JP4850393B2 - 表示装置の作製方法 - Google Patents

表示装置の作製方法 Download PDF

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Publication number
JP4850393B2
JP4850393B2 JP2004072314A JP2004072314A JP4850393B2 JP 4850393 B2 JP4850393 B2 JP 4850393B2 JP 2004072314 A JP2004072314 A JP 2004072314A JP 2004072314 A JP2004072314 A JP 2004072314A JP 4850393 B2 JP4850393 B2 JP 4850393B2
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Japan
Prior art keywords
conductive film
transparent conductive
film
electrode
display device
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Expired - Fee Related
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JP2004072314A
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English (en)
Japanese (ja)
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JP2004311418A (ja
JP2004311418A5 (enExample
Inventor
健吾 秋元
徳子 宮城
晋吾 江口
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2004072314A priority Critical patent/JP4850393B2/ja
Publication of JP2004311418A publication Critical patent/JP2004311418A/ja
Publication of JP2004311418A5 publication Critical patent/JP2004311418A5/ja
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Publication of JP4850393B2 publication Critical patent/JP4850393B2/ja
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  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
JP2004072314A 2003-03-25 2004-03-15 表示装置の作製方法 Expired - Fee Related JP4850393B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004072314A JP4850393B2 (ja) 2003-03-25 2004-03-15 表示装置の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003083120 2003-03-25
JP2003083120 2003-03-25
JP2004072314A JP4850393B2 (ja) 2003-03-25 2004-03-15 表示装置の作製方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011195972A Division JP5079130B2 (ja) 2003-03-25 2011-09-08 表示装置

Publications (3)

Publication Number Publication Date
JP2004311418A JP2004311418A (ja) 2004-11-04
JP2004311418A5 JP2004311418A5 (enExample) 2007-04-05
JP4850393B2 true JP4850393B2 (ja) 2012-01-11

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Family Applications (1)

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JP2004072314A Expired - Fee Related JP4850393B2 (ja) 2003-03-25 2004-03-15 表示装置の作製方法

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JP (1) JP4850393B2 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007035432A (ja) * 2005-07-27 2007-02-08 Fuji Electric Holdings Co Ltd 有機ｅｌ素子およびその製造方法
KR100699072B1 (ko) 2005-08-02 2007-03-27 한국과학기술연구원 산화아연계 투명 도전막
JP2007163995A (ja) * 2005-12-15 2007-06-28 Geomatec Co Ltd 透明導電膜付き基板およびその製造方法
JP2007234259A (ja) * 2006-02-27 2007-09-13 Hitachi Displays Ltd 有機ｅｌ表示装置
US20110001423A1 (en) * 2008-02-15 2011-01-06 Showa Denko K.K. Process for treating an electrode surface, electrode, and process for manufacturing organic electroluminescence devices
JP2009238416A (ja) * 2008-03-26 2009-10-15 Toppan Printing Co Ltd 透明導電膜付き基板及びその製造方法
JP5244439B2 (ja) * 2008-04-08 2013-07-24 三菱電機株式会社 透明導電膜、表示装置、及びこれらの製造方法
US8242487B2 (en) 2008-05-16 2012-08-14 E I Du Pont De Nemours And Company Anode for an organic electronic device
WO2010065505A2 (en) * 2008-12-01 2010-06-10 E. I. Du Pont De Nemours And Company Anode for an organic electronic device
JP2012510540A (ja) 2008-12-01 2012-05-10 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 電気活性材料
JP2012510705A (ja) * 2008-12-01 2012-05-10 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 有機電子デバイス用のアノード
KR101692409B1 (ko) * 2010-03-29 2017-01-04 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
WO2012039000A1 (ja) * 2010-09-21 2012-03-29 パナソニック株式会社 薄膜トランジスタアレイ装置、薄膜トランジスタアレイ装置の製造方法
CN102576711B (zh) 2010-09-21 2015-12-16 株式会社日本有机雷特显示器 薄膜晶体管阵列装置、薄膜晶体管阵列装置的制造方法
KR101920225B1 (ko) * 2012-08-22 2018-11-20 엘지디스플레이 주식회사 유기전기발광소자 및 그 어레이 기판의 제조 방법
KR102322700B1 (ko) * 2014-05-23 2021-11-04 엘지디스플레이 주식회사 유기전계 발광표시장치 및 그 제조방법
JP2016192342A (ja) * 2015-03-31 2016-11-10 パイオニア株式会社 発光装置
JP2020035755A (ja) * 2019-11-01 2020-03-05 パイオニア株式会社 発光装置
CN112670247B (zh) * 2020-12-23 2024-02-02 武汉天马微电子有限公司 一种显示面板的制备方法、显示面板及显示装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6410507A (en) * 1987-07-02 1989-01-13 Optrex Kk Transparent conductive film and its manufacture
JPH09185062A (ja) * 1995-12-27 1997-07-15 Canon Inc 表示素子
JP2000108244A (ja) * 1998-10-05 2000-04-18 Asahi Glass Co Ltd 透明導電膜とその製造方法および透明導電膜付き基体
JP4537596B2 (ja) * 2000-02-10 2010-09-01 パナソニック電工株式会社 有機エレクトロルミネッセンス素子及びその製造方法
JP2001331124A (ja) * 2000-05-22 2001-11-30 Toshiba Corp マトリクスアレイ基板
JP4906022B2 (ja) * 2000-08-10 2012-03-28 株式会社半導体エネルギー研究所 アクティブマトリクス型ｅｌ表示装置及び電子機器
JP2002124680A (ja) * 2000-10-16 2002-04-26 Toshiba Corp アレイ基板及びその製造方法
JP4865165B2 (ja) * 2001-08-29 2012-02-01 株式会社半導体エネルギー研究所 発光装置の作製方法
JP4026343B2 (ja) * 2001-10-02 2007-12-26 ソニー株式会社 有機エレクトロルミネッセンス素子の製造方法

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JP2004311418A (ja) 2004-11-04

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