JP4848017B2 - ３次の開口収差及び１次１グレード（Ｇｒａｄｅ）の軸上色収差を除去するための補正装置 - Google Patents

３次の開口収差及び１次１グレード（Ｇｒａｄｅ）の軸上色収差を除去するための補正装置 Download PDF

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JP4848017B2
JP4848017B2 JP2008543639A JP2008543639A JP4848017B2 JP 4848017 B2 JP4848017 B2 JP 4848017B2 JP 2008543639 A JP2008543639 A JP 2008543639A JP 2008543639 A JP2008543639 A JP 2008543639A JP 4848017 B2 JP4848017 B2 JP 4848017B2
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correction
field
quadrupole
correction device
octupole
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Japanese (ja)
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JP2009518784A5 (enExample
JP2009518784A (ja
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ミュラー ハイコ
ローゼ ハーラルト
ウーレマン シュテファン
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CEOS Corrected Electron Optical Systems GmbH
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CEOS Corrected Electron Optical Systems GmbH
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP2008543639A 2005-12-06 2005-12-06 ３次の開口収差及び１次１グレード（Ｇｒａｄｅ）の軸上色収差を除去するための補正装置 Expired - Lifetime JP4848017B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/DE2005/002210 WO2007065382A1 (de) 2005-12-06 2005-12-06 Korrektiv zur beseitigung des öffnungsfehlers 3. ordnung und des axialen farbfehlers 1. ordnung 1. grades

Publications (3)

Publication Number Publication Date
JP2009518784A JP2009518784A (ja) 2009-05-07
JP2009518784A5 JP2009518784A5 (enExample) 2011-06-30
JP4848017B2 true JP4848017B2 (ja) 2011-12-28

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JP2008543639A Expired - Lifetime JP4848017B2 (ja) 2005-12-06 2005-12-06 ３次の開口収差及び１次１グレード（Ｇｒａｄｅ）の軸上色収差を除去するための補正装置

Country Status (5)

Country Link
US (1) US7989776B2 (enExample)
EP (1) EP1958231B1 (enExample)
JP (1) JP4848017B2 (enExample)
DE (1) DE112005003818A5 (enExample)
WO (1) WO2007065382A1 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4851268B2 (ja) * 2006-08-31 2012-01-11 日本電子株式会社 収差補正方法および電子線装置
DE102007007923A1 (de) * 2007-02-14 2008-08-21 Carl Zeiss Nts Gmbh Phasenschiebendes Element und Teilchenstrahlgerät mit phasenschiebenden Element
DE102007045874A1 (de) 2007-09-25 2009-04-02 Ceos Corrected Electron Optical Systems Gmbh Multipolspulen
DE102007049816B3 (de) 2007-10-20 2009-04-16 Ceos Corrected Electron Optical Systems Gmbh Korrektor
DE102007058443B4 (de) * 2007-12-05 2010-05-06 Ceos Corrected Electron Optical Systems Gmbh Korrektor für axialen und außeraxialen Strahlengang und TEM damit
DE102009010774A1 (de) * 2009-02-26 2010-11-11 Ceos Corrected Electron Optical Systems Gmbh Verfahren und Vorrichtung zur Bildkontrasterzeugung durch Phasenschiebung
US8373136B2 (en) * 2009-10-15 2013-02-12 Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh Achromatic beam deflector, achromatic beam separator, charged particle device, method of operating an achromatic beam deflector, and method of operating an achromatic beam separator
DE102010054541A1 (de) * 2010-12-15 2012-06-21 Ceos Corrected Electron Optical Systems Gmbh Korrektor
DE102011009954A1 (de) * 2011-02-01 2012-08-02 Ceos Corrected Electron Optical Systems Gmbh Korrektor
US8536538B2 (en) * 2011-02-16 2013-09-17 Kla-Tencor Corporation Multiple-pole electrostatic deflector for improving throughput of focused electron beam instruments
JP2013030374A (ja) * 2011-07-29 2013-02-07 Jeol Ltd 電子顕微鏡
JP5934517B2 (ja) * 2012-02-24 2016-06-15 日本電子株式会社 色収差補正装置及び色収差補正装置の制御方法
US9275817B2 (en) 2012-04-09 2016-03-01 Frederick Wight Martin Particle-beam column corrected for both chromatic and spherical aberration
US8541755B1 (en) * 2012-05-09 2013-09-24 Jeol Ltd. Electron microscope
US10103004B2 (en) * 2015-07-02 2018-10-16 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH System and method for imaging a secondary charged particle beam with adaptive secondary charged particle optics
JP6647854B2 (ja) * 2015-12-22 2020-02-14 日本電子株式会社 収差補正方法および荷電粒子線装置
JP7425897B2 (ja) * 2021-01-12 2024-01-31 株式会社日立ハイテク 収差補正装置及び電子顕微鏡

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003520427A (ja) * 2000-01-14 2003-07-02 レオ イレクトロネンミクロスコピィ ゲーエムベーハー ３次収差を除く電子光学補正器
JP2003187731A (ja) * 2001-12-04 2003-07-04 Leo Elektronenmikroskopie Gmbh １階、１次の色収差を補正する補正装置
JP2004087460A (ja) * 2002-06-28 2004-03-18 Jeol Ltd 収差補正装置を備えた荷電粒子ビーム装置
JP2005512282A (ja) * 2001-12-04 2005-04-28 ツェーエーオーエス コレクテッド エレクトロン オプチカル システムズ ゲーエムベーハー 粒子光学補正器

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6770887B2 (en) 2002-07-08 2004-08-03 Ondrej L. Krivanek Aberration-corrected charged-particle optical apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003520427A (ja) * 2000-01-14 2003-07-02 レオ イレクトロネンミクロスコピィ ゲーエムベーハー ３次収差を除く電子光学補正器
JP2003187731A (ja) * 2001-12-04 2003-07-04 Leo Elektronenmikroskopie Gmbh １階、１次の色収差を補正する補正装置
JP2005512282A (ja) * 2001-12-04 2005-04-28 ツェーエーオーエス コレクテッド エレクトロン オプチカル システムズ ゲーエムベーハー 粒子光学補正器
JP2004087460A (ja) * 2002-06-28 2004-03-18 Jeol Ltd 収差補正装置を備えた荷電粒子ビーム装置

Also Published As

Publication number Publication date
WO2007065382A1 (de) 2007-06-14
US20080283749A1 (en) 2008-11-20
US7989776B2 (en) 2011-08-02
EP1958231A1 (de) 2008-08-20
EP1958231B1 (de) 2018-05-23
DE112005003818A5 (de) 2008-11-13
JP2009518784A (ja) 2009-05-07

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