JP2002210730A5 - - Google Patents

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Publication number
JP2002210730A5
JP2002210730A5 JP2001012372A JP2001012372A JP2002210730A5 JP 2002210730 A5 JP2002210730 A5 JP 2002210730A5 JP 2001012372 A JP2001012372 A JP 2001012372A JP 2001012372 A JP2001012372 A JP 2001012372A JP 2002210730 A5 JP2002210730 A5 JP 2002210730A5
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JP
Japan
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JP2001012372A
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Japanese (ja)
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JP4880820B2 (ja
JP2002210730A (ja
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Publication of JP2002210730A5 publication Critical patent/JP2002210730A5/ja
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JP2001012372A 2001-01-19 2001-01-19 レーザ支援加工方法 Expired - Lifetime JP4880820B2 (ja)

Priority Applications (1)

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JP2001012372A JP4880820B2 (ja) 2001-01-19 2001-01-19 レーザ支援加工方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001012372A JP4880820B2 (ja) 2001-01-19 2001-01-19 レーザ支援加工方法

Publications (3)

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JP2002210730A JP2002210730A (ja) 2002-07-30
JP2002210730A5 true JP2002210730A5 (enExample) 2008-04-10
JP4880820B2 JP4880820B2 (ja) 2012-02-22

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JP2001012372A Expired - Lifetime JP4880820B2 (ja) 2001-01-19 2001-01-19 レーザ支援加工方法

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JP4708428B2 (ja) * 2005-11-22 2011-06-22 オリンパス株式会社 ガラス基材の加工方法
JP4402708B2 (ja) * 2007-08-03 2010-01-20 浜松ホトニクス株式会社 レーザ加工方法、レーザ加工装置及びその製造方法
JP5478009B2 (ja) 2007-11-09 2014-04-23 株式会社フジクラ 半導体パッケージの製造方法
WO2012014710A1 (ja) 2010-07-26 2012-02-02 浜松ホトニクス株式会社 レーザ加工方法
JP5702556B2 (ja) 2010-07-26 2015-04-15 浜松ホトニクス株式会社 レーザ加工方法
CN103025478B (zh) 2010-07-26 2015-09-30 浜松光子学株式会社 基板加工方法
CN103025473B (zh) 2010-07-26 2015-12-09 浜松光子学株式会社 基板加工方法
EP2599576B1 (en) 2010-07-26 2019-12-11 Hamamatsu Photonics K.K. Laser processing method
JP5508533B2 (ja) 2010-07-26 2014-06-04 浜松ホトニクス株式会社 光吸収基板の製造方法、及びそれを製造するための成形型の製造方法
JP5653110B2 (ja) 2010-07-26 2015-01-14 浜松ホトニクス株式会社 チップの製造方法
JP5530522B2 (ja) 2010-07-26 2014-06-25 浜松ホトニクス株式会社 半導体デバイスの製造方法
JP5693074B2 (ja) 2010-07-26 2015-04-01 浜松ホトニクス株式会社 レーザ加工方法
WO2012014720A1 (ja) 2010-07-26 2012-02-02 浜松ホトニクス株式会社 レーザ加工方法
JP5574866B2 (ja) 2010-07-26 2014-08-20 浜松ホトニクス株式会社 レーザ加工方法
JP5509332B2 (ja) 2010-07-26 2014-06-04 浜松ホトニクス株式会社 インターポーザの製造方法
JP2011066449A (ja) * 2010-12-20 2011-03-31 Fujikura Ltd 貫通配線基板の製造方法、複合基板の製造方法、及びこれらの製造方法により形成された貫通配線基板や複合基板を用いた電子装置の製造方法
JPWO2012160880A1 (ja) * 2011-05-23 2014-07-31 並木精密宝石株式会社 発光素子の製造方法および発光素子
CN103212822B (zh) * 2012-01-19 2016-07-06 昆山思拓机器有限公司 全自动smt模板切割及检测一体化系统切割及检测方法
WO2014079478A1 (en) 2012-11-20 2014-05-30 Light In Light Srl High speed laser processing of transparent materials
EP2754524B1 (de) 2013-01-15 2015-11-25 Corning Laser Technologies GmbH Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie
CN103111762B (zh) * 2013-01-29 2015-12-09 无锡鼎晶光电科技有限公司 一种将激光打孔应用于蓝宝石片打孔的方法
EP2781296B1 (de) 2013-03-21 2020-10-21 Corning Laser Technologies GmbH Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser
JP6157245B2 (ja) * 2013-07-01 2017-07-05 三菱電機株式会社 レーザ加工装置およびレーザ光軸調整方法
US9815730B2 (en) 2013-12-17 2017-11-14 Corning Incorporated Processing 3D shaped transparent brittle substrate
US9850160B2 (en) 2013-12-17 2017-12-26 Corning Incorporated Laser cutting of display glass compositions
US11556039B2 (en) 2013-12-17 2023-01-17 Corning Incorporated Electrochromic coated glass articles and methods for laser processing the same
US9701563B2 (en) 2013-12-17 2017-07-11 Corning Incorporated Laser cut composite glass article and method of cutting
US10442719B2 (en) 2013-12-17 2019-10-15 Corning Incorporated Edge chamfering methods
US20150165560A1 (en) 2013-12-17 2015-06-18 Corning Incorporated Laser processing of slots and holes
US9517963B2 (en) 2013-12-17 2016-12-13 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
US9676167B2 (en) 2013-12-17 2017-06-13 Corning Incorporated Laser processing of sapphire substrate and related applications
JP2015150609A (ja) 2014-02-18 2015-08-24 アイシン精機株式会社 レーザ加工方法
CN106687419A (zh) 2014-07-08 2017-05-17 康宁股份有限公司 用于激光处理材料的方法和设备
EP3169476A1 (en) 2014-07-14 2017-05-24 Corning Incorporated Interface block; system for and method of cutting a substrate being transparent within a range of wavelengths using such interface block
EP3169479B1 (en) 2014-07-14 2019-10-02 Corning Incorporated Method of and system for arresting incident crack propagation in a transparent material
US11648623B2 (en) 2014-07-14 2023-05-16 Corning Incorporated Systems and methods for processing transparent materials using adjustable laser beam focal lines
US10611667B2 (en) 2014-07-14 2020-04-07 Corning Incorporated Method and system for forming perforations
KR20250133802A (ko) 2014-09-16 2025-09-08 엘피케이에프 레이저 앤드 일렉트로닉스 에스이 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법
US10047001B2 (en) 2014-12-04 2018-08-14 Corning Incorporated Glass cutting systems and methods using non-diffracting laser beams
WO2016115017A1 (en) 2015-01-12 2016-07-21 Corning Incorporated Laser cutting of thermally tempered substrates using the multi photon absorption method
HUE055461T2 (hu) 2015-03-24 2021-11-29 Corning Inc Kijelzõ üveg kompozíciók lézeres vágása és feldolgozása
WO2016160391A1 (en) 2015-03-27 2016-10-06 Corning Incorporated Gas permeable window and method of fabricating the same
EP3319911B1 (en) 2015-07-10 2023-04-19 Corning Incorporated Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same
JP6938543B2 (ja) 2016-05-06 2021-09-22 コーニング インコーポレイテッド 透明基板からの、輪郭設定された形状のレーザ切断及び取り外し
US10410883B2 (en) 2016-06-01 2019-09-10 Corning Incorporated Articles and methods of forming vias in substrates
US10794679B2 (en) 2016-06-29 2020-10-06 Corning Incorporated Method and system for measuring geometric parameters of through holes
WO2018022476A1 (en) 2016-07-29 2018-02-01 Corning Incorporated Apparatuses and methods for laser processing
KR102423775B1 (ko) 2016-08-30 2022-07-22 코닝 인코포레이티드 투명 재료의 레이저 가공
NL2017998B1 (en) * 2016-12-14 2018-06-26 Corning Inc Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots
CN109803786B (zh) * 2016-09-30 2021-05-07 康宁股份有限公司 使用非轴对称束斑对透明工件进行激光加工的设备和方法
LT3311947T (lt) * 2016-09-30 2019-12-27 Corning Incorporated Skaidrių ruošinių lazerinio apdirbimo, naudojant spindulių pluošto dėmes be simetrijos ašių, būdas
US11542190B2 (en) 2016-10-24 2023-01-03 Corning Incorporated Substrate processing station for laser-based machining of sheet-like glass substrates
US10752534B2 (en) 2016-11-01 2020-08-25 Corning Incorporated Apparatuses and methods for laser processing laminate workpiece stacks
US10688599B2 (en) 2017-02-09 2020-06-23 Corning Incorporated Apparatus and methods for laser processing transparent workpieces using phase shifted focal lines
US10580725B2 (en) 2017-05-25 2020-03-03 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US10626040B2 (en) 2017-06-15 2020-04-21 Corning Incorporated Articles capable of individual singulation
US12180108B2 (en) 2017-12-19 2024-12-31 Corning Incorporated Methods for etching vias in glass-based articles employing positive charge organic molecules
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
JP7230650B2 (ja) 2019-04-05 2023-03-01 Tdk株式会社 無機材料基板の加工方法、デバイス、およびデバイスの製造方法
CN111830695B (zh) * 2020-07-31 2025-03-11 北京兆维电子(集团)有限责任公司 一种oled显示面板亮点缺陷修正系统
CN115856066A (zh) * 2022-12-01 2023-03-28 暨南大学 一种基质辅助激光解吸飞行时间的光路系统及质谱仪

Family Cites Families (4)

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JPH09258012A (ja) * 1996-03-26 1997-10-03 Sharp Corp レーザビーム発生用光学素子及びレーザビーム発生装置
JP3433110B2 (ja) * 1998-08-03 2003-08-04 科学技術振興事業団 3次元的回折光学素子及びその製造方法
JP2000343714A (ja) * 1999-04-02 2000-12-12 Seiko Epson Corp 水晶穴加工方法およびインクジェット式記録ヘッドの製造方法
JP2000288766A (ja) * 1999-04-07 2000-10-17 Kubota Corp レーザ加工装置

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