JP4841412B2 - 基板貼合せ装置 - Google Patents
基板貼合せ装置 Download PDFInfo
- Publication number
- JP4841412B2 JP4841412B2 JP2006329730A JP2006329730A JP4841412B2 JP 4841412 B2 JP4841412 B2 JP 4841412B2 JP 2006329730 A JP2006329730 A JP 2006329730A JP 2006329730 A JP2006329730 A JP 2006329730A JP 4841412 B2 JP4841412 B2 JP 4841412B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- holding
- pressing member
- bonding
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims description 185
- 238000010030 laminating Methods 0.000 title claims description 15
- 238000003825 pressing Methods 0.000 claims description 72
- 239000000853 adhesive Substances 0.000 claims description 58
- 230000001070 adhesive effect Effects 0.000 claims description 58
- 239000004065 semiconductor Substances 0.000 claims description 36
- 210000000078 claw Anatomy 0.000 claims description 18
- 230000006837 decompression Effects 0.000 claims description 10
- 230000005489 elastic deformation Effects 0.000 claims description 8
- 235000012431 wafers Nutrition 0.000 description 122
- 230000007246 mechanism Effects 0.000 description 43
- 235000019589 hardness Nutrition 0.000 description 11
- 238000000034 method Methods 0.000 description 9
- 238000005520 cutting process Methods 0.000 description 6
- 230000002093 peripheral effect Effects 0.000 description 6
- 230000007723 transport mechanism Effects 0.000 description 6
- 238000011084 recovery Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- 239000002390 adhesive tape Substances 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000003014 reinforcing effect Effects 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 230000032258 transport Effects 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/10—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/14—Semiconductor wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/0007—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding involving treatment or provisions in order to avoid deformation or air inclusion, e.g. to improve surface quality
- B32B37/003—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding involving treatment or provisions in order to avoid deformation or air inclusion, e.g. to improve surface quality to avoid air inclusion
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
Description
前記両面接着シートの貼り付けられた半導体ウエハの非接着面を保持する保持テーブルと、
前記基板の周縁の複数箇所を保持し、前記保持テーブルに載置保持された半導体ウエハの両面接着シート接着面に基板を近接させて対向配備する保持手段と、
略半球形状の弾性体で構成された押圧部材を備え、前記保持手段に保持された基板の非貼合せ面を押圧部材で押圧し、この押圧部材を弾性変形させて基板面に扁平接触させながら基板を半導体ウエハに貼り合せる貼合せ手段と、
前記押圧部材の弾性変形に伴って前記保持手段による基板の保持を解除させて基板外方に退避させる駆動手段とを備え、
前記押圧部材は、その半球形状の接触開始位置となる先端が扁平面を有する
ことを特徴とする。
前記両面接着シートの貼り付けられた半導体ウエハの非接着面を保持する保持テーブルと、
前記基板の周縁の複数箇所を保持し、前記保持テーブルに載置保持された半導体ウエハの両面接着シート接着面に基板を近接させて対向配備する保持手段と、
略半球形状の弾性体で構成された押圧部材を備え、前記保持手段に保持された基板の非貼合せ面を押圧部材で押圧し、この押圧部材を弾性変形させて基板面に扁平接触させながら基板を半導体ウエハに貼り合せる貼合せ手段と、
前記押圧部材の弾性変形に伴って前記保持手段による基板の保持を解除させて基板外方に退避させる駆動手段とを備え、
前記押圧部材は、先端から取り付け基端側に向うにつれて硬度が高くなるように構成されている
ことを特徴とする。
37 … 保持テーブル
38 … 係止爪
39 … 押圧部材
W1 … 半導体ウエハ
W2 … 支持基板
T1 … 両面接着シート
Claims (5)
- 半導体ウエハに両面接着シートを介在させて支持用の基板を貼り合せる基板貼合せ装置において、
前記両面接着シートの貼り付けられた半導体ウエハの非接着面を保持する保持テーブルと、
前記基板の周縁の複数箇所を保持し、前記保持テーブルに載置保持された半導体ウエハの両面接着シート接着面に基板を近接させて対向配備する保持手段と、
略半球形状の弾性体で構成された押圧部材を備え、前記保持手段に保持された基板の非貼合せ面を押圧部材で押圧し、この押圧部材を弾性変形させて基板面に扁平接触させながら基板を半導体ウエハに貼り合せる貼合せ手段と、
前記押圧部材の弾性変形に伴って前記保持手段による基板の保持を解除させて基板外方に退避させる駆動手段とを備え、
前記押圧部材は、その半球形状の接触開始位置となる先端が扁平面を有する
ことを特徴とする基板貼合せ装置。 - 請求項1に記載の基板貼合せ装置において、
前記押圧部材は、その半球形状の接触開始位置となる先端が扁平面を有する
ことを特徴とする基板貼合せ装置。 - 半導体ウエハに両面接着シートを介在させて支持用の基板を貼り合せる基板貼合せ装置において、
前記両面接着シートの貼り付けられた半導体ウエハの非接着面を保持する保持テーブルと、
前記基板の周縁の複数箇所を保持し、前記保持テーブルに載置保持された半導体ウエハの両面接着シート接着面に基板を近接させて対向配備する保持手段と、
略半球形状の弾性体で構成された押圧部材を備え、前記保持手段に保持された基板の非貼合せ面を押圧部材で押圧し、この押圧部材を弾性変形させて基板面に扁平接触させながら基板を半導体ウエハに貼り合せる貼合せ手段と、
前記押圧部材の弾性変形に伴って前記保持手段による基板の保持を解除させて基板外方に退避させる駆動手段とを備え、
前記押圧部材は、先端から取り付け基端側に向うにつれて硬度が高くなるように構成されている
ことを特徴とする基板貼合せ装置。 - 請求項1ないし請求項3のいずれかに記載の基板貼合せ装置において、
前記保持手段は、基板周縁を係止する係止爪で構成した
ことを特徴とする基板貼合せ装置。 - 請求項1ないし請求項4のいずれかに記載の基板貼合せ装置において、
少なくとも前記保持テーブル、保持手段、および、貼合せ手段を減圧室に収容して構成した
ことを特徴とする基板貼合せ装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006329730A JP4841412B2 (ja) | 2006-12-06 | 2006-12-06 | 基板貼合せ装置 |
US11/949,593 US7811899B2 (en) | 2006-12-06 | 2007-12-03 | Method for laminating substrate and apparatus using the method |
TW096146004A TWI414037B (zh) | 2006-12-06 | 2007-12-04 | 基板貼合方法及利用該方法之裝置 |
KR1020070125330A KR101429283B1 (ko) | 2006-12-06 | 2007-12-05 | 기판 접합 방법 및 이를 이용한 장치 |
CN2007101955700A CN101197254B (zh) | 2006-12-06 | 2007-12-06 | 基板粘合方法及采用该方法的装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006329730A JP4841412B2 (ja) | 2006-12-06 | 2006-12-06 | 基板貼合せ装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011171921A Division JP5373008B2 (ja) | 2011-08-05 | 2011-08-05 | 基板貼合せ方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008147249A JP2008147249A (ja) | 2008-06-26 |
JP4841412B2 true JP4841412B2 (ja) | 2011-12-21 |
Family
ID=39498572
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006329730A Expired - Fee Related JP4841412B2 (ja) | 2006-12-06 | 2006-12-06 | 基板貼合せ装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7811899B2 (ja) |
JP (1) | JP4841412B2 (ja) |
KR (1) | KR101429283B1 (ja) |
CN (1) | CN101197254B (ja) |
TW (1) | TWI414037B (ja) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5113599B2 (ja) * | 2008-04-08 | 2013-01-09 | リンテック株式会社 | シート貼付装置及び貼付方法 |
JP2010135354A (ja) * | 2008-12-02 | 2010-06-17 | Minami Kk | 板材自動貼合装置 |
US20110168317A1 (en) * | 2010-01-12 | 2011-07-14 | Fujifilm Corporation | Controlled Bond Wave Over Patterned Wafer |
JP2011204860A (ja) * | 2010-03-25 | 2011-10-13 | Disco Corp | テープ剥離装置 |
CN102947923B (zh) * | 2010-06-02 | 2015-11-25 | 库卡系统有限责任公司 | 制造装置和方法 |
DE102010045411A1 (de) * | 2010-09-15 | 2012-03-15 | Uwe Beier | Vorrichtung zur Behandlung und/oder Bearbeitung von Substraten |
US8640755B2 (en) * | 2010-10-05 | 2014-02-04 | Skyworks Solutions, Inc. | Securing mechanism and method for wafer bonder |
JP5558452B2 (ja) * | 2011-10-21 | 2014-07-23 | 東京エレクトロン株式会社 | 貼り合わせ装置 |
CN104093569B (zh) * | 2012-02-01 | 2016-11-16 | 旭硝子株式会社 | 层叠体的制造方法及制造装置 |
JP6051717B2 (ja) * | 2012-09-18 | 2016-12-27 | 大日本印刷株式会社 | メンブレン構造体の製造方法 |
CN103811397B (zh) * | 2012-11-13 | 2016-06-01 | 沈阳芯源微电子设备有限公司 | 一种基板翻转对中装置 |
DE102012111246A1 (de) * | 2012-11-21 | 2014-05-22 | Ev Group E. Thallner Gmbh | Vorrichtung und Verfahren zum Bonden |
JP2013232685A (ja) * | 2013-07-25 | 2013-11-14 | Tokyo Electron Ltd | 接合装置 |
JP2016147342A (ja) * | 2015-02-12 | 2016-08-18 | 株式会社ディスコ | 加工装置のチャックテーブル |
KR102448726B1 (ko) * | 2017-08-14 | 2022-09-28 | 삼성전자주식회사 | 라미네이팅 장치 및 그를 이용하는 반도체 패키지 제조 방법 |
US11152328B2 (en) * | 2018-12-13 | 2021-10-19 | eLux, Inc. | System and method for uniform pressure gang bonding |
JP7465552B2 (ja) | 2021-02-10 | 2024-04-11 | Aiメカテック株式会社 | 基板貼り付け装置及び基板貼り付け方法 |
CN114908327B (zh) * | 2022-04-01 | 2023-03-21 | 山东宇峰维创电子有限公司 | 一种石英晶片生产加工用镀膜装置及其使用方法 |
CN116130384B (zh) * | 2022-12-16 | 2023-10-24 | 江苏宝浦莱半导体有限公司 | 一种半导体晶圆贴膜工艺 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60137035A (ja) * | 1983-12-26 | 1985-07-20 | Toshiba Ceramics Co Ltd | ウエ−ハ接着装置 |
JPH0745559A (ja) * | 1993-07-26 | 1995-02-14 | Furukawa Electric Co Ltd:The | 半導体ウエハに粘着テープを接着する方法 |
JP3447518B2 (ja) * | 1996-08-09 | 2003-09-16 | リンテック株式会社 | 接着シート貼付装置および方法 |
JP2000349136A (ja) | 1999-06-01 | 2000-12-15 | Lintec Corp | 粘着材の貼付装置及び貼付方法 |
DE10052293A1 (de) * | 2000-10-20 | 2002-04-25 | B L E Lab Equipment Gmbh | Verfahren zum Aufbringen eines Substrats |
JP2002313688A (ja) * | 2001-04-16 | 2002-10-25 | Toshiba Corp | ウェーハ接着装置 |
JP2004153159A (ja) * | 2002-10-31 | 2004-05-27 | Enzan Seisakusho:Kk | 半導体ウェハの保護部材貼着方法及びその装置 |
JP4330393B2 (ja) * | 2003-07-14 | 2009-09-16 | 日東電工株式会社 | 基板貼合せ方法およびその装置 |
JP4334420B2 (ja) * | 2004-07-01 | 2009-09-30 | 日東電工株式会社 | 保護テープ貼付け方法および保護テープ貼付け装置 |
US7948034B2 (en) * | 2006-06-22 | 2011-05-24 | Suss Microtec Lithography, Gmbh | Apparatus and method for semiconductor bonding |
-
2006
- 2006-12-06 JP JP2006329730A patent/JP4841412B2/ja not_active Expired - Fee Related
-
2007
- 2007-12-03 US US11/949,593 patent/US7811899B2/en not_active Expired - Fee Related
- 2007-12-04 TW TW096146004A patent/TWI414037B/zh not_active IP Right Cessation
- 2007-12-05 KR KR1020070125330A patent/KR101429283B1/ko active IP Right Grant
- 2007-12-06 CN CN2007101955700A patent/CN101197254B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20080138936A1 (en) | 2008-06-12 |
TW200832607A (en) | 2008-08-01 |
KR20080052431A (ko) | 2008-06-11 |
CN101197254A (zh) | 2008-06-11 |
CN101197254B (zh) | 2011-01-26 |
KR101429283B1 (ko) | 2014-08-11 |
US7811899B2 (en) | 2010-10-12 |
JP2008147249A (ja) | 2008-06-26 |
TWI414037B (zh) | 2013-11-01 |
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