JP2006505099A5 - - Google Patents

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Publication number
JP2006505099A5
JP2006505099A5 JP2004530268A JP2004530268A JP2006505099A5 JP 2006505099 A5 JP2006505099 A5 JP 2006505099A5 JP 2004530268 A JP2004530268 A JP 2004530268A JP 2004530268 A JP2004530268 A JP 2004530268A JP 2006505099 A5 JP2006505099 A5 JP 2006505099A5
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JP
Japan
Prior art keywords
layer arrangement
compound
arrangement according
independently
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004530268A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006505099A (ja
JP4825420B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2003/050347 external-priority patent/WO2004018560A1/en
Publication of JP2006505099A publication Critical patent/JP2006505099A/ja
Publication of JP2006505099A5 publication Critical patent/JP2006505099A5/ja
Application granted granted Critical
Publication of JP4825420B2 publication Critical patent/JP4825420B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2004530268A 2002-08-23 2003-07-29 日光暴露への安定性が向上した層配置 Expired - Lifetime JP4825420B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP02102217.3 2002-08-23
EP02102217 2002-08-23
PCT/EP2003/050347 WO2004018560A1 (en) 2002-08-23 2003-07-29 Layer configuration with improved stability to sunlight exposure

Publications (3)

Publication Number Publication Date
JP2006505099A JP2006505099A (ja) 2006-02-09
JP2006505099A5 true JP2006505099A5 (cg-RX-API-DMAC7.html) 2006-09-14
JP4825420B2 JP4825420B2 (ja) 2011-11-30

Family

ID=31896948

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004530268A Expired - Lifetime JP4825420B2 (ja) 2002-08-23 2003-07-29 日光暴露への安定性が向上した層配置

Country Status (5)

Country Link
EP (1) EP1551921B1 (cg-RX-API-DMAC7.html)
JP (1) JP4825420B2 (cg-RX-API-DMAC7.html)
AU (1) AU2003262551A1 (cg-RX-API-DMAC7.html)
DE (1) DE60304363T2 (cg-RX-API-DMAC7.html)
WO (1) WO2004018560A1 (cg-RX-API-DMAC7.html)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004006583A1 (de) 2004-02-10 2005-09-01 H.C. Starck Gmbh Polythiophenformulierungen zur Verbesserung von organischen Leuchtdioden
JP4987239B2 (ja) * 2004-08-30 2012-07-25 信越ポリマー株式会社 導電性組成物
US7666326B2 (en) 2004-08-30 2010-02-23 Shin-Etsu Polymer Co., Ltd. Conductive composition and conductive cross-linked product, capacitor and production method thereof, and antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium
TWI325007B (en) 2004-10-08 2010-05-21 Shinetsu Polymer Co Conductive composition and production method thereof, antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium, and capacitors and production method thereof
JP5283818B2 (ja) * 2004-10-08 2013-09-04 信越ポリマー株式会社 導電性組成物及びその製造方法
JP5124081B2 (ja) 2005-03-09 2013-01-23 住友化学株式会社 フッ素化シクロペンタン環と芳香環との縮合化合物およびその製造方法
JP4823542B2 (ja) * 2005-03-22 2011-11-24 信越ポリマー株式会社 導電性高分子溶液及び導電性塗膜
US20080007518A1 (en) * 2006-06-23 2008-01-10 Debasis Majumdar Conductive polymer coating with improved aging stability
JP4896637B2 (ja) 2006-09-05 2012-03-14 帝人デュポンフィルム株式会社 導電性フィルム
WO2008055834A1 (en) * 2006-11-06 2008-05-15 Agfa-Gevaert Layer configuration with improved stability to sunlight exposure
JP2009209216A (ja) * 2008-02-29 2009-09-17 Fujifilm Corp 導電性ポリマー組成物及び電極材料
JP2009280654A (ja) 2008-05-20 2009-12-03 Fujifilm Corp 導電性ポリマー組成物、導電性ポリマー材料、及び導電性ポリマー材料の製造方法
JP5617640B2 (ja) * 2008-11-19 2014-11-05 日産化学工業株式会社 正孔または電子輸送性薄膜形成用ワニス
JP5402777B2 (ja) * 2009-03-31 2014-01-29 荒川化学工業株式会社 導電性高分子/ドーパント分散体、導電性組成物および導電性皮膜
US8779086B2 (en) * 2010-03-10 2014-07-15 Kuraray Co., Ltd. Electrochromic material and a method for producing the same
JP5637703B2 (ja) * 2010-03-10 2014-12-10 株式会社クラレ π電子系共役ポリマー及びその製造方法
EP3037497B1 (en) * 2014-12-23 2025-02-26 Heraeus Epurio GmbH Process for producing functionalized polythiophenes
JP6977246B2 (ja) * 2015-12-04 2021-12-08 東ソー株式会社 帯電防止薄膜、及び帯電防止用水溶液
JP6977357B2 (ja) * 2017-07-21 2021-12-08 東ソー株式会社 チオフェンスルホン酸塩
JP7035883B2 (ja) * 2018-07-27 2022-03-15 三菱マテリアル株式会社 剥離液
JP7146620B2 (ja) * 2018-12-21 2022-10-04 信越ポリマー株式会社 キャパシタ及びその製造方法、並びに導電性高分子分散液
JP7550658B2 (ja) * 2021-01-13 2024-09-13 信越ポリマー株式会社 導電性高分子含有液及びその製造方法、並びに導電性積層体及びその製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0678492B2 (ja) * 1986-11-27 1994-10-05 昭和電工株式会社 高電導性重合体組成物及びその製造方法
ATE287929T1 (de) * 1994-05-06 2005-02-15 Bayer Ag Leitfähige beschichtungen hergestellt aus mischungen enthaltend polythiophen und lösemittel
US6333145B1 (en) * 1998-11-17 2001-12-25 Agfa-Gevaert Method for preparing a conductive polythiophene layer at low temperature
DE69919661T2 (de) * 1998-11-17 2005-09-22 Agfa-Gevaert Verfahren zur Herstellung einer Schicht aus leitfähigen Polythiophen bei niedriger Temperatur
EP1079397A1 (en) * 1999-08-23 2001-02-28 Agfa-Gevaert N.V. Method of making an electroconductive pattern on a support
DE10004725A1 (de) * 2000-02-03 2001-08-09 Bayer Ag Verfahren zur Herstellung von wasserlöslichen pi-konjugierten Polymeren

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