03-25 | Hamamatsu Photonics K.K. | Substrate processing method |
| WO2012014710A1 (ja) | 2010-07-26 | 2012-02-02 | 浜松ホトニクス株式会社 | レーザ加工方法 |
| US9108269B2 (en) | 2010-07-26 | 2015-08-18 | Hamamatsu Photonics K. K. | Method for manufacturing light-absorbing substrate and method for manufacturing mold for making same |
| KR101940334B1 (ko) | 2010-07-26 | 2019-01-18 | 하마마츠 포토닉스 가부시키가이샤 | 레이저 가공 방법 |
| JP5530522B2 (ja) | 2010-07-26 | 2014-06-25 | 浜松ホトニクス株式会社 | 半導体デバイスの製造方法 |
| JP5653110B2 (ja) | 2010-07-26 | 2015-01-14 | 浜松ホトニクス株式会社 | チップの製造方法 |
| JP2011066449A (ja) * | 2010-12-20 | 2011-03-31 | Fujikura Ltd | 貫通配線基板の製造方法、複合基板の製造方法、及びこれらの製造方法により形成された貫通配線基板や複合基板を用いた電子装置の製造方法 |
| WO2012160880A1 (ja) * | 2011-05-23 | 2012-11-29 | 並木精密宝石株式会社 | 発光素子の製造方法および発光素子 |
| CN103212822B (zh) * | 2012-01-19 | 2016-07-06 | 昆山思拓机器有限公司 | 全自动smt模板切割及检测一体化系统切割及检测方法 |
| JP6157245B2 (ja) * | 2013-07-01 | 2017-07-05 | 三菱電機株式会社 | レーザ加工装置およびレーザ光軸調整方法 |
| JP2015150609A (ja) | 2014-02-18 | 2015-08-24 | アイシン精機株式会社 | レーザ加工方法 |
| KR20210022773A (ko) | 2014-09-16 | 2021-03-03 | 엘피케이에프 레이저 앤드 일렉트로닉스 악티엔게젤샤프트 | 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법 |
| LT3311947T (lt) * | 2016-09-30 | 2019-12-27 | Corning Incorporated | Skaidrių ruošinių lazerinio apdirbimo, naudojant spindulių pluošto dėmes be simetrijos ašių, būdas |
| NL2017998B1 (en) * | 2016-12-14 | 2018-06-26 | Corning Inc | Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots |
| US10626040B2 (en) | 2017-06-15 | 2020-04-21 | Corning Incorporated | Articles capable of individual singulation |
| CN111830695B (zh) * | 2020-07-31 | 2025-03-11 | 北京兆维电子(集团)有限责任公司 | 一种oled显示面板亮点缺陷修正系统 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09258012A (ja) * | 1996-03-26 | 1997-10-03 | Sharp Corp | レーザビーム発生用光学素子及びレーザビーム発生装置 |
| JP3433110B2 (ja) * | 1998-08-03 | 2003-08-04 | 科学技術振興事業団 | 3次元的回折光学素子及びその製造方法 |
| JP2000343714A (ja) * | 1999-04-02 | 2000-12-12 | Seiko Epson Corp | 水晶穴加工方法およびインクジェット式記録ヘッドの製造方法 |
| JP2000288766A (ja) * | 1999-04-07 | 2000-10-17 | Kubota Corp | レーザ加工装置 |
-
2001
- 2001-01-19 JP JP2001012372A patent/JP4880820B2/ja not_active Expired - Lifetime
Cited By (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9850159B2 (en) | 2012-11-20 | 2017-12-26 | Corning Incorporated | High speed laser processing of transparent materials |
| US11345625B2 (en) | 2013-01-15 | 2022-05-31 | Corning Laser Technologies GmbH | Method and device for the laser-based machining of sheet-like substrates |
| US11028003B2 (en) | 2013-01-15 | 2021-06-08 | Corning Laser Technologies GmbH | Method and device for laser-based machining of flat substrates |
| US10421683B2 (en) | 2013-01-15 | 2019-09-24 | Corning Laser Technologies GmbH | Method and device for the laser-based machining of sheet-like substrates |
| CN103111762B (zh) * | 2013-01-29 | 2015-12-09 | 无锡鼎晶光电科技有限公司 | 一种将激光打孔应用于蓝宝石片打孔的方法 |
| CN103111762A (zh) * | 2013-01-29 | 2013-05-22 | 无锡鼎晶光电科技有限公司 | 一种将激光打孔应用于蓝宝石片打孔的方法 |
| US10280108B2 (en) | 2013-03-21 | 2019-05-07 | Corning Laser Technologies GmbH | Device and method for cutting out contours from planar substrates by means of laser |
| US11713271B2 (en) | 2013-03-21 | 2023-08-01 | Corning Laser Technologies GmbH | Device and method for cutting out contours from planar substrates by means of laser |
| US10611668B2 (en) | 2013-12-17 | 2020-04-07 | Corning Incorporated | Laser cut composite glass article and method of cutting |
| US9701563B2 (en) | 2013-12-17 | 2017-07-11 | Corning Incorporated | Laser cut composite glass article and method of cutting |
| US10173916B2 (en) | 2013-12-17 | 2019-01-08 | Corning Incorporated | Edge chamfering by mechanically processing laser cut glass |
| US10179748B2 (en) | 2013-12-17 | 2019-01-15 | Corning Incorporated | Laser processing of sapphire substrate and related applications |
| US10183885B2 (en) | 2013-12-17 | 2019-01-22 | Corning Incorporated | Laser cut composite glass article and method of cutting |
| US10233112B2 (en) | 2013-12-17 | 2019-03-19 | Corning Incorporated | Laser processing of slots and holes |
| US10144093B2 (en) | 2013-12-17 | 2018-12-04 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
| US10597321B2 (en) | 2013-12-17 | 2020-03-24 | Corning Incorporated | Edge chamfering methods |
| US10293436B2 (en) | 2013-12-17 | 2019-05-21 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
| US9815730B2 (en) | 2013-12-17 | 2017-11-14 | Corning Incorporated | Processing 3D shaped transparent brittle substrate |
| US11556039B2 (en) | 2013-12-17 | 2023-01-17 | Corning Incorporated | Electrochromic coated glass articles and methods for laser processing the same |
| US10392290B2 (en) | 2013-12-17 | 2019-08-27 | Corning Incorporated | Processing 3D shaped transparent brittle substrate |
| US9850160B2 (en) | 2013-12-17 | 2017-12-26 | Corning Incorporated | Laser cutting of display glass compositions |
| US10442719B2 (en) | 2013-12-17 | 2019-10-15 | Corning Incorporated | Edge chamfering methods |
| US9676167B2 (en) | 2013-12-17 | 2017-06-13 | Corning Incorporated | Laser processing of sapphire substrate and related applications |
| US11148225B2 (en) | 2013-12-17 | 2021-10-19 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
| US9815144B2 (en) | 2014-07-08 | 2017-11-14 | Corning Incorporated | Methods and apparatuses for laser processing materials |
| US11697178B2 (en) | 2014-07-08 | 2023-07-11 | Corning Incorporated | Methods and apparatuses for laser processing materials |
| US10526234B2 (en) | 2014-07-14 | 2020-01-07 | Corning Incorporated | Interface block; system for and method of cutting a substrate being transparent within a range of wavelengths using such interface block |
| US10611667B2 (en) | 2014-07-14 | 2020-04-07 | Corning Incorporated | Method and system for forming perforations |
| US11648623B2 (en) | 2014-07-14 | 2023-05-16 | Corning Incorporated | Systems and methods for processing transparent materials using adjustable laser beam focal lines |
| US10335902B2 (en) | 2014-07-14 | 2019-07-02 | Corning Incorporated | Method and system for arresting crack propagation |
| US11014845B2 (en) | 2014-12-04 | 2021-05-25 | Corning Incorporated | Method of laser cutting glass using non-diffracting laser beams |
| US10047001B2 (en) | 2014-12-04 | 2018-08-14 | Corning Incorporated | Glass cutting systems and methods using non-diffracting laser beams |
| US10252931B2 (en) | 2015-01-12 | 2019-04-09 | Corning Incorporated | Laser cutting of thermally tempered substrates |
| US11773004B2 (en) | 2015-03-24 | 2023-10-03 | Corning Incorporated | Laser cutting and processing of display glass compositions |
| US10525657B2 (en) | 2015-03-27 | 2020-01-07 | Corning Incorporated | Gas permeable window and method of fabricating the same |
| US11186060B2 (en) | 2015-07-10 | 2021-11-30 | Corning Incorporated | Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same |
| US11111170B2 (en) | 2016-05-06 | 2021-09-07 | Corning Incorporated | Laser cutting and removal of contoured shapes from transparent substrates |
| US11114309B2 (en) | 2016-06-01 | 2021-09-07 | Corning Incorporated | Articles and methods of forming vias in substrates |
| US11774233B2 (en) | 2016-06-29 | 2023-10-03 | Corning Incorporated | Method and system for measuring geometric parameters of through holes |
| US10377658B2 (en) | 2016-07-29 | 2019-08-13 | Corning Incorporated | Apparatuses and methods for laser processing |
| US10522963B2 (en) | 2016-08-30 | 2019-12-31 | Corning Incorporated | Laser cutting of materials with intensity mapping optical system |
| US11130701B2 (en) | 2016-09-30 | 2021-09-28 | Corning Incorporated | Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots |
| US10730783B2 (en) | 2016-09-30 | 2020-08-04 | Corning Incorporated | Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots |
| US11542190B2 (en) | 2016-10-24 | 2023-01-03 | Corning Incorporated | Substrate processing station for laser-based machining of sheet-like glass substrates |
| US10752534B2 (en) | 2016-11-01 | 2020-08-25 | Corning Incorporated | Apparatuses and methods for laser processing laminate workpiece stacks |
| US10688599B2 (en) | 2017-02-09 | 2020-06-23 | Corning Incorporated | Apparatus and methods for laser processing transparent workpieces using phase shifted focal lines |
| US11062986B2 (en) | 2017-05-25 | 2021-07-13 | Corning Incorporated | Articles having vias with geometry attributes and methods for fabricating the same |
| US11078112B2 (en) | 2017-05-25 | 2021-08-03 | Corning Incorporated | Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same |
| US11972993B2 (en) | 2017-05-25 | 2024-04-30 | Corning Incorporated | Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same |
| US12180108B2 (en) | 2017-12-19 | 2024-12-31 | Corning Incorporated | Methods for etching vias in glass-based articles employing positive charge organic molecules |
| US11554984B2 (en) | 2018-02-22 | 2023-01-17 | Corning Incorporated | Alkali-free borosilicate glasses with low post-HF etch roughness |
| US11478874B2 (en) | 2019-04-05 | 2022-10-25 | Tdk Corporation | Method of processing inorganic material substrate, device, and method of manufacturing device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002210730A (ja) | 2002-07-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4880820B2 (ja) | レーザ支援加工方法 | |
| EP1990125B1 (en) | Glass processing method using laser | |
| US11059129B2 (en) | Method and device for laser micromachining | |
| JP4631044B2 (ja) | レーザ加工方法および装置 | |
| JP5432658B2 (ja) | 透過型電子顕微鏡法用サンプルの作成方法および装置 | |
| KR101181719B1 (ko) | 펨토초 레이저에 의해 나노 보이드 어레이 형성을 통한 절단방법 | |
| Vanagas et al. | Glass cutting by femtosecond pulsed irradiation | |
| US8247731B2 (en) | Laser scribing and machining of materials | |
| Doualle et al. | CO2 laser microprocessing for laser damage growth mitigation of fused silica optics | |
| US6518539B2 (en) | Method for producing damage resistant optics | |
| JP2022522255A (ja) | レーザ誘発型屈折率変化を用いたスケーラブルな製造 | |
| Dogan et al. | Optimization of ultrafast laser parameters for 3D micromachining of fused silica | |
| JP5002808B2 (ja) | レーザ加工装置及びレーザ加工方法 | |
| JP3352934B2 (ja) | 高強度超短パルスレーザー加工方法およびその装置 | |
| Zalloum et al. | On femtosecond micromachining of HPHT single-crystal diamond with direct laser writing using tight focusing | |
| Campbell et al. | Single-pulse femtosecond laser machining of glass | |
| CN118455713A (zh) | 一种基于红外飞秒和紫外飞秒的双脉冲激光加工方法 | |
| KR101049381B1 (ko) | 초음파 진동을 사용하는 하이브리드 레이저 가공 장치 | |
| JP2008006652A (ja) | 硬脆材料板体の分割加工方法 | |
| JP2008036641A (ja) | レーザ加工装置およびレーザ加工方法 | |
| Mizeikis et al. | Silicon surface processing techniques for micro-systems fabrication | |
| Oosterbeek et al. | Ablation threshold dependence on incident wavelength during ultrashort pulsed laser ablation | |
| JP3734718B2 (ja) | レーザーによる透明試料の内部加工過程の測定方法及びそのための装置 | |
| Manzo et al. | Demonstration of enhanced surface mobility of adsorbate cluster species by surface acoustic wave excitation induced by a pulsed laser | |
| He et al. | Spatiotemporal manipulation of ultrashort pulses for three-dimensional (3-D) laser processing in glass materials |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20031031 |
|
| RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20040129 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20041109 |
|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20041109 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20041109 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041208 |
|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20041215 |
|
| RD05 | Notification of revocation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7425 Effective date: 20041228 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20041208 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20041215 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041228 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080111 |
|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20080111 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20080111 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080227 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20101021 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20101026 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101224 |
|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20110117 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20110117 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110531 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110727 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20111115 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20111202 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 4880820 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20141209 Year of fee payment: 3 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |