JP4859645B2 - 化粧料用の粉体及びそれを含有してなる化粧料 - Google Patents

化粧料用の粉体及びそれを含有してなる化粧料 Download PDF

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Publication number
JP4859645B2
JP4859645B2 JP2006325657A JP2006325657A JP4859645B2 JP 4859645 B2 JP4859645 B2 JP 4859645B2 JP 2006325657 A JP2006325657 A JP 2006325657A JP 2006325657 A JP2006325657 A JP 2006325657A JP 4859645 B2 JP4859645 B2 JP 4859645B2
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powder
cosmetics
cosmetic
copolymer
mass
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JP2008137944A (ja
JP2008137944A5 (enExample
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忠光 浦本
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Pola Orbis Holdings Inc
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Pola Chemical Industries Inc
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JP2006325657A 2006-12-01 2006-12-01 化粧料用の粉体及びそれを含有してなる化粧料 Active JP4859645B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006325657A JP4859645B2 (ja) 2006-12-01 2006-12-01 化粧料用の粉体及びそれを含有してなる化粧料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006325657A JP4859645B2 (ja) 2006-12-01 2006-12-01 化粧料用の粉体及びそれを含有してなる化粧料

Publications (3)

Publication Number Publication Date
JP2008137944A JP2008137944A (ja) 2008-06-19
JP2008137944A5 JP2008137944A5 (enExample) 2010-01-14
JP4859645B2 true JP4859645B2 (ja) 2012-01-25

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JP2006325657A Active JP4859645B2 (ja) 2006-12-01 2006-12-01 化粧料用の粉体及びそれを含有してなる化粧料

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010037211A (ja) * 2008-07-31 2010-02-18 Pola Chem Ind Inc 固形粉末化粧料
KR101915973B1 (ko) * 2011-10-31 2018-11-07 (주)아모레퍼시픽 자외선 차단용 유무기 복합분체 및 이를 함유하는 화장료 조성물
CN103505376B (zh) * 2012-06-20 2019-04-30 株式会社爱茉莉太平洋 用于阻断紫外线的有机、无机复合粉体及含有该复合粉体的化妆品组合物
KR101767207B1 (ko) * 2012-11-30 2017-08-11 (주)아모레퍼시픽 생체친화성 고분자로 코팅된 무기분체 및 이를 함유하는 화장료 조성물
JP7202159B2 (ja) * 2018-12-04 2023-01-11 ポーラ化成工業株式会社 粉体含有化粧料
JP7236349B2 (ja) * 2019-08-16 2023-03-09 信越化学工業株式会社 分散性粉体及び化粧料

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3178950B2 (ja) * 1993-10-19 2001-06-25 ポーラ化成工業株式会社 化粧料用の粉体及びそれを含有する化粧料
JP3975880B2 (ja) * 2002-10-17 2007-09-12 日本油脂株式会社 表面被覆処理された粉体を含有してなる化粧料
JP2004189652A (ja) * 2002-12-10 2004-07-08 Iwase Cosfa Kk 改質粉体および化粧料
JP4248366B2 (ja) * 2003-10-21 2009-04-02 ポーラ化成工業株式会社 敏感肌用のメークアップ
JP2006160675A (ja) * 2004-12-08 2006-06-22 Pola Chem Ind Inc メークアップ化粧料
JP2006160703A (ja) * 2004-12-10 2006-06-22 Pola Chem Ind Inc メークアップ化粧料
JP2006213620A (ja) * 2005-02-02 2006-08-17 Fancl Corp 油中水型日焼け止め化粧料

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