JP4847957B2 - 光触媒性酸化チタン層を析出する方法 - Google Patents
光触媒性酸化チタン層を析出する方法 Download PDFInfo
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- JP4847957B2 JP4847957B2 JP2007529329A JP2007529329A JP4847957B2 JP 4847957 B2 JP4847957 B2 JP 4847957B2 JP 2007529329 A JP2007529329 A JP 2007529329A JP 2007529329 A JP2007529329 A JP 2007529329A JP 4847957 B2 JP4847957 B2 JP 4847957B2
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- titanium oxide
- oxide layer
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- photocatalytic
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2456—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/71—Photocatalytic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Catalysts (AREA)
- Physical Vapour Deposition (AREA)
Description
試料2 マグネトロンスパッタリング法により析出された光触媒性TiO2層を備えたガラス板、
試料3 本発明の方法により析出された光触媒性TiO2層を備えたガラス板。
試料5 本発明の方法によりコーティングされたガラス板。
Claims (12)
- 真空チャンバ(1)における高レート電子ビーム蒸着によって少なくとも1つの対象(8)上に光触媒性酸化チタン層を析出する方法において、
−前記真空チャンバ(1)内に酸素含有雰囲気を発生させ、
−主としてTi成分を有する材料(3)を電子ビーム(5)により蒸発させ、
−前記析出をプラズマによって支援し、該プラズマをカソードとして接続されている蒸発すべき前記材料(3)の表面における拡散アーク放電により形成し、
−コーティング速度は少なくとも20nm/sであり、
−前記析出の間の対象温度を100℃〜500℃に維持し、
−前記酸化チタン層が結晶性であり、且つ該酸化チタン層を主としてアナターゼ相として析出する、ことを特徴とする光触媒性酸化チタン層を析出する方法。 - 前記真空チャンバ(1)における酸素濃度を、化学量論的な酸化チタン層が前記対象(8)上に析出されるように調節する、請求項1記載の方法。
- 前記対象(8)に50V〜300Vの負のバイアス電圧を印加する、請求項1または2記載の方法。
- 前記バイアス電圧を直流電圧または中周波または高周波でパルジングされる電圧として印加する、請求項3記載の方法。
- 前記真空チャンバ(1)において5×10-4mbar〜1×10-2mbarの酸素分圧を生じさせる、請求項1から4までのいずれか1項記載の方法。
- プラズマ活性化の際にアーク電流を少なくとも100Aに調節する、請求項1から5までのいずれか1項記載の方法。
- コーティング速度を30nm/s〜120nm/sの範囲に設定する、請求項1から6までのいずれか1項記載の方法。
- 前記析出の間の対象温度を200℃〜300℃に維持する、請求項1から7までのいずれか1項記載の方法。
- 10nm〜1μmの厚さの層を析出する、請求項1から8までのいずれか1項記載の方法。
- 20nm〜100nmの厚さの層を析出する、請求項9記載の方法。
- 前記対象と前記光触媒性酸化チタン層との間に、拡散バリアとしての中間層を析出する、請求項1から10までのいずれか1項記載の方法。
- 拡散バリアとしてSiO2層を析出する、請求項11記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004042650.3 | 2004-09-03 | ||
DE102004042650A DE102004042650B4 (de) | 2004-09-03 | 2004-09-03 | Verfahren zum Abscheiden von photokatalytischen Titanoxid-Schichten |
PCT/EP2005/009129 WO2006027106A1 (de) | 2004-09-03 | 2005-08-24 | Verfahren zum abscheiden von photokatalytischen titanoxid-schichten |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008511434A JP2008511434A (ja) | 2008-04-17 |
JP4847957B2 true JP4847957B2 (ja) | 2011-12-28 |
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Application Number | Title | Priority Date | Filing Date |
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JP2007529329A Expired - Fee Related JP4847957B2 (ja) | 2004-09-03 | 2005-08-24 | 光触媒性酸化チタン層を析出する方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4847957B2 (ja) |
KR (1) | KR20070048723A (ja) |
CN (1) | CN101018882A (ja) |
DE (1) | DE102004042650B4 (ja) |
WO (1) | WO2006027106A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8419857B2 (en) | 2009-03-31 | 2013-04-16 | United Technologies Corporation | Electron beam vapor deposition apparatus and method of coating |
DE102009051439A1 (de) | 2009-10-30 | 2011-05-05 | Gottfried Wilhelm Leibniz Universität Hannover | Metallisch beschichtetes oder teilbeschichtetes Substrat und Verfahren zu dessen Herstellung |
DE102010023418A1 (de) * | 2010-06-11 | 2011-12-15 | Uhde Gmbh | Ein- oder mehrseitige Substratbeschichtung |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5958194A (en) * | 1997-09-18 | 1999-09-28 | Glazier; Alan N. | Gas permeable elastomer contact lens bonded with titanium and/or oxides thereof |
JP3258023B2 (ja) * | 1994-10-31 | 2002-02-18 | 財団法人神奈川科学技術アカデミー | 酸化チタン光触媒構造体及びその製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6387844B1 (en) * | 1994-10-31 | 2002-05-14 | Akira Fujishima | Titanium dioxide photocatalyst |
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2004
- 2004-09-03 DE DE102004042650A patent/DE102004042650B4/de not_active Expired - Fee Related
-
2005
- 2005-08-24 JP JP2007529329A patent/JP4847957B2/ja not_active Expired - Fee Related
- 2005-08-24 CN CNA2005800293389A patent/CN101018882A/zh active Pending
- 2005-08-24 KR KR1020077003220A patent/KR20070048723A/ko not_active Application Discontinuation
- 2005-08-24 WO PCT/EP2005/009129 patent/WO2006027106A1/de active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3258023B2 (ja) * | 1994-10-31 | 2002-02-18 | 財団法人神奈川科学技術アカデミー | 酸化チタン光触媒構造体及びその製造方法 |
US5958194A (en) * | 1997-09-18 | 1999-09-28 | Glazier; Alan N. | Gas permeable elastomer contact lens bonded with titanium and/or oxides thereof |
Also Published As
Publication number | Publication date |
---|---|
DE102004042650A1 (de) | 2006-03-23 |
WO2006027106A1 (de) | 2006-03-16 |
JP2008511434A (ja) | 2008-04-17 |
CN101018882A (zh) | 2007-08-15 |
KR20070048723A (ko) | 2007-05-09 |
DE102004042650B4 (de) | 2007-07-19 |
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