JP4825420B2 - 日光暴露への安定性が向上した層配置 - Google Patents

日光暴露への安定性が向上した層配置 Download PDF

Info

Publication number
JP4825420B2
JP4825420B2 JP2004530268A JP2004530268A JP4825420B2 JP 4825420 B2 JP4825420 B2 JP 4825420B2 JP 2004530268 A JP2004530268 A JP 2004530268A JP 2004530268 A JP2004530268 A JP 2004530268A JP 4825420 B2 JP4825420 B2 JP 4825420B2
Authority
JP
Japan
Prior art keywords
layer
group
compound
acid
layer arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2004530268A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006505099A (ja
JP2006505099A5 (cg-RX-API-DMAC7.html
Inventor
ルーウエト，フランク
バン・ダイク，ゲールト
ロキユフイール，ヨハン
グローネンダール，ベルト
アンドリーセン，ヒエロニムス
Original Assignee
アグフア−ゲヴエルト
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by アグフア−ゲヴエルト filed Critical アグフア−ゲヴエルト
Publication of JP2006505099A publication Critical patent/JP2006505099A/ja
Publication of JP2006505099A5 publication Critical patent/JP2006505099A5/ja
Application granted granted Critical
Publication of JP4825420B2 publication Critical patent/JP4825420B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
    • C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
    • C08G61/126—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds with a five-membered ring containing one sulfur atom in the ring
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J165/00—Adhesives based on macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Adhesives based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
    • C08L25/02—Homopolymers or copolymers of hydrocarbons
    • C08L25/04—Homopolymers or copolymers of styrene
    • C08L25/06—Polystyrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
    • C08L25/02—Homopolymers or copolymers of hydrocarbons
    • C08L25/04—Homopolymers or copolymers of styrene
    • C08L25/08—Copolymers of styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
    • C08L2666/02—Organic macromolecular compounds, natural resins, waxes or and bituminous materials
    • C08L2666/04—Macromolecular compounds according to groups C08L7/00 - C08L49/00, or C08L55/00 - C08L57/00; Derivatives thereof
    • C08L2666/06—Homopolymers or copolymers of unsaturated hydrocarbons; Derivatives thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Thin Film Transistor (AREA)
  • Non-Insulated Conductors (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2004530268A 2002-08-23 2003-07-29 日光暴露への安定性が向上した層配置 Expired - Lifetime JP4825420B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP02102217.3 2002-08-23
EP02102217 2002-08-23
PCT/EP2003/050347 WO2004018560A1 (en) 2002-08-23 2003-07-29 Layer configuration with improved stability to sunlight exposure

Publications (3)

Publication Number Publication Date
JP2006505099A JP2006505099A (ja) 2006-02-09
JP2006505099A5 JP2006505099A5 (cg-RX-API-DMAC7.html) 2006-09-14
JP4825420B2 true JP4825420B2 (ja) 2011-11-30

Family

ID=31896948

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004530268A Expired - Lifetime JP4825420B2 (ja) 2002-08-23 2003-07-29 日光暴露への安定性が向上した層配置

Country Status (5)

Country Link
EP (1) EP1551921B1 (cg-RX-API-DMAC7.html)
JP (1) JP4825420B2 (cg-RX-API-DMAC7.html)
AU (1) AU2003262551A1 (cg-RX-API-DMAC7.html)
DE (1) DE60304363T2 (cg-RX-API-DMAC7.html)
WO (1) WO2004018560A1 (cg-RX-API-DMAC7.html)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004006583A1 (de) 2004-02-10 2005-09-01 H.C. Starck Gmbh Polythiophenformulierungen zur Verbesserung von organischen Leuchtdioden
JP4987239B2 (ja) * 2004-08-30 2012-07-25 信越ポリマー株式会社 導電性組成物
US7666326B2 (en) 2004-08-30 2010-02-23 Shin-Etsu Polymer Co., Ltd. Conductive composition and conductive cross-linked product, capacitor and production method thereof, and antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium
TWI325007B (en) 2004-10-08 2010-05-21 Shinetsu Polymer Co Conductive composition and production method thereof, antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium, and capacitors and production method thereof
JP5283818B2 (ja) * 2004-10-08 2013-09-04 信越ポリマー株式会社 導電性組成物及びその製造方法
JP5124081B2 (ja) 2005-03-09 2013-01-23 住友化学株式会社 フッ素化シクロペンタン環と芳香環との縮合化合物およびその製造方法
JP4823542B2 (ja) * 2005-03-22 2011-11-24 信越ポリマー株式会社 導電性高分子溶液及び導電性塗膜
US20080007518A1 (en) * 2006-06-23 2008-01-10 Debasis Majumdar Conductive polymer coating with improved aging stability
JP4896637B2 (ja) 2006-09-05 2012-03-14 帝人デュポンフィルム株式会社 導電性フィルム
WO2008055834A1 (en) * 2006-11-06 2008-05-15 Agfa-Gevaert Layer configuration with improved stability to sunlight exposure
JP2009209216A (ja) * 2008-02-29 2009-09-17 Fujifilm Corp 導電性ポリマー組成物及び電極材料
JP2009280654A (ja) 2008-05-20 2009-12-03 Fujifilm Corp 導電性ポリマー組成物、導電性ポリマー材料、及び導電性ポリマー材料の製造方法
JP5617640B2 (ja) * 2008-11-19 2014-11-05 日産化学工業株式会社 正孔または電子輸送性薄膜形成用ワニス
JP5402777B2 (ja) * 2009-03-31 2014-01-29 荒川化学工業株式会社 導電性高分子／ドーパント分散体、導電性組成物および導電性皮膜
US8779086B2 (en) * 2010-03-10 2014-07-15 Kuraray Co., Ltd. Electrochromic material and a method for producing the same
JP5637703B2 (ja) * 2010-03-10 2014-12-10 株式会社クラレ π電子系共役ポリマー及びその製造方法
EP3037497B1 (en) * 2014-12-23 2025-02-26 Heraeus Epurio GmbH Process for producing functionalized polythiophenes
JP6977246B2 (ja) * 2015-12-04 2021-12-08 東ソー株式会社 帯電防止薄膜、及び帯電防止用水溶液
JP6977357B2 (ja) * 2017-07-21 2021-12-08 東ソー株式会社 チオフェンスルホン酸塩
JP7035883B2 (ja) * 2018-07-27 2022-03-15 三菱マテリアル株式会社 剥離液
JP7146620B2 (ja) * 2018-12-21 2022-10-04 信越ポリマー株式会社 キャパシタ及びその製造方法、並びに導電性高分子分散液
JP7550658B2 (ja) * 2021-01-13 2024-09-13 信越ポリマー株式会社 導電性高分子含有液及びその製造方法、並びに導電性積層体及びその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63135453A (ja) * 1986-11-27 1988-06-07 Showa Denko Kk 高電導性重合体組成物及びその製造方法
JP2000153229A (ja) * 1998-11-17 2000-06-06 Agfa Gevaert Nv 低温で導電性ポリチオフェン層を形成するための方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE287929T1 (de) * 1994-05-06 2005-02-15 Bayer Ag Leitfähige beschichtungen hergestellt aus mischungen enthaltend polythiophen und lösemittel
US6333145B1 (en) * 1998-11-17 2001-12-25 Agfa-Gevaert Method for preparing a conductive polythiophene layer at low temperature
EP1079397A1 (en) * 1999-08-23 2001-02-28 Agfa-Gevaert N.V. Method of making an electroconductive pattern on a support
DE10004725A1 (de) * 2000-02-03 2001-08-09 Bayer Ag Verfahren zur Herstellung von wasserlöslichen pi-konjugierten Polymeren

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63135453A (ja) * 1986-11-27 1988-06-07 Showa Denko Kk 高電導性重合体組成物及びその製造方法
JP2000153229A (ja) * 1998-11-17 2000-06-06 Agfa Gevaert Nv 低温で導電性ポリチオフェン層を形成するための方法

Also Published As

Publication number Publication date
WO2004018560A1 (en) 2004-03-04
DE60304363T2 (de) 2006-11-30
DE60304363D1 (de) 2006-05-18
JP2006505099A (ja) 2006-02-09
EP1551921A1 (en) 2005-07-13
EP1551921B1 (en) 2006-03-29
AU2003262551A1 (en) 2004-03-11

Similar Documents

Publication Publication Date Title
JP4825420B2 (ja) 日光暴露への安定性が向上した層配置
KR101400533B1 (ko) 일광 노출에 대한 안정성이 개선된 층 구성체
KR101502978B1 (ko) 태양광 노출에 대한 안정성이 개선된 층 구성체
US7147936B2 (en) Layer configuration with improved stability to sunlight exposure
US6977390B2 (en) Layer configuration comprising an electron-blocking element
JP4122338B2 (ja) 導電性ポリマーを含む分散液及びフィルム、並びにオプトエレクトロニックデバイス
JP5303704B2 (ja) セレン含有導電性ポリマー及び導電性ポリマーの製造方法
US20090140219A1 (en) Selenium Containing Electrically Conductive Polymers and Method of Making Electrically Conductive Polymers
US7056600B2 (en) Layer configuration comprising an electron-blocking element
US7307276B2 (en) Layer configuration comprising an electron-blocking element
CN103304783B (zh) 一种聚噻吩分散体系及其制备方法和应用
JP5420560B2 (ja) 太陽光暴露に対する安定性が向上した層構成
WO2004019346A1 (en) Layer configuration comprising an electron-blocking element
WO2004019347A1 (en) Layer configuration comprising an electron-blocking element

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060725

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060725

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20080319

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090825

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20091125

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20091202

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20091224

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20100106

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100121

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110308

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110603

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110906

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110912

R150 Certificate of patent or registration of utility model

Ref document number: 4825420

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140916

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term